Xiaowei Yang, I. Kozhevnikov, Qiushi Huang, De-chao Xu, Jiang Li, Zhong Zhang, Zhanshan Wang
The high resolution extreme ultraviolet spectroscopy mission based on the normal-incidence multilayered diffraction grating technology, which provides high effective area and spectral resolution, can carry out a survey of local Galactic stellar and white dwarf targets. Compared to grazing-incidence systems, this approach allows previous observatory-class science to be delivered in a low-cost package. The instrument has already been proven in two sub-orbital space flights. However, the multilayer used before is periodic one and the working band-pass is limited. In this paper, the spectroscopic properties of a normal-incidence multilayered diffraction grating were simulated with three kinds multilayers for the wavelength range between 17.5nm and 25.0nm, which includes lines of Fe VIII to XIII that will be strongest in the cooler (solar like) coronae, plus some weaker lines of O, Si, S and Ar. The highest efficiency at central wavelength of band-pass can be obtained if the periodic multilayer is adopted. The most flat response efficiency can be achieved if we utilized a non-periodic multilayer. The simulation results demonstrated that the choice of the multilayer is dependent on the requirement to the spectroscopy mission and should be considered carefully.
基于正入射多层衍射光栅技术的高分辨率极紫外光谱任务，提供了较高的有效面积和光谱分辨率，可以对银河系本地恒星和白矮星目标进行巡天。与放牧系统相比，这种方法允许以低成本的方式提供以前的观测级科学。该仪器已经在两次亚轨道太空飞行中得到了验证。然而，以前使用的多层是周期性的，工作带通是有限的。本文在17.5nm ~ 25.0nm波长范围内用三种多层膜模拟了正入射多层衍射光栅的光谱特性，其中包括在较冷的(类太阳)日冕中最强的Fe VIII ~ XIII谱线，以及较弱的O、Si、S和Ar谱线。采用周期性多层膜可以在带通中心波长处获得最高的效率。如果我们使用非周期多层，则可以获得最平坦的响应效率。仿真结果表明，多层膜的选择取决于光谱任务的要求，应慎重考虑。
{"title":"The normal-incidence multilayered diffraction grating for the high resolution astrophysical extreme ultraviolet spectroscopy","authors":"Xiaowei Yang, I. Kozhevnikov, Qiushi Huang, De-chao Xu, Jiang Li, Zhong Zhang, Zhanshan Wang","doi":"10.1117/12.2191307","DOIUrl":"https://doi.org/10.1117/12.2191307","url":null,"abstract":"The high resolution extreme ultraviolet spectroscopy mission based on the normal-incidence multilayered diffraction grating technology, which provides high effective area and spectral resolution, can carry out a survey of local Galactic stellar and white dwarf targets. Compared to grazing-incidence systems, this approach allows previous observatory-class science to be delivered in a low-cost package. The instrument has already been proven in two sub-orbital space flights. However, the multilayer used before is periodic one and the working band-pass is limited. In this paper, the spectroscopic properties of a normal-incidence multilayered diffraction grating were simulated with three kinds multilayers for the wavelength range between 17.5nm and 25.0nm, which includes lines of Fe VIII to XIII that will be strongest in the cooler (solar like) coronae, plus some weaker lines of O, Si, S and Ar. The highest efficiency at central wavelength of band-pass can be obtained if the periodic multilayer is adopted. The most flat response efficiency can be achieved if we utilized a non-periodic multilayer. The simulation results demonstrated that the choice of the multilayer is dependent on the requirement to the spectroscopy mission and should be considered carefully.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130436579","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The use of fluorescence in microscopy is a well known technology today. Due to the autofluorescence of the materials of the optical system components, the contrast of the images is degraded. The calculation of autofluorescense usually is performed by brute force methods as volume scattering. The efficiency of calculations in this case is extremely low and a huge number of rays must be calculated. In stray light calculations the concept of important sampling is used to reduce computational effort. The idea is to calculate only rays, which have the chance to reach the target surface. The fluorescence conversion can be considered to be a scatter process and therefore a modification of this idea is used here. The reduction factor is calculated by simply comparing in every z-plane of the lenses the size of the illuminated phase space domain with the corresponding acceptance domain. The boundaries of the domains are determined by simple tracing of the limiting rays of the light cone of the source as well as the pixel area under consideration. The small overlap of both domains can be estimated by geometrical considerations. The correct photometric scaling and the discretization of the volumes must be performed properly. Some necessary approximations produce negligible errors. The improvement in run time is in the range of 104. It is shown with some practical examples of microscopic lenses, that the results are comparable with conventional methods. The limitations and the consequences for questions of the lens design are discussed.
