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2019 Devices for Integrated Circuit (DevIC)最新文献

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Synthesis of Morphological-Variant ZnO nanostructures 形貌变化ZnO纳米结构的合成
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783324
A. Dikshit, Kamal, A. Singh, J. Rana, R. Singh, Nillohit Mukhrjee, P. Chakrabarti
Nanostructures of zinc oxide have great potential in optoelectronics as well as in sensing applications. Here, we report the controlled and systematic growth of ZnO nanostructure by hydrothermal and vapor-liquid-solid (VLS) techniques, which can be used in various electronics and optoelectronic devices. The effect of various growth parameters (growth temperature, annealing time, the thickness of seed layer, to name a few) on the morphology of ZnO nanostructures has been studied. Ultra-long nanowires of length more than $300mumathrm{m}$ have been synthesized with aspect ratio around 10.
氧化锌纳米结构在光电子学和传感应用方面具有巨大的潜力。在这里,我们报道了通过水热和蒸汽-液-固(VLS)技术控制和系统地生长ZnO纳米结构,该结构可用于各种电子和光电子器件。研究了不同生长参数(生长温度、退火时间、种子层厚度等)对ZnO纳米结构形貌的影响。已经合成了长度超过$300mu mathm {m}$的超长纳米线,其宽高比约为10。
{"title":"Synthesis of Morphological-Variant ZnO nanostructures","authors":"A. Dikshit, Kamal, A. Singh, J. Rana, R. Singh, Nillohit Mukhrjee, P. Chakrabarti","doi":"10.1109/DEVIC.2019.8783324","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783324","url":null,"abstract":"Nanostructures of zinc oxide have great potential in optoelectronics as well as in sensing applications. Here, we report the controlled and systematic growth of ZnO nanostructure by hydrothermal and vapor-liquid-solid (VLS) techniques, which can be used in various electronics and optoelectronic devices. The effect of various growth parameters (growth temperature, annealing time, the thickness of seed layer, to name a few) on the morphology of ZnO nanostructures has been studied. Ultra-long nanowires of length more than $300mumathrm{m}$ have been synthesized with aspect ratio around 10.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125610268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Comparative Analysis of Underlapped Silicon on Insulator and Underlapped Silicon on Nothing Dielectric and Charge Modulated FET based Biosensors 基于介电和电荷调制场效应晶体管的生物传感器的绝缘体上和无介电和电荷调制层间硅的比较分析
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783714
Khuraijam Nelson Singh, P. Dutta
A biosensor based on silicon on insulator (SOI) MOSFET provides many advantages over the conventional biosensors but still suffers from the inherent problem which exists in SOI structures. Silicon on nothing (SON) MOSFET which is a derivative of SOI MOSFET is an option which has been considered by many as an alternative due to its excellent performances. In this study, underlapped silicon on insulator (USOI) and underlapped silicon on nothing (USON) dielectric and charge modulated FET (DCMFET) has been compared for biosensing application. Modulation of the devices electrical characteristics, namely surface potential, threshold voltage, and sensitivity have been studied to understand the sensing of biomolecules without labeling. Detection of biomolecules is evaluated as a shift of threshold voltage of the devices with the change in biomolecules dielectric constants and charges. The data obtained from the analytical models showed both the devices as highly sensitive; however, USON-DCMFET is found to be the better choice. The analytical models have also been verified by using the data obtained from the 2-D numerical simulations performed using SILVACO ATLAS.
