首页 > 最新文献

Semiconductors最新文献

英文 中文
Top-Down Formation of Biocompatible SiC Nanotubes 自上而下形成生物相容性碳化硅纳米管
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030035
A. D. Bouravleuv, A. N. Kazakin, Yu. A. Nashchekina, A. V. Nashchekin, E. V. Ubyyvovk, V. A. Astrahanceva, A. V. Osipov, G. V. Svyatec, S. A. Kukushkin

Abstract

It was found that the synthesis of silicon carbide epitaxial layers on silicon by coordinated substitution of atoms can be accompanied by the formation of silicon carbide nanotubes growing deep into silicon substrates. That is, for the first time discovered a new “top-down” mechanism for the formation of silicon carbide nanotubes.

摘要 研究发现,通过原子的配位置换在硅上合成碳化硅外延层的同时,可以形成碳化硅纳米管,并向硅衬底深处生长。也就是说,首次发现了一种 "自上而下 "形成碳化硅纳米管的新机制。
{"title":"Top-Down Formation of Biocompatible SiC Nanotubes","authors":"A. D. Bouravleuv, A. N. Kazakin, Yu. A. Nashchekina, A. V. Nashchekin, E. V. Ubyyvovk, V. A. Astrahanceva, A. V. Osipov, G. V. Svyatec, S. A. Kukushkin","doi":"10.1134/s1063782624030035","DOIUrl":"https://doi.org/10.1134/s1063782624030035","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>It was found that the synthesis of silicon carbide epitaxial layers on silicon by coordinated substitution of atoms can be accompanied by the formation of silicon carbide nanotubes growing deep into silicon substrates. That is, for the first time discovered a new “top-down” mechanism for the formation of silicon carbide nanotubes.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"74 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206626","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Formation of Channel Silicon to Create Filter Layers 形成通道硅以创建滤波器层
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030060
K. E. Ivlev, V. V. Bolotov, I. V. Ponomareva, E. V. Knyazev

Abstract

The features of the formation of porous layers on substrates of low doped silicon of и-type conductivity by anodic etching using illumination are considered. The formation of microporous silicon layer on the walls of macropores was found. It is shown that the illumination modes strongly influence the morphological parameters of the obtained layers. After exposure to alkali, macroporous layers with pore diameters up to 550 nm were obtained, which can be used to create filter layers.

摘要 研究了利用光照在低掺杂硅基底上通过阳极蚀刻形成多孔层的特点。研究发现在大孔壁上形成了微孔硅层。研究表明,照明模式对所获得层的形态参数有很大影响。暴露于碱液后,获得了孔径达 550 nm 的大孔层,可用于制造过滤层。
{"title":"Formation of Channel Silicon to Create Filter Layers","authors":"K. E. Ivlev, V. V. Bolotov, I. V. Ponomareva, E. V. Knyazev","doi":"10.1134/s1063782624030060","DOIUrl":"https://doi.org/10.1134/s1063782624030060","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The features of the formation of porous layers on substrates of low doped silicon of и-type conductivity by anodic etching using illumination are considered. The formation of microporous silicon layer on the walls of macropores was found. It is shown that the illumination modes strongly influence the morphological parameters of the obtained layers. After exposure to alkali, macroporous layers with pore diameters up to 550 nm were obtained, which can be used to create filter layers.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"32 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-Current Low-Voltage Switches for Nanosecond Pulse Durations Based on Thyristor (Al)GaAs/GaAs Homo- and Heterostructures 基于晶闸管 (Al)GaAs/GaAs 同质和异质结构的纳秒脉冲持续时间大电流低压开关
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s106378262403014x
S. O. Slipchenko, A. A. Podoskin, I. V. Shushkanov, V. A. Krychkov, A. E. Rizaev, M. I. Kondratov, A. E. Grishin, N. A. Pikhtin, T. A. Bagaev, V. N. Svetogorov, M. A. Ladugin, A. A. Marmalyuk, V. A. Simakov

