首页 > 最新文献

2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)最新文献

英文 中文
Implementation of low power compressed ROM for direct digital frequency synthesizer 直接数字频率合成器低功耗压缩ROM的实现
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920859
Salah Alkurwy, S. M. Md Ali, M. Islam
A Low Power Compressed ROM Look-up table has been presented in this paper to achieve low power consumption of the direct digital frequency synthesizer as well small core size. The quarter wave symmetry technique is used to store only one quarter of the sine wave. The suggested 12-bit compressed ROM designed consists of three 4-bit sub-ROMs based on an angular decomposition technique and trigonometric identity. Exploiting the advantages of sine-cosine symmetrical attributes together with XOR logic gates, one sub-ROM block can be removed from the design. These techniques, compressed the ROM into 368 bits. The ROM compressed ratio is 534.2:1, with only two adders, two multipliers, and XOR-gates with high frequency resolution of 0.029 Hz.
为了实现直接数字频率合成器的低功耗和小芯尺寸,本文提出了一种低功耗压缩ROM查找表。四分之一波对称技术用于仅存储四分之一的正弦波。基于角分解技术和三角恒等式设计的12位压缩ROM由3个4位子ROM组成。利用正弦余弦对称属性和异或逻辑门的优势,可以从设计中去除一个子rom块。这些技术将ROM压缩为368位。ROM压缩比为534.2:1,只有两个加法器、两个乘法器和高频分辨率为0.029 Hz的异或门。
{"title":"Implementation of low power compressed ROM for direct digital frequency synthesizer","authors":"Salah Alkurwy, S. M. Md Ali, M. Islam","doi":"10.1109/SMELEC.2014.6920859","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920859","url":null,"abstract":"A Low Power Compressed ROM Look-up table has been presented in this paper to achieve low power consumption of the direct digital frequency synthesizer as well small core size. The quarter wave symmetry technique is used to store only one quarter of the sine wave. The suggested 12-bit compressed ROM designed consists of three 4-bit sub-ROMs based on an angular decomposition technique and trigonometric identity. Exploiting the advantages of sine-cosine symmetrical attributes together with XOR logic gates, one sub-ROM block can be removed from the design. These techniques, compressed the ROM into 368 bits. The ROM compressed ratio is 534.2:1, with only two adders, two multipliers, and XOR-gates with high frequency resolution of 0.029 Hz.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"173 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116132254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Gold-free Cu-metallized III-V solar cell 无金铜金属化III-V型太阳能电池
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920866
Ching-Hsiang Hsu, Hsun-Jui Chang, H. Yu, Hong-Quan Nguyen, J. Ma, E. Chang
Au-free, fully Cu-metallized InGaP/InGaAs/Ge triple-junction solar cells using Pd/Ge/Cu as front contact and Pt/Ti/Pt/Cu/Cr as back contact were fabricated and the results are reported for the first time. From the specific contact resistance measurement, these Cu-metallized ohmic contacts have low contact resistance in the order of 10-6 Ω-cm2. AES and TEM results clearly show the formation mechanisms of the Cu-metallization ohmic structures, for Pd/Ge/Cu contact, it was due to the formation of Ge diffusion into the GaAs layer, and for the Pt/Ti/Pt/Cu/Cr contact, it was due to high work function of Pt layer, these copper metallized ohmic contacts were quite stable even after 310 °C annealing. The I-V curves of the Cu-metallized InGaP/InGaAs/Ge triple-junction solar cells showed similar electrical characteristics to the solar cells with Au-metallized triple junction solar cell. Overall, the Pd/Ge/Cu and Pt/Ti/Pt/Cu ohmic contacts have been successfully applied to the InGaP/InGaAs/Ge triple-junction solar cells and demonstrated excellent performance.
