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2018 13th European Microwave Integrated Circuits Conference (EuMIC)最新文献

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A 3.9-4.7 GHz 0.35 mW DCO with −187.4 dBc FoM in 28nm CMOS 3.9-4.7 GHz 0.35 mW DCO,−187.4 dBc FoM, 28nm CMOS
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539952
Run Levinger, R. Levi, E. Shumaker, S. Levin, G. Horovitz
This paper presents an LC tank, ultra-low power CMOS digitally controlled oscillator (DCO) with resistive drain delay element designed and fabricated in 28 nm CMOS process. The implemented DCO covers 3.95 to 4.7 GHz (17% tuning range, TR) with a resolution of 300 to 500 KHz and gain variation of less than 3 % within a sub-band. Measured phase noise at 4.6 GHz is − 83, −109.5 and −130 dBc/Hz for 100 KHz, 1 MHz and 10 MHz offsets respectively. The DCO is designed to be temperature robust and allows operation within −40°C to 130°C. The DCO and output buffers consume 0.44 mA from a 0.8 V supply, for a total power of 0.35mW. The DCO active area is 0.04 mm2.
本文介绍了一种采用28纳米CMOS工艺设计制作的具有阻性漏极延迟元件的超低功耗CMOS数字控制振荡器(DCO)。所实现的DCO覆盖3.95 ~ 4.7 GHz(17%调谐范围,TR),分辨率为300 ~ 500 KHz,子带内增益变化小于3%。在100 KHz、1 MHz和10 MHz偏移量下,4.6 GHz测量相位噪声分别为- 83、- 109.5和- 130 dBc/Hz。DCO设计具有温度稳健性,可在- 40°C至130°C范围内工作。DCO和输出缓冲器从0.8 V电源消耗0.44 mA,总功率为0.35mW。DCO有效面积为0.04 mm2。
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引用次数: 4
LDMOS Technology for Power Amplifiers Up to 12 GHz 用于12ghz以下功率放大器的LDMOS技术
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539904
S. Theeuwen, H. Mollee, R. Heeres, F. van Rijs
We show the capability of LDMOS technology for power amplifiers at frequencies up to 12 GHz. The frequency roll-off of the RF parameters is presented for the several LDMOS nodes (12V, 30V, 50V). Spectacularly high RF performance is measured by using on-wafer load pull for 4mm structures made in LDMOS 30V node. At 12 GHz, we measure a 35% drain efficiency, 10 dB gain and 1.0W/mm power density. Furthermore at 5 GHz, this on wafer LDMOS has about 63% drain efficiency, 19 dB gain and 1.4 W/mm, showing that LDMOS is capable of serving 5–12 GHz applications. As a demonstrator, we show the first packaged C-band LDMOS amplifier with more than 20W output power and an efficiency of 50–51 % over the band in combination with 15–16 dB maximum linear gain.
我们展示了LDMOS技术在频率高达12 GHz的功率放大器上的能力。给出了几个LDMOS节点(12V, 30V, 50V)射频参数的频率滚降。通过使用LDMOS 30V节点制造的4mm结构的片上负载拉来测量惊人的高射频性能。在12 GHz时,我们测量了35%的漏极效率,10 dB增益和1.0W/mm功率密度。此外,在5 GHz时,该片上LDMOS具有约63%的漏极效率,19 dB增益和1.4 W/mm,表明LDMOS能够服务于5 - 12 GHz应用。作为演示,我们展示了第一个封装的c波段LDMOS放大器,输出功率超过20W,该波段效率为50 - 51%,最大线性增益为15-16 dB。
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引用次数: 13
110–135 GHz SiGe BiCMOS Frequency Quadrupler Based on a Single Gilbert Cell 基于单吉尔伯特单元的110-135 GHz SiGe BiCMOS四倍频器
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539958
M. Ko, Mohamed Hussein Eissa, J. Borngräber, A. Çağrı Ulusoy, D. Kissinger
This paper proposes a compact and efficient frequency quadrupler based on a single Gilbert cell which converts 30 GHz input frequency directly into 120 GHz. It consists of a spiral Marchand edge coupled input balun, a Gilbert cell based quadrupler core and an output buffer. The Gilbert cell core, which is conventionally utilized as a doubler, is utilized here as a quadrupler to generate strong fourth harmonic by maximizing the nonlinearity of the transconductance stage in order to mix the third harmonic with the fundamental component in the switching quad. The usage of single stage multiplication enables to achieve high power efficiency and wide bandwidth. The circuit implemented in 0.13μm SiGe BiCMOS achieves an output power of 2.7 dBm at 120 GHz with a 3-dB bandwidth of 25 GHz and a power efficiency of 4.1 %. Spurious rejection is better than 30 dBc at the output frequency of 120 GHz. The circuit occupies a silicon area of 0.42 mm2.
