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Erratum to: Design of a Nonlinear Model of a Pseudomorphic 0.15 µm рHEMT AlGaAs/InGaAs/GaAs Transistor 勘误:设计一个伪态 0.15 µm рHEMT AlGaAs/InGaAs/GaAs 晶体管的非线性模型
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723900043
D. Tsunvaza, R. V. Ryzhuk, I. S. Vasil’evskii, N. I. Kargin, V. A. Klokov

An Erratum to this paper has been published: https://doi.org/10.1134/S1063739723900043

本文的勘误已发表: https://doi.org/10.1134/S1063739723900043
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引用次数: 0
Probe and Spectral Diagnostics of the Plasma of the BCl3–Cl2 Gas Medium BCl3-Cl2 气体介质等离子体的探针和光谱诊断法
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700701
D. B. Murin, I. A. Chesnokov, I. A. Gogulev, A. E. Grishkov

Abstract

The probe and spectral measurements of the plasma of the BCl3–Cl2 gas medium are carried out. Data are obtained on the influence of the initial composition of the gas medium on the electric field strength, gas temperature, particle concentration, and reduced electric field strength under conditions of a direct current glow discharge. The emission spectra of the plasma of the BCl3–Cl2 gas medium are analyzed, the main emitting components are identified, and the relationships between radiation intensities and particle concentrations are established.

摘要 对 BCl3-Cl2 气体介质的等离子体进行了探测和光谱测量。获得了气体介质初始成分对直流辉光放电条件下的电场强度、气体温度、粒子浓度和还原电场强度的影响数据。分析了 BCl3-Cl2 气体介质等离子体的发射光谱,确定了主要发射成分,并建立了辐射强度与粒子浓度之间的关系。
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引用次数: 0
Optically Pumped Bipolar Transistor 光泵双极晶体管
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700762
Yu. K. Al’tudov, D. S. Gaev, A. V. Pskhu, S. Sh. Rekhviashvili

Abstract

The properties of a bipolar NPN transistor when exposed to unmodulated incoherent radiation created by a white LED are studied. The static and dynamic characteristics of the transistor are measured at various exposure intensities. It is shown that the change in the characteristics of the transistor under the optical effect is due to the increased lifetime of nonequilibrium charge carriers and the photovoltaic effect in PN transitions. For these reasons, the gain increases, the switching threshold decreases, and the transistor’s speed increases. The results obtained are applicable both to the creation of high-speed transistors and integrated circuits of a fundamentally new type.

摘要 研究了双极 NPN 晶体管在白色发光二极管产生的非调制非相干辐射下的特性。测量了晶体管在不同照射强度下的静态和动态特性。结果表明,在光学效应下晶体管特性的变化是由于非平衡电荷载流子寿命的增加和 PN 转换中的光生伏打效应。由于这些原因,增益增加,开关阈值降低,晶体管的速度提高。所获得的结果既适用于制造高速晶体管,也适用于制造全新类型的集成电路。
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引用次数: 0
Design of Integrated Voltage Multipliers Using Standard CMOS Technologies 利用标准 CMOS 技术设计集成电压倍增器
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700713
A. S. Sinyukin, B. G. Konoplev, A. V. Kovalev

Abstract

The results of the design of integrated multistage voltage multipliers as components of supply modules for wireless passive microdevices are presented. The parameters of transistors that are significant for the construction of multipliers are considered for three typical CMOS technologies: CM018G 180 nm, HCMOS8D 180 nm, and C250G 250 nm. The Cadence CAD simulation results demonstrate that when implementing an eight-stage multiplier using the CM018G technology, the minimum output voltage level required for operation of the microcircuit is achieved at input amplitude of 250 mV; and when implementing a similar device using the HCMOS8D technology, at an amplitude of 375 mV. Using the example of the constructed 16-stage multiplier, it is shown that the voltage multiplication efficiency values range from 20 to 54% for a wide range of the input voltage, and the efficiency decreases only by 1–3% compared to the 8-stage implementation. The proposed recommendations for the design of integrated voltage rectifiers-multipliers can be used in the development of the passive supply units for microelectronic devices.

