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2019 14th European Microwave Integrated Circuits Conference (EuMIC)最新文献

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Pulsed Photoconductive Connected Slot Array Operating at the Sub-mm Wavelength Band 工作于亚毫米波段的脉冲光导连接槽阵列
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909489
A. Garufo, A. Davies, I. Lager, N. Llombart, A. Neto, P. Sberna, G. Carluccio, J. Freeman, D. R. Bacon, L. Li, J. Bueno, J. Baselmans, E. Linfield
A novel pulsed photoconductive THz source is presented that is able to radiate mW-level average powers, over a large bandwidth by exploiting both the optical and electrical properties of photoconductive sources and the ultrawideband properties of connected antenna arrays. An optical system composed of a micro-lenses array splits the laser beam into N x N spots that host the active excitation of the antenna arrays. An “ad hoc” network has been adopted to bias the array active spots in order to implement a connected antenna array configuration. The array feeds a silicon lens to increase the directivity of the radiated THz beam. A slot array prototype has been designed, fabricated, and measured. The proposed solutions achieve excellent power radiation levels by making use of an accurate electromagnetic design. This solution can offer enhancements to any active system relying on pulsed photoconductive antennas.
提出了一种新型脉冲光导太赫兹源,利用光导源的光学和电学特性以及连接的天线阵列的超宽带特性,能够在大带宽上辐射毫瓦级的平均功率。由微透镜阵列组成的光学系统将激光束分成N × N个光斑,这些光斑承载着天线阵列的主动激发。采用“自组织”网络对阵列有源点进行偏置,以实现连接的天线阵列配置。该阵列馈入一个硅透镜以增加辐射太赫兹光束的方向性。设计、制作和测量了一个槽阵原型。所提出的解决方案通过使用精确的电磁设计实现了优异的功率辐射水平。该解决方案可以增强任何依赖脉冲光导天线的有源系统。
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引用次数: 0
A 300 GHz Active Frequency Tripler in Transferred-Substrate InP DHBT Technology 一种基于转移基板的300 GHz有源三倍频器
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909673
T. Johansen, M. Hossain, S. Boppel, R. Doerner, V. Krozer, W. Heinrich
This paper presents a monolithic integrated active frequency tripler implemented in an InP double heterojunction bipolar transistor (DHBT) transferred-substrate (TS) technology. The active tripler is based on a balanced topology with Marchand balun at the input and rat-race hybrid coupler at the output. Reflector networks are employed to enhanced the third harmonic response. The measured third harmonic output power is -2.4dBm at 267 GHz and -6.2 dBm at 303 GHz. The second harmonic leakage remains 10 dB lower than the third harmonic power over this bandwidth. The DC power consumption of the active tripler is only 37.6 mW at 303 GHz leading to a DC conversion efficiency of 0.64%.
提出了一种采用InP双异质结双极晶体管(DHBT)转移衬底(TS)技术实现的单片集成有源三频器。有源三倍器基于平衡拓扑,输入端为马尔尚平衡器,输出端为大鼠竞赛混合耦合器。采用反射网络增强三次谐波响应。测量到的三次谐波输出功率在267 GHz时为-2.4dBm,在303 GHz时为-6.2 dBm。在此带宽范围内,二次谐波泄漏比三次谐波功率低10db。有源三倍器在303 GHz时的直流功耗仅为37.6 mW,直流转换效率为0.64%。
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引用次数: 2
EuMIC 2019 Hub Page EuMIC 2019 Hub页面
Pub Date : 2019-09-01 DOI: 10.23919/eumic.2019.8909422
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引用次数: 0
MOM Capacitance Characterization in G-Band using On-wafer 3D-TRL Calibration 使用片上3D-TRL校准的g波段MOM电容表征
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909558
A. Saadi, M. Margalef, S. L. Pilliet, C. Gaquière, D. Gloria, C. Durand, P. Ferrari
In this paper Metal-Oxide-Metal (MOM) capacitors integrated in a BiCMOS 55-nm process are characterized by using 3D-TRL calibration technique. Using 3D electromagnetic (EM) simulation, optimized 3D-TRL standards were designed to cancel the impact of the Back-End-of-Line and define new reference planes at the MOM access-line on low level metal (Metal 4). The intrinsic MOM parameters were well extracted and good agreement was reached between, 3D EM simulation, Design-kit simulation and measurement within the frequency range from 140 to 220 GHz. Further, based on EM simulation, the 3D-TRL was compared to the conventional TRL. This proved the advantage of the 3D-TRL in the parasitic resistance extraction. To the best of author’s knowledge, it is the first time that MOM capacitors are accurately characterized in this frequency range.
