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Study on influence of silicone encapsulant for ceramic LED package after HTOL test 有机硅封装对陶瓷LED封装HTOL测试影响的研究
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962856
Jemin Kim, B. Ma, K. Lee
To estimate influence of silicone encapsulant for ceramic LED package, we prepared silicone samples and ceramic LED packages used encapsulant as the same silicone with neither bonding adhesive nor phosphor. Also, a test jig was designed for high temperature operational life (HTOL) test on ceramic LED packages. The test jig made ceramic LED packages luminous, and was able to guide the light from ceramic LED packages to silicone samples. And then, thermal and optical stress tests on silicone samples were performed with HTOL test on ceramic LED packages in three different temperatures to compare the transmittance of the silicone samples according to the thermal and optical stress from ceramic LED packages. Transmittance of silicone sample and luminous flux of ceramic LED package were measured every 250 hours by UV-VIS spectrophotometer and integrating sphere, respectively. As results, more transmittance variations at 300~400 nm were inspected in silicone samples tested by thermal and optical stresses than by only thermal stress. And, the difference of transmittance characteristics was analyzed to find out how the silicone samples had changed during thermal and optical stress test with Raman analysis. In addition, the luminous flux of ceramic LED package was also changed during HTOL test according to transmittance variations in silicone samples.
为了评估硅酮封装剂对陶瓷LED封装的影响,我们制备了硅酮样品,陶瓷LED封装使用硅酮作为相同的硅酮,不使用粘合剂和荧光粉。设计了陶瓷LED封装高温工作寿命(HTOL)测试夹具。测试夹具使陶瓷LED封装发光,并能够将光从陶瓷LED封装引导到硅胶样品上。然后,对硅胶样品进行热应力和光应力测试,并在三种不同温度下对陶瓷LED封装进行热应力和光应力测试,比较硅胶样品根据陶瓷LED封装的热应力和光应力的透射率。用紫外-可见分光光度计和积分球每隔250 h分别测量硅胶样品的透光率和陶瓷LED封装的光通量。结果表明,在300~400 nm处,热应力和光应力对硅树脂样品透射率的影响大于热应力对透射率的影响。并通过拉曼分析分析透光特性的差异,了解硅酮样品在热应力和光应力测试中的变化情况。此外,陶瓷LED封装的光通量也会根据硅酮样品的透光率变化而变化。
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引用次数: 1
Electronics packaging technologies for the volume integration in components for medical tools and instruments 用于医疗工具和仪器部件体积集成的电子封装技术
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962804
M. Detert, B. Schmidt, Franziska Wittig, David Wagner
The electronics packaging in microsystems technology for medical applications includes various tasks. The interdisciplinary approach is the most important basis for the success of a product. For the reliable operation of medical microsystems different factors must be considered. The functionalization of a catheter depends on different influence factors. The form factor takes the most important role. For a miniaturized and functional catheter tip, the diameter depends on the medical application. Other factors like the shape, reliability and also the cost must be considered. The paper shows the whole technology carrier of a medical product in relation to the field of electronics packaging.
用于医疗应用的微系统技术中的电子封装包括各种任务。跨学科的方法是产品成功的最重要的基础。为了保证医疗微系统的可靠运行,必须考虑各种因素。导管的功能化取决于不同的影响因素。外形因素扮演着最重要的角色。对于一个小型化和功能性的导管尖端,其直径取决于医疗应用。其他因素,如形状,可靠性和成本也必须考虑。本文从电子封装领域的角度,展示了医疗产品的整体技术载体。
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引用次数: 2
High-temperature shear strength of solid-liquid interdiffusion (SLID) bonding: Cu-Sn, Au-Sn and Au-In 固液互扩散键合的高温剪切强度:Cu-Sn, Au-Sn和Au-In
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962772
K. Aasmundtveit, T. Luu, Astrid-Sofie B. Vardøy, T. A. Tollefsen, Kaiying Wang, N. Hoivik
Solid-Liquid Interdiffusion (SLID) bonding is a promising bonding technique, particularly for high-temperature applications. Based on intermetallics as the bonding medium, the bonds are stable at temperatures far above the processing temperature which is in the range of normal solder temperatures. This work confirms experimentally this high-temperature stability through shear strength testing as function of temperature (room temperature to 300 °C) for three different SLID systems: Cu-Sn, Au-Sn and Au-In. All three systems remain solid within the tested temperature range, as expected, but they show remarkably different temperature dependence of mechanical strength: Au-Sn SLID bonds show strongly decreasing shear strength with temperature (but at 300 °C it is still well above the MIL-STD requirement); Cu-Sn SLID bonds show only small changes; whereas Au-In SLID bonds show increased shear strength at 300 °C, accompanied with a change in fracture mode from brittle to ductile. All three behaviours can be explained from the phase diagrams with the actual phases in use.
