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2017 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)最新文献

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A fully-integrated S/C band transmitter in 45nm CMOS/ 0.2gm GaN heterogeneous technology 采用45纳米CMOS/ 0.2gm GaN异质技术的全集成S/C波段发射机
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240477
M. LaRue, B. Dupaix, S. Rashid, T. Barton, T. James, W. Gouty, P. Watson, T. Quach, W. Khalil
A fully-integrated transmitter is presented in DARPA's DAHI process technology, featuring heterogeneous integration of 45nm SOI CMOS and 0.2pm GaN technologies. This transmitter is capable of transmitting SOQPSK-TG telemetry waveforms across 2–5 GHz with a peak transmitter power efficiency of 41.32% and peak output power of 32.93 dBm. A reconfigurable CMOS phase modulator is implemented to provide 6-bit phase resolution across the entire output frequency range, and a wide-swing CMOS buffer was designed to drive the GaN power amplifier. The GaN PA features a three-stage design, featuring a differential CML buffer, push-pull inverting buffer, and a class-E switch-mode power amplifier to efficiently amplify the signal. To the authors' knowledge, this is the first fully-integrated transmitter combining CMOS and GaN technology demonstrated in literature.
采用DARPA的DAHI工艺技术,提出了一种完全集成的发射机,具有45纳米SOI CMOS和0.2pm GaN技术的异构集成。该发射机能够在2-5 GHz范围内传输SOQPSK-TG遥测波形,峰值发射机功率效率为41.32%,峰值输出功率为32.93 dBm。实现了一个可重构的CMOS相位调制器,在整个输出频率范围内提供6位相位分辨率,设计了一个宽摆CMOS缓冲器来驱动GaN功率放大器。GaN PA采用三级设计,具有差分CML缓冲器,推挽反相缓冲器和e类开关模式功率放大器,可有效放大信号。据作者所知,这是文献中第一个结合CMOS和GaN技术的完全集成的发射机。
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引用次数: 6
A CW 20W Ka-band GaN high power MMIC amplifier with a gate pitch designed by using one-finger large signal models 采用单指大信号模型设计了一种带门距的连续波20W ka波段GaN高功率MMIC放大器
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240422
Y. Yamaguchi, J. Kamioka, M. Hangai, S. Shinjo, K. Yamanaka
This paper reports a 20 W Ka-band GaN high power MMIC (Monolithic Microwave Integrated Circuit) amplifier under continuous wave (CW) operation. The one-finger large signal models were made to take account of both the phase difference of RF gate voltage at a gate feeder and thermal effect. By using this model, the gate pitch length of unit cell transistor was optimally designed to obtain maximum output power as MMIC amplifier under CW operation. As a result, 21.7W output power under CW operation was successfully achieved with power added efficiency (PAE) of 19.8% at Ka-band by a single-ended MMIC. To the best of authors' knowledge, this output power is state-of-the-art for GaN MMIC amplifiers under CW operation at Ka-band.
本文报道了一种连续波工作下的20 W ka波段GaN大功率单片微波集成电路放大器。建立了考虑栅极馈线处射频栅极电压相位差和热效应的单指大信号模型。利用该模型,优化设计了单元晶体管的栅极间距长度,使其在连续波工作下作为MMIC放大器获得最大输出功率。结果表明,在连续波工作下,单端MMIC的输出功率为21.7W, ka波段的功率附加效率(PAE)为19.8%。据作者所知,这种输出功率对于ka波段连续波工作的GaN MMIC放大器来说是最先进的。
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引用次数: 26
Current contours based IMN design methodology for broadband GaN Doherty power amplifiers 基于电流轮廓的宽带GaN Doherty功率放大器IMN设计方法
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240470
K. Patel, H. Golestaneh, S. Boumaiza
This paper proposes a design methodology based off the novel concept of current contours to insure proper current profiles for the main and peaking transistors needed to satisfy the load modulation conditions in a Doherty power amplifier over a wide frequency range. Utilizing this technique allows the construction of input matching networks that maximize the efficiency enhancement and linearity of the DPA. As a proof-of-concept, a 12 W DPA was designed. From 2.7 GHz to 4.7 GHz, continuous wave measurements have shown efficiency levels of greater than 37 % at 6 dB output power back-off and peak power. A gain of at least 8 db was shown with output power ranging from 40.7 dBm ±1 dB. Under an 80 MHz carrier aggregated signal, modulated signal results showed good linearizability with an ACLR of −48 dBc/Hz after digital pre-distortion.
