首页 > 最新文献

Semiconductors最新文献

英文 中文
Photoluminescence of Arsenic Doped Epitaxial Films of Cd0.3Hg0.7Te 掺砷的 Cd0.3Hg0.7Te 外延薄膜的光致发光特性
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-16 DOI: 10.1134/s1063782624040122
M. S. Ruzhevich, D. D. Firsov, O. S. Komkov, K. D. Mynbaev, V. S. Varavin, M. V. Yakushev

Abstract

The results of photoluminescence (PL) study of As-doped Cd0.3Hg0.7Te solid solutions layers grown by molecular beam epitaxy on a Si substrate are presented. Analysis of the PL spectra obtained at different temperatures and excitation laser powers allows one to judge the nature of the observed peaks. The activation of arsenic in annealed samples was established, as a result of which small acceptor levels are formed. The effectiveness of arsenic as an acceptor impurity for cadmium-mercury tellurides has been confirmed.

摘要 介绍了通过分子束外延在硅基底上生长的掺砷 Cd0.3Hg0.7Te 固溶体层的光致发光(PL)研究结果。通过分析在不同温度和激发激光功率下获得的光致发光光谱,可以判断观察到的峰值的性质。确定了退火样品中砷的活化作用,其结果是形成了小的受体水平。砷作为镉汞碲化物的受体杂质的有效性已得到证实。
{"title":"Photoluminescence of Arsenic Doped Epitaxial Films of Cd0.3Hg0.7Te","authors":"M. S. Ruzhevich, D. D. Firsov, O. S. Komkov, K. D. Mynbaev, V. S. Varavin, M. V. Yakushev","doi":"10.1134/s1063782624040122","DOIUrl":"https://doi.org/10.1134/s1063782624040122","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The results of photoluminescence (PL) study of As-doped Cd<sub>0.3</sub>Hg<sub>0.7</sub>Te solid solutions layers grown by molecular beam epitaxy on a Si substrate are presented. Analysis of the PL spectra obtained at different temperatures and excitation laser powers allows one to judge the nature of the observed peaks. The activation of arsenic in annealed samples was established, as a result of which small acceptor levels are formed. The effectiveness of arsenic as an acceptor impurity for cadmium-mercury tellurides has been confirmed.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142258030","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Formation of Single and Heterostructured Nanowires Based on InAs1 – xPx Solid Solutions on Si(111) 基于 InAs1 - xPx 固溶体在 Si(111) 上形成单层和异质结构纳米线
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-16 DOI: 10.1134/s1063782624040080
A. K. Kaveev, V. V. Fedorov, L. N. Dvoretckaya, S. V. Fedina, I. S. Mukhin

Abstract

We study the growth of nanowire arrays based on InAsP on silicon substrates. It was found that during the growth process two structural phases are formed: a cubic structure of the sphalerite type and a hexagonal structure of the wurtzite type. The epitaxial relations between InAsP and Si were determined: [0001]NWs || [111]Si, [(11bar {2}0)]NWs || [(1bar {1}0)]Si. A decrease of the radial growth rate and the formation of an axial heterojunction were revealed with the formation of thin (<100 nm) segments of the InAs1 – xPx solid solution and maintaining a sufficiently high partial pressure of the As flow (at least 50%).

摘要 我们研究了基于 InAsP 的纳米线阵列在硅衬底上的生长过程。研究发现,在生长过程中会形成两种结构相:闪锌矿型立方结构和钨矿型六方结构。确定了 InAsP 和硅之间的外延关系:[0001]NWs||[111]Si,[(11bar {2}0)]NWs||[(1bar {1}0)]Si。随着 InAs1 - xPx 固溶体薄片(100 nm)的形成,并保持足够高的 As 流分压(至少 50%),发现径向生长速率降低,并形成了轴向异质结。
{"title":"Formation of Single and Heterostructured Nanowires Based on InAs1 – xPx Solid Solutions on Si(111)","authors":"A. K. Kaveev, V. V. Fedorov, L. N. Dvoretckaya, S. V. Fedina, I. S. Mukhin","doi":"10.1134/s1063782624040080","DOIUrl":"https://doi.org/10.1134/s1063782624040080","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>We study the growth of nanowire arrays based on InAsP on silicon substrates. It was found that during the growth process two structural phases are formed: a cubic structure of the sphalerite type and a hexagonal structure of the wurtzite type. The epitaxial relations between InAsP and Si were determined: [0001]<sub>NWs</sub> || [111]<sub>Si</sub>, [<span>(11bar {2}0)</span>]<sub>NWs</sub> || [<span>(1bar {1}0)</span>]<sub>Si</sub>. A decrease of the radial growth rate and the formation of an axial heterojunction were revealed with the formation of thin (&lt;100 nm) segments of the InAs<sub>1 –</sub> <sub><i>x</i></sub>P<sub><i>x</i></sub> solid solution and maintaining a sufficiently high partial pressure of the As flow (at least 50%).</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142258026","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Defects with Deep Levels in High-Voltage Gradual p–i–n Heterojunctions AlGaAsSb/GaAs 高压渐变 pi-n 异质结 AlGaAsSb/GaAs 中的深层缺陷
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-16 DOI: 10.1134/s1063782624040146
M. M. Sobolev, F. Yu. Soldatenkov