本文提出了一种基于单个吉尔伯特单元的紧凑高效的四倍频器,可将30 GHz的输入频率直接转换为120 GHz。它由一个螺旋马尔尚和边缘耦合输入平衡器、一个基于吉尔伯特单元的四倍器核心和一个输出缓冲器组成。吉尔伯特芯,传统上被用作倍频器,在这里被用作四倍频器,通过最大化跨导级的非线性来产生强四次谐波,以便将三次谐波与开关四元中的基频分量混合。采用单级乘法可以实现高功率效率和宽带宽。该电路采用0.13μm SiGe BiCMOS实现,在120 GHz时输出功率为2.7 dBm, 3db带宽为25 GHz,功率效率为4.1%。在120 GHz输出频率下,抑制杂散性能优于30 dBc。电路的硅面积为0.42 mm2。
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引用次数: 9
A New Compact Model for Accurate Simulation of RF Noise in Sub-40nm Multi-Finger nMOSFETs 一种精确模拟40nm以下多指nmosfet射频噪声的新型紧凑模型
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539965
Jyh-Chyurn Guo, K. Yeh
A new compact model has been developed in this paper for accurate simulation of RF noise and extraction of actual intrinsic noise in sub-40 nm multi-finger nMOSFETs. This model can predict and verify the excess noise sources before and after deembedding, the mechanism responsible for the complicated layout dependence in various noise parameters, and facilitate optimization design for low noise devices and circuits in nanoscale CMOS technology.
本文建立了一种新的紧凑模型,用于精确模拟40 nm以下多指nmosfet的射频噪声和提取实际本征噪声。该模型可以预测和验证去嵌入前后的多余噪声源,以及各种噪声参数复杂布局依赖的机理,为纳米级CMOS技术中低噪声器件和电路的优化设计提供方便。
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引用次数: 0
Ultra-Compact Low-Loss Integrated Transformer-Based Ku-Band Quadrature Hybrid Coupler 基于超小型低损耗集成变压器的ku波段正交混合耦合器
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539914
Manuel Potércau, N. Deltimple, A. Ghiotto
In this paper, an ultra-compact transformer-based integrated quadrature hybrid coupler is presented. Its design, taking advantage of the transformer distributed parasitic capacitances to minimize lumped capacitors, achieves low insertion loss and high compactness. For demonstration purposes, a prototype, operating at Ku-band and based on the 130 nm BiCMOS technology from STMicroelectronics, has been fabricated. Theoretical, simulated and experimental results are reported. The demonstrated integrated coupler occupies an area as small as 0.0014 mm2. In the 17.3 to 20.2 GHz frequency range (15.5% relative bandwidth) used for SATCOM applications, an insertion loss and a phase imbalance of better than 0.4 dB and 2° are experimentally obtained, respectively, with an amplitude imbalance of less than 1 dB.
提出了一种基于超紧凑变压器的集成正交混合耦合器。其设计利用变压器的分布式寄生电容,最大限度地减少了集总电容,实现了低插入损耗和高紧凑性。为了演示目的,我们制作了一个基于意法半导体130纳米BiCMOS技术的ku波段原型机。给出了理论、仿真和实验结果。所演示的集成耦合器占地面积小至0.0014 mm2。在用于SATCOM应用的17.3 ~ 20.2 GHz频率范围(15.5%相对带宽)中,实验获得的插入损耗和相位不平衡分别优于0.4 dB和2°,幅度不平衡小于1 dB。
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引用次数: 4
A Terahertz Direct Detector in 22nm FD-SOI CMOS 22nm FD-SOI CMOS的太赫兹直接探测器
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539908
R. Jain, Robin Zatta, J. Grzyb, D. Harame, U. Pfeiffer
This paper reports on the design and characterization of a CMOS based direct terahertz detector in an advanced 22nm FD-SOI technology. The nFET detector is implemented with an on-chip ring antenna fully compliant with the technology density rules. At 0.855 THz, a maximum optical responsivity and a minimum noise equivalent power (NEP) of 1.51 kV/W and 22.65 pW/HZ1/2respectively were measured in a voltage mode readout at a chopping frequency of 3 kHz. In the current mode readout, a maximum responsivity of 180 mA/W and minimum NEP of 12 pW/HZ1/2were measured at a chopping frequency of 120 kHz. Additionally, the effect of transistor back-gate biasing on the detector responsivity is also characterized. The detector sensitivity is comparable to the best reported room-temperature THz direct detectors in any silicon integrated technology, along with the highest reported RF operational bandwidth with NEP below 40 pW/HZ1/2in the measured frequency band of 0.7–1 THz.