Abstract

A series of low-voltage thyristor current switches based on (Al)GaAs/GaAs homo- and heterostructures with a volume charge region formed in the lightly doped p-GaAs base layer have been developed. The transient processes characteristics in pulse generation mode of nanosecond duration have been studied. It has been shown that the use of a wide-bandgap barrier based on AlGaAs at the n‑emitter/p-base junction allows reducing the minimum control current amplitude from 30 to 3 mA, and the turn-on delay time can be shortened to 6 ns. For the developed thyristor switches, a minimum transition time of 3.7–3.9 ns was demonstrated when operating in a circuit with a 1 nF capacitive load. In a circuit with a nominal 1 Ω resistive load, the thyristor switches provided a peak current of 17.5 A with a pulse duration of 3.7 ns.

摘要 开发了一系列基于(Al)GaAs/GaAs同质和异质结构的低压晶闸管电流开关,在轻掺杂的 p-GaAs 基底层中形成了一个体积电荷区。研究了纳秒级脉冲发生模式下的瞬态过程特性。结果表明,在 n 发射极/p 基底结使用基于 AlGaAs 的宽带隙势垒,可将最小控制电流幅度从 30 mA 减小到 3 mA,而且接通延迟时间可缩短到 6 ns。就所开发的晶闸管开关而言,在带有 1 nF 电容负载的电路中工作时,最小转换时间为 3.7-3.9 ns。在标称电阻负载为 1 Ω 的电路中,晶闸管开关的峰值电流为 17.5 A,脉冲持续时间为 3.7 ns。
{"title":"High-Current Low-Voltage Switches for Nanosecond Pulse Durations Based on Thyristor (Al)GaAs/GaAs Homo- and Heterostructures","authors":"S. O. Slipchenko, A. A. Podoskin, I. V. Shushkanov, V. A. Krychkov, A. E. Rizaev, M. I. Kondratov, A. E. Grishin, N. A. Pikhtin, T. A. Bagaev, V. N. Svetogorov, M. A. Ladugin, A. A. Marmalyuk, V. A. Simakov","doi":"10.1134/s106378262403014x","DOIUrl":"https://doi.org/10.1134/s106378262403014x","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>A series of low-voltage thyristor current switches based on (Al)GaAs/GaAs homo- and heterostructures with a volume charge region formed in the lightly doped <i>p</i>-GaAs base layer have been developed. The transient processes characteristics in pulse generation mode of nanosecond duration have been studied. It has been shown that the use of a wide-bandgap barrier based on AlGaAs at the <i>n</i>‑emitter/<i>p</i>-base junction allows reducing the minimum control current amplitude from 30 to 3 mA, and the turn-on delay time can be shortened to 6 ns. For the developed thyristor switches, a minimum transition time of 3.7–3.9 ns was demonstrated when operating in a circuit with a 1 nF capacitive load. In a circuit with a nominal 1 Ω resistive load, the thyristor switches provided a peak current of 17.5 A with a pulse duration of 3.7 ns.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"13 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206655","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Magnetic Minibands in Superlattices Based on the Semi-Dirac Crystals 基于半狄拉克晶体的超晶格中的磁小带
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030096
S. V. Kryuchkov, E. I. Kukhar, E. Yu. Kotelnikov

Abstract

Semi-Dirac crystals with a weak periodic modulation of the energy gap has been considered. The formation of minibands in such crystals has been studied when the latter are placed in a quantizing magnetic field. The width of the formed magnetic minibands has been shown to depend not only on the magnetic field intensity, but also on the band gap of the initial sample in contrast to gap graphene. The effect of this feature on the magneto conductivity of studied material has been investigated.

