Pub Date : 2017-08-01DOI: 10.1109/3M-NANO.2017.8286288
Xianbin He, Liangyu Cui, K. Cai, Yanling Tian, Xianping Liu
Atomic force microscopy (AFM) is a useful tool in nanoscale measurement. However, conventional AFM suffers from slow scan speed, limiting the use for biological detection or nanofabrication, due to the limited bandwidth of AFM components. In which the resonant frequency of the AFM scanner is usually too low to achieve high-speed scanning. In this paper, a parallel kinematic piezoelectric actuator (PZT) AFM scanner is designed to achieve high-speed atomic force microscopy (HS-AFM) scanning. After that, finite element analysis (FEA) is adopted to characterize the scanner. Finally, images of standard gratings obtained at 25 Hz with our home-made AFM system is presented after calibration and motion coupling compensation.
{"title":"A parallel kinematic scanner designed for high-speed atomic force microscopy","authors":"Xianbin He, Liangyu Cui, K. Cai, Yanling Tian, Xianping Liu","doi":"10.1109/3M-NANO.2017.8286288","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286288","url":null,"abstract":"Atomic force microscopy (AFM) is a useful tool in nanoscale measurement. However, conventional AFM suffers from slow scan speed, limiting the use for biological detection or nanofabrication, due to the limited bandwidth of AFM components. In which the resonant frequency of the AFM scanner is usually too low to achieve high-speed scanning. In this paper, a parallel kinematic piezoelectric actuator (PZT) AFM scanner is designed to achieve high-speed atomic force microscopy (HS-AFM) scanning. After that, finite element analysis (FEA) is adopted to characterize the scanner. Finally, images of standard gratings obtained at 25 Hz with our home-made AFM system is presented after calibration and motion coupling compensation.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"282 1","pages":"46-49"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86739949","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This paper presents a method for the manipulation of magnetic nanoparticles by optically induced dielectrophoresis (ODEP) device that can realize the transportation and convergence of nanoparticles. ODEP can be realized with a sandwich structure of three layers including the photoconductive layer, the liquid layer with the sample and the indium tin oxide electrode (ITO) layer. In this work, magnetic nanoparticles with the diameter of 10–100nm were successfully manipulated by positive dielectrophoresis force. The solution with magnetic nanoparticles on a mica substrate placed in the sandwich structure was dried in the air and imaged by atomic force microscope (AFM). The AFM images showed that the magnetic nanoparticles were converged in the illumination area. This method can be used to manipulate magnetic nanoparticles.
{"title":"Manipulation of magnetic nanoparticles by optically induced dielectrophoresis","authors":"Ying Wang, Feifei Wang, Tingting Huang, Fenfen Guo, Ying Xie, Zhengxun Song, Jinyun Liu, Zuobin Wang, Yihui Wang","doi":"10.1109/3M-NANO.2017.8286334","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286334","url":null,"abstract":"This paper presents a method for the manipulation of magnetic nanoparticles by optically induced dielectrophoresis (ODEP) device that can realize the transportation and convergence of nanoparticles. ODEP can be realized with a sandwich structure of three layers including the photoconductive layer, the liquid layer with the sample and the indium tin oxide electrode (ITO) layer. In this work, magnetic nanoparticles with the diameter of 10–100nm were successfully manipulated by positive dielectrophoresis force. The solution with magnetic nanoparticles on a mica substrate placed in the sandwich structure was dried in the air and imaged by atomic force microscope (AFM). The AFM images showed that the magnetic nanoparticles were converged in the illumination area. This method can be used to manipulate magnetic nanoparticles.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"55 1","pages":"325-328"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83016477","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2017-08-01DOI: 10.1109/3M-NANO.2017.8286259
Jiajing Zhu, Chengjuan Yang, Fujun Wang, Yanling Tian, Xianping Liu
In recent years, the fabrication of hydrophobic surface has become a research hotspot. In this paper, three different patterns were fabricated successfully on the silicon wafers by lithography technology and the effects of dimension and interval parameters on surface wettability were the highlights in this study. Due to the different structural features, the overall average of linear pattern's contact angles were less than the overall average of grid pattern's contact angles and dot pattern's contact angles. What's more, the dimension parameters played a more important role than the interval parameters on the surface wettability. The smaller dimension of microstructure obviously preferred to have higher contact angle with better surface hydrophobic performance, especially when the size is less than 100μm. When the dimension of microstructure was 60μm, the contact angle were all larger than 90°, and some of them even reached the super-hydrophobic surface (larger than 150°).
