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Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)最新文献

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Thermo-mechanical impact of laser-induced solder ball attach process on ball grid arrays 激光诱导焊锡球附着过程对球栅阵列的热机械影响
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962767
S. Stoyanov, A. Dabek, C. Bailey
Current trends in electronics packaging are driven by the demands imposed by the ever increasing high-volume consumer electronics market. The consequence of this, along with the introduction of the European Union legislations that banned the use of lead (Pb) and other hazardous materials in electrical and electronic products, is that high reliability equipment manufacturers have their component selection choices almost entirely limited to lead-free packaged commercial-of-the-shelf (COTS) components. The widespread adoption of lead-free electronic components into complex electronic systems designed for the Aerospace, Defence and High Performance (ADHP) industry must be judiciously planned in order to preserve the industry's reliability expectations. One area of concern for BGAs is thermo-mechanically induced premature (intermittent) electronic faults. One strategy to eliminate that risk is to replace the Pb-free solder balls with the baseline tin-lead solder alloy. Post-manufacturing processes that can be used to remove (deballing) and then deposit back (reballing) BGA solder balls are increasingly put in practice. The discussion in this paper focuses on the modelbased approach for assessing the thermo-mechanical responses of BGAs subjected to laser reballing. The findings of this work are that laser assisted BGA re-balling is a safe process with very localised thermal effects that present very small or no risk of thermally induced damage in relation to the discussed failure modes.
当前电子产品包装的趋势是由不断增长的高容量消费电子市场的需求所驱动的。其结果是,随着欧盟立法禁止在电气和电子产品中使用铅(Pb)和其他有害物质的引入,高可靠性设备制造商的组件选择几乎完全局限于无铅包装的商用货架(COTS)组件。为航空航天、国防和高性能(ADHP)行业设计的复杂电子系统广泛采用无铅电子元件,必须进行明智的规划,以保持行业的可靠性期望。bga关注的一个领域是热机械引起的过早(间歇性)电子故障。消除这种风险的一种策略是用基准锡铅焊料合金取代无铅焊料球。制造后的工艺,可用于去除(脱球),然后沉积(重球)BGA焊料球越来越多地付诸实践。本文主要讨论了基于模型的方法来评估BGAs在激光重球作用下的热-力学响应。这项工作的结果是,激光辅助BGA再球化是一个安全的过程,具有非常局部的热效应,相对于所讨论的失效模式,热诱导损伤的风险非常小或没有风险。
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引用次数: 2
Modelling of printable metal-oxide TFTs for circuit simulation 用于电路仿真的可打印金属氧化物tft的建模
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962797
A. Alastalo, J. Leppaniemi, K. Ojanpera, H. Majumdar
This paper focuses on circuit simulation for thin film transistors that can be based on organic or inorganic metal-oxide materials and fabricated using solution processing such as printing or using the more conventional methods such as sputtering. In particular, the paper focuses on solution processed metal oxides. Existing compact device models are generalized in the article to include AC properties and statistical variations. Simulation results for a four-transistor flip-flop circuit are compared against measured characteristics to verify model predictions. The simulation tools will serve in building more complicated analogue and digital printed circuits.