固液互扩散键合是一种很有前途的键合技术,特别是在高温应用中。基于金属间化合物作为键合介质,在远高于正常焊接温度范围内的加工温度下,键合是稳定的。这项工作通过实验证实了三种不同的滑动系统(Cu-Sn, Au-Sn和Au-In)的高温稳定性,通过剪切强度测试作为温度(室温至300°C)的函数。这三种体系在测试温度范围内都保持固体状态,正如预期的那样,但它们表现出明显不同的机械强度温度依赖性:Au-Sn滑动键的剪切强度随着温度的升高而急剧下降(但在300°C时仍远高于MIL-STD要求);Cu-Sn滑动键变化不大;而Au-In滑动键在300°C时抗剪强度增加,同时断裂模式从脆性转变为延性。所有三种行为都可以用实际使用的阶段图来解释。
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引用次数: 14
Influence of curing conditions on mechanical properties and reliability of the interconnects made by ICA for printed electronics with micro additives 固化条件对含有微量添加剂的ICA印制电子互连材料力学性能和可靠性的影响
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962802
M. Kościelski, J. Sitek
Conductive adhesives are widely used nowadays in electronic packaging eg. as a convenient way to connect chip on flexible substrate [1-3] such as Kapton foil, PEN foil, paper, thin epoxy laminate etc. Conductive adhesive mainly consist of organic polymer matrix and conductive fillers. Silver is widely the first choice as for its properties, electrical and thermal conductance and easy of producing the particles of different sizes and shapes. Silver is also beneficial because it's not prone towards oxidation. The drawback of the printed electronics is its longevity, as during time they degrade, that's why this technique is often used for simple assemblies such as RFID tags.
导电胶粘剂目前在电子封装中得到了广泛的应用。作为在柔性基板上连接芯片的便捷方式[1-3],如卡普顿箔,PEN箔,纸张,薄环氧层压板等。导电胶主要由有机聚合物基体和导电填料组成。银因其优良的性能、导电性和导热性,以及易于制造不同大小和形状的颗粒,被广泛地作为首选材料。银也是有益的,因为它不容易氧化。印刷电子产品的缺点是它的寿命长,因为在一段时间内它们会退化,这就是为什么这种技术经常用于简单的组件,如RFID标签。
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引用次数: 2
Hermetical package of infrared sensors by Al/Ni self-propagating joining process 采用Al/Ni自传播连接工艺的红外传感器密封封装
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962721
Wenbo Zhu, Fengshun Wu, Yanjun Xu, Changqing Liu
In this paper, patterned Cu and Si substrates are interconnected via solder alloys through Al/Ni self-propagating nano-film to obtain hermetical packaging for infrared detector. During the joining process, substrates which are coated with different solder layers (e.g. Sn and AuSn) are bonded under various atmospheres. By optimizing joining parameters, reliable metallurgical joints between Si/Cu and Si/Si can be achieved through self-propagating exothermic reaction process of Al/Ni multilayered nano-films. Thin IMC layers are observed at the bonding interfaces with some micro-voids being detected, but the bonding obtained is acceptable and can meet the requirements of the package of infrared sensors. Furthermore, the solder behavior and the formation of defects under different bonding conditions are compared to enable the optimization of the self-propagating joining process. To verify the reliability of self-propagating joints, the formed bonds are also evaluated in terms of IMCs formation and interfacial characteristics. In particular, the voids and potential leakage in joints are estimated through CSAM inspection. And the composition, morphology and defects in solder joints under different bonding conditions are also characterized based on the cross-sections of the joints. Finally, in comparison with traditional reflow process, the feasibility and advantages of self-propagating joining in hermetical package can articulated in the discussion.