摘要 研究了能隙具有微弱周期性调制的半狄拉克晶体。研究了将此类晶体置于量子化磁场中时,晶体中迷你带的形成。研究表明,形成的磁性迷你带的宽度不仅取决于磁场强度,还取决于初始样品的带隙,这与间隙石墨烯形成了鲜明对比。研究还探讨了这一特征对所研究材料磁导率的影响。
{"title":"Magnetic Minibands in Superlattices Based on the Semi-Dirac Crystals","authors":"S. V. Kryuchkov, E. I. Kukhar, E. Yu. Kotelnikov","doi":"10.1134/s1063782624030096","DOIUrl":"https://doi.org/10.1134/s1063782624030096","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Semi-Dirac crystals with a weak periodic modulation of the energy gap has been considered. The formation of minibands in such crystals has been studied when the latter are placed in a quantizing magnetic field. The width of the formed magnetic minibands has been shown to depend not only on the magnetic field intensity, but also on the band gap of the initial sample in contrast to gap graphene. The effect of this feature on the magneto conductivity of studied material has been investigated.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"18 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Epitaxial Heterostructures of the Active Region for Near-Infrared LEDs 用于近红外发光二极管有源区的外延异质结构
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030138
R. A. Salii, S. A. Mintairov, A. M. Nadtochiy, N. A. Kalyuzhnyy

Abstract

The influence of AlGaAsP, GaAsP and AlGaAs/GaAsP compensating layers on the optical quality of the active area based on InGaAs/GaAs quantum wells for LEDs emitting at a wavelength of 940 nm has been studied. Heterostructures with multiple quantum wells have been grown by MOVPE technique using various approaches to compensating structural stresses. An increase in photoluminescence intensity by more than 32% was demonstrated when using AlGaAs/GaAsP compensating layers.

摘要 研究了 AlGaAsP、GaAsP 和 AlGaAs/GaAsP 补偿层对基于 InGaAs/GaAs 量子阱的有源区光学质量的影响,这些有源区用于波长为 940 nm 的发光二极管。通过 MOVPE 技术,采用各种方法补偿结构应力,生长出了具有多个量子阱的异质结构。使用 AlGaAs/GaAsP 补偿层时,光致发光强度提高了 32% 以上。
{"title":"Epitaxial Heterostructures of the Active Region for Near-Infrared LEDs","authors":"R. A. Salii, S. A. Mintairov, A. M. Nadtochiy, N. A. Kalyuzhnyy","doi":"10.1134/s1063782624030138","DOIUrl":"https://doi.org/10.1134/s1063782624030138","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The influence of AlGaAsP, GaAsP and AlGaAs/GaAsP compensating layers on the optical quality of the active area based on InGaAs/GaAs quantum wells for LEDs emitting at a wavelength of 940 nm has been studied. Heterostructures with multiple quantum wells have been grown by MOVPE technique using various approaches to compensating structural stresses. An increase in photoluminescence intensity by more than 32% was demonstrated when using AlGaAs/GaAsP compensating layers.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"3 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis of Individual Collision Cascade Parameters during Irradiation of Ga2O3 by Atomic and Molecular Ions 原子和分子离子辐照 Ga2O3 过程中的单个碰撞级联参数分析
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030163
A. I. Struchkov, K. V. Karabeshkin, P. A. Karaseov, A. I. Titov

Abstract

Collision cascade density is one of the most important parameters that determine radiation damage accumulation in semiconductors under ion bombardment. We perform calculation of collision cascade parameters formed in β-Ga2O3 by irradiation with 1.3 keV/amu atomic F, P, and molecular PF4 ions using two different methods: the method considering sub-cascade formation, and by calculation an average number of vacancies in spheres of fixed radius. The calculated results are compared with experimental data on damage accumulation in β-Ga2O3 under irradiation with aforementioned ions. It is shown that both methods qualitatively predict the effect of collision cascade density on radiation damage accumulation in gallium oxide. Fractal nature of cascades formed in β-Ga2O3 is established, corresponding fractal dimension is calculated.

