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2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)最新文献

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Investigation of high-k/metal gate MOS capacitors annealed by microwave annealing as a post-metal annealing process 高k/金属栅MOS电容器的微波后退火研究
Pub Date : 2016-11-21 DOI: 10.1109/NANO.2016.7751519
Yin-Hsien Su, T. Kuo, Wen-Hsi Lee, Yao-Ren Lee
MOSFETs with high-k and metal gate materials have been adopted nowadays. However, using traditional rapid thermal annealing as the annealing process after metal deposition causes thick SiO2 inter-layers and large flat-band shift. For future processes, an alternative post-metal annealing method has to be found. This study investigated electrical characteristics and physical properties of TiN/Al/TiN/HfO2/Si MOS capacitors annealed with a microwave annealing technique. The results show that samples annealed by microwave annealing at 2700W demonstrate low equivalent oxide thickness, low interface states density and low oxide trapped charge density. Besides, the diffusion of Al into oxides films is also suppressed. As a result, for high-k/metal gate MOS capacitors, high oxide capacitance, high breakdown voltage and low leakage current can be obtained using microwave annealing.
目前已采用高k和金属栅极材料的mosfet。然而,采用传统的快速热退火作为金属沉积后的退火工艺,会导致SiO2间层较厚、平带位移较大。对于未来的工艺,必须找到一种替代的金属后退火方法。研究了用微波退火技术退火TiN/Al/TiN/HfO2/Si MOS电容器的电学特性和物理性能。结果表明:经2700W微波退火后的样品具有较低的等效氧化物厚度、较低的界面态密度和较低的氧化物俘获电荷密度;此外,Al在氧化物膜中的扩散也受到抑制。因此,对于高k/金属栅MOS电容器,采用微波退火可以获得高氧化电容、高击穿电压和低漏电流。
{"title":"Investigation of high-k/metal gate MOS capacitors annealed by microwave annealing as a post-metal annealing process","authors":"Yin-Hsien Su, T. Kuo, Wen-Hsi Lee, Yao-Ren Lee","doi":"10.1109/NANO.2016.7751519","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751519","url":null,"abstract":"MOSFETs with high-k and metal gate materials have been adopted nowadays. However, using traditional rapid thermal annealing as the annealing process after metal deposition causes thick SiO2 inter-layers and large flat-band shift. For future processes, an alternative post-metal annealing method has to be found. This study investigated electrical characteristics and physical properties of TiN/Al/TiN/HfO2/Si MOS capacitors annealed with a microwave annealing technique. The results show that samples annealed by microwave annealing at 2700W demonstrate low equivalent oxide thickness, low interface states density and low oxide trapped charge density. Besides, the diffusion of Al into oxides films is also suppressed. As a result, for high-k/metal gate MOS capacitors, high oxide capacitance, high breakdown voltage and low leakage current can be obtained using microwave annealing.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"15 1","pages":"773-776"},"PeriodicalIF":0.0,"publicationDate":"2016-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91222819","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Relationship between electric properties and surface flatness of (ZnO)x(InN)1−x films on ZnO templates ZnO模板上(ZnO)x(InN)1−x薄膜的电学性能与表面平整度的关系
Pub Date : 2016-11-21 DOI: 10.1109/NANO.2016.7751421
K. Matsushima, M. Shiratani, N. Itagaki
We have studied effects of deposition temperature on electrical properties of (ZnO)x(InN)1-x (ZION) films on ZnO templates. With increasing the deposition temperature from RT to 450°C, the electron mobility decreases from 93 cm2/Vs to 70 cm2/Vs and the carrier density increases from 1.8×1019 cm-3 to 3.4×1019 cm-3. Furthermore, we found a correlation between electrical properties and root mean square (RMS) roughness of the films. These results suggest the surface flatness is an important parameter to determine electrical properties of ZION films.