制备了以Pd/Ge/Cu为前触点,Pt/Ti/Pt/Cu/Cr为后触点的无au、全Cu金属化InGaP/InGaAs/Ge三结太阳能电池。从具体接触电阻测量来看,这些金属化铜欧姆触点的接触电阻较低,约为10-6 Ω-cm2。AES和TEM结果清楚地显示了铜金属化欧姆结构的形成机制,对于Pd/Ge/Cu触点,这是由于Ge扩散到GaAs层中形成的,对于Pt/Ti/Pt/Cu/Cr触点,这是由于Pt层的高功函数,这些铜金属化欧姆触点即使经过310℃退火也相当稳定。cu金属化InGaP/InGaAs/Ge三结太阳电池的I-V曲线与au金属化三结太阳电池的电特性相似。总体而言,Pd/Ge/Cu和Pt/Ti/Pt/Cu欧姆触点已成功应用于InGaP/InGaAs/Ge三结太阳能电池,并表现出优异的性能。
{"title":"Gold-free Cu-metallized III-V solar cell","authors":"Ching-Hsiang Hsu, Hsun-Jui Chang, H. Yu, Hong-Quan Nguyen, J. Ma, E. Chang","doi":"10.1109/SMELEC.2014.6920866","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920866","url":null,"abstract":"Au-free, fully Cu-metallized InGaP/InGaAs/Ge triple-junction solar cells using Pd/Ge/Cu as front contact and Pt/Ti/Pt/Cu/Cr as back contact were fabricated and the results are reported for the first time. From the specific contact resistance measurement, these Cu-metallized ohmic contacts have low contact resistance in the order of 10-6 Ω-cm2. AES and TEM results clearly show the formation mechanisms of the Cu-metallization ohmic structures, for Pd/Ge/Cu contact, it was due to the formation of Ge diffusion into the GaAs layer, and for the Pt/Ti/Pt/Cu/Cr contact, it was due to high work function of Pt layer, these copper metallized ohmic contacts were quite stable even after 310 °C annealing. The I-V curves of the Cu-metallized InGaP/InGaAs/Ge triple-junction solar cells showed similar electrical characteristics to the solar cells with Au-metallized triple junction solar cell. Overall, the Pd/Ge/Cu and Pt/Ti/Pt/Cu ohmic contacts have been successfully applied to the InGaP/InGaAs/Ge triple-junction solar cells and demonstrated excellent performance.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134258103","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Dispersion characteristics of twisted clad chiral nihility fibers 扭曲包层手性纤维的色散特性
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920852
N. Iqbal, M. Baqir, P. Choudhury
Electromagnetic behavior of twisted clad optical fiber structure is investigated under the situation of core section being composed of chiral nihility metamaterial. Twists in the fiber clad are introduced in the form of sheath helical conductor loadings at the core-clad interface. The dispersion relation for the fiber structure is deduced and analyzed (considering low-order sustained hybrid modes) in respect of the effect on the dispersion characteristics due to the alterations in helix pitch angle. It have been found that the fiber structure generally shows decrease in normalized propagation constant with the increase normalized frequency parameter. Also, the dispersion behavior is greatly affected due to the variations in the angle of twists in the helix pitch.