{"title":"Efficient simulation of autofluorescence effects in microscopic lenses","authors":"H. Gross, O. Rodenko, M. Esslinger, A. Tünnermann","doi":"10.1117/12.2191260","DOIUrl":"https://doi.org/10.1117/12.2191260","url":null,"abstract":"The use of fluorescence in microscopy is a well known technology today. Due to the autofluorescence of the materials of the optical system components, the contrast of the images is degraded. The calculation of autofluorescense usually is performed by brute force methods as volume scattering. The efficiency of calculations in this case is extremely low and a huge number of rays must be calculated. In stray light calculations the concept of important sampling is used to reduce computational effort. The idea is to calculate only rays, which have the chance to reach the target surface. The fluorescence conversion can be considered to be a scatter process and therefore a modification of this idea is used here. The reduction factor is calculated by simply comparing in every z-plane of the lenses the size of the illuminated phase space domain with the corresponding acceptance domain. The boundaries of the domains are determined by simple tracing of the limiting rays of the light cone of the source as well as the pixel area under consideration. The small overlap of both domains can be estimated by geometrical considerations. The correct photometric scaling and the discretization of the volumes must be performed properly. Some necessary approximations produce negligible errors. The improvement in run time is in the range of 104. It is shown with some practical examples of microscopic lenses, that the results are comparable with conventional methods. The limitations and the consequences for questions of the lens design are discussed.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134203977","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Recording of binary volumetric diffractive optical elements within a 13 μm thick photosensitive chalcogenide layer using an innovative exposure set-up based on digital micro-mirrors devices is demonstrated. Different examples of beam transformations are shown such as the conversion of Gaussian beam into higher order modes or top-hat beam shapers.
{"title":"Volume phase elements in chalcogenide (Ge33As12Se55) thin films","authors":"Alexandre Joërg, M. Lequime, J. Lumeau","doi":"10.1117/12.2191372","DOIUrl":"https://doi.org/10.1117/12.2191372","url":null,"abstract":"Recording of binary volumetric diffractive optical elements within a 13 μm thick photosensitive chalcogenide layer using an innovative exposure set-up based on digital micro-mirrors devices is demonstrated. Different examples of beam transformations are shown such as the conversion of Gaussian beam into higher order modes or top-hat beam shapers.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133886133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Rogers, M. Caldwell, P. Eccleston, D. Griffin, P. Greenway, A. Fludra, K. Middleton, I. Tosh, T. Richards, Anne Phillipon, U. Schühle
SPICE is a high resolution imaging spectrometer operating at extreme ultraviolet wavelengths, 70.4 - 79.0 nm and 97.3 - 104.9 nm. It is a facility instrument on the ESA Solar Orbiter mission. SPICE will address the key science goals of Solar Orbiter by providing the quantitative knowledge of the physical state and composition of the plasmas in the solar atmosphere, in particular investigating the source regions of outflows and ejection processes which link the solar surface and corona to the heliosphere. By observing the intensities of selected spectral lines and line profiles, SPICE will derive temperature, density, flow and composition information for the plasmas in the temperature range from 10,000 K to 10MK. The optical components of the instrument consist of an off axis parabolic mirror mounted on a mechanism with a scan range of 8 arc minutes. This allows the rastering of an image of the spectrometer slit, which is interchangeable defining the instrument resolution, on the sky. A concave toroidal variable line space grating disperses, magnifies, and re-images incident radiation onto a pair of photocathode coated microchannel plate image intensifiers, coupled to active pixel sensors. For the instrument to meet the scientific and engineering objectives these components must be tightly aligned with each other and the mechanical interface to the spacecraft. This alignment must be maintained throughout the environmental exposure of the instrument to vibration and thermal cycling seen during launch, and as the spacecraft orbits around the sun. The built alignment is achieved through a mixture of dimensional metrology, autocollimation, interferometry and imaging tests. This paper shall discuss the requirements and the methods of optical alignment.