{"title":"Lithography-induced wettability changes of silicon","authors":"Jiajing Zhu, Chengjuan Yang, Fujun Wang, Yanling Tian, Xianping Liu","doi":"10.1109/3M-NANO.2017.8286259","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286259","url":null,"abstract":"In recent years, the fabrication of hydrophobic surface has become a research hotspot. In this paper, three different patterns were fabricated successfully on the silicon wafers by lithography technology and the effects of dimension and interval parameters on surface wettability were the highlights in this study. Due to the different structural features, the overall average of linear pattern's contact angles were less than the overall average of grid pattern's contact angles and dot pattern's contact angles. What's more, the dimension parameters played a more important role than the interval parameters on the surface wettability. The smaller dimension of microstructure obviously preferred to have higher contact angle with better surface hydrophobic performance, especially when the size is less than 100μm. When the dimension of microstructure was 60μm, the contact angle were all larger than 90°, and some of them even reached the super-hydrophobic surface (larger than 150°).","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"139 1","pages":"69-73"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87544717","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2017-08-01DOI: 10.1109/3M-NANO.2017.8286316
Xixian Mo, Bo Zhang
In this paper, we present a novel electromagnetic driving scheme for nano-scale positioning stage with three-degree-of-freedom. Three air bearings are used to provide the suspension force for the stage against gravity. The stage has a +-50nm position resolution over a travel range of 50 × 50 mm in the xy plane. We explain the actuating scheme, the design of mechanical system in detail. The hardware-in-loop simulation scheme is adopted to build the control system of the stage. We describe the dynamic model of the stage and design its controller. We provide the test results to demonstrate the precision positioning capabilities of the proposed stage.
{"title":"Design and driving of a 3-DOF electromagnetic direct-drive nanopositioning stage with long stroke","authors":"Xixian Mo, Bo Zhang","doi":"10.1109/3M-NANO.2017.8286316","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286316","url":null,"abstract":"In this paper, we present a novel electromagnetic driving scheme for nano-scale positioning stage with three-degree-of-freedom. Three air bearings are used to provide the suspension force for the stage against gravity. The stage has a +-50nm position resolution over a travel range of 50 × 50 mm in the xy plane. We explain the actuating scheme, the design of mechanical system in detail. The hardware-in-loop simulation scheme is adopted to build the control system of the stage. We describe the dynamic model of the stage and design its controller. We provide the test results to demonstrate the precision positioning capabilities of the proposed stage.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"7 1","pages":"236-241"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83330206","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
High uniformity of the web tension is of key importance in roll-to-roll printed electronics (R2RPE). A roller support stage with remote center of motion (RCM) is proposed to eliminate the uneven tension which can be transformed into an equivalent force and two equivalent moments. The equivalent force is supported by the rigid structure, then the equivalent moments can be eliminated by adjusting the roller angle, thus the uniformity of the tension can be guaranteed. The stage mainly consists of a high-stiffness spherical air bearing (SAB) and a multi-degree-of-freedom (multi-DOF) compliant mechanism. The roller center and the rotation center of the SAB locate at the same point. Therefore the roller will not produce lateral parasitic movement when the roller angle is changed. Based on the classical beam theory and the pseudo-rigid-body-model (PRBM), the analytical model of the compliant mechanism have been established. Finite element analysis (FEA) is conducted to verify the established model. Both the analytical model and FEA results demonstrate the superior property of the design, which indicates that the proposed mechanism can meet the requirements for the angle adjustment capacity of the roller support stage.
{"title":"A roller support stage with remote center of motion for roll-to-roll printed electronics","authors":"Shasha Chen, Weihai Chen, Jingmeng Liu, Wenjie Chen","doi":"10.1109/3M-NANO.2017.8286260","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286260","url":null,"abstract":"High uniformity of the web tension is of key importance in roll-to-roll printed electronics (R2RPE). A roller support stage with remote center of motion (RCM) is proposed to eliminate the uneven tension which can be transformed into an equivalent force and two equivalent moments. The equivalent force is supported by the rigid structure, then the equivalent moments can be eliminated by adjusting the roller angle, thus the uniformity of the tension can be guaranteed. The stage mainly consists of a high-stiffness spherical air bearing (SAB) and a multi-degree-of-freedom (multi-DOF) compliant mechanism. The roller center and the rotation center of the SAB locate at the same point. Therefore the roller will not produce lateral parasitic movement when the roller angle is changed. Based on the classical beam theory and the pseudo-rigid-body-model (PRBM), the analytical model of the compliant mechanism have been established. Finite element analysis (FEA) is conducted to verify the established model. Both the analytical model and FEA results demonstrate the superior property of the design, which indicates that the proposed mechanism can meet the requirements for the angle adjustment capacity of the roller support stage.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"23 1","pages":"319-324"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84390453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2017-08-01DOI: 10.1109/3M-NANO.2017.8286283
C. Liang, Fujun Wang, Yanling Tian, Dawei Zhang
In high precision micro-manipulation task, precision angle adjustment is very important, which directly affects the quality of micro-manipulation. In this paper a novel 2-DOF (degree of freedom) rotation platform driven by two piezoelectric (PZT) actuators is designed to realize precision angle adjustment. The rotation platform has compact flexure-based mechanical structure and light weight. The rotation decoupling in X-and Y-axes are realized through the Hook joint. In order to obtain large range rotational angle, bridge-type mechanism is utilized in the 2-DOF rotation platform. An analytical model for rotational angle and input stiffness calculation is established. The influences of key parameters on the rotational angle as well as input stiffness of the rotation platform are analyzed. Finite element analysis (FEA) is conducted to evaluate the analytical model. The results of FEA fit the analytical model well and show the rotation platform exhibits good performance.