本文重点研究了基于有机或无机金属氧化物材料的薄膜晶体管的电路模拟,这些晶体管可以采用溶液加工(如印刷)或使用更传统的方法(如溅射)制造。本文特别关注溶液处理的金属氧化物。本文对现有的紧凑器件模型进行了推广,以包括交流特性和统计变化。四晶体管触发器电路的仿真结果与测量特性进行了比较,以验证模型预测。仿真工具将服务于构建更复杂的模拟和数字印刷电路。
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引用次数: 0
Solder fatigue acceleration prediction and testing results for different thermal test- and field cycling environments 不同热试验和现场循环环境下焊料疲劳加速预测和测试结果
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962747
R. Dudek, M. Hildebrandt, R. Doering, S. Rzepka, H. Trageser, R. Kohl, C. Wang
Due to the relatively short use time of lead-free solders, the issue of solder joint service life is not fully resolved yet. In particular, there is a lack of testing data for long term thermal cyclic under benign cyclic conditions as well as a on a reliable predictive model for solder fatigue acceleration. This subject has been addressed by long-term testing. Boards from series production were subjected to field cycles 23°C/93°C, 6 hours. After 3 ½ and 4 ½ years or 4800 and 6500 cycles, respectively, the test boards were analyzed. Both solders under investigation, SAC 305 and Innolot, were additionally tested under -40/150°C, 1hour, test cycling conditions. An acceleration factor of approximately 11 was figured out based on computer tomography and cross sectioning analyses. For SAC acceleration predictions based on different published analytical models (Norris/Landsberg equations) were compared to the testing results. The predicted range of acceleration factors was 4.9-39.4, i.e. this type of prediction can be misleading. A second type of comparison was made based on finite element analysis and a related phenomenological model, which gave predictions of the acceleration at least on the save side. For Innolot less fatigue was generally seen, however, kinds of brittle cracking were observed different for field and test loadings. In a final part of the paper an additional study on the effect of two test cycles, 0/100°C and -40/125°C, 1 hour, on multi row QFN fatigue is discussed which shows that involvement of plastic package with Tg in the cyclic range can cause acceleration totally different from analytical predictions.
由于无铅焊料的使用时间相对较短,焊点的使用寿命问题还没有完全解决。特别是缺乏良性循环条件下的长期热循环试验数据,也缺乏可靠的焊料疲劳加速预测模型。这个问题已经通过长期测试得到解决。批量生产的电路板经受23°C/93°C, 6小时的现场循环。分别经过3年半和4年半或4800和6500个循环后,对测试板进行了分析。所研究的两种焊料SAC 305和Innolot在-40/150°C, 1小时的测试循环条件下进行了额外测试。基于计算机断层扫描和横切面分析,计算出加速度因子约为11。基于不同已发表的分析模型(Norris/Landsberg方程)的SAC加速度预测与测试结果进行了比较。加速度因子的预测范围为4.9-39.4,即这种预测可能会产生误导。第二种类型的比较是基于有限元分析和相关的现象学模型进行的,该模型至少在保存方面给出了加速度的预测。对于Innolot来说,通常可以看到较少的疲劳,但在现场和试验载荷下观察到的脆性开裂类型不同。在论文的最后一部分,对两个测试周期,0/100°C和-40/125°C, 1小时,对多排QFN疲劳的影响进行了额外的研究,结果表明,在循环范围内,塑料包装与Tg的参与会导致与分析预测完全不同的加速度。
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引用次数: 13
3D flip chip packaging of MEMS sensor MEMS传感器的3D倒装封装
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962737
A. Gadda, R. Tuovinen, H. Rimminen, S. Lalu, J. Saarilahti, A. Karkkainen
Advanced 3D packaging of a Micro Electro Mechanical Systems (MEMS) chip and a CMOS/ASIC Chip was studied. We successfully introduced redistribution process applying two spin coated polybenzoxazole (PBO) polymer layers and two metal layers on 200 mm ASIC wafer. Both MEMS and ASIC bump pad openings were set to 60 μm in diameter. Sputtering and electrochemical plating (ECP) techniques were utilized for metallization. On the Al pads of the sensor Au stud bumps were created. The redistributed ASIC pads were coated with sputtered Au on top of the ECP nickel metal layer and thus Au-Au flip chip bonding was accomplished. The MEMS sensor element in this study was capacitive pressure sensing diaphragm. The diaphragm was made of poly-Si. The pressure range tested was typical barometric range from 35 kPa to 115 kPa. The device operating temperature range from - 40 °C to + 85 °C was tested. Along with the packaging process, solder ball transfer jig was fabricated using bulk silicon wafer. It enabled transfer of eight solder balls to the Chip Scale Packaging (CSP) at one time. The solder ball landing pad was sputtered Au as well. The solder ball pad openings were 300 μm in diameter. Two different size of solder balls were used, 310 μm and 410 μm to ensure enough clearance between CSP and Printed Circuit Board (PCB). Solder balls were consisted of polymer core ball with SnAgCu (SAC) solder metal layers. Several thermo compression bondings were carried out and fine-tune solder ball connections. Functionality was verified by electrical device measurements. To improve productivity, replacement of the Au stud bumps was demonstrated using wafer level ECP to make SnAg μbumps. The plating quality attained within 1 μm height uniformity inside a bonding chip area. SEM observation showed that connection of SnAg micro bump to Au-pad metal was realized.