摘要碰撞级联密度是决定离子轰击下半导体辐射损伤累积的最重要参数之一。我们使用两种不同的方法计算了在 1.3 keV/amu 原子 F、P 和分子 PF4 离子照射下在β-Ga2O3 中形成的碰撞级联参数:考虑子级联形成的方法和计算固定半径球中空位的平均数量的方法。计算结果与上述离子照射下 β-Ga2O3 中损伤累积的实验数据进行了比较。结果表明,这两种方法都能定性地预测碰撞级联密度对氧化镓中辐射损伤累积的影响。确定了在β-Ga2O3中形成的级联的分形性质,并计算了相应的分形维数。
{"title":"Analysis of Individual Collision Cascade Parameters during Irradiation of Ga2O3 by Atomic and Molecular Ions","authors":"A. I. Struchkov, K. V. Karabeshkin, P. A. Karaseov, A. I. Titov","doi":"10.1134/s1063782624030163","DOIUrl":"https://doi.org/10.1134/s1063782624030163","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Collision cascade density is one of the most important parameters that determine radiation damage accumulation in semiconductors under ion bombardment. We perform calculation of collision cascade parameters formed in β-Ga<sub>2</sub>O<sub>3</sub> by irradiation with 1.3 keV/amu atomic F, P, and molecular PF<sub>4</sub> ions using two different methods: the method considering sub-cascade formation, and by calculation an average number of vacancies in spheres of fixed radius. The calculated results are compared with experimental data on damage accumulation in β-Ga<sub>2</sub>O<sub>3</sub> under irradiation with aforementioned ions. It is shown that both methods qualitatively predict the effect of collision cascade density on radiation damage accumulation in gallium oxide. Fractal nature of cascades formed in β-Ga<sub>2</sub>O<sub>3</sub> is established, corresponding fractal dimension is calculated.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"255 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206658","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optical Excitation of Spin-Triplet States of Two-Electron Donors in Silicon 硅中双电子捐赠者自旋三重态的光学激发
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030175
V. V. Tsyplenkov, R. Kh. Zhukavin, V. N. Shastin

Abstract

In this paper, we propose a method for resonant optical excitation of ortho states of two-electron donors in silicon, direct transitions to which from the ground state are extremely suppressed in case of a weak spin-orbit coupling. Excitation is proposed to be carried out using the points of anti-crossing of ortho and para states under conditions of uniaxial stress of the crystal. In these points the states cannot be unambiguously assigned to any group of states with a certain spin, as a result of which the optical transition becomes allowed. The structure of the energy levels of two-electron impurities is such that the excitation of such state almost unambiguously leads to the population of the underlying ortho-type state, which is expected to be very long-lived in the case of weak spin-orbit coupling. In the present work, theoretical estimates of the cross sections for optical transitions in the vicinity of the level anticrossing point as a function of strain for strong and weak spin-orbit coupling are made.

摘要 本文提出了一种共振光学激发硅中双电子供体正交态的方法,在自旋轨道耦合较弱的情况下,从基态到正交态的直接跃迁被极度抑制。建议在晶体单轴应力条件下,利用正态和对位态的反交叉点进行激发。在这些点上的态无法明确归属于任何具有特定自旋的态组,因此允许发生光学转变。双电子杂质的能级结构是这样的:这种状态的激发几乎可以明确地导致底层正交型状态的出现,而在自旋轨道耦合较弱的情况下,这种状态预计会非常长寿。在本研究中,我们对强自旋轨道耦合和弱自旋轨道耦合情况下,电平反交点附近的光学转变截面随应变的变化进行了理论估算。
{"title":"Optical Excitation of Spin-Triplet States of Two-Electron Donors in Silicon","authors":"V. V. Tsyplenkov, R. Kh. Zhukavin, V. N. Shastin","doi":"10.1134/s1063782624030175","DOIUrl":"https://doi.org/10.1134/s1063782624030175","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>In this paper, we propose a method for resonant optical excitation of ortho states of two-electron donors in silicon, direct transitions to which from the ground state are extremely suppressed in case of a weak spin-orbit coupling. Excitation is proposed to be carried out using the points of anti-crossing of ortho and para states under conditions of uniaxial stress of the crystal. In these points the states cannot be unambiguously assigned to any group of states with a certain spin, as a result of which the optical transition becomes allowed. The structure of the energy levels of two-electron impurities is such that the excitation of such state almost unambiguously leads to the population of the underlying ortho-type state, which is expected to be very long-lived in the case of weak spin-orbit coupling. In the present work, theoretical estimates of the cross sections for optical transitions in the vicinity of the level anticrossing point as a function of strain for strong and weak spin-orbit coupling are made.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"50 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206659","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Model of Breakdown of MOS-Structures by the Mechanism of Anode Hydrogen Release 阳极氢释放机制下的 MOS 结构分解模型
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030011
O. V. Aleksandrov