{"title":"Design and modeling of a 2-DOF decoupled rotation platform for micro-manipulation","authors":"C. Liang, Fujun Wang, Yanling Tian, Dawei Zhang","doi":"10.1109/3M-NANO.2017.8286283","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286283","url":null,"abstract":"In high precision micro-manipulation task, precision angle adjustment is very important, which directly affects the quality of micro-manipulation. In this paper a novel 2-DOF (degree of freedom) rotation platform driven by two piezoelectric (PZT) actuators is designed to realize precision angle adjustment. The rotation platform has compact flexure-based mechanical structure and light weight. The rotation decoupling in X-and Y-axes are realized through the Hook joint. In order to obtain large range rotational angle, bridge-type mechanism is utilized in the 2-DOF rotation platform. An analytical model for rotational angle and input stiffness calculation is established. The influences of key parameters on the rotational angle as well as input stiffness of the rotation platform are analyzed. Finite element analysis (FEA) is conducted to evaluate the analytical model. The results of FEA fit the analytical model well and show the rotation platform exhibits good performance.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"1 1","pages":"7-12"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87762715","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2017-08-01DOI: 10.1109/3M-NANO.2017.8286292
Zhiming Zhang, P. Yan
Many piezo-driven nanopositioning systems employ ultra high resolution capacitive sensors for displacement feedback, which results in significant time delays induced by AD conversion. The infinite dimensionality of such systems poses new challenges for nanopositioning control, where traditional control methods can not be applied directly. In this paper, a model with time delay on a nanopositioning stage is discussed, and a parameter identification method is further deployed using experiments to determine the time delay and other model parameters. A robust H∞ control design approach is also developed by using Pade expansion to approximate the time delay block. Real time experiments with the proposed control design are conducted on a piezo-actuated nanopositioning stage, where high precision motions, robustness against model uncertainties, as well as hysteresis compensation capability, are demonstrated, which significantly outperforms traditional PI control approach.
{"title":"H∞ control for piezo-actuated nanopositioning stages with time delays","authors":"Zhiming Zhang, P. Yan","doi":"10.1109/3M-NANO.2017.8286292","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286292","url":null,"abstract":"Many piezo-driven nanopositioning systems employ ultra high resolution capacitive sensors for displacement feedback, which results in significant time delays induced by AD conversion. The infinite dimensionality of such systems poses new challenges for nanopositioning control, where traditional control methods can not be applied directly. In this paper, a model with time delay on a nanopositioning stage is discussed, and a parameter identification method is further deployed using experiments to determine the time delay and other model parameters. A robust H∞ control design approach is also developed by using Pade expansion to approximate the time delay block. Real time experiments with the proposed control design are conducted on a piezo-actuated nanopositioning stage, where high precision motions, robustness against model uncertainties, as well as hysteresis compensation capability, are demonstrated, which significantly outperforms traditional PI control approach.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"84 1","pages":"224-228"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82065489","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2017-08-01DOI: 10.1109/3M-NANO.2017.8286322
Yongqiang Deng, Erwei Shang, Yu Liu, Weilian Gao, Yanqiu Chen, C. Bao, Peng Yan, Jin Jiang
A high-precision micro contact transfer printing machine, utilizing cantilever based force feedback control, is homebuilt for a general function in this work. It owns an agile access to control the contact force between the substrate and the printing stamp. The force is on-line processed by a micro controller unit carrying a P (proportional) — controller. The sample stage is installed on the horizontal axis so that the stamp could move from the ink position to the sample position. A real-time image of the press-down progress is shown on the operation interface, running on a personal computer. The printer could be implemented in printing electronics. With the resolution of 0.01N, the force between the stamp and the sample could be loaded precisely and the whole transfer printing process is visible thus it provides a way to take the force under consideration while investigating the mechanism of the transfer printer. Final demonstration on printing of a metallic array with resolution down to 1 micron has been in success.