研究了微电子机械系统(MEMS)芯片和CMOS/ASIC芯片的先进3D封装。在200 mm ASIC晶圆上成功地引入了两层自旋涂覆聚苯并恶唑(PBO)聚合物层和两层金属层的再分配工艺。MEMS和ASIC凹凸垫开口的直径均设置为60 μm。利用溅射和电化学镀(ECP)技术进行金属化。在传感器的铝衬垫上产生了Au螺柱凸起。重新分布的ASIC衬垫在ECP镍金属层的顶部涂有溅射的Au,从而实现了Au-Au倒装芯片的键合。本研究的MEMS传感器元件为电容式压敏膜片。隔膜是由多晶硅制成的。测试压力范围为35kpa ~ 115kpa的典型气压范围。测试设备工作温度范围为- 40°C至+ 85°C。在封装过程中,利用大块硅片制备了焊料球转移夹具。它可以一次将八个焊料球转移到芯片规模封装(CSP)。焊锡球着陆垫也溅射了金。焊球垫开口直径为300 μm。采用310 μm和410 μm两种不同尺寸的焊料球,以确保CSP和印刷电路板(PCB)之间有足够的间隙。焊锡球由聚合物芯球和SnAgCu (SAC)焊锡金属层组成。进行了几种热压连接和微调焊锡球连接。通过电气设备测量验证了功能。为了提高生产效率,我们演示了用晶圆级ECP制造SnAg μ凸点来替代Au螺柱凸点。在键合芯片区域内,镀层质量达到1 μm高度均匀。SEM观察表明,SnAg微凸点与Au-pad金属实现了连接。
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引用次数: 1
Printable and disposable supercapacitor from nanocellulose and carbon nanotubes 由纳米纤维素和碳纳米管制成的可打印和一次性超级电容器
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962740
S. Tuukkanen, S. Lehtimäki, F. Jahangir, Antti-Pekka Eskelinen, Donald Lupo, Sami Franssila
Supercapacitors are promising energy storage devices providing capacitance much higher than conventional capacitors and higher power density and longer cycle life than Li-batteries. We report printable and disposable supercapacitors fabricated from solution-processed carbon nanotube (CNT) composite material as active electrodes and nanocellulose (NC) as a separator. Use of a highly porous and electrically conducting CNT film as electrode materials eliminates the need of current collector. NC is a robust separator material used instead of conventional polymer separator films. Supercapacitor characterization was done with a galvanostatic discharge method according to an industrial standard. The capacitance of 1.8 cm2 devices was 14.9-16.5 mF (7.4-9.1 mF/cm2 or 2.4-2.9 F/g) and equivalent series resistance (ESR) 74-155 Ω. This type of low-cost energy storage devices fabricated from safe and environmentally friendly materials have obvious applications in autonomous intelligence and disposable low-end products.