{"title":"Optical alignment of the SPICE EUV imaging spectrometer","authors":"K. Rogers, M. Caldwell, P. Eccleston, D. Griffin, P. Greenway, A. Fludra, K. Middleton, I. Tosh, T. Richards, Anne Phillipon, U. Schühle","doi":"10.1117/12.2191050","DOIUrl":"https://doi.org/10.1117/12.2191050","url":null,"abstract":"SPICE is a high resolution imaging spectrometer operating at extreme ultraviolet wavelengths, 70.4 - 79.0 nm and 97.3 - 104.9 nm. It is a facility instrument on the ESA Solar Orbiter mission. SPICE will address the key science goals of Solar Orbiter by providing the quantitative knowledge of the physical state and composition of the plasmas in the solar atmosphere, in particular investigating the source regions of outflows and ejection processes which link the solar surface and corona to the heliosphere. By observing the intensities of selected spectral lines and line profiles, SPICE will derive temperature, density, flow and composition information for the plasmas in the temperature range from 10,000 K to 10MK. The optical components of the instrument consist of an off axis parabolic mirror mounted on a mechanism with a scan range of 8 arc minutes. This allows the rastering of an image of the spectrometer slit, which is interchangeable defining the instrument resolution, on the sky. A concave toroidal variable line space grating disperses, magnifies, and re-images incident radiation onto a pair of photocathode coated microchannel plate image intensifiers, coupled to active pixel sensors. For the instrument to meet the scientific and engineering objectives these components must be tightly aligned with each other and the mechanical interface to the spacecraft. This alignment must be maintained throughout the environmental exposure of the instrument to vibration and thermal cycling seen during launch, and as the spacecraft orbits around the sun. The built alignment is achieved through a mixture of dimensional metrology, autocollimation, interferometry and imaging tests. This paper shall discuss the requirements and the methods of optical alignment.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"45 3","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132767116","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Trubetskov, T. Amotchkina, A. Tikhonravov, L. Veisz, V. Pervak
In the present work, an innovative optical element developed for the multiterawatt few-cycle light wave synthesizer based on optical parametric amplification is demonstrated. The synthesizer currently produces sub-5-fs, 80-mJ, 18-TW pulses. The required element had to be deposited on 15 mm substrate having 75 mm in diameter; an average value of the GDD of +75 fs2 and reflectance exceeding 99% in the spectral wavelength region from 570 to 1030 nm. Mechanical stresses of the designed dispersive mirror (DM) caused the substrate bending that distorts wave front quality resulting in the distorting of the beam waveform of laser system. In order to compensate this mechanical stress, the substrate back side was covered by an antireflection coating providing the lowest possible reflection in the working spectral range, having the total physical thickness close to DM thickness and total thicknesses of Nb2O5/SiO2 layers close to the corresponding total thicknesses of Nb2O5/SiO2 in DM. The produced DM-AR optical element exhibits excellent spectral properties.
{"title":"Design, production, and reverse engineering of a double sided innovative thin film laser element","authors":"M. Trubetskov, T. Amotchkina, A. Tikhonravov, L. Veisz, V. Pervak","doi":"10.1117/12.2191120","DOIUrl":"https://doi.org/10.1117/12.2191120","url":null,"abstract":"In the present work, an innovative optical element developed for the multiterawatt few-cycle light wave synthesizer based on optical parametric amplification is demonstrated. The synthesizer currently produces sub-5-fs, 80-mJ, 18-TW pulses. The required element had to be deposited on 15 mm substrate having 75 mm in diameter; an average value of the GDD of +75 fs2 and reflectance exceeding 99% in the spectral wavelength region from 570 to 1030 nm. Mechanical stresses of the designed dispersive mirror (DM) caused the substrate bending that distorts wave front quality resulting in the distorting of the beam waveform of laser system. In order to compensate this mechanical stress, the substrate back side was covered by an antireflection coating providing the lowest possible reflection in the working spectral range, having the total physical thickness close to DM thickness and total thicknesses of Nb2O5/SiO2 layers close to the corresponding total thicknesses of Nb2O5/SiO2 in DM. The produced DM-AR optical element exhibits excellent spectral properties.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133249831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Cylindrical targets give the opportunity to improve the process stability of magnetron sputtering processes although reactive deposition might be a challenge. Sputtering from metal doped oxide targets in connection with a plasma source unlocks the full potential: the process can be driven in well-known mid-frequency mode and the plasma source ensures fully stoichiometric films with low loss. During the last years different developments for oxide cylindrical targets were done. The suitable composition has to be found regarding e.g. the density and an arc-free process as familiar for planar targets. In the tube geometry new manufacturing methods are required that ensure these properties. In the present paper we show some examples of the high refractive index materials tantalum oxide: single film characterization as well as realized complex precision optical filters. The results are accompanied by performance measurements in terms of uniformity over 200 mm glass wavers as well as carrier to carrier and batch to batch. These were measured by the position of a quarter-wave stack’s edge.