Abstract—

High-voltage gradual p0in0 junctions of AlxGa1 – xAs1 – ySby with x ~ 0.24 and y ~ 0.05 in the i‑region were studied using capacitance-voltage characteristics method and transient spectroscopy of deep levels. It has been established that the effective recombination trap in them is the DX-center of the Si donor impurity, with a thermal activation energy Et = 414 meV, a capture cross section σn = 1.04 × 10–14 cm2, and a concentration Nd = 2.4 × 1015 cm–3. In the heterostructures studied, there were no deep levels associated with dislocations.

摘要-采用电容-电压特性法和深电平瞬态光谱法研究了 i 区 x ~ 0.24 和 y ~ 0.05 的 AlxGa1 - xAs1 - ySby 的高压渐变 p0-i-n0 结。结果表明,它们中的有效重组陷阱是硅供体杂质的 DX 中心,热活化能 Et = 414 meV,俘获截面 σn = 1.04 × 10-14 cm2,浓度 Nd = 2.4 × 1015 cm-3。在所研究的异质结构中,不存在与位错相关的深层位。
{"title":"Defects with Deep Levels in High-Voltage Gradual p–i–n Heterojunctions AlGaAsSb/GaAs","authors":"M. M. Sobolev, F. Yu. Soldatenkov","doi":"10.1134/s1063782624040146","DOIUrl":"https://doi.org/10.1134/s1063782624040146","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract—</h3><p>High-voltage gradual <i>p</i><sup>0</sup>–<i>i</i>–<i>n</i><sup>0</sup> junctions of Al<sub><i>x</i></sub>Ga<sub>1 –</sub> <sub><i>x</i></sub>As<sub>1 –</sub> <sub><i>y</i></sub>Sb<sub><i>y</i></sub> with <i>x</i> ~ 0.24 and <i>y</i> ~ 0.05 in the <i>i</i>‑region were studied using capacitance-voltage characteristics method and transient spectroscopy of deep levels. It has been established that the effective recombination trap in them is the <i>DX</i>-center of the Si donor impurity, with a thermal activation energy <i>E</i><sub><i>t</i></sub> = 414 meV, a capture cross section σ<sub><i>n</i></sub> = 1.04 × 10<sup>–14</sup> cm<sup>2</sup>, and a concentration <i>N</i><sub><i>d</i></sub> = 2.4 × 10<sup>15</sup> cm<sup>–3</sup>. In the heterostructures studied, there were no deep levels associated with dislocations.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142258031","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Defects in GaInAsBi Epitaxial Films on Si(001) Substrates 硅(001)基底上 GaInAsBi 外延薄膜中的缺陷
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-16 DOI: 10.1134/s1063782624040110
A. S. Pashchenko, O. V. Devitsky, M. L. Lunina

Abstract

Growth of a thin GalnAsBi film was carried out on a Si (001) substrate by pulsed laser deposition. The growth was carried out in the Volmer–Weber. The grains are preferentially monophase, but are separated by dislocation network, and in some areas, there are antiphase boundaries. Investigation of the real structure by transmission electron microscopy and X-ray diffractometry shows that stress relaxation occurred due to plastic shears by means of a nucleation of dislocations and a slip close-packed {111} planes, as well as twinning and a change in surface roughness. Using X-ray diffractometry, it was found that the GaInAsBi film has a lattice parameter of 5.856 Å. The root-mean-square roughness of the film surface, measured by atomic force microscopy, was 0.51 nm.