超级电容器是一种很有前途的能量存储设备,其电容比传统电容器高得多,比锂电池具有更高的功率密度和更长的循环寿命。我们报道了用溶液处理的碳纳米管(CNT)复合材料作为活性电极,纳米纤维素(NC)作为分离器制成的可打印和一次性超级电容器。使用高多孔性和导电性的碳纳米管薄膜作为电极材料,消除了对集流器的需要。NC是一种坚固耐用的隔膜材料,用于替代传统的聚合物隔膜膜。根据工业标准,采用恒流放电法对超级电容器进行了表征。1.8 cm2器件的电容为14.9-16.5 mF (7.4-9.1 mF/cm2或2.4-2.9 F/g),等效串联电阻(ESR)为74-155 Ω。这种由安全环保材料制成的低成本储能装置在自主智能和一次性低端产品方面具有明显的应用前景。
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引用次数: 23
GaN/SiC MMICs and packaging for use in future transmit / receive modules 用于未来发射/接收模块的GaN/SiC mmic和封装
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962788
M. Oppermann, Felix Thurow, B. Bunz
Future applications like new types of multifunctional sensors (e.g. surveillance radar) will be realised with cost-effective and high yield manufacturing solutions, like high-volume SMD based electronic products. Different package types, e.g. QFN (Quad Flat no-Lead) and ceramic based packages in L/HTCC (Low/High Temperature Cofired Ceramic) technology, mainly used for power devices will be shown and compared. Next generation of GaN (Gallium Nitride) MMICs will cover more functionalities on the same chip. Therefore specific package designs with higher number of RF interfaces are mandatory. Multifunctional MMICs will allow very compact T/R (Transmit/Receive) module designs, and will reduce the number of active devices and packages used in PCB (Printed Circuit Board) based module solutions.
未来的应用,如新型多功能传感器(如监视雷达),将实现具有成本效益和高产量的制造解决方案,如大批量基于SMD的电子产品。将展示和比较主要用于功率器件的不同封装类型,例如QFN (Quad Flat no-Lead)和L/HTCC(低/高温共烧陶瓷)技术的陶瓷封装。下一代GaN(氮化镓)mmic将在同一芯片上覆盖更多功能。因此,具有更高数量RF接口的特定封装设计是强制性的。多功能mmic将允许非常紧凑的T/R(发送/接收)模块设计,并将减少基于PCB(印刷电路板)的模块解决方案中使用的有源器件和封装的数量。
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引用次数: 4
MEMS, MOEMS, RF-MEMS and photonics packaging based on LTCC technology 基于LTCC技术的MEMS, MOEMS, RF-MEMS和光子封装
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962731
P. Karioja, K. Kautio, J. Ollila, K. Keranen, M. Karppinen, V. Heikkinen, T. Jaakola, M. Lahti
In order to fulfill the specifications of photonic systems, various optoelectronic chips, MEMS, MOEMS and RF-MEMS devices, micro-optical elements and integrated circuits needs to be integrated into functional components, modules and systems. The sub-systems of the photonic system must be fabricated by the use of cost-efficient, reproducible, well-established, high-volume manufacturing technologies. The functionality of the system is outlined by the combination of the functionalities of individual devices. The performance of the system, however, is defined by packaging and integration methods and configurations. Low temperature cofired ceramics (LTCC) is one of our key technology assets for photonics and MEMS/MOEMS/RF-MEMS packaging. In photonics integration, the tolerance of device alignment is the key issue of integration. In order to be able to use mass-manufacturing tools, the primary aim is to process 3D structures, such as, grooves, cavities, holes, bumps and alignment fiducials, which can be used for the passive alignment of devices. The tolerances of LTCC structures are typically ±5μm and in some specific cases ±2μm. Therefore, LTCC provides means for the passive alignment of multimode fiber as well as MOEMS devices. Thermal management by the use of thermal vias in LTCC is a well-established technique, and liquid cooling channels in the LTCC substrate provide efficient additional means for high-power laser cooling. When targeting for thermally controlled systems, thermal bridge structures can be used to isolate critical devices from main structures. LTCC provides inherently hermetic substrate allowing for the possibility to hermetic encapsulation. Hermetic fiber feed throughs and transparent windows can be integrated in LTCC structures. Cavities, channels and sealed gas cells can be fabricated, also. RF antennas and coil structures for electro-magnetic field control can be integrated in the LTCC substrate. Therefore, 3D packaging of MEMS, MOEMS and photonic devices is enabled by LTCC.