我们研究了沉积温度对ZnO模板上(ZnO)x(InN)1-x (ZION)薄膜电性能的影响。随着沉积温度从RT升高到450℃,电子迁移率从93 cm2/Vs降低到70 cm2/Vs,载流子密度从1.8×1019 cm-3增加到3.4×1019 cm-3。此外,我们发现电学性质与薄膜的均方根(RMS)粗糙度之间存在相关性。这些结果表明,表面平整度是决定锡安薄膜电性能的一个重要参数。
{"title":"Relationship between electric properties and surface flatness of (ZnO)x(InN)1−x films on ZnO templates","authors":"K. Matsushima, M. Shiratani, N. Itagaki","doi":"10.1109/NANO.2016.7751421","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751421","url":null,"abstract":"We have studied effects of deposition temperature on electrical properties of (ZnO)<sub>x</sub>(InN)<sub>1-x</sub> (ZION) films on ZnO templates. With increasing the deposition temperature from RT to 450°C, the electron mobility decreases from 93 cm<sup>2</sup>/Vs to 70 cm<sup>2</sup>/Vs and the carrier density increases from 1.8×10<sup>19</sup> cm<sup>-3</sup> to 3.4×10<sup>19</sup> cm<sup>-3</sup>. Furthermore, we found a correlation between electrical properties and root mean square (RMS) roughness of the films. These results suggest the surface flatness is an important parameter to determine electrical properties of ZION films.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"1 1","pages":"674-675"},"PeriodicalIF":0.0,"publicationDate":"2016-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77236571","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Independently controlled etching and growth of graphene quantum dots and their SERS applications 石墨烯量子点的独立控制蚀刻和生长及其SERS应用
Pub Date : 2016-08-24 DOI: 10.1109/NANO.2016.7751493
Ying-Ren Chen, Chenglung Chung, Gideon Chen, Y. Tzeng
We report the fabrication of graphene quantum dots on Cu substrates by thermal CVD. The synthesized high-density graphene quantum dots exhibit strong surface enhanced Raman scattering (SERS) effects. The nanoscale distance of 30~50nm between neighboring quantum dots combined with quantum dots to form nanostructures favorable for plasmonic coupling enhanced high local electric fields, which lead to greatly enhanced strength of signal from Raman scattering of molecules on the substrate as an effective means of detecting, identifying, and measuring low concentration molecules of scientific and technological significance.
我们报道了用热气相沉积法在Cu衬底上制备石墨烯量子点。合成的高密度石墨烯量子点具有较强的表面增强拉曼散射效应。邻近量子点之间30~50nm的纳米尺度距离与量子点结合形成有利于等离子体耦合的纳米结构,增强了高局域电场,使得基底上分子拉曼散射信号强度大大增强,是检测、识别和测量低浓度分子的有效手段,具有重要的科技意义。
{"title":"Independently controlled etching and growth of graphene quantum dots and their SERS applications","authors":"Ying-Ren Chen, Chenglung Chung, Gideon Chen, Y. Tzeng","doi":"10.1109/NANO.2016.7751493","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751493","url":null,"abstract":"We report the fabrication of graphene quantum dots on Cu substrates by thermal CVD. The synthesized high-density graphene quantum dots exhibit strong surface enhanced Raman scattering (SERS) effects. The nanoscale distance of 30~50nm between neighboring quantum dots combined with quantum dots to form nanostructures favorable for plasmonic coupling enhanced high local electric fields, which lead to greatly enhanced strength of signal from Raman scattering of molecules on the substrate as an effective means of detecting, identifying, and measuring low concentration molecules of scientific and technological significance.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"83 1","pages":"759-762"},"PeriodicalIF":0.0,"publicationDate":"2016-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83747915","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Confined water in nanoporous silica: Application to humidity sensors 纳米多孔二氧化硅中的密闭水:湿度传感器的应用
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751476
P. Bonnaud, R. Miura, A. Suzuki, Naoto Miyamoto, N. Hatakeyama, A. Miyamoto
Because of their strong hydrophilicity, nanoporous silica materials are good candidates for humidity sensor applications. We employed molecular modeling to investigate the water behavior when confined in such materials in order to refine the design of the next generation of devices. We focused in this work on the mechanical behavior of those porous silica materials.