本文报道了采用先进的22nm FD-SOI技术,基于CMOS的直接太赫兹探测器的设计和表征。nFET探测器采用完全符合技术密度规则的片上环形天线实现。在0.855 THz下,斩波频率为3 kHz的电压模式读出,最大光响应率为1.51 kV/W,最小噪声等效功率(NEP)为22.65 pW/ hz1 /2。在电流模式读出中,斩波频率为120 kHz时,最大响应度为180 mA/W,最小NEP为12 pW/ hz1 /2。此外,还研究了晶体管后门偏置对探测器响应度的影响。该探测器的灵敏度可与任何硅集成技术中报道的最佳室温太赫兹直接探测器相媲美,同时在0.7-1太赫兹的测量频段内,具有最高的RF工作带宽,NEP低于40 pW/ hz1 /2。
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引用次数: 22
Mixed Technologies Packaged High Power Frond-End for Broadband 28GHz 5G Solutions 用于宽带28GHz 5G解决方案的混合技术封装高功率前端
Pub Date : 2018-09-01 DOI: 10.23919/eumc.2018.8541584
M. Ayad, A. Couturier, P. Poilvert, L. Marechal, P. Auxemery
This paper presents the realization and characteristics of broadband plastic low cost packaged 5G High Power Frond-End (HPFE) operating in 24-31GHz bandwidth. This demonstrator includes a Transmit and Receive paths realized on mixed technologies: 150nm Gallium Nitride on Silicon Carbide (AlGaN/GaN on SiC) and 150nm Gallium Arsenide (GaAs). Continuous Wave (CW) measured power results of the Transmit path (Tx) demonstrates a maximum output power (POUT, Tx) higher than 2W (33.5dBm) with 24% power added efficiency (PAE), and 36dB of insertion gain (GI, Tx) in the 24-31GHz bandwidth. The receiver path (Rx) presents an maximum output power (POUT, Rx) of 30m W (15.5dBm) and an average Noise Figure (NF) of 3.6dB with an associated Insertion Gain (GI, Rx) of 20dB in the same bandwidth. The HPFE/Tx linearity has been investigated with several M-QAM modulation signals with 25/50 and 100MHz channel spacing and using Digital Pre-Distortion (DPD) leading to 48dBc Adjacent Channel Leakage Ratio (ACLR) and 40dB Mean Squared Error (MSE) for average output powers ranging from 17dBm to 25dBm. The linearity performances have been compared to the ones obtained with two other linear GaAs amplifiers (P A1 and P A2) dedicated to point to point telecommunications application: the HPFE presents similar linearity performances associated to a higher efficiency.
介绍了工作在24-31GHz带宽范围内的宽带塑料低成本封装5G高功率前端(HPFE)的实现及其特点。该演示器包括采用混合技术实现的发射和接收路径:150nm碳化硅上的氮化镓(AlGaN/GaN on SiC)和150nm砷化镓(GaAs)。发射路径(Tx)的连续波(CW)测量功率结果表明,在24-31GHz带宽下,最大输出功率(POUT, Tx)高于2W (33.5dBm),功率附加效率(PAE)为24%,插入增益(GI, Tx)为36dB。接收器路径(Rx)在相同带宽下的最大输出功率(POUT, Rx)为30m W (15.5dBm),平均噪声系数(NF)为3.6dB,相关的插入增益(GI, Rx)为20dB。我们研究了几种具有25/50和100MHz信道间隔的M-QAM调制信号的HPFE/Tx线性度,并使用数字预失真(DPD)在17dBm至25dBm的平均输出功率范围内导致48dBc的相邻信道泄漏比(ACLR)和40dB的均方误差(MSE)。将线性性能与专用于点对点电信应用的另外两个线性GaAs放大器(pa1和pa2)的线性性能进行了比较:HPFE具有与更高效率相关的相似线性性能。
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引用次数: 0
A Novel Laser-Assisted Fabrication Process for Nanowired Substrate Integrated Devices 纳米线衬底集成器件的激光辅助制造新工艺
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539911
V. Van Kerckhoven, L. Piraux, I. Huynen
This paper presents an innovative method to synthesize nanowire-based microwave devices integrated inside a nanoporous alumina membrane. A laser treatment is used to destroy locally the template surface porosity, preventing the nanowire growth in the modified regions. We have realized a substrate integrated waveguide (SIW) in which the vertical walls consist of nanowire arrays. The waveguide can then be modified to achieve different types of microwave devices by properly placing nanowire arrays inside the SIW. The so-obtained devices combine the advantages of nanowire arrays (compactness, tunable permittivity and permeability,…) with those of substrate integrated waveguides (low losses). Our fabrication approach enables wide range of devices and we present promising results for integrated waveguide isolators.