为了实现光子系统的规格,需要将各种光电子芯片、MEMS、MOEMS和RF-MEMS器件、微光元件和集成电路集成到功能元件、模块和系统中。光子系统的子系统必须通过使用成本效益高、可复制、成熟、大批量的制造技术来制造。系统的功能由各个设备的功能组合而成。然而,系统的性能是由封装和集成方法以及配置来定义的。低温共烧陶瓷(LTCC)是我们用于光子学和MEMS/MOEMS/RF-MEMS封装的关键技术资产之一。在光电集成中,器件对准公差是集成的关键问题。为了能够使用大规模制造工具,主要目标是处理3D结构,例如凹槽,空腔,孔,凸起和对准基准,这些结构可用于设备的被动对准。LTCC结构的公差通常为±5μm,在某些特定情况下为±2μm。因此,LTCC为多模光纤和MOEMS器件的无源对准提供了手段。在LTCC中使用热通孔进行热管理是一项成熟的技术,LTCC衬底中的液体冷却通道为高功率激光冷却提供了有效的额外手段。当目标是热控制系统时,可以使用热桥结构将关键器件与主要结构隔离开来。LTCC提供固有的密封基板,允许密封封装的可能性。密封纤维馈通和透明窗口可以集成在LTCC结构中。也可以制造空腔、通道和密封的气室。用于电磁场控制的射频天线和线圈结构可以集成在LTCC衬底中。因此,通过LTCC可以实现MEMS、MOEMS和光子器件的3D封装。
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引用次数: 7
High speed through glass via manufacturing technology for interposer 高速通过玻璃通过制造技术的中间层
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962711
Roman Ostholt, N. Ambrosius, R. A. Kruger
Silicon and organic materials are largely accepted as substrates for interposer. Glass outperforms the current interposer materials in a number of properties such as mechanical strength, low loss and chemical resistance. In addition it offers the potential of being a low cost but high density substrate material. As this is recognized glass is an emerging material for interposer application. While metallization is widely solved, via formation is still one of main drawbacks of glass interposers. Current glass drilling technologies lack either in speed, minimal diameter or quality for interposer application. In this paper a new high speed Through-Glass-Via (TGV) manufacturing process is presented. The new process is based on a laser induced chemical etching of the glass substrate. Laser induced glass etching technologies are known in the art. Using ultra short laser pulses a permanent modification of the glass is generated which triggers an anisotropic etching. In contrast to the state of the art, the presented process generates a modification from one surface of the glass substrate to the other with one shot only. Therefore the technology enables structuring on the fly. The speed of the on the fly process only depends on the dynamics of the base machine. Structuring speeds of around 5000 TGV/s can be achieved. The process works with standard glasses used for interposer. It does not depend on a special glass additive or additional thermal treatments of the glass before etching. Results are shown for glass thicknesses between 50 μm and 200 μm. Depending on the length of the etching step TGV diameter between 10 μm and 50 μm can be achieved. The TGVs have a small taper of below 5°.
硅和有机材料被广泛接受作为中间体的衬底。玻璃在机械强度、低损耗和耐化学性等方面优于当前的中间层材料。此外,它提供了低成本的潜力,但高密度的基板材料。众所周知,玻璃是一种新兴的中间材料。虽然金属化已经得到了广泛的解决,但通孔形成仍然是玻璃中间体的主要缺点之一。目前的玻璃钻孔技术在速度、最小直径或中间应用的质量上都存在不足。本文提出了一种新的高速玻璃通孔(TGV)制造工艺。新工艺是基于激光诱导的玻璃基板化学蚀刻。激光诱导玻璃蚀刻技术是已知的艺术。利用超短激光脉冲对玻璃进行永久性修饰,从而触发各向异性蚀刻。与本技术的状态相反,本发明的工艺仅用一枪就产生从玻璃基板的一个表面到另一个表面的修饰。因此,该技术可以在飞行中构建。动态过程的速度只取决于基本机器的动力学。可以实现5000 TGV/s左右的结构速度。该工艺使用标准玻璃作为中间层。它不依赖于特殊的玻璃添加剂或在蚀刻前对玻璃进行额外的热处理。结果显示了玻璃厚度在50 μm和200 μm之间。根据刻蚀步骤的长度,可以实现直径在10 μm到50 μm之间的TGV。tgv的锥度小于5°。
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引用次数: 21
Mechanical characterization of bond wire materials in electronic devices at elevated temperatures 高温下电子器件中键合线材料的力学特性
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962748
G. Lorenz, F. Naumann, M. Mittag, M. Petzold