由于其亲水性强,纳米多孔二氧化硅材料是湿度传感器应用的良好候选者。为了改进下一代设备的设计,我们采用分子模型来研究水在这种材料中的行为。我们在这项工作中重点研究了这些多孔二氧化硅材料的力学行为。
{"title":"Confined water in nanoporous silica: Application to humidity sensors","authors":"P. Bonnaud, R. Miura, A. Suzuki, Naoto Miyamoto, N. Hatakeyama, A. Miyamoto","doi":"10.1109/NANO.2016.7751476","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751476","url":null,"abstract":"Because of their strong hydrophilicity, nanoporous silica materials are good candidates for humidity sensor applications. We employed molecular modeling to investigate the water behavior when confined in such materials in order to refine the design of the next generation of devices. We focused in this work on the mechanical behavior of those porous silica materials.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"31 1","pages":"270-272"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72978352","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Growth of ∼3-nm ZnO nano-islands using Atomic Layer Deposition 利用原子层沉积法生长~ 3nm ZnO纳米岛
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751340
Nazek El‐atab, F. Chowdhury, T. G. Ulusoy, A. Ghobadi, Amin Nazirzadeh, A. Okyay, A. Nayfeh
In this work, the deposition of 3-nm dispersed Zinc-Oxide (ZnO) nanoislands by thermal Atomic Layer Deposition (ALD) is demonstrated. The physical and electronic properties of the islands are studied using Atomic Force Microscopy, UV-Vis-NIR spectroscopy, and X-ray Photoelectron Spectroscopy. The results show that there is quantum confinement in 1D in the nanoislands which is manifested by the increase of the bandgap and the reduction of the electron affinity of the ZnO islands. The results are promising for the fabrication of future electronic and optoelectronic devices by single ALD step.
本文研究了用热原子层沉积法(ALD)沉积3纳米分散氧化锌(ZnO)纳米岛。使用原子力显微镜、紫外-可见-近红外光谱和x射线光电子能谱对岛屿的物理和电子特性进行了研究。结果表明,纳米岛在一维上存在量子约束,表现为带隙的增大和ZnO岛的电子亲和力的降低。这一结果为单步ALD制造未来的电子和光电子器件提供了前景。
{"title":"Growth of ∼3-nm ZnO nano-islands using Atomic Layer Deposition","authors":"Nazek El‐atab, F. Chowdhury, T. G. Ulusoy, A. Ghobadi, Amin Nazirzadeh, A. Okyay, A. Nayfeh","doi":"10.1109/NANO.2016.7751340","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751340","url":null,"abstract":"In this work, the deposition of 3-nm dispersed Zinc-Oxide (ZnO) nanoislands by thermal Atomic Layer Deposition (ALD) is demonstrated. The physical and electronic properties of the islands are studied using Atomic Force Microscopy, UV-Vis-NIR spectroscopy, and X-ray Photoelectron Spectroscopy. The results show that there is quantum confinement in 1D in the nanoislands which is manifested by the increase of the bandgap and the reduction of the electron affinity of the ZnO islands. The results are promising for the fabrication of future electronic and optoelectronic devices by single ALD step.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"79 5","pages":"687-689"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72633585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Development of H+ emission gun using a proton conducting glass fiber 质子导电玻璃纤维氢离子发射枪的研制
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751521
Y. Daiko, S. Mizutani, K. Segawa, S. Honda, Y. Iwamoto
H+ emission from the sharpening glass fiber was successfully observed. Here, ion current density and chemical functionalization via ion irradiation are presented.
成功地观察到锐化玻璃纤维的H+发射。本文介绍了离子辐照下的离子电流密度和化学功能化。
{"title":"Development of H+ emission gun using a proton conducting glass fiber","authors":"Y. Daiko, S. Mizutani, K. Segawa, S. Honda, Y. Iwamoto","doi":"10.1109/NANO.2016.7751521","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751521","url":null,"abstract":"H+ emission from the sharpening glass fiber was successfully observed. Here, ion current density and chemical functionalization via ion irradiation are presented.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"11 1","pages":"351-353"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77754308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Evaluation of insect locomotion using MEMS piezoresistive force sensors 用MEMS压阻式力传感器评价昆虫运动
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751305
H. Takahashi, I. Shimoyama
Small insects have agile performance in flight, walking locomotion, and so on. Currently, many researchers have been focusing the dynamics of their locomotion. We have been developing micro scaled piezoresistive force sensors to measure forces exerted by insects during flying, walking and jumping. In this paper, we introduce these sensors which are specialized for target insects.