研究了芯段由手性虚无超材料构成的扭曲包层光纤结构的电磁行为。光纤包层中的扭转以在芯包层界面处的护套螺旋导体载荷的形式引入。推导了光纤结构的色散关系(考虑低阶持续杂化模式),分析了螺旋螺距角的变化对色散特性的影响。研究发现,随着归一化频率参数的增大,光纤结构的归一化传播常数普遍减小。此外,螺旋螺距扭曲角度的变化对色散行为也有很大影响。
{"title":"Dispersion characteristics of twisted clad chiral nihility fibers","authors":"N. Iqbal, M. Baqir, P. Choudhury","doi":"10.1109/SMELEC.2014.6920852","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920852","url":null,"abstract":"Electromagnetic behavior of twisted clad optical fiber structure is investigated under the situation of core section being composed of chiral nihility metamaterial. Twists in the fiber clad are introduced in the form of sheath helical conductor loadings at the core-clad interface. The dispersion relation for the fiber structure is deduced and analyzed (considering low-order sustained hybrid modes) in respect of the effect on the dispersion characteristics due to the alterations in helix pitch angle. It have been found that the fiber structure generally shows decrease in normalized propagation constant with the increase normalized frequency parameter. Also, the dispersion behavior is greatly affected due to the variations in the angle of twists in the helix pitch.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133281014","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The impact of minority carrier lifetime and carrier concentration on the efficiency of CIGS solar cell 少数载流子寿命和载流子浓度对CIGS太阳能电池效率的影响
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920786
M. Fathil, M. K. Md Arshad, U. Hashim, A. R. Ruslinda, R. Ayub, A. H. Azman, M. Nurfaiz, M. Z. Kamarudin, M. Aminuddin, A. Munir
This paper deals with minority carrier lifetime and carrier concentration of Cu(In, Ga)Se2 (CIGS)-based thin film solar cells with a ZnS(n)/CIGS(p) heterojunction structure. The structure is simulated in commercial numerical simulation and the impact of minority carrier lifetime in the CIGS absorber layer on the open circuit voltage, short circuit current density, fill factor and efficiency of the CIGS solar cell are investigated. The increase of minority carrier lifetime has also increased the CIGS solar cell performance. Similar effects are also observed at different carrier concentrations of CIGS layer. All these simulated results give a helpful indication for a practical fabrication process.
本文研究了具有ZnS(n)/CIGS(p)异质结结构的Cu(In, Ga)Se2 (CIGS)薄膜太阳能电池的少数载流子寿命和载流子浓度。在商业数值模拟中对该结构进行了模拟,并研究了CIGS吸收层中少数载流子寿命对CIGS太阳能电池开路电压、短路电流密度、填充系数和效率的影响。少数载流子寿命的增加也提高了CIGS太阳能电池的性能。在不同载流子浓度的CIGS层中也观察到类似的效应。这些模拟结果对实际制作工艺有一定的指导意义。
{"title":"The impact of minority carrier lifetime and carrier concentration on the efficiency of CIGS solar cell","authors":"M. Fathil, M. K. Md Arshad, U. Hashim, A. R. Ruslinda, R. Ayub, A. H. Azman, M. Nurfaiz, M. Z. Kamarudin, M. Aminuddin, A. Munir","doi":"10.1109/SMELEC.2014.6920786","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920786","url":null,"abstract":"This paper deals with minority carrier lifetime and carrier concentration of Cu(In, Ga)Se2 (CIGS)-based thin film solar cells with a ZnS(n)/CIGS(p) heterojunction structure. The structure is simulated in commercial numerical simulation and the impact of minority carrier lifetime in the CIGS absorber layer on the open circuit voltage, short circuit current density, fill factor and efficiency of the CIGS solar cell are investigated. The increase of minority carrier lifetime has also increased the CIGS solar cell performance. Similar effects are also observed at different carrier concentrations of CIGS layer. All these simulated results give a helpful indication for a practical fabrication process.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"77 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128283552","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
An ultra-low power and area efficient 10 bit digital to analog converter architecture 超低功耗、面积效率高的 10 位数模转换器架构
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920858
Iffa Binti Sharuddin, L. Lee
An ultra-low power and area efficient successive approximation register (SAR) analog-to-digital converter (ADC) is presented. To achieve ultra-low power performance, a digital-to-analog converter (DAC) architecture is proposed that combined a 4-bit thermometer coded and a 6-bit C-2C array to form a 10-bit DAC. Thereby, power consumption and area of the design are drastically reduced by virtue of lower switching activity and smaller size capacitor array. Add on to that, the architecture also has better linearity. The proposed 10-bit DAC is designed and simulated in a 0.18 μm CMOS process. Simulation results show that it only consumed 1.74 nW at 1.5 V power supply.