Today, micro- and power electronic components are used within a rapidly increasing number of different automotive applications playing a key role within power generation and energy conversion systems. As a consequence, particularly the interconnecting materials of electronics systems are extremely challenged by harsh environment conditions like high operational temperatures, which are partially superposed by intensive mechanical loading and high thermo mechanical stresses. In order to meet the robustness and reliability demands required for industrial applications, detailed understanding of the material response regarding (visco-) elastic, plastic or creep deformation behavior as a function of temperature is necessary. In this study, elastic and plastic material properties of bond wire materials at temperatures up to 350°C have been determined by nanoindentation. Using a Voce model to consider the plastic material behavior, the applied material parameter extraction procedure was exemplarily demonstrated for three different heavy bond wire materials as a model system. The test method presented has been validated by comparing results from reference tensile testing with the deformation behavior gained from nanoindentation testing. Thus, the testing method and data evaluation procedure can also be applied to determine local material parameters in critical process- or application-affected regions of microelectronic packaging materials.
今天,微型和电力电子元件被用于越来越多的不同汽车应用中,在发电和能量转换系统中发挥着关键作用。因此,特别是电子系统的互连材料受到恶劣环境条件的极大挑战,例如高工作温度,这些恶劣环境条件部分由密集的机械负载和高热机械应力叠加。为了满足工业应用所需的鲁棒性和可靠性要求,有必要详细了解材料的(粘)弹性、塑性或蠕变变形行为随温度的变化。在这项研究中,通过纳米压痕测定了键合线材料在高达350°C温度下的弹性和塑性材料性能。利用voice模型考虑材料的塑性行为,以三种不同的重键线材料为模型系统,举例说明了所应用的材料参数提取过程。通过对比参考拉伸试验结果和纳米压痕试验结果,验证了所提出的试验方法的有效性。因此,测试方法和数据评估程序也可以应用于确定微电子封装材料关键工艺或应用影响区域的局部材料参数。
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引用次数: 1
Development of low contact resistance interconnection for display applications 用于显示应用的低接触电阻互连的发展
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962817
Haksun Lee, Y. Eom, Hyun-Cheol Bae, Kwang-Seong Choi, J. H. Lee
This paper focuses on development of a low contact resistance interconnection for low temperature bonding applications. Alternative to conventional display interconnection mechanisms using anisotropic conductive film (ACF), solder and underfill method using low melting point Bi58-Sn solder is suggested. Solder bumping is carried out using a maskless Solder-on-Pad technology. An average bump height of 16.4μm with 80μm bump pitch is achieved by optimizing the solder paste material called Solder-Bump-Maker. The test vehicle with bumps is flip chip bonded with a top die using Fluxing underfill. In order to analyze the quality of the bonded interconnection, contact resistance was measured using the 4-point probe method, and a moisture absorption test was conducted in a 85°C/85% relative humidity condition for 100 hours. The contact resistance values before and after the reliability test show no significant difference, which demonstrates that the suggested interconnection is a robust joint with increased electrical performance.
本文重点研究了低温键合应用中低接触电阻互连的发展。建议采用低熔点Bi58-Sn焊料替代传统的各向异性导电膜(ACF)显示互连机制。焊料碰撞采用无掩膜焊盘技术。通过优化名为solder - bump - maker的锡膏材料,实现了平均凹凸高度为16.4μm,凹凸间距为80μm。带有凸起的测试车辆是使用Fluxing底料与顶模粘合的倒装芯片。为了分析键合互连的质量,采用4点探针法测量接触电阻,并在85℃/85%相对湿度条件下进行吸湿试验100小时。可靠性试验前后的接触电阻值无显著差异,说明所建议的连接是一个坚固的连接,电气性能有所提高。
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引用次数: 2
期刊
Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)
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