小昆虫在飞行、行走运动等方面具有敏捷的表现。目前,许多研究人员都在关注它们的运动动力学。我们一直在开发微型压阻式力传感器,以测量昆虫在飞行、行走和跳跃过程中施加的力。本文介绍了这些专门用于目标昆虫的传感器。
{"title":"Evaluation of insect locomotion using MEMS piezoresistive force sensors","authors":"H. Takahashi, I. Shimoyama","doi":"10.1109/NANO.2016.7751305","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751305","url":null,"abstract":"Small insects have agile performance in flight, walking locomotion, and so on. Currently, many researchers have been focusing the dynamics of their locomotion. We have been developing micro scaled piezoresistive force sensors to measure forces exerted by insects during flying, walking and jumping. In this paper, we introduce these sensors which are specialized for target insects.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"45 1","pages":"931-932"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80007876","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Highly sensitive reduce graphene oxide — Molecular imprinted polymer organic thin film transistor for serine detection 高灵敏度还原氧化石墨烯-分子印迹聚合物有机薄膜晶体管丝氨酸检测
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751418
Nurul Farhanah Ab Halim, N. Musa, Z. Zakaria, S. F. Kamaruddin, A. M. Mohd Noor, N. Derman, A. Shakaff
The use of biomimetic sensor has attracted attention due to its sensitivity and selectivity. Molecular imprinted polymer (MIP) among the best synthetic biomimetic interfaces to detect target molecules. However MIP has low electrical conductivity. Sensor fabricated using high conductive polymer will possess a good sensitivity and short response time. Therefore, it is important to enhance the conductivity of MIP, thus it would directly influence charge carrier mobility of the polymer itself. The resulting rGO-MIP OTFT exhibit electrical conductivity of 3.10×10-3 Sm-1 at 0.4wt/vol% and MIP exhibit electrical conductivity of 7.16×10-4 Sm-1. The electrical conductivity of rGO-MIP increased about one in magnitude order compared to MIP. Moreover, this work reports the electrical performance of reduce graphene oxide-molecular imprinted polymer organic thin film transistor (rGO-MIP OTFT) for serine detection. rGO was introduced into MIP, to allow a highly conductive sensing material thus enhanced selectivity and sensitivity of the sensor. By analyzing the electrical performance of the sensors, the performances of OTFT sensor enhanced with rGO-MIP interlayer and OTFT sensor with MIP interlayer when exposed to serine analyte were obtained. The results showed that there were remarkable shifts of drain current obtained from OTFT sensor with rGO-MIP interlayer after exposed to serine analyte. Moreover, the sensitivity of OTFT sensor with rGO-MIP interlayer was nearly higher than the OTFT sensor with MIP interlayer. Hence, it proved that rGO successfully enhanced the sensing performance of OTFT sensor.