本文介绍了一种超低功耗、高效面积的逐次逼近寄存器(SAR)模数转换器(ADC)。为实现超低功耗性能,提出了一种数模转换器 (DAC) 架构,它将 4 位温度计编码和 6 位 C-2C 阵列结合起来,形成一个 10 位 DAC。通过降低开关活动和减小电容器阵列的尺寸,该设计的功耗和面积大幅减少。此外,该架构还具有更好的线性度。所提出的 10 位 DAC 采用 0.18 μm CMOS 工艺进行设计和仿真。仿真结果表明,在 1.5 V 电源电压下,其功耗仅为 1.74 nW。
{"title":"An ultra-low power and area efficient 10 bit digital to analog converter architecture","authors":"Iffa Binti Sharuddin, L. Lee","doi":"10.1109/SMELEC.2014.6920858","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920858","url":null,"abstract":"An ultra-low power and area efficient successive approximation register (SAR) analog-to-digital converter (ADC) is presented. To achieve ultra-low power performance, a digital-to-analog converter (DAC) architecture is proposed that combined a 4-bit thermometer coded and a 6-bit C-2C array to form a 10-bit DAC. Thereby, power consumption and area of the design are drastically reduced by virtue of lower switching activity and smaller size capacitor array. Add on to that, the architecture also has better linearity. The proposed 10-bit DAC is designed and simulated in a 0.18 μm CMOS process. Simulation results show that it only consumed 1.74 nW at 1.5 V power supply.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129233805","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Fabrication of a CMOS-compatible surface acoustic wave device for application in pathogen sensing 用于病原体传感的cmos兼容表面声波器件的制造
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920878
S. T. Ten, U. Hashim, F. Malek, W. Liu, K. L. Foo, C. Voon, F. H. Wee, Y. S. Lee, H. Hisham, A. Sudin, M. S. Nur Humaira
Surface acoustic waves (SAW) devices have been initially developed and used for the high-volume low-cost TV component. Due to the ultra-sensitivity to the surface perturbation, SAW based devices have been modified to be sensors. Initially, SAW based sensors were developed for gas detection and recently they have been moving towards biological detection. Shear horizontal surface acoustic wave (SHSAW), one of the SAW based type is most suitable for the application in liquid based condition. Ultra sensitive pathogen sensors are needed to improve the food security and quality of life as well. Hence, the ultra-high sensitive biosensor has been designed in this research towards the low concentration pathogen detection. One of the main SHSAW components is the interdigital transducer (IDT). Currently, there are variety of techniques to fabricate the accurate size electrodes, Electron beam lithography and X-ray lithography. However, these methods are very costly. Therefore, this paper is presenting the more economical fabrication process which is using complementary metal-oxide-semiconductor method to fabricate inter-digital transducers on 640 YX LiNbO3 piezoelectric substrate. Comparisons were made for the theoretical calculation and fabricated measurement resonant frequency of the 3μm, 8 μm, 12 μm, 25 μm and 20μm width IDTs and the differences obtained are less than 5%.
表面声波(SAW)器件已初步开发并用于大批量低成本电视组件。由于对表面扰动的超灵敏度,SAW基器件已被改造成传感器。最初,基于SAW的传感器是用于气体检测的,最近它们已经向生物检测方向发展。剪切水平表面声波(SHSAW)是基于SAW的一种类型,最适合在液体条件下应用。超灵敏的病原体传感器对于提高食品安全和生活质量也是必不可少的。因此,本研究设计了超高灵敏度的生物传感器,用于低浓度病原体的检测。其中一个主要的SHSAW元件是数字间换能器(IDT)。目前,制造精确尺寸电极的技术有电子束光刻和x射线光刻。然而,这些方法是非常昂贵的。因此,本文提出了在640yx LiNbO3压电衬底上采用互补金属-氧化物-半导体法制作数字间换能器的更经济的制造工艺。对3μm、8 μm、12 μm、25 μm和20μm宽度idt的理论计算和实测谐振频率进行了比较,得到的误差小于5%。