{"title":"Recent developments in precision optical coatings prepared by cylindrical magnetron sputtering","authors":"S. Bruns, M. Vergöhl, Tobias Zickenrott","doi":"10.1117/12.2191351","DOIUrl":"https://doi.org/10.1117/12.2191351","url":null,"abstract":"Cylindrical targets give the opportunity to improve the process stability of magnetron sputtering processes although reactive deposition might be a challenge. Sputtering from metal doped oxide targets in connection with a plasma source unlocks the full potential: the process can be driven in well-known mid-frequency mode and the plasma source ensures fully stoichiometric films with low loss. During the last years different developments for oxide cylindrical targets were done. The suitable composition has to be found regarding e.g. the density and an arc-free process as familiar for planar targets. In the tube geometry new manufacturing methods are required that ensure these properties. In the present paper we show some examples of the high refractive index materials tantalum oxide: single film characterization as well as realized complex precision optical filters. The results are accompanied by performance measurements in terms of uniformity over 200 mm glass wavers as well as carrier to carrier and batch to batch. These were measured by the position of a quarter-wave stack’s edge.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"152 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116960660","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This paper presents topology optimized designs of carpet cloaks made of dielectrics modeled by a level set boundary expression. The objective functional, evaluating the performance of the carpet cloaks, is defined as the integrated intensity of the difference between electric field reflected by the flat plane and that controlled by a carpet cloak covering a bump. The dielectric structures of carpet cloak are designed to minimize the objective functional value and, in some cases, the value reach 0.34% of that when a bare bump exists. Dielectric structures of carpet cloaks are expressed by level set functions given on grid points. The function becomes positive in dielectrics, negative in air and zero on air-dielectric interfaces and express air-dielectric interfaces explicitly.
{"title":"Topology optimized design of carpet cloaks based on a level set approach","authors":"G. Fujii, M. Nakamura","doi":"10.1117/12.2191256","DOIUrl":"https://doi.org/10.1117/12.2191256","url":null,"abstract":"This paper presents topology optimized designs of carpet cloaks made of dielectrics modeled by a level set boundary expression. The objective functional, evaluating the performance of the carpet cloaks, is defined as the integrated intensity of the difference between electric field reflected by the flat plane and that controlled by a carpet cloak covering a bump. The dielectric structures of carpet cloak are designed to minimize the objective functional value and, in some cases, the value reach 0.34% of that when a bare bump exists. Dielectric structures of carpet cloaks are expressed by level set functions given on grid points. The function becomes positive in dielectrics, negative in air and zero on air-dielectric interfaces and express air-dielectric interfaces explicitly.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117059939","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Composite organic-inorganic coatings are realized by ion beam sputtering (IBS) from a zone target consisting of PTFE and Al2O3. The composition of the sputtered coatings is measured by Energy-Dispersive X-ray spectroscopy and the molecular structure is analyzed by Fourier Transform Infrared spectroscopy. The variation of the refractive index and the optical quality in dependence of the carbon-fluorine content for different material compositions is investigated. Furthermore, the intrinsic stress of the coatings is analyzed and a change from compressive to tensile stress in dependence of the composition is observed. The production of ion beam sputtered composite coatings with low refractive index and tensile stress is demonstrated.