基于绝缘体上硅(SOI) MOSFET的生物传感器与传统的生物传感器相比具有许多优点,但仍然存在SOI结构存在的固有问题。无基硅(SON) MOSFET是SOI MOSFET的衍生物,由于其优异的性能,许多人认为它是一种替代品。本研究比较了介电和电荷调制FET (DCMFET)在生物传感中的应用。研究了器件电特性的调制,即表面电位、阈值电压和灵敏度,以了解生物分子的无标记传感。生物分子的检测被评价为器件的阈值电压随生物分子介电常数和电荷的变化而变化。从分析模型得到的数据表明,这两个装置都是高度敏感的;然而,USON-DCMFET被认为是更好的选择。利用SILVACO ATLAS进行的二维数值模拟数据验证了分析模型的正确性。
{"title":"Comparative Analysis of Underlapped Silicon on Insulator and Underlapped Silicon on Nothing Dielectric and Charge Modulated FET based Biosensors","authors":"Khuraijam Nelson Singh, P. Dutta","doi":"10.1109/DEVIC.2019.8783714","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783714","url":null,"abstract":"A biosensor based on silicon on insulator (SOI) MOSFET provides many advantages over the conventional biosensors but still suffers from the inherent problem which exists in SOI structures. Silicon on nothing (SON) MOSFET which is a derivative of SOI MOSFET is an option which has been considered by many as an alternative due to its excellent performances. In this study, underlapped silicon on insulator (USOI) and underlapped silicon on nothing (USON) dielectric and charge modulated FET (DCMFET) has been compared for biosensing application. Modulation of the devices electrical characteristics, namely surface potential, threshold voltage, and sensitivity have been studied to understand the sensing of biomolecules without labeling. Detection of biomolecules is evaluated as a shift of threshold voltage of the devices with the change in biomolecules dielectric constants and charges. The data obtained from the analytical models showed both the devices as highly sensitive; however, USON-DCMFET is found to be the better choice. The analytical models have also been verified by using the data obtained from the 2-D numerical simulations performed using SILVACO ATLAS.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133652167","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Optimization of Electrical Parameters for the Gate Stack Double Gate (GSDG) MOSFET using Simplex-PSO Algorithm 基于Simplex-PSO算法的栅极堆叠双栅极MOSFET电参数优化
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783730
Dibyendu Chowdhury, B. P. De, K. B. Maji, Sumalya Ghosh, R. Kar, D. Mandal
In this article, the electrical parameters of the Gate Stack Double Gate (GSDG) MOSFET are optimized utilizing the Simplex-Particle Swarm Optimization (Simplex-PSO) algorithm. The electrical parameters like the OFF-state current, transconductance and subthreshold swing have been considered to formulate the overall Cost Function (CF). The overall CF is achieved by the weighted sum approach method. The results attained from the Simplex-PSO are formed to be better than the previous literature.
本文利用Simplex-Particle Swarm Optimization (Simplex-PSO)算法对栅极堆叠双栅(GSDG) MOSFET的电学参数进行了优化。考虑了断开状态电流、跨导和亚阈值摆幅等电气参数来制定总体成本函数(CF)。总体CF采用加权和法实现。Simplex-PSO的结果优于以往的文献。
{"title":"Optimization of Electrical Parameters for the Gate Stack Double Gate (GSDG) MOSFET using Simplex-PSO Algorithm","authors":"Dibyendu Chowdhury, B. P. De, K. B. Maji, Sumalya Ghosh, R. Kar, D. Mandal","doi":"10.1109/DEVIC.2019.8783730","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783730","url":null,"abstract":"In this article, the electrical parameters of the Gate Stack Double Gate (GSDG) MOSFET are optimized utilizing the Simplex-Particle Swarm Optimization (Simplex-PSO) algorithm. The electrical parameters like the OFF-state current, transconductance and subthreshold swing have been considered to formulate the overall Cost Function (CF). The overall CF is achieved by the weighted sum approach method. The results attained from the Simplex-PSO are formed to be better than the previous literature.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123953630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Performance Prediction of Stacked Nanowire Transistors in the Presence of Random Discrete Dopants and Metal Gate Granularity 随机掺杂和金属栅粒度下堆叠纳米线晶体管的性能预测
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783687
S. Dey, E. Mohapatra, J. Jena, S. Das, Tara Prasanna Dash, C. K. Maiti
Gate-all-around nanowire field effect transistors (GAA-NW-FETs) in a horizontal configuration is now being considered as a strong candidate to extend today's CMOS technology to its ultimate scaling limits. In this paper, full 3-D device simulations are performed to study the effect of random discrete dopants (RDD) and metal gate granularity (MGG) on the performance of a 10nm channel length vertically stacked silicon nanowire FETs. The impact of metal grain crystallographic orientation on the gate work function and presence of discrete dopants on transistor threshold voltage is reported. The discrete dopants have been distributed randomly in the source/drain and channel regions of the device. Due to the small dimensions of the transistor a quantum transport formalism has been deployed in simulation. Our results show the magnitude and importance of RDD and MGG and the need for process optimization to minimize device parameter variations in sub-10nm technology nodes.