本文提出了一种合成纳米线微波器件的创新方法。采用激光处理局部破坏模板表面孔隙,防止纳米线在修饰区域生长。我们实现了一个垂直壁由纳米线阵列组成的基板集成波导(SIW)。然后,波导可以通过适当地在SIW内放置纳米线阵列来修改以实现不同类型的微波器件。所获得的器件结合了纳米线阵列的优点(紧凑,介电常数和磁导率可调,…)和衬底集成波导的优点(低损耗)。我们的制造方法使各种器件成为可能,我们在集成波导隔离器方面取得了有希望的结果。
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引用次数: 3
204GHz Stacked-Power Amplifiers Designed by a Novel Two-Port Technique 基于双端口技术设计的204GHz堆叠功率放大器
Pub Date : 2018-09-01 DOI: 10.23919/EUMIC.2018.8539884
Ahmed S. H. Ahmed, A. Farid, M. Urteaga, M. Rodwell
We report stacked mm-wave power amplifiers designed by a novel 2-port technique. Two power amplifiers designed into 130-nm InP HBT to verify the technique. The first design (unit cell) biased at 436mW Pdc produces 34.6mW saturated output power with 5.8% PAE at 204GHz. The amplifier has a 13.9dB peak small signal gain at 236GHz and 27 GHz 3–dB bandwidth. The chip size is 0.63mm×0.54mm including the pads. The second design combines two cells in parallel with an additional gain stage. The design consumes 1.18W Pdc and it shows a 63mW saturated output power with 4.8%PAE at 204GHz. The amplifier has a 22.7 dB peak small signal gain at 230GHz and larger than 25GHz 3–dB bandwidth. The chip size is 0.7mm×1.3mm including the pads. The paper reports the first stacked power amplifier designed in a rigorous way at mm-wave frequenices.
我们报告了一种新的双端口技术设计的堆叠毫米波功率放大器。两个功率放大器设计成130纳米InP HBT来验证该技术。第一种设计(单元电池)偏置在436mW Pdc,在204GHz时产生34.6mW的饱和输出功率,PAE为5.8%。该放大器在236GHz和27ghz 3db带宽下的峰值小信号增益为13.9dB。芯片尺寸为0.63mm×0.54mm,包括衬垫。第二种设计结合了两个平行的电池和一个额外的增益级。该设计功耗为1.18W Pdc,在204GHz时饱和输出功率为63mW, pae为4.8%。该放大器在230GHz时的峰值小信号增益为22.7 dB,带宽大于25GHz 3db。芯片尺寸为0.7mm×1.3mm,包括衬垫。本文报道了第一个在毫米波频率下严格设计的堆叠功率放大器。
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引用次数: 10
Electrothermal X-Parameters for Dynamic Modeling of RF and Microwave Power Transistors 射频和微波功率晶体管动态建模的电热x参数
Pub Date : 2018-09-01 DOI: 10.23919/eumc.2018.8541708
S. Gillespie, D. Root, M. Marcu, P. Aaen
For the first time, this paper presents and validates a novel extension of the X-parameter behavioral modeling paradigm to include dynamic electro-thermal phenomena, a key source of long-term memory affecting transistors. The dynamic thermal X-parameter model (DTXM) adds a novel but straightforward method to implement envelope domain sub-circuit in a feedback loop around a conventional static X -parameter model, enabling the simulation of modulated waveform-dependent dynamic self-heating effects. The extended model is identified from conventional CW or pulsed X-parameter measurements, over a range of ambient temperatures. A re-referencing of the extracted X-parameter data to the junction temperature is performed, based on estimated or a calculated thermal resistance and thermal capacitance. The model can also be generated in the simulation environment starting from a dynamic electro-thermal compact time-domain model. The DTXM accounts for thermally-induced asymmetry of intermodulation distortion products and temperature hysteresis depending on the signal bandwidth.
本文首次提出并验证了x参数行为建模范式的新扩展,以包括动态电热现象,这是影响晶体管长期记忆的关键来源。动态热X参数模型(DTXM)增加了一种新颖而直接的方法,可以在传统的静态X参数模型周围的反馈环路中实现包络域子电路,从而能够模拟依赖于调制波形的动态自热效应。扩展模型是通过常规的连续波或脉冲x参数测量在一定的环境温度范围内确定的。根据估计或计算的热阻和热电容,将提取的x参数数据重新引用到结温。该模型也可以在仿真环境中从动态电热压缩时域模型开始生成。DTXM解释了互调失真产品的热致不对称性和依赖于信号带宽的温度滞后。
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引用次数: 0
期刊
2018 13th European Microwave Integrated Circuits Conference (EuMIC)
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