{"title":"Fabrication of a CMOS-compatible surface acoustic wave device for application in pathogen sensing","authors":"S. T. Ten, U. Hashim, F. Malek, W. Liu, K. L. Foo, C. Voon, F. H. Wee, Y. S. Lee, H. Hisham, A. Sudin, M. S. Nur Humaira","doi":"10.1109/SMELEC.2014.6920878","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920878","url":null,"abstract":"Surface acoustic waves (SAW) devices have been initially developed and used for the high-volume low-cost TV component. Due to the ultra-sensitivity to the surface perturbation, SAW based devices have been modified to be sensors. Initially, SAW based sensors were developed for gas detection and recently they have been moving towards biological detection. Shear horizontal surface acoustic wave (SHSAW), one of the SAW based type is most suitable for the application in liquid based condition. Ultra sensitive pathogen sensors are needed to improve the food security and quality of life as well. Hence, the ultra-high sensitive biosensor has been designed in this research towards the low concentration pathogen detection. One of the main SHSAW components is the interdigital transducer (IDT). Currently, there are variety of techniques to fabricate the accurate size electrodes, Electron beam lithography and X-ray lithography. However, these methods are very costly. Therefore, this paper is presenting the more economical fabrication process which is using complementary metal-oxide-semiconductor method to fabricate inter-digital transducers on 640 YX LiNbO3 piezoelectric substrate. Comparisons were made for the theoretical calculation and fabricated measurement resonant frequency of the 3μm, 8 μm, 12 μm, 25 μm and 20μm width IDTs and the differences obtained are less than 5%.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132594937","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Modelling of hybrid energy harvester with DC-DC boost converter using arbitary input sources for ultra-low-power micro-devices 基于任意输入源的超低功耗微型器件DC-DC升压变换器混合能量采集器建模
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920787
Michelle Lim, S. Ali, S. Jahariah, M. Islam
This work involves the modeling of three arbitrary input sources representing Hybrid Energy Harvesters (HEH) using a DC-DC Boost converter. These sources are combined in parallel and targeted at scavenging passive human power, therefore the three suitable ambient sources are motion, thermal and indoor light. Multiple sources mitigate limitations caused by single source harvesters but suffer impedance mismatches which greatly limit the total combined power that could have been harvested. A Boost Converter with suitable parameters has been designed and integrated to the HEH and PSPICE software has been used for both the modeling of arbitrary sources as well as the integration with the Boost Converter. An input source as low as 18 mV to 907 mV was able to be boosted into a 310 mV-27.9 V output when suitable parametric values were selected for the Ultra Low Power (ULP) HEH. A duty ratio of 0.5, with 10 kΩ load, 22 μH inductor as well as a switching frequency of 25 kHz was selected to be slightly above the audio range as well as being high enough to reduce passive component sizes. While VO/ VS of the boost converter is linear, PO/PIN is a function of third order polynomial. Therefore, at the HEH's lowest combined configuration of 1 K temperature difference, 0.25 g of vibration and 100 lux of indoor lighting, a combined 14 μW can be harvested. At its maximum of 10 K heat difference, 1 g vibration and 1000 lux of indoor lighting a combined 187 μW can be harvested. At its minimum, this enables possibility of battery-less applications in powering a quartz watch at 5 μW while at its maximum capacity powering a pace maker of ~50 μW as well as micro devices of ~100 μW solely from passive human activity. Once a 33 mF input capacitor is placed between the sources and converter, an output power of between 9.61 μW-78 mW can be obtained.