摘要 介绍了作为无线无源微型设备电源模块组件的集成多级电压乘法器的设计结果。考虑了三种典型 CMOS 技术中对构建乘法器具有重要意义的晶体管参数:CM018G 180 纳米、HCMOS8D 180 纳米和 C250G 250 纳米。Cadence CAD 仿真结果表明,在使用 CM018G 技术实现八级乘法器时,输入振幅为 250 mV 时即可达到微电路工作所需的最低输出电压水平;而在使用 HCMOS8D 技术实现类似器件时,输入振幅为 375 mV。以构建的 16 级乘法器为例,结果表明在输入电压的较大范围内,电压乘法效率值在 20% 至 54% 之间,与 8 级乘法器相比,效率仅降低 1%-3%。所提出的集成电压整流器-乘法器设计建议可用于微电子器件无源电源单元的开发。
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引用次数: 0
Performance Calculation for a MEMS Switch with a Floating Electrode 带浮动电极的微机电系统开关的性能计算
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700750
M. O. Morozov, I. V. Uvarov

Abstract

Switches fabricated using MEMS technology are considered as a promising element base of radio electronics. The main characteristic of a MEMS switch is the ratio of capacitances in the closed and open states. For conventional devices, this ratio is of several units, but it can be significantly increased by implementing original design solutions. This paper studies the switch, which is a combination of capacitive and resistive devices. Its working characteristics are considered depending on the substrate properties and contact resistance. The switch provides a capacitance ratio of 27.7 and 46.1 when using sapphire and borosilicate glass substrates, while high-resistivity silicon does not allow attaining values above 7.4 due to the high parasitic capacitance. The isolation and insertion loss are 14.7–19.4 and 0.8–1.1 dB in the frequency range of 4–10 GHz on a sapphire wafer. Acceptable S-parameters are achieved when the contact resistance is not higher than 1 Ω.

摘要 利用微机电系统技术制造的开关被认为是无线电电子学中一种前景广阔的元件基础。微机电系统开关的主要特点是闭合和打开状态下的电容比。对于传统器件来说,这一比率为几个单位,但通过采用独创的设计方案,这一比率可以显著提高。本文研究的开关是电容和电阻器件的组合。它的工作特性取决于基底特性和接触电阻。当使用蓝宝石和硼硅玻璃基底时,开关的电容比分别为 27.7 和 46.1,而高电阻率硅由于寄生电容较高,其电容比无法达到 7.4 以上。在蓝宝石晶片上,4-10 千兆赫频率范围内的隔离度和插入损耗分别为 14.7-19.4 分贝和 0.8-1.1 分贝。当接触电阻不高于 1 Ω 时,可获得可接受的 S 参数。
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引用次数: 0
Tapered Silicon Oxide Etching for Creation of Capacitor Structures for Measurement of Dielectric Characteristics 锥形氧化硅蚀刻用于创建电容器结构以测量介电特性
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700695
A. V. Miakonkikh, V. O. Kuzmenko, A. E. Melnikov, K. V. Rudenko

Abstract

The article develops the possibility of forming silicon oxide structures with tapered walls using dry etching methods, including a two-stage process involving the formation of a tapered photoresist mask and plasma etching of the silicon oxide. A study of the process of tapered resist etching was carried out. The influence of plasma parameters and composition on the etching process was studied, plasma diagnostics were carried out using Langmuir probe and optical emission actinometry methods, and the mechanisms of tapered resist etching were suggested. The etching process was optimized and structures with a resist thickness of 400 nm and a sidewall angle of up to 61° were obtained. A subsequent SiO2 etching process allowed the slope of the resist to be transferred. The slope of the SiO2 wall was 57°. The resulting structures with tapered SiO2 walls make it possible to produce capacitors for studying the characteristics of dielectrics, as well as the structure of microelectromechanics and microfluidics.

摘要 文章探讨了使用干法蚀刻方法形成具有锥形壁的氧化硅结构的可能性,包括形成锥形光刻胶掩膜和等离子体蚀刻氧化硅的两阶段过程。对锥形抗蚀剂蚀刻过程进行了研究。研究了等离子体参数和成分对蚀刻过程的影响,使用朗缪尔探针和光发射光度法进行了等离子体诊断,并提出了锥形抗蚀剂蚀刻的机理。对蚀刻过程进行了优化,获得了抗蚀剂厚度为 400 nm、侧壁角度高达 61° 的结构。随后的二氧化硅蚀刻过程可以转移抗蚀剂的斜率。二氧化硅壁的斜度为 57°。由此产生的具有锥形二氧化硅壁的结构可以制作电容器,用于研究电介质的特性以及微机电和微流体的结构。
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引用次数: 0
Performance Estimation and Application of Analog Device using 32 nm CNFET 使用 32 纳米 CNFET 的模拟设备的性能评估与应用
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700683
S. K. Tripathi, Raju Patel, Deepak Agrawal, Manoj Singh Adhikari