本文利用3D-TRL校准技术对集成在BiCMOS 55纳米工艺中的金属氧化物金属(MOM)电容器进行了表征。利用三维电磁(EM)仿真,设计了优化的3D- trl标准,以消除后端线的影响,并在低电平金属(metal 4)的MOM访问线上定义新的参考平面。在140 ~ 220 GHz的频率范围内,很好地提取了固有的MOM参数,并在3D EM仿真、Design-kit仿真和测量之间达成了良好的一致性。在EM仿真的基础上,将3D-TRL与传统TRL进行了比较。这证明了3D-TRL在寄生虫抗性提取中的优势。据作者所知,这是第一次在这个频率范围内准确表征MOM电容器。
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引用次数: 5
A Novel Wide-Band Finger-Shaped Phase Shifter on Silicon-On-Glass (SOG) Technology for Sub-Millimeter Wave and Terahertz Applications 用于亚毫米波和太赫兹应用的新型基于玻璃上硅(SOG)技术的宽带指状移相器
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909679
A. Taeb, S. Gigoyan, M. Basha, S. Chaudhuri, S. Safavi-Naeini
This paper presents a novel approach to realize a low-cost and wide-band phase shifter structure operating over 150-190 GHz range of frequencies. The proposed finger-shaped phase shifter is implemented based on a newly developed integrated Silicon-On-Glass (SOG) technology. The phase shifting mechanism is achieved by moving a finger-shaped High Conductivity Silicon (HCS) section over the High Resistivity Silicon (HRS) waveguide, using a micro-positioner. Perturbing the silicon waveguide field causes phase shift. The experimental results indicates the proposed SOG finger-shaped phase shifter provides the averages of 15.6 degree/wavelength phase shift and 1.38 dB/wavelength added loss, respectively, over 150-190 GHz range of frequencies.
本文提出了一种实现低成本宽带移相器结构的新方法,该移相器的工作频率为150 ~ 190 GHz。所提出的手指状移相器是基于新开发的集成玻璃上硅(SOG)技术实现的。相移机制是通过使用微定位器在高电阻率硅(HRS)波导上移动手指形状的高导电性硅(HCS)部分来实现的。干扰硅波导场会引起相移。实验结果表明,在150 ~ 190 GHz频率范围内,所提出的SOG指状移相器的平均相移度为15.6度/波长,附加损耗为1.38 dB/波长。
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引用次数: 0
Gigahertz Frequency Graphene Transistor, high yield process and good stability under strain 千兆赫频率石墨烯晶体管,产率高,应变稳定性好
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909548
W. Wei, S. Mhedhbi, S. B. Salk, T. Levert, O. Txoperena, E. Pallecchi, H. Happy
We report a bonding free fabrication process suitable for flexible substrate based graphene field effect transistors (GFETs). Transistors with different gate length (100 nm, 200 nm and 300 nm) and different channel width $(12 mu mathrm{m}, 24 mu mathrm{m}$ and $50 mu mathrm{m})$ are successfully fabricated on Kapton substrate. The transistor yield is more than 80%. Our GFETs exhibit good stability with 0.5% strain applied. Our finding ensures for next application of RF circuit based on graphene transistor.
我们报道了一种适用于柔性衬底石墨烯场效应晶体管(gfet)的无键制造工艺。在Kapton衬底上成功制备了不同栅极长度(100 nm、200 nm和300 nm)和不同通道宽度(12 mu mathrm{m}、24 mu mathrm{m}$和50 mu mathrm{m})$的晶体管。晶体管的良率超过80%。我们的gfet在0.5%的应变下表现出良好的稳定性。我们的发现为基于石墨烯晶体管的射频电路的下一步应用奠定了基础。
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引用次数: 0
10W K band GaN MMIC amplifier embedded in Waveguide-based Metal Ceramic Package 基于波导的金属陶瓷封装的10W K波段GaN MMIC放大器
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909524
L. Marechal, B. Gerfault, G. L. Rhun, M. Dinari, T. Huet, E. Richard, V. Serru, M. Camiade, C. Chang, L. Brunel, G. Mouchon
This paper describes the design methodology and characterization of a 10W K Band packaged amplifier for space applications. The MMIC was developed on the new UMS $0.15 mumathrm{m}$ gate length GaN technology on SiC substrate as the final stage of a downlink satellite transmitter in the 17.3-20.2 GHz frequency band. A dedicated hermetic package has been developed around the MMIC with an output waveguide transition (compatible of WR51) for low loss integration in a Solid State Power Amplifier (SSPA) output combiner. This packaged High Power Amplifier (HPA) measured in CW mode, reaches 10W output power in saturation, with an associated 35% of Power Added Efficiency (PAE) and 10° AM-PM variation. These data are provided for a package backside temperature of $90^{circ}mathrm{C}$.