这项工作涉及使用DC-DC Boost转换器对代表混合能量收集器(HEH)的三个任意输入源进行建模。这些光源并联组合,旨在清除被动的人力,因此三种合适的环境光源是运动光、热光和室内光。多源电源减轻了单源采集器的限制,但会受到阻抗不匹配的影响,这极大地限制了可以采集的总组合功率。设计了一个参数合适的升压变换器,并将其集成到HEH和PSPICE软件中,用于任意源的建模以及与升压变换器的集成。当为超低功率(ULP) HEH选择合适的参数值时,低至18 mV至907 mV的输入源能够升压到310 mV-27.9 V的输出。选择占空比为0.5,负载为10 kΩ,电感为22 μH,开关频率为25 kHz,略高于音频范围,并且足够高,可以减小无源元件的尺寸。升压变换器的VO/ VS是线性的,而PO/PIN是一个三阶多项式函数。因此,在HEH的最低组合配置(1 K温差、0.25 g振动和100勒克斯室内照明)下,可收获14 μW的能量。在最大10k热差、1g振动和1000勒克斯室内照明下,可收获187 μW。从最小的角度来看,这使得无电池应用在为5 μW的石英表供电的可能性成为可能,而在其最大容量下,为~50 μW的起搏器以及仅由被动人类活动供电的~100 μW的微型设备供电。一旦在源和变换器之间放置一个33mf的输入电容,可以获得9.61 μW-78 mW之间的输出功率。
{"title":"Modelling of hybrid energy harvester with DC-DC boost converter using arbitary input sources for ultra-low-power micro-devices","authors":"Michelle Lim, S. Ali, S. Jahariah, M. Islam","doi":"10.1109/SMELEC.2014.6920787","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920787","url":null,"abstract":"This work involves the modeling of three arbitrary input sources representing Hybrid Energy Harvesters (HEH) using a DC-DC Boost converter. These sources are combined in parallel and targeted at scavenging passive human power, therefore the three suitable ambient sources are motion, thermal and indoor light. Multiple sources mitigate limitations caused by single source harvesters but suffer impedance mismatches which greatly limit the total combined power that could have been harvested. A Boost Converter with suitable parameters has been designed and integrated to the HEH and PSPICE software has been used for both the modeling of arbitrary sources as well as the integration with the Boost Converter. An input source as low as 18 mV to 907 mV was able to be boosted into a 310 mV-27.9 V output when suitable parametric values were selected for the Ultra Low Power (ULP) HEH. A duty ratio of 0.5, with 10 kΩ load, 22 μH inductor as well as a switching frequency of 25 kHz was selected to be slightly above the audio range as well as being high enough to reduce passive component sizes. While VO/ VS of the boost converter is linear, PO/PIN is a function of third order polynomial. Therefore, at the HEH's lowest combined configuration of 1 K temperature difference, 0.25 g of vibration and 100 lux of indoor lighting, a combined 14 μW can be harvested. At its maximum of 10 K heat difference, 1 g vibration and 1000 lux of indoor lighting a combined 187 μW can be harvested. At its minimum, this enables possibility of battery-less applications in powering a quartz watch at 5 μW while at its maximum capacity powering a pace maker of ~50 μW as well as micro devices of ~100 μW solely from passive human activity. Once a 33 mF input capacitor is placed between the sources and converter, an output power of between 9.61 μW-78 mW can be obtained.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129452060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 19
Characterization of vertical strained SiGe impact ionization MOSFET for ultra-sensitive biosensor application 用于超灵敏生物传感器的垂直应变SiGe冲击电离MOSFET的表征
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920819
I. Saad, H. M. Zuhir, C. B. Seng, A. M. Khairul, B. Ghosh, N. Bolong, R. Ismail
This paper venture into prospective ideas of finding viable solution of nanoelectronics device design by an assessment of incorporating vertical impact-ionization MOSFET (IMOS) with strained SiGe technology into a formation of an emerging device structure with elevated performance and reliable outcomes for future bio-based sensor application. Impact Ionization FET biosensors can be extremely promising for applications where ultra-high sensitivity and fast response is desirable. An ultra-low power with low Subthreshold Swing and high breakdown voltage are imperative for ultra-sensitive biosensor. Impact ionization MOSFET (IMOS) is expected to have a subthreshold swing (S) down to 20 mV/dec which is much lower compared to Conventional MOSFET (CMOS). This will eventually enhanced the switching behavior of the transistor and enhancing its electrical performance and response time particularly when scaled down into nanometre regime. However, vertical IMOS experience parasitic bipolar transistors (PBT) effect and low breakdown voltage. Parasitic Bipolar Transistor effect is a phenomenon where the MOSFET act as a minority carrier device like BJT instead of majority carrier device. This is not favorable for any power device or sensor. Dielectric Pocket (DP) is believed to be able to minimize the PBT effect while improving the performance of the device. Eventually, this device will prolong the increase density of transistor in a chip for future application of biosensor nanoelectronics.