Abstract

Carbon nanotubes have emerged as a major material for advanced CMOS devices. The diameter of the carbon has a significant impact on the device’s properties as well as the creation of circuits that use the CNFET. Variations in circuit characteristics with CNT diameter are more obvious in analog domain designs than in digital CNFET-based designs. The proposed study demonstrates the influence of CNT parameter change on a flexible analog device, the differential voltage current conveyor. The performance of a CNFET-based instrumentation amplifier is also studied. To show the studied, HSPICE simulations were done on 32 nm CNFETs.

摘要 碳纳米管已成为先进 CMOS 器件的主要材料。碳的直径对器件的特性以及使用 CNFET 创建电路有重大影响。与基于 CNFET 的数字设计相比,在模拟领域的设计中,电路特性随 CNT 直径的变化更为明显。本研究展示了 CNT 参数变化对灵活的模拟设备--差分电压电流传送器--的影响。此外,还研究了基于 CNFET 的仪表放大器的性能。为了展示所研究的内容,对 32 nm CNFET 进行了 HSPICE 仿真。
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引用次数: 0
Prototypes of Devices for Heterogeneous Hybrid Semiconductor Electronics with an Embedded Biomolecular Domain 嵌入生物分子域的异质混合半导体电子器件原型
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700725
M. A. Baranov, E. K. Karseeva, O. Yu. Tsybin

Abstract

A macromolecular system embedded in a semiconductor microelectronic device is considered as a biomolecular nano- or micro-sized domain that performs the functions of converting acoustic and electromagnetic signals. The issues of the choice of substances, the dynamic and structural-functional state of the domain, and the physical foundations of its interaction with matrix elements are discussed. The process of excitation of forced oscillations in amino acid molecules (for example, glycine, tryptophan, and diphenyl-L-alanine) under the influence of short (10–100 ps) packets of electrical signals in the IR range with a frequency in the range of 1–125 THz is studied by the method of supercomputer nonequilibrium modeling of molecular dynamics. The acoustoelectric interpretation of oscillation generation is carried out using a unified equivalent circuit of the peptide group. Examples of prototypes of heterogeneous devices being developed are given. It is concluded that embedded biomolecular domains, presented as a multifunctional element base, are promising for signal conversion in hybrid microelectronics.

摘要 将嵌入半导体微电子装置的大分子系统视为一个纳米或微米级的生物分子域,它具有转换声信号和电磁信号的功能。本文讨论了物质的选择、畴的动态和结构功能状态及其与矩阵元素相互作用的物理基础等问题。通过超级计算机分子动力学非平衡建模方法,研究了在频率为 1-125 太赫兹的红外范围内短(10-100 ps)电信号包的影响下,氨基酸分子(如甘氨酸、色氨酸和二苯基-L-丙氨酸)受迫振荡的激发过程。利用肽组的统一等效电路对振荡的产生进行了声电解释。给出了正在开发的异质设备原型的例子。结论是,作为多功能元素基础的嵌入式生物分子域在混合微电子学的信号转换方面大有可为。
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引用次数: 0
Simulation of a Vertical Ballistic Quantum-Barrier Field-Effect Transistor Based on an Undoped AlxGa1–xAs Quantum Nanowire 模拟基于未掺杂 AlxGa1-xAs 量子纳米线的垂直弹道量子势垒场效应晶体管
Q4 Engineering Pub Date : 2024-02-08 DOI: 10.1134/s1063739723700749
D. V. Pozdnyakov, A. V. Borzdov, V. M. Borzdov

Abstract

A design and topological solution for a tunnel field-effect transistor of a new type is proposed and the simulation of the transistor is performed. The device is a vertical ballistic field-effect transistor with a cylindrical metallic gate based on a cylindrical undoped AlxGa1–xAs quantum nanowire located in an Al2O3 matrix. For the given geometry of the device structure, the optimum of the fraction of aluminum in the semiconductor composition varying along the transistor channel is found, at which, unlike a conventional tunnel field-effect transistor, not only is the complete suppression of the quantum barrier for electrons by a positive gate voltage ensured but also the minimum possible electrical resistance of the transistor channel is achieved. The current-voltage characteristics of the transistor are calculated within the framework of a rigorous quantum-mechanical description of the electron transport in its channel, taking into account the nonparabolic nature of the band structure of the semiconductor.