本文介绍了一种用于空间应用的10W K波段封装放大器的设计方法和特性。MMIC是在SiC衬底上采用新的UMS $0.15 mumathrm{m}$栅长GaN技术开发的,作为17.3-20.2 GHz频段下行卫星发射机的最后一级。围绕MMIC开发了专用密封封装,具有输出波导转换(与WR51兼容),可在固态功率放大器(SSPA)输出组合器中实现低损耗集成。这种封装的高功率放大器(HPA)在连续波模式下测量,在饱和状态下达到10W输出功率,附带35%的功率附加效率(PAE)和10°AM-PM变化。这些数据是在包装背面温度为$90^{circ} mathm {C}$的情况下提供的。
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引用次数: 12
Experimental Analysis of In-package Harmonic Manipulations with a 160 W GaN HEMT Power Bar
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909396
O. Ceylan, A. Işik, Yi Zhu, S. Pires
In this study, contributions of the proper harmonic terminations at the input and output of large power bars to efficiency of the packaged high power RF devices are presented. The designed networks have low-pass filter characteristic including specific terminations for 2nd harmonics and are implemented into ceramic packages. The power bars consist of 16 mm total gate width GaN HEMTs of 0.45 $mu$m process technology. The measured results show that proper terminations of the harmonics at the input and output provide 18 % DE improvement. 80.5 % peak drain efficiency and 52 dBm peak output power were achieved at 2.9 GHz. Drain efficiency was higher than 76 % in 2.7-3.1 GHz band.
在本研究中,提出了在大功率棒的输入和输出处适当的谐波终端对封装的高功率射频器件效率的贡献。所设计的网络具有低通滤波器特性,包括特定的二次谐波终端,并实现在陶瓷封装中。电源棒由总栅极宽度为16mm的GaN hemt组成,工艺技术为0.45 $mu$m。测量结果表明,在输入和输出处适当的谐波端接可使DE提高18%。在2.9 GHz下,峰值漏极效率达到80.5%,峰值输出功率达到52 dBm。2.7 ~ 3.1 GHz频段漏极效率高于76%。
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引用次数: 2
HCI-Proof Ultra-Broadband Millimeter-Wave Amplifier for Automotive Radar 用于汽车雷达的抗hci超宽带毫米波放大器
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909465
N. Hasegawa, S. Kishimoto, S. Yamaura
In this paper, a circuit configuration to solve the problem of hot carrier injection (HCI) in a millimeter-wave amplifier is proposed. It is necessary to drive the LO-terminal of a mixer with sufficient voltage swing, but as it is generally known, there is the problem of HCI in CMOS transistors. Applying voltage exceeding the HCI limit to a transistor will accelerate the degradation of the transistor. Therefore, we controlled the output power of the driver amplifier to adjust the voltage swing to an allowable range. Furthermore, by controlling the output power, a wide range of frequency flatness from 72 GHz to 88 GHz has been achieved. This circuit is fabricated in 40-nm CMOS.
本文提出了一种解决毫米波放大器热载流子注入问题的电路结构。有必要用足够的电压摆幅来驱动混频器的lo端,但众所周知,CMOS晶体管中存在HCI问题。对晶体管施加超过HCI限制的电压将加速晶体管的退化。因此,我们控制驱动放大器的输出功率,将电压摆幅调整到一个允许的范围。此外,通过控制输出功率,实现了72ghz ~ 88ghz范围内的频率平坦度。该电路是在40纳米CMOS中制造的。
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引用次数: 1
A Planar Single-ended Kilowatt-level VHF Class E Power Amplifier 平面单端千瓦级甚高频E类功率放大器
Pub Date : 2019-09-01 DOI: 10.23919/EuMIC.2019.8909543
Renbin Tong, Stefan Book, L. H. Duc, D. Dancila
This paper demonstrates a high-efficiency kilowatt-level Class E RF power amplifier which is designed as RF source for particle accelerator energy systems. Class E method of switch mode feathers is employed here to improve efficiency for such high power kilowatts PA in a single chip. It uses a powerful LDMOS-transistor in a single-ended design and provides 1200 W peak power with 83% drain efficiency and 19.9 dB gain at 100 MHz operation. In addition it provides 1010 W peak power with 87% drain efficiency and 20.4 dB gain at 102 MHz operation. All measurements were performed in pulsed operation with a 5% duty cycle, 3.5 ms pulse at 14 Hz repetition. According to the authors’ knowledge, this kilowatts power amplifier adopted Class E method is reported at first time in this field.
介绍了一种用于粒子加速器能量系统的高效率千瓦级E类射频功率放大器。为了提高单芯片高功率千瓦级PA的效率,本文采用了开关模式羽毛的E类方法。它采用强大的单端ldmos晶体管设计,在100 MHz工作时提供1200 W的峰值功率,83%的漏极效率和19.9 dB增益。此外,它在102 MHz工作时提供1010 W的峰值功率,87%的漏极效率和20.4 dB增益。所有测量均在脉冲操作中进行,占空比为5%,脉冲频率为3.5 ms,重复频率为14hz。据笔者所知,这种采用E类方法的千瓦级功率放大器在该领域尚属首次报道。
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引用次数: 1
期刊
2019 14th European Microwave Integrated Circuits Conference (EuMIC)
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