本文通过评估将垂直冲击电离MOSFET (IMOS)与应变SiGe技术结合起来,形成一种具有更高性能和可靠结果的新兴器件结构,为未来的生物基传感器应用提供了可行的纳米电子器件设计解决方案。冲击电离效应场效应管生物传感器在需要超高灵敏度和快速响应的应用中非常有前途。超低功耗、低亚阈值摆幅和高击穿电压是超灵敏生物传感器的必要条件。冲击电离MOSFET (IMOS)的亚阈值摆幅(S)有望降至20 mV/dec,这比传统的MOSFET (CMOS)要低得多。这将最终增强晶体管的开关行为,并提高其电气性能和响应时间,特别是当缩小到纳米级时。然而,垂直IMOS具有寄生双极晶体管(PBT)效应和低击穿电压。寄生双极晶体管效应是指MOSFET充当像BJT一样的少数载流子器件而不是多数载流子器件的现象。这对任何动力装置或传感器都是不利的。介电袋(DP)被认为能够最大限度地减少PBT效应,同时提高器件的性能。最终,该装置将延长晶体管密度的增加,为未来生物传感器纳米电子学的应用奠定基础。
{"title":"Characterization of vertical strained SiGe impact ionization MOSFET for ultra-sensitive biosensor application","authors":"I. Saad, H. M. Zuhir, C. B. Seng, A. M. Khairul, B. Ghosh, N. Bolong, R. Ismail","doi":"10.1109/SMELEC.2014.6920819","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920819","url":null,"abstract":"This paper venture into prospective ideas of finding viable solution of nanoelectronics device design by an assessment of incorporating vertical impact-ionization MOSFET (IMOS) with strained SiGe technology into a formation of an emerging device structure with elevated performance and reliable outcomes for future bio-based sensor application. Impact Ionization FET biosensors can be extremely promising for applications where ultra-high sensitivity and fast response is desirable. An ultra-low power with low Subthreshold Swing and high breakdown voltage are imperative for ultra-sensitive biosensor. Impact ionization MOSFET (IMOS) is expected to have a subthreshold swing (S) down to 20 mV/dec which is much lower compared to Conventional MOSFET (CMOS). This will eventually enhanced the switching behavior of the transistor and enhancing its electrical performance and response time particularly when scaled down into nanometre regime. However, vertical IMOS experience parasitic bipolar transistors (PBT) effect and low breakdown voltage. Parasitic Bipolar Transistor effect is a phenomenon where the MOSFET act as a minority carrier device like BJT instead of majority carrier device. This is not favorable for any power device or sensor. Dielectric Pocket (DP) is believed to be able to minimize the PBT effect while improving the performance of the device. Eventually, this device will prolong the increase density of transistor in a chip for future application of biosensor nanoelectronics.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125222746","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Fabrication of SONOS flash memory device by using engineered tunnel barrier technique 利用工程隧道阻挡技术制备SONOS闪存器件
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920891
M. Zakaria, S. R. Kasjoo, A. F. Mahyidin, A. W. Al-Mufti, R. Ayub, U. Hashim
Flash memory is a device that used as a tool to store data electrically without external power supply. The charge-trap such as SONOS structure is the most widely used in flash memory technology fabrication due to the advantages of this device in term of scaling and performance characteristic. Conventional Flash memory with thickness 5nm single oxide shows good performance, but suffer leakage current and data retention. To overcome this problem, a SONOS flash memory was fabricated by using techniques that known as Engineered Tunnel Barrier to replace the conventional single oxide used in conventional flash memory. In this project, the total equivalent thickness oxide for all experiments is set at the 8nm to compare the performances. Thus, it will result in a faster write and erase speed. The analysis results will determine the most preferred structure that improved the programming characteristic.