{"title":"An overview on design of homebuilt micro-contact transfer printing machine with easy access to one micron patterning resolution","authors":"Yongqiang Deng, Erwei Shang, Yu Liu, Weilian Gao, Yanqiu Chen, C. Bao, Peng Yan, Jin Jiang","doi":"10.1109/3M-NANO.2017.8286322","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286322","url":null,"abstract":"A high-precision micro contact transfer printing machine, utilizing cantilever based force feedback control, is homebuilt for a general function in this work. It owns an agile access to control the contact force between the substrate and the printing stamp. The force is on-line processed by a micro controller unit carrying a P (proportional) — controller. The sample stage is installed on the horizontal axis so that the stamp could move from the ink position to the sample position. A real-time image of the press-down progress is shown on the operation interface, running on a personal computer. The printer could be implemented in printing electronics. With the resolution of 0.01N, the force between the stamp and the sample could be loaded precisely and the whole transfer printing process is visible thus it provides a way to take the force under consideration while investigating the mechanism of the transfer printer. Final demonstration on printing of a metallic array with resolution down to 1 micron has been in success.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"28 4 1","pages":"242-245"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91281842","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This paper presents the design and measurement of electrostatic energy harvesting. A spray coated electret based electrostatic energy harvester with out-of-plane gap closing scheme is fabricated using advanced MEMS technology. The size of this device is 13×18 mm2. With the matched resistance of 21 MΩ, an output power of 12 μW is harvested when the resonant frequency is 154 Hz under the acceleration of 28.5 m/s2. The thermal stability of this device is tested on 100 °C, decent power can be output after 34 hours.
{"title":"MEMS electrostatic energy harvesting device with spray coated electret","authors":"Anxin Luo, Yixin Xu, Siyan Chen, Hanning Dong, Yulong Zhang, Fei Wang","doi":"10.1109/3M-NANO.2017.8286330","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286330","url":null,"abstract":"This paper presents the design and measurement of electrostatic energy harvesting. A spray coated electret based electrostatic energy harvester with out-of-plane gap closing scheme is fabricated using advanced MEMS technology. The size of this device is 13×18 mm2. With the matched resistance of 21 MΩ, an output power of 12 μW is harvested when the resonant frequency is 154 Hz under the acceleration of 28.5 m/s2. The thermal stability of this device is tested on 100 °C, decent power can be output after 34 hours.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"2018 1","pages":"134-137"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83485745","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In this work, SÌO2 sol and 1H, 1H, 2H, 2H-perfluorodecylsilane are mixed in a certain proportion by ultrasonic to obtain modified SiO2 sol and gel. A superhydrophobic coating with a contact angle of 160° and a slide angle of less than 5° was constructed by spin coating on a glass substrate. The sol-gel techniques we used is simple and inexpensive, and the as-constructed superhydrophobic coatings are relatively uniform. In addition, by controlling the number of spin coating, the durability of the coating can be effectively enhanced. It is believed that this technique can hold a great potential in superhydrophobic surface fabrication.
{"title":"Construction of superhydrophobic surfaces by sol-gel techniques","authors":"Liang Gu, Yanyan Wang, Chengyun Xu, Feng Zhang, Zhuhui Wu, Xiaoxing Zhang, Zhenwu Shi, C. Peng","doi":"10.1109/3M-NANO.2017.8286295","DOIUrl":"https://doi.org/10.1109/3M-NANO.2017.8286295","url":null,"abstract":"In this work, SÌO2 sol and 1H, 1H, 2H, 2H-perfluorodecylsilane are mixed in a certain proportion by ultrasonic to obtain modified SiO2 sol and gel. A superhydrophobic coating with a contact angle of 160° and a slide angle of less than 5° was constructed by spin coating on a glass substrate. The sol-gel techniques we used is simple and inexpensive, and the as-constructed superhydrophobic coatings are relatively uniform. In addition, by controlling the number of spin coating, the durability of the coating can be effectively enhanced. It is believed that this technique can hold a great potential in superhydrophobic surface fabrication.","PeriodicalId":6582,"journal":{"name":"2017 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)","volume":"18 1","pages":"156-160"},"PeriodicalIF":0.0,"publicationDate":"2017-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85645309","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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