Abstract

A quantitative model of the breakdown of MOS-structures with relatively thick (10–100 nm) gate dielectric by the mechanism of anode hydrogen release from interphase boundary Si-SiO2 is proposed. The breakdown delay time is determined by dispersion transport and accumulation of hydrogen ions in the gate dielectric. It is shown that at a high concentration of hydrogen in MOS structures and electric field strength of less than ~10 MV/cm, the model satisfactorily describes breakdown delay times significantly shorter than those expected from the 1/E model. At higher field strengths, the breakdown is described by the anode hole injection model.

摘要 本文提出了栅介质相对较厚(10-100 nm)的 MOS 结构在阳极氢从相间边界 Si-SiO2 释放的机制下发生击穿的定量模型。击穿延迟时间由栅极介电质中氢离子的分散传输和积累决定。研究表明,在 MOS 结构中氢浓度较高且电场强度小于 ~10 MV/cm 的情况下,该模型能令人满意地描述击穿延迟时间,该时间明显短于 1/E 模型的预期时间。在较高的电场强度下,击穿由阳极空穴注入模型描述。
{"title":"Model of Breakdown of MOS-Structures by the Mechanism of Anode Hydrogen Release","authors":"O. V. Aleksandrov","doi":"10.1134/s1063782624030011","DOIUrl":"https://doi.org/10.1134/s1063782624030011","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>A quantitative model of the breakdown of MOS-structures with relatively thick (10–100 nm) gate dielectric by the mechanism of anode hydrogen release from interphase boundary Si-SiO<sub>2</sub> is proposed. The breakdown delay time is determined by dispersion transport and accumulation of hydrogen ions in the gate dielectric. It is shown that at a high concentration of hydrogen in MOS structures and electric field strength of less than ~10 MV/cm, the model satisfactorily describes breakdown delay times significantly shorter than those expected from the 1/<i>E</i> model. At higher field strengths, the breakdown is described by the anode hole injection model.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"203 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206623","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Electrochemical Profiling of n+/n GaAs Structures for Field-Effect Transistors 用于场效应晶体管的 n+/n GaAs 结构的电化学剖面分析
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030126
D. Yu. Protasov, P. P. Kamesh, K. A. Svit, D. V. Dmitriev, A. A. Makeeva, E. M. Rzaev, K. S. Zhuravlev

Abstract

It is shown that when using a standard electrochemical profiling recipe that applies intensive illumination by halogen lamp with power up to 250 W of n+/n GaAs structure to generate the holes necessary for etching, the resulting electron distribution profile differs from that set during growth for an electron concentration in the n+-layer > 4 × 1018 cm–3 when using EDTA electrolyte. This difference is due to the appearance and development of etching pits caused by the increase in the degree of defectivity of GaAs layers with increasing concentration of the donor impurity—silicon. To obtain adequate electron distribution profiles in n+/n GaAs structures it is necessary to limit the illumination up to 25 W.