水平结构的栅极全能纳米线场效应晶体管(gaa - nw - fet)现在被认为是将今天的CMOS技术扩展到其最终缩放极限的强有力的候选者。本文通过全三维器件仿真研究了随机离散掺杂剂(RDD)和金属栅极粒度(MGG)对10nm沟道长度垂直堆叠硅纳米线场效应管性能的影响。报道了金属晶粒取向对栅极功函数的影响以及离散掺杂剂的存在对晶体管阈值电压的影响。离散掺杂剂随机分布在器件的源/漏和通道区域。由于晶体管的尺寸小,在模拟中采用了量子输运形式。我们的研究结果显示了RDD和MGG的规模和重要性,以及在亚10nm技术节点上进行工艺优化以最小化器件参数变化的必要性。
{"title":"Performance Prediction of Stacked Nanowire Transistors in the Presence of Random Discrete Dopants and Metal Gate Granularity","authors":"S. Dey, E. Mohapatra, J. Jena, S. Das, Tara Prasanna Dash, C. K. Maiti","doi":"10.1109/DEVIC.2019.8783687","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783687","url":null,"abstract":"Gate-all-around nanowire field effect transistors (GAA-NW-FETs) in a horizontal configuration is now being considered as a strong candidate to extend today's CMOS technology to its ultimate scaling limits. In this paper, full 3-D device simulations are performed to study the effect of random discrete dopants (RDD) and metal gate granularity (MGG) on the performance of a 10nm channel length vertically stacked silicon nanowire FETs. The impact of metal grain crystallographic orientation on the gate work function and presence of discrete dopants on transistor threshold voltage is reported. The discrete dopants have been distributed randomly in the source/drain and channel regions of the device. Due to the small dimensions of the transistor a quantum transport formalism has been deployed in simulation. Our results show the magnitude and importance of RDD and MGG and the need for process optimization to minimize device parameter variations in sub-10nm technology nodes.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"63 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116028106","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of High-K Spacer on the Performance of Gate-Stack Uniformly doped DG-MOSFET 高k间隔层对栅极堆叠均匀掺杂DG-MOSFET性能的影响
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783272
S. K. Das, S. Swain, S. Biswal, D. Nayak, U. Nanda, Biswajit Baral, Dhananjaya Tripathy
In this work, we have analyzed the novelty of the Gate Stack Double Gate (DG) MOSFET with respect to different spacer variations in order to reduce the short channel effect challenges and simultaneously increasing the device performance. Silicon is used as the channel material along with the gate stacked technology for studying the analog performance and Radio Frequency (RF) performance of the device. For gate stacking, two types of oxides are used- one denoting low-K i.e SiO2 and the other as high-K i.e- HfO2. Spacers with various permittivities were used to understand their effects on the performance of the device. The simulation result shows that the use of spacer material affected both the analog and RF behavior of the device significantly. The computer aided design (TCAD) simulations have been carried by SILVACO International.
在这项工作中,我们分析了栅极堆叠双栅(DG) MOSFET在不同间隔变化方面的新颖性,以减少短通道效应挑战,同时提高器件性能。采用硅作为通道材料,结合栅极堆叠技术研究器件的模拟性能和射频(RF)性能。对于栅极堆积,使用两种类型的氧化物-一种表示低k,即SiO2,另一种表示高k,即HfO2。使用不同介电常数的间隔片来了解它们对器件性能的影响。仿真结果表明,间隔材料的使用对器件的模拟性能和射频性能都有显著影响。计算机辅助设计(TCAD)仿真由SILVACO国际公司进行。
{"title":"Effect of High-K Spacer on the Performance of Gate-Stack Uniformly doped DG-MOSFET","authors":"S. K. Das, S. Swain, S. Biswal, D. Nayak, U. Nanda, Biswajit Baral, Dhananjaya Tripathy","doi":"10.1109/DEVIC.2019.8783272","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783272","url":null,"abstract":"In this work, we have analyzed the novelty of the Gate Stack Double Gate (DG) MOSFET with respect to different spacer variations in order to reduce the short channel effect challenges and simultaneously increasing the device performance. Silicon is used as the channel material along with the gate stacked technology for studying the analog performance and Radio Frequency (RF) performance of the device. For gate stacking, two types of oxides are used- one denoting low-K i.e SiO2 and the other as high-K i.e- HfO2. Spacers with various permittivities were used to understand their effects on the performance of the device. The simulation result shows that the use of spacer material affected both the analog and RF behavior of the device significantly. The computer aided design (TCAD) simulations have been carried by SILVACO International.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131386669","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Novel Self-Pipelining Strategy for Efficient Multiplication 一种高效乘法的自流水线策略
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783651
Rahul Pal, J. Ghosh, A. Saha
In this work a novel self-pipelining strategy with proper synchronization among subsequent stages for low-power high-speed digital multiplication is explored. The true and complementary clock inputs are alternatively applied to each subsequent self-latching stage to achieve proposed self-pipelining operation. A $mathbf{4}-mathbf{b}times mathbf{4}-mathbf{b}$ self-pipelined Wallace-tree multiplier based on aforesaid idea has been designed first. Next, the $mathbf{4}-mathbf{b}times mathbf{4}-mathbf{b}$ multiplier thus designed has been exploited in order to design proposed self-pipelined $mathbf{8}-mathbf{b} times mathbf{8}-mathbf{b}$ multiplier with decomposition logic. All the designs and optimization are performed on TSMC $mathbf{0.18}mathbf{mu} mathbf{m}$ CMOS technology based on BSIM3 device parameters with 1.8V supply rail and at 25°C temperature using S-Edit of Tanner EDA V.13. The performance of designed multiplier has been evaluated with T-Spice simulation using W-Edit. A benchmarking comparison with respect to latest competitive design establishes superiority of proposed idea.