在本文中,图案化的Cu和Si衬底通过钎料合金通过Al/Ni自传播纳米薄膜相互连接,从而获得红外探测器的密封封装。在连接过程中,涂有不同焊料层(例如Sn和AuSn)的衬底在不同的气氛下进行连接。通过优化连接参数,可以通过Al/Ni多层纳米膜的自扩散放热反应过程实现Si/Cu和Si/Si之间可靠的冶金连接。在键合界面处观察到薄的IMC层,并检测到一些微空洞,但得到的键合是可以接受的,可以满足红外传感器封装的要求。此外,还比较了不同连接条件下焊料的行为和缺陷的形成,从而优化了自扩展连接工艺。为了验证自扩展接头的可靠性,还从imc形成和界面特征方面对形成的键进行了评估。特别是,通过CSAM检测,对接头的空隙和潜在泄漏进行了估计。并根据焊点的横截面对不同焊接条件下焊点的成分、形貌和缺陷进行了表征。最后,通过与传统回流工艺的比较,论述了密封封装自扩展连接的可行性和优越性。
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引用次数: 0
In-situ-X-ray investigation on vacuum soldering processes for conventional and diffusion soldering 传统和扩散真空焊接工艺的现场x射线研究
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962862
A. Klemm, M. Oppermann, T. Zerna
In power electronics there is currently a development to higher operating temperatures of up to 300 °C. This was made possible by an improved availability of semiconductor materials such as silicon carbide. At these temperatures conventional solders can no longer be used for Die-Attachment. Therefore new technologies are necessary. One possible solution is to use diffusion soldering. Khaja et al. [1] presented an approach for diffusion soldering by printing of a conventional solder paste with a 20 μm thin stencil. In power the void content is typically required to be less than 10 %. Khaja et al. showed that the application of a vacuum vapour phase soldering process can ensure a very low void content of the resulting solder joints. In a previous paper we showed that vacuum soldering processes are in principle better suited for this purpose than overpressure processes [2]. In this work we found the same effects, which we observed in our previous work, also for conventional SAC305 solder paste on DCB substrates. Furthermore we investigated different vacuum soldering processes. We could not observe any apparent difference between vacuum soldering processes with several separate vacuum steps and processes with a single vacuum step. However the strength of the vacuum step influences the final void content significantly. Furthermore we found that void content over time curves of soldering processes without pressure changes exhibit a minimum. When a solder joint is kept at peak temperature for a longer period of time the void content steadily increases again. We showed that this can be suppressed with overpressure. Therefore we conclude that for diffusion soldering with long peak times of several minutes a combined soldering process of vacuum and overpressure steps is required.
在电力电子领域,目前正在向高达300°C的更高工作温度发展。这是由于半导体材料如碳化硅的可用性提高而成为可能的。在这样的温度下,传统焊料不能再用于模具连接。因此,新技术是必要的。一种可能的解决方案是使用扩散焊接。Khaja等人[1]提出了一种用20 μm薄的模板打印传统锡膏进行扩散焊接的方法。在电力中,通常要求孔隙含量小于10%。Khaja等人表明,真空气相焊接工艺的应用可以确保所得到的焊点的空隙率非常低。在之前的一篇论文中,我们表明真空焊接工艺原则上比超压工艺更适合于此目的[2]。在这项工作中,我们发现了与我们在之前的工作中观察到的相同的效果,也适用于DCB基板上的传统SAC305锡膏。此外,我们还研究了不同的真空焊接工艺。我们没有观察到有几个单独真空步骤的真空焊接工艺和有一个真空步骤的真空焊接工艺有任何明显的区别。而真空台阶的强度对最终孔隙率影响较大。此外,我们还发现,在没有压力变化的情况下,焊接过程中空洞含量随时间的变化曲线最小。当焊点在峰值温度下保持较长时间时,空洞含量再次稳定增加。我们证明了这可以用超压来抑制。因此,我们得出结论,对于具有几分钟长的峰值时间的扩散焊接,需要真空和超压步骤的组合焊接工艺。
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引用次数: 3
Comparison between ENA and ENEPIG surface finish for high density TBGA package 高密度TBGA封装表面光洁度ENA与ENEPIG的比较
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962847
K. Pun, M. Islam, T. Ng
Recently Electroless Ni/Electroless Pd/Immersion Au (ENEPIG) is being offered as an alternative surface finish to established processing such as Immersion Sn, Immersion Ag, Organic solderability preservatives (OSP), Electrolytic Ni/Au (ENA), and electroless Ni/immersion Au (ENIG) surface finish. With high solder joint quality and wire bondability, it is claimed to be more cost effective as an Au layer of lower thickness can be used. The performance of solder joints upon ENA and ENEPIG surface finishes are evaluated by extended reflow tests at 245°C followed by ball shear testing. Following extended reflow, the ENEPIG/solder system provides lower shear strengths than the ENA/solder system. It is found that columnar Cu-Ni-Sn IMCs with small amount of Pd and P-rich Ni layer have formed at the interface of ENEPIG/solder system, causing brittle fracture with lower shear strength in the ball shear test. In contrast, layer-type Cu-Ni-Sn IMCs formed at the interface of ENA/solder system in the absence of Pd which caused ductile fracture in ball shear test. Therefore, it has been demonstrated that solder joint on ENA surface finish is more reliable and suitable to be used for long-term reliability of electronic products.