摘要 通过脉冲激光沉积法在硅 (001) 基底上生长了 GalnAsBi 薄膜。生长是在 Volmer-Weber 条件下进行的。晶粒主要是单相的,但被位错网络分隔开来,在某些区域还存在反相边界。通过透射电子显微镜和 X 射线衍射仪对实际结构的研究表明,由于塑性剪切,位错成核、紧密堆积的{111}平面滑移,以及孪晶和表面粗糙度的变化,导致了应力松弛。原子力显微镜测量的薄膜表面均方根粗糙度为 0.51 nm。
{"title":"Defects in GaInAsBi Epitaxial Films on Si(001) Substrates","authors":"A. S. Pashchenko, O. V. Devitsky, M. L. Lunina","doi":"10.1134/s1063782624040110","DOIUrl":"https://doi.org/10.1134/s1063782624040110","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Growth of a thin GalnAsBi film was carried out on a Si (001) substrate by pulsed laser deposition. The growth was carried out in the Volmer–Weber. The grains are preferentially monophase, but are separated by dislocation network, and in some areas, there are antiphase boundaries. Investigation of the real structure by transmission electron microscopy and X-ray diffractometry shows that stress relaxation occurred due to plastic shears by means of a nucleation of dislocations and a slip close-packed {111} planes, as well as twinning and a change in surface roughness. Using X-ray diffractometry, it was found that the GaInAsBi film has a lattice parameter of 5.856 Å. The root-mean-square roughness of the film surface, measured by atomic force microscopy, was 0.51 nm.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142258027","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Features of InP on Si Nanowire Growth 硅基 InP 纳米线生长的特点
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030084
L. B. Karlina, A. S. Vlasov, I. V. Ilkiv, A. V. Vershinin, I. P. Soshnikov

Abstract

The possibility of InP nanowhiskers growth from the saturated phosphorus and indium vapors with V/III ratio of 8–10 in a quasi-closed volume on (111) oriented silicon substrates with a natural oxide layer 2–2.5 nm has been demonstrated. The growth of InP nanowhiskers from Au-In-P catalytic droplets formed during the initial period is reported. Optical studies confirmed the formation of InP nanostructures upon the Si surface. The nanostructures exhibit a high doping level presumably with tin atoms.

摘要 在具有 2-2.5 nm 天然氧化层的取向 (111) 硅衬底上,证明了在准封闭体积内从 V/III 比为 8-10 的饱和磷和铟蒸汽中生长 InP 纳米晶须的可能性。报告显示,在初始阶段形成的金-铟-磷催化液滴生长出 InP 纳米晶须。光学研究证实在硅表面形成了 InP 纳米结构。这些纳米结构显示出锡原子的高掺杂水平。
{"title":"Features of InP on Si Nanowire Growth","authors":"L. B. Karlina, A. S. Vlasov, I. V. Ilkiv, A. V. Vershinin, I. P. Soshnikov","doi":"10.1134/s1063782624030084","DOIUrl":"https://doi.org/10.1134/s1063782624030084","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The possibility of InP nanowhiskers growth from the saturated phosphorus and indium vapors with V/III ratio of 8–10 in a quasi-closed volume on (111) oriented silicon substrates with a natural oxide layer 2–2.5 nm has been demonstrated. The growth of InP nanowhiskers from Au-In-P catalytic droplets formed during the initial period is reported. Optical studies confirmed the formation of InP nanostructures upon the Si surface. The nanostructures exhibit a high doping level presumably with tin atoms.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206629","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low Resistance State Degradation during Endurance Measurements in HfO2/HfOXNY-Based Structures 基于 HfO2/HfOXNY 的结构在耐久性测量过程中的低电阻状态退化
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030114
O. O. Permyakova, A. E. Rogozhin, A. V. Myagonkikh, K. V. Rudenko

Abstract

The mechanism of resistive switching in Pt/HfO2(8 nm)/HfOXNY(4 nm)/TiN structures, in which there are two resistive switching modes: bipolar resistive switching and complementary resistive switching. We demonstrate that resistive switching without external current compliance is possible. It is shown experimentally that the conductivity in the low-resistance state corresponds to the space-charge-limited current. A qualitative model is proposed that describes the transition from bipolar resistive switching to complementary resistive switching using Schottky barrier modulation at the metal-insulator interface. Based on this model, an explanation is given for the degradation of the low-resistance state during endurance measurements.