本文探讨了一种新颖的自流水线策略,该策略在低功耗高速数字乘法的后续阶段之间具有适当的同步。真时钟和互补时钟输入交替地应用于每个后续的自锁存阶段,以实现所建议的自流水线操作。首先设计了基于上述思想的$mathbf{4}-mathbf{b}乘以mathbf{4}-mathbf{b}$自流水线华莱士树乘法器。接下来,利用这样设计的$mathbf{4}-mathbf{b}次mathbf{4}-mathbf{b}$乘法器,设计出具有分解逻辑的自流水线$mathbf{8}-mathbf{b} 次mathbf{8}-mathbf{b}$乘法器。所有设计和优化都是在TSMC $mathbf{0.18}mathbf{mu} mathbf{m}$ CMOS技术上进行的,基于BSIM3器件参数,1.8V电源轨,温度为25°C,使用Tanner EDA V.13的S-Edit。利用W-Edit对设计的乘法器性能进行了T-Spice仿真评估。对最新的竞争性设计进行基准比较,确立了所提出思想的优越性。
{"title":"Novel Self-Pipelining Strategy for Efficient Multiplication","authors":"Rahul Pal, J. Ghosh, A. Saha","doi":"10.1109/DEVIC.2019.8783651","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783651","url":null,"abstract":"In this work a novel self-pipelining strategy with proper synchronization among subsequent stages for low-power high-speed digital multiplication is explored. The true and complementary clock inputs are alternatively applied to each subsequent self-latching stage to achieve proposed self-pipelining operation. A $mathbf{4}-mathbf{b}times mathbf{4}-mathbf{b}$ self-pipelined Wallace-tree multiplier based on aforesaid idea has been designed first. Next, the $mathbf{4}-mathbf{b}times mathbf{4}-mathbf{b}$ multiplier thus designed has been exploited in order to design proposed self-pipelined $mathbf{8}-mathbf{b} times mathbf{8}-mathbf{b}$ multiplier with decomposition logic. All the designs and optimization are performed on TSMC $mathbf{0.18}mathbf{mu} mathbf{m}$ CMOS technology based on BSIM3 device parameters with 1.8V supply rail and at 25°C temperature using S-Edit of Tanner EDA V.13. The performance of designed multiplier has been evaluated with T-Spice simulation using W-Edit. A benchmarking comparison with respect to latest competitive design establishes superiority of proposed idea.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121841318","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Smart Power Theft Detection System 智能电力盗窃检测系统
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783395
Nitin K Mucheli, U. Nanda, D. Nayak, P. Rout, S. Swain, S. K Das, S. Biswal
Power theft is normally done by two methods that is bypassing or hooking. So to detect it, a system (current measuring and comparing) is proposed in which the household distribution of current is done indirectly from the electric pole to an intermediate distributor box and then to the individual houses. The current is measured periodically in the distributor box and is posted to the server database for each house using GSM/GPRS module. Similarly, for each house electric meter is designed which can measure the value of the current and post the same to the server database periodically using GSM/GPRS module. At the time of the installation of the electric meter the details of the users are stored in the database through a user friendly mobile application including the address, latitude, longitude using mobile GPS and the photograph of the user's house/area. Upon successful comparison between the current values from distributor box and electric meter in the server if we get a marginal difference between the currents then the theft is detected. Finally, the details of the user are shared with the authorized mobile application including the address and photograph of the area. The latitude and longitude are also used to show the area of theft in Google maps. And hence the required steps are taken. The same process is used for hooking but on the individual electric poles.