{"title":"Properties of transparent organic-inorganic composite coatings prepared by ion beam sputtering of PTFE and Al2O3","authors":"M. Gauch, H. Ehlers, D. Ristau","doi":"10.1117/12.2191067","DOIUrl":"https://doi.org/10.1117/12.2191067","url":null,"abstract":"Composite organic-inorganic coatings are realized by ion beam sputtering (IBS) from a zone target consisting of PTFE and Al2O3. The composition of the sputtered coatings is measured by Energy-Dispersive X-ray spectroscopy and the molecular structure is analyzed by Fourier Transform Infrared spectroscopy. The variation of the refractive index and the optical quality in dependence of the carbon-fluorine content for different material compositions is investigated. Furthermore, the intrinsic stress of the coatings is analyzed and a change from compressive to tensile stress in dependence of the composition is observed. The production of ion beam sputtered composite coatings with low refractive index and tensile stress is demonstrated.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"71 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124049563","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The position stability of optical elements is an essential part of the tolerance budget of an optical system because its compensation would require an alignment step after the lens has left the factory. In order to achieve a given built performance the stability error contribution needs to be known and accounted for. Given a high-end lens touching the edge of technology not knowing, under- or overestimating this contribution becomes a serious cost and risk factor. If overestimated the remaining parts of the budget need to be tighter. If underestimated the total project might fail. For many mounting principles the stability benchmark is based on previous systems or information gathered by elaborated testing of complete optical systems. This renders the development of a new system into a risky endeavour, because these experiences are not sufficiently precise and tend to be not transferable when scaling of the optical elements is intended. This contribution discusses the influences of different optical mounting concepts on the position stability using the example of high numerical aperture (HNA) inspection lenses working in the deep ultraviolet (DUV) spectrum. A method to investigate the positional stability is presented for selected mounting examples typical for inspection lenses.
{"title":"Lens-mount stability trade-off: a survey exemplified for DUV wafer inspection objectives","authors":"Achmed Bouazzam, T. Erbe, S. Fahr, J. Werschnik","doi":"10.1117/12.2191511","DOIUrl":"https://doi.org/10.1117/12.2191511","url":null,"abstract":"The position stability of optical elements is an essential part of the tolerance budget of an optical system because its compensation would require an alignment step after the lens has left the factory. In order to achieve a given built performance the stability error contribution needs to be known and accounted for. Given a high-end lens touching the edge of technology not knowing, under- or overestimating this contribution becomes a serious cost and risk factor. If overestimated the remaining parts of the budget need to be tighter. If underestimated the total project might fail. For many mounting principles the stability benchmark is based on previous systems or information gathered by elaborated testing of complete optical systems. This renders the development of a new system into a risky endeavour, because these experiences are not sufficiently precise and tend to be not transferable when scaling of the optical elements is intended. This contribution discusses the influences of different optical mounting concepts on the position stability using the example of high numerical aperture (HNA) inspection lenses working in the deep ultraviolet (DUV) spectrum. A method to investigate the positional stability is presented for selected mounting examples typical for inspection lenses.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"99 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124074772","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
C. Stolz, J. Wolfe, P. Mirkarimi, J. Folta, J. Adams, M. Menor, R. Raman, Norm Neilsen, M. Norton, R. Luthi, N. Teslich, C. Menoni, D. Patel
Multilayer interference optical mirror coatings are traditionally fluence-limited by nodular inclusions. Planarization of these defects modifies the geometrically and interference-induced light intensification to increase the laser resistance of mirror coatings. Previous studies using engineered defects on the substrate or buried in the middle of the coating stack have focused only on understanding the improvement in laser resistance. However, real coating defects are distributed throughout the coating. To better understand differences between the critical fluence-limiting defects of both planarized and non-planarized mirror coatings, laser damage pit depths were determined as a function of laser fluence.
{"title":"Depth determination of critical fluence-limiting defects within planarized and non-planarized mirror coatings","authors":"C. Stolz, J. Wolfe, P. Mirkarimi, J. Folta, J. Adams, M. Menor, R. Raman, Norm Neilsen, M. Norton, R. Luthi, N. Teslich, C. Menoni, D. Patel","doi":"10.1117/12.2197349","DOIUrl":"https://doi.org/10.1117/12.2197349","url":null,"abstract":"Multilayer interference optical mirror coatings are traditionally fluence-limited by nodular inclusions. Planarization of these defects modifies the geometrically and interference-induced light intensification to increase the laser resistance of mirror coatings. Previous studies using engineered defects on the substrate or buried in the middle of the coating stack have focused only on understanding the improvement in laser resistance. However, real coating defects are distributed throughout the coating. To better understand differences between the critical fluence-limiting defects of both planarized and non-planarized mirror coatings, laser damage pit depths were determined as a function of laser fluence.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128348948","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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