最近,化学镀镍/化学镀钯/浸金(ENEPIG)作为一种可替代的表面处理工艺,如浸锡、浸银、有机可焊性防腐剂(OSP)、电解镀镍/镀金(ENA)和化学镀镍/浸金(ENIG)表面处理。由于具有较高的焊点质量和线材粘合性,因此可以使用较低厚度的Au层,因此具有更高的成本效益。通过在245°C下进行延伸回流试验,然后进行球剪试验,评估ENA和ENEPIG表面处理的焊点性能。随着回流时间的延长,ENEPIG/焊料系统的抗剪强度低于ENA/焊料系统。结果表明,在ENEPIG/钎料体系界面处形成了含有少量Pd和富p Ni层的柱状Cu-Ni-Sn IMCs,造成了较低抗剪强度的脆性断裂。而在不含Pd的情况下,在ENA/solder体系界面处形成层状Cu-Ni-Sn IMCs,导致球剪断裂。因此,证明了ENA表面处理的焊点更加可靠,适合用于电子产品的长期可靠性。
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引用次数: 1
Reliability of carbon nanotube bumps for chip on glass application 用于玻璃芯片的碳纳米管凸点的可靠性
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962753
Xiaogang Fan, Xiaolei Li, W. Mu, D. Jiang, Shirong Huang, Yifeng Fu, Yan Zhang, Johan Liu
Carbon nanotubes (CNTs) are an ideal candidate material for electronic interconnects due to their extraordinary thermal, electrical and mechanical properties. In this study, densified CNT bumps utilizing the paper-mediated controlled method were applied as the interconnection for chip on glass (COG) applications, and the silicon chip with patterned CNT bumps was then flipped and bonded onto a glass substrate using anisotropic conductive adhesive (ACA) at a bonding pressure of 127.4 Mpa, 170°C for 8 seconds. The electrical properties of the COG were evaluated with the contact resistance of each bump measured using the four-point probe method. Three different structure traces, marked as Trace A, Trace B, and Trace C, were tested, respectively. Thermal cycling (-40 to 85°C, 800 cycles) and damp heat tests (85°C/85% RH, 1000 hours) were also conducted to evaluate the reliability of the CNT-COG structure. The average contact resistance of the samples was recorded during these tests, in which there was no obvious electrical failure observed after both the thermal cycling and damp heat tests. The results of these tests indicated that the COG has good reliability and the CNT bumps have promising potential applications in COG.