窃电通常有两种方法:旁路或钩接。为此,提出了一种通过电线杆到中间配电箱再到各家各户间接分配家庭电流的系统(电流测量与比较)。通过GSM/GPRS模块,在配电箱中定期测量电流,并将其发送到每户的服务器数据库中。同样,为每户设计电表,通过GSM/GPRS模块定时测量电流值,并将电流值发送到服务器数据库。在安装电表时,用户的详细资料通过一个方便用户使用的移动应用程序存储在数据库中,包括使用移动GPS的地址、纬度、经度和用户房屋/地区的照片。在成功比较配电箱和服务器电表的电流值后,如果我们得到电流之间的微小差异,则检测到盗窃。最后,用户的详细信息与授权的移动应用程序共享,包括该地区的地址和照片。在谷歌地图上,纬度和经度也用于显示被盗区域。因此采取了必要的步骤。同样的过程用于钩,但在单独的电线杆上。
{"title":"Smart Power Theft Detection System","authors":"Nitin K Mucheli, U. Nanda, D. Nayak, P. Rout, S. Swain, S. K Das, S. Biswal","doi":"10.1109/DEVIC.2019.8783395","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783395","url":null,"abstract":"Power theft is normally done by two methods that is bypassing or hooking. So to detect it, a system (current measuring and comparing) is proposed in which the household distribution of current is done indirectly from the electric pole to an intermediate distributor box and then to the individual houses. The current is measured periodically in the distributor box and is posted to the server database for each house using GSM/GPRS module. Similarly, for each house electric meter is designed which can measure the value of the current and post the same to the server database periodically using GSM/GPRS module. At the time of the installation of the electric meter the details of the users are stored in the database through a user friendly mobile application including the address, latitude, longitude using mobile GPS and the photograph of the user's house/area. Upon successful comparison between the current values from distributor box and electric meter in the server if we get a marginal difference between the currents then the theft is detected. Finally, the details of the user are shared with the authorized mobile application including the address and photograph of the area. The latitude and longitude are also used to show the area of theft in Google maps. And hence the required steps are taken. The same process is used for hooking but on the individual electric poles.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127239142","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
Mobility Modulation in V-shaped Double Quantum Well based HEMT Structure 基于v型双量子阱的HEMT结构的迁移率调制
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783242
S. Palo, A. K. Panda, T. Sahu, N. Sahoo, T. C. Tripathy
In the present work, modulation of low temperature mobility $mathbf{mu}$ is studied theoretically with the application of electric field $pmb{F}_{pmb{e}}$ in a double quantum well HEMT structure whose channel is craved from $pmb{Al}_{x}pmb{Ga}_{mathit{1}-x}pmb{As}$ having V-shaped potential. We show that there is an unusual rise in $pmb{mu}$ at the transition field where the change in subband occupancy occurs, unlike that of the conventional square quantum well systems.
本文应用电场$pmb{F}_{pmb{e}}$,从具有v形电位的$pmb{Al}_{x}pmb{Ga}_{mathit{1}-x}pmb{As}$的双量子阱HEMT结构中,从理论上研究了低温迁移率$mathbf{mu}$的调制。我们发现,与传统的方形量子阱系统不同,在子带占位变化发生的过渡场,$pmb{mu}$有一个不寻常的上升。
{"title":"Mobility Modulation in V-shaped Double Quantum Well based HEMT Structure","authors":"S. Palo, A. K. Panda, T. Sahu, N. Sahoo, T. C. Tripathy","doi":"10.1109/DEVIC.2019.8783242","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783242","url":null,"abstract":"In the present work, modulation of low temperature mobility $mathbf{mu}$ is studied theoretically with the application of electric field $pmb{F}_{pmb{e}}$ in a double quantum well HEMT structure whose channel is craved from $pmb{Al}_{x}pmb{Ga}_{mathit{1}-x}pmb{As}$ having V-shaped potential. We show that there is an unusual rise in $pmb{mu}$ at the transition field where the change in subband occupancy occurs, unlike that of the conventional square quantum well systems.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127897373","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Performance analysis of optical logic XOR gate using dual-control Tera Hertz Optical Asymmetric Demultiplexer (DCTOAD) 双控Tera赫兹光不对称解复用器光逻辑异或门性能分析
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783496
K. Maji, K. Mukherjee
In this paper we have proposed performance of optical logic XOR gate using dual control Tera Hertz Optical Asymmetric Demultiplexer (DCTOAD). For the first time DCTOAD based XOR gate with soliton pulse is proposed and analyzed in terms of eye diagram and quality factor. Extinction Ratio (ER), Contrast Ratio(CR) and relative eye opening are also calculated. High Q factor implies bit error free operation.