摘要 提出了一种新型隧道场效应晶体管的设计和拓扑方案,并对该晶体管进行了仿真。该器件是一种垂直弹道场效应晶体管,具有一个圆柱形金属栅极,其基础是位于 Al2O3 矩阵中的圆柱形未掺杂 AlxGa1-xAs 量子纳米线。与传统的隧道场效应晶体管不同的是,在给定的器件结构几何形状下,找到了半导体成分中沿晶体管沟道变化的铝比例的最佳值,在该值下,不仅能确保正栅极电压完全抑制电子的量子势垒,还能实现晶体管沟道的最小电阻。该晶体管的电流-电压特性是在严格的量子力学描述框架内对其沟道中的电子传输进行计算的,同时考虑到了半导体带状结构的非抛物线性质。
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引用次数: 0
Design and Evaluation of Low Power CMOS Based Schmitt Trigger Circuits 基于施密特触发器的低功耗 CMOS 电路的设计与评估
Q4 Engineering Pub Date : 2023-12-01 DOI: 10.1134/s1063739723700671

Abstract

The requirement of high speed low power square wave generators that yield spike free signal enabled the design of Schmitt trigger circuit. The designs BJT or FET based circuits have disadvantages like spikes in output signal cannot be suppressed, the output signal gain control is required, low packing density, considerable power dissipation, etc. This has paved way to development of CMOS based design. Further low power requirement enabled the CMOS based low power design aspects for the Schmitt trigger circuit. The designs are modeled in DSCH and Microwind tools for schematic and layout development at various technologies like 90, 65, 45, 32 and 22 nm. The choice of designs used are basic Schmitt trigger circuit, dynamic CMOS logic based Schmitt trigger circuit, pseudo NMOS based Schmitt trigger circuit, weak PMOS domino based Schmitt trigger circuit, NORA logic based Schmitt trigger circuit, leakage control transistor (LECTOR) based Schmitt trigger circuit, GALEOR (gated leakage transistor) based Schmitt trigger circuit and feed-forward leakage self-suppression logic (FFLSSL) based Schmitt trigger circuit. While the least number of transistors used are in the pseudo NMOS based Schmitt trigger circuit and highest number of transistors are used in NORA logic based Schmitt trigger circuit. Still pseudo NMOS requires ratioed logic which is a measure drawback. The pseudo NMOS logic based Schmitt trigger circuit occupies very less area by at least 27.027%. The power dissipation is very less in FFLSSL based Schmitt Trigger circuit by at least 75%. The delay is less in FFLSSL based Schmitt trigger circuit by at least 10.15%.

摘要 由于需要能产生无尖峰信号的高速、低功耗方波发生器,因此设计了施密特触发器电路。基于 BJT 或 FET 的电路设计存在一些缺点,如无法抑制输出信号中的尖峰、需要对输出信号进行增益控制、封装密度低、功耗大等。这为基于 CMOS 的设计的发展铺平了道路。进一步的低功耗要求使得基于 CMOS 的施密特触发器电路的低功耗设计成为可能。设计在 DSCH 和 Microwind 工具中建模,用于 90、65、45、32 和 22 纳米等不同技术的原理图和布局开发。选用的设计包括基本施密特触发器电路、基于动态 CMOS 逻辑的施密特触发器电路、基于伪 NMOS 的施密特触发器电路、基于弱 PMOS 多米诺的施密特触发器电路、基于 NORA 逻辑的施密特触发器电路、基于漏电控制晶体管(LECTOR)的施密特触发器电路、基于门控漏电晶体管(GALEOR)的施密特触发器电路和基于前馈漏电自抑制逻辑(FFLSSL)的施密特触发器电路。基于伪 NMOS 的施密特触发电路使用的晶体管数量最少,而基于 NORA 逻辑的施密特触发电路使用的晶体管数量最多。不过,伪 NMOS 仍然需要比率逻辑,这是一个很大的缺点。基于伪 NMOS 逻辑的施密特触发器电路占地面积非常小,至少为 27.027%。基于 FFLSSL 的施密特触发器电路的功耗至少降低了 75%。基于 FFLSSL 的施密特触发器电路的延迟至少减少了 10.15%。
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引用次数: 0
期刊
Russian Microelectronics
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