碳纳米管(CNTs)由于其非凡的热、电和机械性能而成为电子互连的理想候选材料。在本研究中,利用纸张介导的控制方法将致密的碳纳米管凸起作为玻璃芯片(COG)应用的互连,然后将带有图图化碳纳米管凸起的硅芯片翻转并使用各向异性导电胶(ACA)在127.4 Mpa的键合压力下,170°C,粘合8秒。利用四点探针法测量每个凸点的接触电阻来评估COG的电学性能。分别测试了三种不同的结构轨迹,标记为轨迹A、轨迹B和轨迹C。还进行了热循环(-40至85°C, 800个循环)和湿热试验(85°C/85% RH, 1000小时),以评估CNT-COG结构的可靠性。在这些试验中记录了样品的平均接触电阻,在热循环和湿热试验后均未观察到明显的电气故障。实验结果表明,碳纳米管凸点具有良好的可靠性,在碳纳米管凸点中具有广阔的应用前景。
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引用次数: 1
Development of void free, high reliability underfill encapsulated fine pitch system on flex packages 柔性封装上无空隙、高可靠性下填料封装细间距系统的研制
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962785
K. Pun, Anupam Sharma, Amandeep Singh, M. Islam, T. Ng
In system on flex (SOF) packages with high density I/O's, a number of factors induces concentrated stress field around the bonded areas (bumps & traces) during assembly process. For example, the choice of underfill / encapsulant and the associated processes could affect the package integrity. Poor control of the underfill process could potentially result in delamination on various interfaces. It also increases the chances of moisture absorption thus potentially results in electro-chemical corrosion of the stressed area which affects the package reliability. In this paper, we present the development of processes targeted at ensuring good underfill reliability. It is revealed that delamination is driven by either the adhesion failure within the substrate and underfill or by the stresses induced in the interfacial sites. We developed an extra cleaning process to remove seed-layer Cr+ to avoid adhesion failure due to contamination of flex. Filler type underfill material is found to give more strength than non-filler materials but at a cost of flow rate and capturing voids. Effect of peak temperature during assembly process was studied; this shows that through controlling the reflow temperature, the underfill integrity may be maintained which potentially allows more complex assembly processes. However, at the same time, poor control of the reflow temperature may significantly affect the underfill material causing it to deteriorate at a rapid rate. Further development into assembly processing at lower temperature would be beneficial for high reliability of SOF packages.
在具有高密度I/O的柔性系统(SOF)封装中,在装配过程中,许多因素会导致粘合区域(凸起和痕迹)周围的集中应力场。例如,下填料/封装剂的选择和相关工艺可能会影响包装的完整性。欠充填过程控制不当可能会导致不同界面上的分层。它还增加了吸湿的机会,从而可能导致应力区域的电化学腐蚀,从而影响封装的可靠性。在本文中,我们提出了旨在确保良好的下填料可靠性的工艺发展。结果表明,脱层是由衬底和下填料内部的粘附破坏或界面部位的应力引起的。我们开发了一种额外的清洁工艺来去除种子层Cr+,以避免由于挠曲污染而导致粘合失败。填料型底填材料被发现比非填料材料提供更多的强度,但以流速和捕获空隙为代价。研究了装配过程中峰值温度的影响;这表明,通过控制回流温度,可以保持下充填体的完整性,从而可能允许更复杂的装配过程。但与此同时,回流温度控制不当会对下填料产生较大影响,导致下填料劣化速度加快。进一步发展低温装配工艺将有利于软封装的高可靠性。
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引用次数: 0
Alternative integration scheme for half-bridge switch using double etched Si3N4 substrate 采用双蚀刻氮化硅衬底的半桥开关替代集成方案
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962723
A. Solomon, A. Castellazzi
The recent research exercises have targeted the transfer of the sandwich package benefits to application bespoke switch design, including flipchip and device stacking topology [1]. This paper will present the work in an alternative integration scheme for a half-bridge switch using 70μm thin Si IGBTs and diodes addressing higher strength, higher toughness and higher thermal conductivity. Using alumina ceramic substrates are prone to failure compared to silicon nitride. The switch is totally wire bond less where bonded wires have large parasitic inductance which deteriorates the electromagnetic performance. In addition to the wire bond, the interconnection pattern plays a great roll of helping the loop current to be entirely vertical.
最近的研究练习的目标是将三明治封装的优势转移到应用定制开关设计中,包括倒装芯片和器件堆叠拓扑[1]。本文将介绍使用70μm薄Si igbt和二极管的半桥开关的替代集成方案,以实现更高的强度,更高的韧性和更高的导热性。与氮化硅相比,使用氧化铝陶瓷衬底容易失效。该开关完全采用无导线键合,而键合导线的寄生电感较大,影响了开关的电磁性能。除了线键之外,互连模式在帮助环路电流完全垂直方面起着很大的作用。
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引用次数: 2
期刊
Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)
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