摘要 研究表明,当使用标准电化学剖析配方,通过功率高达 250 W 的卤素灯对 n+/n GaAs 结构进行高强度照射以产生蚀刻所需的空穴时,所得到的电子分布曲线与使用 EDTA 电解液时在 n+ 层中的电子浓度为 4 × 1018 cm-3 时的电子分布曲线不同。造成这种差异的原因是,随着供体杂质硅浓度的增加,砷化镓层的缺陷程度也会增加,从而导致蚀刻坑的出现和发展。为了在 n+/n GaAs 结构中获得足够的电子分布图,有必要将照明限制在 25 W 以下。
{"title":"The Electrochemical Profiling of n+/n GaAs Structures for Field-Effect Transistors","authors":"D. Yu. Protasov, P. P. Kamesh, K. A. Svit, D. V. Dmitriev, A. A. Makeeva, E. M. Rzaev, K. S. Zhuravlev","doi":"10.1134/s1063782624030126","DOIUrl":"https://doi.org/10.1134/s1063782624030126","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>It is shown that when using a standard electrochemical profiling recipe that applies intensive illumination by halogen lamp with power up to 250 W of <i>n</i><sup>+</sup>/<i>n</i> GaAs structure to generate the holes necessary for etching, the resulting electron distribution profile differs from that set during growth for an electron concentration in the <i>n</i><sup>+</sup>-layer &gt; 4 × 10<sup>18</sup> cm<sup>–3</sup> when using EDTA electrolyte. This difference is due to the appearance and development of etching pits caused by the increase in the degree of defectivity of GaAs layers with increasing concentration of the donor impurity—silicon. To obtain adequate electron distribution profiles in <i>n</i><sup>+</sup>/<i>n</i> GaAs structures it is necessary to limit the illumination up to 25 W.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"58 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206632","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Two-Subband Magnetotransport in GaAs Single Quantum Well with Superlattice Doping 超晶格掺杂砷化镓单量子阱中的双子带磁电传输
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030047
A. A. Bykov, D. V. Nomokonov, I. S. Strygin, I. V. Marchishin, A. K. Bakarov

Abstract

Two-subband magnetotransport of quasi-2D electron gas in GaAs single quantum well with AlAs/GaAs superlattice doping has been studied at T = 4.2 K in magnetic fields B < 2T. It was demonstrated that application of negative gate voltage leads to transformation of studied two-subband electron system into the one-subband system. This transformation is accompanied by appearance of positive magnetoresistance. This behavior has been described by conventional model of classical positive magnetoresistance that takes into account elastic intersubband scattering of electrons. Combined analysis of classical positive magnetoresistance and quantum magneto-intersubband oscillations makes it possible to define the values of transport rates of intrasubband scattering and quantum rate of intersubband scattering.

摘要 研究了掺杂有 AlAs/GaAs 超晶格的 GaAs 单量子阱中准二维电子气体在 T = 4.2 K 的磁场 B < 2T 下的双能带磁传输。研究表明,施加负栅极电压会导致所研究的双子带电子系统转变为单子带系统。这种转变伴随着正磁阻的出现。传统的经典正磁阻模型对这种行为进行了描述,该模型考虑了电子的弹性带间散射。结合对经典正磁电阻和量子磁内带振荡的分析,可以确定带内散射的传输速率值和带间散射的量子速率值。
{"title":"Two-Subband Magnetotransport in GaAs Single Quantum Well with Superlattice Doping","authors":"A. A. Bykov, D. V. Nomokonov, I. S. Strygin, I. V. Marchishin, A. K. Bakarov","doi":"10.1134/s1063782624030047","DOIUrl":"https://doi.org/10.1134/s1063782624030047","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Two-subband magnetotransport of quasi-2D electron gas in GaAs single quantum well with AlAs/GaAs superlattice doping has been studied at <i>T</i> = 4.2 K in magnetic fields <i>B</i> &lt; 2<i>T</i>. It was demonstrated that application of negative gate voltage leads to transformation of studied two-subband electron system into the one-subband system. This transformation is accompanied by appearance of positive magnetoresistance. This behavior has been described by conventional model of classical positive magnetoresistance that takes into account elastic intersubband scattering of electrons. Combined analysis of classical positive magnetoresistance and quantum magneto-intersubband oscillations makes it possible to define the values of transport rates of intrasubband scattering and quantum rate of intersubband scattering.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":"29 1","pages":""},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206656","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Semiconductors
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1