闪存是一种不用外部电源就能存储数据的工具。SONOS结构的电荷阱由于其在可缩放性和性能特性方面的优势,在闪存技术制造中应用最为广泛。传统的5nm厚度的单氧化物闪存性能良好,但存在漏电流和数据保留的问题。为了克服这个问题,SONOS闪存采用了工程隧道屏障技术来取代传统闪存中使用的单一氧化物。在本项目中,所有实验的总等效氧化厚度都设置在8nm,以比较性能。因此,它将导致更快的写入和擦除速度。分析结果将确定改善编程特性的最优选结构。
{"title":"Fabrication of SONOS flash memory device by using engineered tunnel barrier technique","authors":"M. Zakaria, S. R. Kasjoo, A. F. Mahyidin, A. W. Al-Mufti, R. Ayub, U. Hashim","doi":"10.1109/SMELEC.2014.6920891","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920891","url":null,"abstract":"Flash memory is a device that used as a tool to store data electrically without external power supply. The charge-trap such as SONOS structure is the most widely used in flash memory technology fabrication due to the advantages of this device in term of scaling and performance characteristic. Conventional Flash memory with thickness 5nm single oxide shows good performance, but suffer leakage current and data retention. To overcome this problem, a SONOS flash memory was fabricated by using techniques that known as Engineered Tunnel Barrier to replace the conventional single oxide used in conventional flash memory. In this project, the total equivalent thickness oxide for all experiments is set at the 8nm to compare the performances. Thus, it will result in a faster write and erase speed. The analysis results will determine the most preferred structure that improved the programming characteristic.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"110 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122442741","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Electronic state transition in cooperatively interacting point-defects in semiconductor crystals 半导体晶体中协同作用点缺陷的电子态跃迁
Pub Date : 2014-10-13 DOI: 10.1109/SMELEC.2014.6920844
M. A. Mohamed, B. Majlis, M. Ani
Electron state transition of deep level point defects in a semiconductor crystal was studied. Low-temperature grown GaAs produced excess antisite As (AsGa) which produces localized spin when doped with Be. A nearly abrupt decrease of 1.7% of the resistance is detected at a temperature around 4 K which is consistent with abrupt decrease of magnetization. These observations are explained as a result of cooperative transition of electron states of AsGa defects. First-principal calculations of the electron state of an AsGa atom with a shallow acceptor Be show that at the transition an AsGa+ ion is displaced to the interstitial site and becomes a neutral atom and finally results in formation of a hole producing enhancement in conductivity.
研究了半导体晶体中深能级点缺陷的电子态跃迁。低温生长的砷化镓在掺杂Be后产生过量的反位砷(AsGa),产生局域自旋。在4 K左右的温度下,电阻几乎突然下降了1.7%,这与磁化强度的突然下降是一致的。这些观察结果被解释为AsGa缺陷电子态协同跃迁的结果。对具有浅层Be受体的AsGa原子的电子态的第一次主计算表明,在跃迁时,AsGa+离子被转移到间隙位置,成为中性原子,最终形成空穴,从而提高电导率。
{"title":"Electronic state transition in cooperatively interacting point-defects in semiconductor crystals","authors":"M. A. Mohamed, B. Majlis, M. Ani","doi":"10.1109/SMELEC.2014.6920844","DOIUrl":"https://doi.org/10.1109/SMELEC.2014.6920844","url":null,"abstract":"Electron state transition of deep level point defects in a semiconductor crystal was studied. Low-temperature grown GaAs produced excess antisite As (AsGa) which produces localized spin when doped with Be. A nearly abrupt decrease of 1.7% of the resistance is detected at a temperature around 4 K which is consistent with abrupt decrease of magnetization. These observations are explained as a result of cooperative transition of electron states of AsGa defects. First-principal calculations of the electron state of an AsGa atom with a shallow acceptor Be show that at the transition an AsGa+ ion is displaced to the interstitial site and becomes a neutral atom and finally results in formation of a hole producing enhancement in conductivity.","PeriodicalId":268203,"journal":{"name":"2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116535142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
2014 IEEE International Conference on Semiconductor Electronics (ICSE2014)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1