仿生传感器因其灵敏度和选择性而备受关注。分子印迹聚合物(MIP)是检测靶分子的最佳合成仿生界面之一。然而,MIP具有低导电性。采用高导电性聚合物制成的传感器具有良好的灵敏度和较短的响应时间。因此,提高MIP的导电性至关重要,它将直接影响聚合物本身载流子的迁移率。得到的rGO-MIP OTFT在0.4wt/vol%时的电导率为3.10×10-3 Sm-1, MIP的电导率为7.16×10-4 Sm-1。与MIP相比,rGO-MIP的电导率提高了约一个数量级。此外,本工作还报道了用于丝氨酸检测的还原氧化石墨烯-分子印迹聚合物有机薄膜晶体管(rGO-MIP OTFT)的电性能。将氧化石墨烯引入到MIP中,以允许高导电性传感材料,从而提高传感器的选择性和灵敏度。通过对传感器电学性能的分析,得到了rGO-MIP中间层和MIP中间层对丝氨酸分析物作用下OTFT传感器性能的增强效果。结果表明,rGO-MIP夹层OTFT传感器暴露于丝氨酸分析物后,漏极电流发生显著变化。此外,rGO-MIP夹层OTFT传感器的灵敏度几乎高于MIP夹层OTFT传感器。由此证明,rGO成功地提高了OTFT传感器的传感性能。
{"title":"Highly sensitive reduce graphene oxide — Molecular imprinted polymer organic thin film transistor for serine detection","authors":"Nurul Farhanah Ab Halim, N. Musa, Z. Zakaria, S. F. Kamaruddin, A. M. Mohd Noor, N. Derman, A. Shakaff","doi":"10.1109/NANO.2016.7751418","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751418","url":null,"abstract":"The use of biomimetic sensor has attracted attention due to its sensitivity and selectivity. Molecular imprinted polymer (MIP) among the best synthetic biomimetic interfaces to detect target molecules. However MIP has low electrical conductivity. Sensor fabricated using high conductive polymer will possess a good sensitivity and short response time. Therefore, it is important to enhance the conductivity of MIP, thus it would directly influence charge carrier mobility of the polymer itself. The resulting rGO-MIP OTFT exhibit electrical conductivity of 3.10×10-3 Sm-1 at 0.4wt/vol% and MIP exhibit electrical conductivity of 7.16×10-4 Sm-1. The electrical conductivity of rGO-MIP increased about one in magnitude order compared to MIP. Moreover, this work reports the electrical performance of reduce graphene oxide-molecular imprinted polymer organic thin film transistor (rGO-MIP OTFT) for serine detection. rGO was introduced into MIP, to allow a highly conductive sensing material thus enhanced selectivity and sensitivity of the sensor. By analyzing the electrical performance of the sensors, the performances of OTFT sensor enhanced with rGO-MIP interlayer and OTFT sensor with MIP interlayer when exposed to serine analyte were obtained. The results showed that there were remarkable shifts of drain current obtained from OTFT sensor with rGO-MIP interlayer after exposed to serine analyte. Moreover, the sensitivity of OTFT sensor with rGO-MIP interlayer was nearly higher than the OTFT sensor with MIP interlayer. Hence, it proved that rGO successfully enhanced the sensing performance of OTFT sensor.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"1 1","pages":"284-287"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79009912","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ultrahigh-density self-assembled quantum dots of InGaAs and suppression of optical state-filling effect InGaAs超高密度自组装量子点及其抑制光态填充效应
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751331
Masayuki Urabe, Kazuki Takeishi, Kodai Itabashi, J. Takayama, Shula L. Chen, A. Murayama
We have grown ultrahigh-density self-assembled quantum dots (QDs) of InGaAs with sheet densities up to 2.5×1011 cm-2 and lateral diameters down to 10 nm, where the dot density increases with increasing As pressure during dot growth under optimum growth conditions. A ground-state photoluminescence (PL) spectrum shows a spectral width of 47 meV for the highest-density sample. Optical excitation-density dependences of the PL intensity and time profile are studied. The PL intensity from QD excited states increases with increasing excitation power, originating from a state-filling effect in QDs, which is directly confirmed by a plateau-like behavior on the PL decay curve. We find that the filling effect is significantly suppressed in the above ultrahigh-density dot ensemble, which suggests potential applications to superior energy-saving lasing and spin-functional optical devices.