摘要 Pt/HfO2(8 nm)/HfOXNY(4 nm)/TiN 结构中的电阻开关机理,其中存在两种电阻开关模式:双极电阻开关和互补电阻开关。我们证明,电阻开关无需外部电流顺应。实验表明,低电阻状态下的电导率与空间电荷限制电流相对应。我们提出了一个定性模型,利用金属-绝缘体界面上的肖特基势垒调制来描述从双极电阻开关到互补电阻开关的过渡。根据这一模型,我们可以解释在耐久性测量过程中低电阻状态的退化。
{"title":"Low Resistance State Degradation during Endurance Measurements in HfO2/HfOXNY-Based Structures","authors":"O. O. Permyakova, A. E. Rogozhin, A. V. Myagonkikh, K. V. Rudenko","doi":"10.1134/s1063782624030114","DOIUrl":"https://doi.org/10.1134/s1063782624030114","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>The mechanism of resistive switching in Pt/HfO<sub>2</sub>(8 nm)/HfO<sub><i>X</i></sub>N<sub><i>Y</i></sub>(4 nm)/TiN structures, in which there are two resistive switching modes: bipolar resistive switching and complementary resistive switching. We demonstrate that resistive switching without external current compliance is possible. It is shown experimentally that the conductivity in the low-resistance state corresponds to the space-charge-limited current. A qualitative model is proposed that describes the transition from bipolar resistive switching to complementary resistive switching using Schottky barrier modulation at the metal-insulator interface. Based on this model, an explanation is given for the degradation of the low-resistance state during endurance measurements.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206631","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multi-Phonon Relaxation of the 1s(T2) Triplet of Neutral Magnesium Donors in Silicon 硅中的中性镁捐献者的 1s(T2)三重子的多丰弛豫
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030023
N. A. Bekin, R. Kh. Zhukavin, V. V. Tsyplenkov, V. N. Shastin

Abstract

Using adiabatic and one-electron approximations, the rate of multiphonon relaxation of the 1s(T2) triplet of neutral magnesium donors in silicon is estimated. The dominant scattering processes associated with interaction with LO and LA phonons are taken into account. According to calculations, the rate of multiphonon relaxation at zero temperature is of the order of 1011 s–1.

摘要 利用绝热和单电子近似,估算了硅中性镁供体 1s(T2)三重子的多声子弛豫速率。考虑了与 LO 和 LA 声子相互作用相关的主要散射过程。根据计算结果,零温度下的多声子弛豫速率约为 1011 s-1。
{"title":"Multi-Phonon Relaxation of the 1s(T2) Triplet of Neutral Magnesium Donors in Silicon","authors":"N. A. Bekin, R. Kh. Zhukavin, V. V. Tsyplenkov, V. N. Shastin","doi":"10.1134/s1063782624030023","DOIUrl":"https://doi.org/10.1134/s1063782624030023","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Using adiabatic and one-electron approximations, the rate of multiphonon relaxation of the 1<i>s</i>(<i>T</i><sub>2</sub>) triplet of neutral magnesium donors in silicon is estimated. The dominant scattering processes associated with interaction with LO and LA phonons are taken into account. According to calculations, the rate of multiphonon relaxation at zero temperature is of the order of 10<sup>11</sup> s<sup>–1</sup>.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206625","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of Intermediate Low-Temperature Heating on Precipitation in Nonstoichiometric GaAs 中间低温加热对非化学计量砷化镓沉淀的影响
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030151
L. A. Snigirev, N. A. Bert, V. V. Preobrazhenskii, M. A. Putyato, B. R. Semyagin, V. V. Chaldyshev

Abstract

Initial stage of precipitate formation during post-growth annealing of nonstoichiometric GaAs and GaAs0.97Sb0.03 grown by low-temperature (150°C) MBE on GaAs (001) substrate with intermediate growth interruption and simultaneous heating up to 250°C was studied by transmission electron microscopy. Short-term intermediate heating despite the low temperature was revealed to result in the precipitation of larger particles during subsequent post-growth annealing compared to the material not subjected to such heating. This effect is explained by the huge concentration of excess arsenic in LT-GaAs and LT-GaAs0.97Sb0.03 grown at 150°C, enhanced diffusion due to the high concentration of nonequilibrium gallium vacancies, and non-threshold nucleation.