本文提出了采用双控制Tera赫兹光非对称解复用器实现光逻辑异或门的性能。首次提出了基于dclod的带孤子脉冲的异或门,并从眼图和质量因子的角度对其进行了分析。消光比(ER)、对比度(CR)和相对睁眼率也进行了计算。高Q因子意味着无误码操作。
{"title":"Performance analysis of optical logic XOR gate using dual-control Tera Hertz Optical Asymmetric Demultiplexer (DCTOAD)","authors":"K. Maji, K. Mukherjee","doi":"10.1109/DEVIC.2019.8783496","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783496","url":null,"abstract":"In this paper we have proposed performance of optical logic XOR gate using dual control Tera Hertz Optical Asymmetric Demultiplexer (DCTOAD). For the first time DCTOAD based XOR gate with soliton pulse is proposed and analyzed in terms of eye diagram and quality factor. Extinction Ratio (ER), Contrast Ratio(CR) and relative eye opening are also calculated. High Q factor implies bit error free operation.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116829669","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Up-state and Down-state Capacitance Measurement in RF MEMS One-bit Switch Designed at Microwave Frequency Range 微波频率下射频MEMS位开关上、下电容测量
Pub Date : 2019-03-01 DOI: 10.1109/DEVIC.2019.8783948
P. Debnath, A. Deyasi, A. Sarkar
Insertion loss, isolation factor and return loss of one-bit RF MEMS switch designed at higher microwave frequency ranges is numerically measured for computation of up-state and down-state capacitance. SiO2 is the material considered for design purpose and simulation is performed over the entire microwave frequency range in order to investigate the position of maximum loss (peak point). Overlap cross-sectional area is varied over the possible fabrication range, and losses are measured for both actuated as well as unactuated states of the device over the varying overlap region. Both up and down state capacitances are measured which are higher with increase of active area. Return loss of −50 dB is observed for unactuated state whereas it becomes very low (~ −7.5 dB) for actuated device. Also for down state capacitance measurement, isolation increases upto −40 dB. Results are very useful for phase-shifter design at microwave spectrum.
对高微波频率下设计的1位射频MEMS开关的插入损耗、隔离因数和回波损耗进行了数值测量,计算了开关的上、下状态电容。SiO2是用于设计目的的材料,在整个微波频率范围内进行模拟,以研究最大损耗(峰值点)的位置。重叠横截面积在可能的制造范围内变化,并且在不同的重叠区域内测量器件的驱动和非驱动状态的损耗。上下状态电容均随有源面积的增大而增大。非驱动状态下的回波损耗为- 50 dB,而驱动状态下的回波损耗非常低(~ - 7.5 dB)。同样,对于下降状态电容测量,隔离度增加到- 40 dB。研究结果对微波谱移相器的设计具有重要的指导意义。
{"title":"Up-state and Down-state Capacitance Measurement in RF MEMS One-bit Switch Designed at Microwave Frequency Range","authors":"P. Debnath, A. Deyasi, A. Sarkar","doi":"10.1109/DEVIC.2019.8783948","DOIUrl":"https://doi.org/10.1109/DEVIC.2019.8783948","url":null,"abstract":"Insertion loss, isolation factor and return loss of one-bit RF MEMS switch designed at higher microwave frequency ranges is numerically measured for computation of up-state and down-state capacitance. SiO2 is the material considered for design purpose and simulation is performed over the entire microwave frequency range in order to investigate the position of maximum loss (peak point). Overlap cross-sectional area is varied over the possible fabrication range, and losses are measured for both actuated as well as unactuated states of the device over the varying overlap region. Both up and down state capacitances are measured which are higher with increase of active area. Return loss of −50 dB is observed for unactuated state whereas it becomes very low (~ −7.5 dB) for actuated device. Also for down state capacitance measurement, isolation increases upto −40 dB. Results are very useful for phase-shifter design at microwave spectrum.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"79 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117084683","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2019 Devices for Integrated Circuit (DevIC)
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