在最佳生长条件下,制备了薄膜密度可达2.5×1011 cm-2、横向直径可达10 nm的超高密度自组装InGaAs量子点,其点密度随As压力的增加而增加。基态光致发光(PL)光谱显示,最高密度样品的光谱宽度为47 meV。研究了光激发密度与光激发强度和光激发密度的关系。量子点激发态的PL强度随着激发功率的增加而增加,这是由于量子点的状态填充效应,这在PL衰减曲线上直接得到了平台状行为的证实。我们发现,在上述超高密度点系综中,填充效应被显著抑制,这表明在高性能节能激光和自旋功能光学器件中具有潜在的应用前景。
{"title":"Ultrahigh-density self-assembled quantum dots of InGaAs and suppression of optical state-filling effect","authors":"Masayuki Urabe, Kazuki Takeishi, Kodai Itabashi, J. Takayama, Shula L. Chen, A. Murayama","doi":"10.1109/NANO.2016.7751331","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751331","url":null,"abstract":"We have grown ultrahigh-density self-assembled quantum dots (QDs) of InGaAs with sheet densities up to 2.5×1011 cm-2 and lateral diameters down to 10 nm, where the dot density increases with increasing As pressure during dot growth under optimum growth conditions. A ground-state photoluminescence (PL) spectrum shows a spectral width of 47 meV for the highest-density sample. Optical excitation-density dependences of the PL intensity and time profile are studied. The PL intensity from QD excited states increases with increasing excitation power, originating from a state-filling effect in QDs, which is directly confirmed by a plateau-like behavior on the PL decay curve. We find that the filling effect is significantly suppressed in the above ultrahigh-density dot ensemble, which suggests potential applications to superior energy-saving lasing and spin-functional optical devices.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"23 1","pages":"638-639"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81812647","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Nanotool Feeding System for efficient nanomanipulation inside Electron Microscope 用于电子显微镜内高效纳米操作的纳米刀具进给系统
Pub Date : 2016-08-01 DOI: 10.1109/NANO.2016.7751541
M. Nakajima, Nagao Kei, Masaru Takeuchi, Y. Hasegawa, T. Fukuda, Qiang Huang
Nanotool feeding system (NTFS) is presented for efficient nanomanipulation. We constructed a unique bio-nanomanipulation system inside an Environmental-SEM (E-SEM) using various nanotools, for example stiffness measurement nanotool, dual electrical nanoprobe, nanopicker, nanofork, nanocutter, nanoputter, and nanoinjector. For continues usage of different multiple tools, it needs to exchange the nanotools continuously. In this paper, the Rotary-table Nanotool Feeding System (R-NTFS) is proposed to realize continuous exchange of different multiple tools individually. An efficient continuous nanomanipulation was achieved by a short exchange time which was about 13 seconds. Finally, the multiple nanoinjection was demonstrated using the proposed R-NTFS.
为了实现高效的纳米操作,提出了纳米刀具进给系统。我们在环境扫描电镜(E-SEM)内构建了一个独特的生物纳米操作系统,使用了各种纳米工具,如刚度测量纳米工具、双电纳米探针、纳米钳、纳米叉、纳米切割器、纳米探针和纳米注射器。为了持续使用不同的多工具,需要不断地交换纳米工具。本文提出了一种旋转工作台纳米刀具进给系统(R-NTFS),以实现不同刀具的连续交换。交换时间短,约为13秒,实现了高效的连续纳米操作。最后,利用所提出的R-NTFS演示了多重纳米注射。
{"title":"Nanotool Feeding System for efficient nanomanipulation inside Electron Microscope","authors":"M. Nakajima, Nagao Kei, Masaru Takeuchi, Y. Hasegawa, T. Fukuda, Qiang Huang","doi":"10.1109/NANO.2016.7751541","DOIUrl":"https://doi.org/10.1109/NANO.2016.7751541","url":null,"abstract":"Nanotool feeding system (NTFS) is presented for efficient nanomanipulation. We constructed a unique bio-nanomanipulation system inside an Environmental-SEM (E-SEM) using various nanotools, for example stiffness measurement nanotool, dual electrical nanoprobe, nanopicker, nanofork, nanocutter, nanoputter, and nanoinjector. For continues usage of different multiple tools, it needs to exchange the nanotools continuously. In this paper, the Rotary-table Nanotool Feeding System (R-NTFS) is proposed to realize continuous exchange of different multiple tools individually. An efficient continuous nanomanipulation was achieved by a short exchange time which was about 13 seconds. Finally, the multiple nanoinjection was demonstrated using the proposed R-NTFS.","PeriodicalId":6646,"journal":{"name":"2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)","volume":"61 1","pages":"36-37"},"PeriodicalIF":0.0,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84205727","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
期刊
2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO)
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