摘要 通过透射电子显微镜研究了在砷化镓(001)衬底上通过低温(150°C)MBE 生长的非原子序数砷化镓和砷化镓 0.97Sb0.03 的生长后退火过程中沉淀物形成的初始阶段,中间生长中断并同时加热至 250°C。结果表明,与没有经过这种加热的材料相比,在低温条件下的短期中间加热会导致在随后的生长后退火过程中析出更大的颗粒。在 150°C 生长的 LT-GaAs 和 LT-GaAs0.97Sb0.03 中过量砷的巨大浓度、非平衡镓空位的高浓度导致的扩散增强以及非阈值成核,都可以解释这种效应。
{"title":"Influence of Intermediate Low-Temperature Heating on Precipitation in Nonstoichiometric GaAs","authors":"L. A. Snigirev, N. A. Bert, V. V. Preobrazhenskii, M. A. Putyato, B. R. Semyagin, V. V. Chaldyshev","doi":"10.1134/s1063782624030151","DOIUrl":"https://doi.org/10.1134/s1063782624030151","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Initial stage of precipitate formation during post-growth annealing of nonstoichiometric GaAs and GaAs<sub>0.97</sub>Sb<sub>0.03</sub> grown by low-temperature (150°C) MBE on GaAs (001) substrate with intermediate growth interruption and simultaneous heating up to 250°C was studied by transmission electron microscopy. Short-term intermediate heating despite the low temperature was revealed to result in the precipitation of larger particles during subsequent post-growth annealing compared to the material not subjected to such heating. This effect is explained by the huge concentration of excess arsenic in LT-GaAs and LT-GaAs<sub>0.97</sub>Sb<sub>0.03</sub> grown at 150<b>°</b>C, enhanced diffusion due to the high concentration of nonequilibrium gallium vacancies, and non-threshold nucleation.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206657","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Features of Formation of InxGa1 – xN Bulk Layers in the Immiscibility Gap of Solid Solutions (x ~ 0.6) by Molecular Beam Epitaxy with Plasma Nitrogen Activation 等离子氮活化分子束外延法在固溶体(x ~ 0.6)不溶间隙中形成 InxGa1 - xN 块状层的特征
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030072
M. A. Kalinnikov, D. N. Lobanov, K. E. Kudryavtsev, B. A. Andreev, P. A. Yunin, L. V. Krasilnikova, A. V. Novikov, E. V. Skorokhodov, Z. F. Skorokhodov

Abstract

In this paper, the features of the formation of bulk InGaN layers with an indium content of ~ 60% in the immiscibility gap of InGaN ternary solid solutions by the method of molecular-beam epitaxy with plasma nitrogen activation are studied. The structures under study were grown on sapphire substrates, while the epitaxy temperature and the ratio of metal (In + Ga) and activated (atomic) nitrogen fluxes were varied. It has been demonstrated that the rates of thermal decomposition and phase separation for In0.6Ga0.4N ternary solutions depend nonmonotonically on the growth temperature in the range Tgr = 430–470°C. It is shown that InGaN thermal decomposition processes occur on the growth surface and lead to the appearance of surface phases of metallic In and binary InN, while phase separation leads to the appearance of InGaN phases of various compositions throughout the volume of the deposited InGaN layer. It is shown that, in the temperature range under study, phase separation is determined by surface diffusion, which can be suppressed by growth under highly nitrogen-enriched conditions, which made it possible to obtain homogeneous InGaN layers with an In content of In ~ 60% during high-temperature (Tgr = 470°C) growth. It is shown that the suppression of InGaN thermal decomposition processes is decisive in achieving effective interband luminescence of the obtained structures, while the presence of phase separation affects the radiative properties of InGaN layers to a lesser extent, at least in the region of low (T = 77 K) temperatures.

摘要 本文研究了利用等离子氮活化分子束外延方法在 InGaN 三元固溶体的不溶隙中形成铟含量约为 60% 的 InGaN 体层的特点。所研究的结构生长在蓝宝石衬底上,外延温度以及金属(In + Ga)和活化(原子)氮通量的比例各不相同。研究表明,在 Tgr = 430-470°C 的范围内,In0.6Ga0.4N 三元溶液的热分解率和相分离率与生长温度非单调相关。研究表明,InGaN 的热分解过程发生在生长表面,并导致金属 In 和二元 InN 表面相的出现,而相分离则导致在整个沉积 InGaN 层体积中出现不同成分的 InGaN 相。研究表明,在研究的温度范围内,相分离是由表面扩散决定的,在高富氮条件下生长可以抑制表面扩散,这使得在高温(Tgr = 470°C)生长过程中获得 In 含量为 In ~ 60% 的均匀 InGaN 层成为可能。研究表明,InGaN 热分解过程的抑制对于所获得结构实现有效的带间发光起着决定性作用,而相分离的存在对 InGaN 层辐射特性的影响较小,至少在低温(T = 77 K)区域是如此。
{"title":"Features of Formation of InxGa1 – xN Bulk Layers in the Immiscibility Gap of Solid Solutions (x ~ 0.6) by Molecular Beam Epitaxy with Plasma Nitrogen Activation","authors":"M. A. Kalinnikov, D. N. Lobanov, K. E. Kudryavtsev, B. A. Andreev, P. A. Yunin, L. V. Krasilnikova, A. V. Novikov, E. V. Skorokhodov, Z. F. Skorokhodov","doi":"10.1134/s1063782624030072","DOIUrl":"https://doi.org/10.1134/s1063782624030072","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>In this paper, the features of the formation of bulk InGaN layers with an indium content of ~ 60% in the immiscibility gap of InGaN ternary solid solutions by the method of molecular-beam epitaxy with plasma nitrogen activation are studied. The structures under study were grown on sapphire substrates, while the epitaxy temperature and the ratio of metal (In + Ga) and activated (atomic) nitrogen fluxes were varied. It has been demonstrated that the rates of thermal decomposition and phase separation for In<sub>0.6</sub>Ga<sub>0.4</sub>N ternary solutions depend nonmonotonically on the growth temperature in the range <i>T</i><sub>gr</sub> = 430–470°C. It is shown that InGaN thermal decomposition processes occur on the growth surface and lead to the appearance of surface phases of metallic In and binary InN, while phase separation leads to the appearance of InGaN phases of various compositions throughout the volume of the deposited InGaN layer. It is shown that, in the temperature range under study, phase separation is determined by surface diffusion, which can be suppressed by growth under highly nitrogen-enriched conditions, which made it possible to obtain homogeneous InGaN layers with an In content of In ~ 60% during high-temperature (<i>T</i><sub>gr</sub> = 470°C) growth. It is shown that the suppression of InGaN thermal decomposition processes is decisive in achieving effective interband luminescence of the obtained structures, while the presence of phase separation affects the radiative properties of InGaN layers to a lesser extent, at least in the region of low (<i>T</i> = 77 K) temperatures.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226258","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Formation of InAs Nanoislands on Silicon Surfaces and Heterostructures Based on Them 在硅表面形成 InAs 纳米岛及其异质结构
IF 0.7 4区 物理与天体物理 Q4 PHYSICS, CONDENSED MATTER Pub Date : 2024-09-04 DOI: 10.1134/s1063782624030059
I. V. Ilkiv, V. V. Lendyashova, B. B. Borodin, V. G. Talalaev, T. Shugabaev, R. R. Reznik, G. E. Cirlin

Abstract

Experimental results of studying the InAs islands formation of silicon surface by molecular beam epitaxy are presented. It has been found that, InAs islands with both bimodal and uniform size distributions can be formed depending on the Si surface relief and the presence of nanopits. The possibility of fabricating heterostructures with InAs quantum dots demonstrating photoluminescence in the region of 1.65 μm, was showed.

摘要 介绍了分子束外延法研究硅表面 InAs 岛形成的实验结果。研究发现,根据硅表面的凹凸和纳米坑的存在,可以形成具有双峰和均匀尺寸分布的 InAs 岛。研究还显示了制造具有 InAs 量子点的异质结构的可能性,这些量子点可在 1.65 μm 区域发光。
{"title":"Formation of InAs Nanoislands on Silicon Surfaces and Heterostructures Based on Them","authors":"I. V. Ilkiv, V. V. Lendyashova, B. B. Borodin, V. G. Talalaev, T. Shugabaev, R. R. Reznik, G. E. Cirlin","doi":"10.1134/s1063782624030059","DOIUrl":"https://doi.org/10.1134/s1063782624030059","url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>Experimental results of studying the InAs islands formation of silicon surface by molecular beam epitaxy are presented. It has been found that, InAs islands with both bimodal and uniform size distributions can be formed depending on the Si surface relief and the presence of nanopits. The possibility of fabricating heterostructures with InAs quantum dots demonstrating photoluminescence in the region of 1.65 μm, was showed.</p>","PeriodicalId":21760,"journal":{"name":"Semiconductors","volume":null,"pages":null},"PeriodicalIF":0.7,"publicationDate":"2024-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142206627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Semiconductors
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1