本文提出了一种基于电流轮廓新概念的设计方法,以确保在宽频率范围内满足多尔蒂功率放大器负载调制条件所需的主晶体管和峰值晶体管的适当电流分布。利用这种技术可以构建输入匹配网络,最大限度地提高DPA的效率和线性度。作为概念验证,设计了一个12w DPA。从2.7 GHz到4.7 GHz,连续波测量显示,在6 dB输出功率和峰值功率下,效率水平大于37%。输出功率范围为40.7 dBm±1 db,增益至少为8 db。在80 MHz载波聚合信号下,经过数字预失真处理的调制信号具有良好的线性化性能,ACLR为−48 dBc/Hz。
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引用次数: 0
A 56 Gb/s PAM-4 linear transimpedance amplifier in 0.13-μm SiGe BiCMOS technology for optical receivers 基于0.13 μm SiGe BiCMOS技术的56 Gb/s PAM-4线性透阻放大器
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240445
S. Bhagavatheeswaran, T. Cummings, Eric Tangen, M. Heins, R. Chan, C. Steinbeiser
This paper describes the implementation of a state-of-the art 56Gb/s single-channel linear transimpedance amplifier (TIA) integrated circuit for PAM-4/NRZ/DMT modulation formats used in data center interconnects (DCI) and base station front haul applications. Fabricated in 130nm SiGe BiCMOS process, the TIA has a single-ended input, differential output configuration, with nominal maximum DC transimpedance gain of ∼5.8 kQ (75 dB), gain dynamic range of 28 dB, average input referred noise (IRN) of 14.9 pA/VHz, typical bandwidth of 38 GHz across the entire gain dynamic range, Total Harmonic Distortion (THD) of 2% for output of 500mVppd, adjustable output voltage swing up to 1Vppd, all operated with typical supply of 3.3 V. At 2.8 V supply, bandwidth of 34 GHz has been achieved. Performance has been measured from −5C to 95C. The TIA has Receive Signal Strength Indicator (RSSI) for measuring the input signal strength, peak detect (PKD) function for measuring the output amplitude and in-built photo-diode (PD) cathode bias network. The chip can be operated in manual gain control (MGC) or automatic gain control (AGC) mode. The die area is 1.6 mmA2. A state-of-the art 4-level Pulse Amplitude Modulation (PAM-4) eye diagram at 56Gb/s has been demonstrated with this linear TIA. The Die has been integrated into an optical product from Discovery Semiconductors and several optical interconnect products.
本文介绍了用于数据中心互连(DCI)和基站前端传输应用的PAM-4/NRZ/DMT调制格式的先进56Gb/s单通道线性跨阻放大器(TIA)集成电路的实现。TIA采用130nm SiGe BiCMOS工艺制造,具有单端差分输出配置,标称最大直流跨阻增益为~ 5.8 kQ (75 dB),增益动态范围为28 dB,平均输入参考噪声(IRN)为14.9 pA/VHz,整个增益动态范围的典型带宽为38 GHz,输出500mVppd时总谐波失真(THD)为2%,输出电压摆幅可调至1Vppd,所有工作在3.3 V的典型电源下。在2.8 V电源下,实现了34 GHz的带宽。性能测量范围从- 5C到95C。该TIA具有用于测量输入信号强度的接收信号强度指示器(RSSI),用于测量输出幅度的峰值检测(PKD)功能和内置光电二极管(PD)阴极偏置网络。该芯片可以在手动增益控制(MGC)或自动增益控制(AGC)模式下工作。模具面积1.6 mmA2。一个最先进的4级脉冲幅度调制(PAM-4)眼图在56Gb/s已经证明了这种线性TIA。该芯片已集成到Discovery半导体的光学产品和几个光学互连产品中。
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引用次数: 8
A 5–15 GHz stacked I/Q modulator with 15–19 dBm OP1dB and 26–30 dBm OIP3 in 45 nm SOI CMOS 基于45纳米SOI CMOS的5-15 GHz堆叠I/Q调制器,具有15-19 dBm OP1dB和26-30 dBm OIP3
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240436
S. Zihir, Gabriel M. Rebeiz
In this paper, a 5–15 GHz I/Q modulator implemented in 45 nm SOI CMOS is presented, which shares DC current through biasing branch, I/Q mixers and stacked-FET power amplifier (PA) to provide high output power and linearity. Stacked SOI transistors are used to isolate the modulator from high voltage swing at the load and mitigate device break-down. The proposed architecture results in an OP1db and OIP3 of 15.6–19.5 dBm and 26–30 dBm at 5–15 GHz, respectively. The circuit occupies only 0.46 rnrn2 including pads. Application areas are in the 5G high-linearity IF circuity for high data-rate modulations.
本文提出了一种采用45 nm SOI CMOS实现的5-15 GHz I/Q调制器,该调制器通过偏置支路、I/Q混频器和堆叠fet功率放大器(PA)共享直流电流,提供高输出功率和线性度。堆叠SOI晶体管用于隔离调制器在负载处的高电压振荡,并减轻器件击穿。该架构在5-15 GHz下的OP1db和OIP3分别为15.6-19.5 dBm和26-30 dBm。包括焊盘在内,该电路仅占用0.46 rnrn2。应用领域是用于高数据速率调制的5G高线性中频电路。
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引用次数: 1
Balanced active frequency multipliers in D and G bands using 250nm InP DHBT technology 采用250nm InP DHBT技术的D和G频段平衡有源倍频器
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240437
Sona Carpenter, Z. He, H. Zirath
A wideband balanced active frequency doubler at Dband (110–170 GHz) and a frequency tripler at G-band (140–220 GHz) is presented. The circuits are implemented in a 250nm InP DHBT technology with ft/fmax 350/600 GHz respectively. The experimental results of the frequency doubler exhibit an output power of 4.2 dBm with 3-dB output bandwidth from 120 to 158 GHz corresponding to 27.3 % relative bandwidth. The power efficiency is 11.9 % at 124 GHz output and 5 dBm input power. The doubler chip consumes a dc-power of 19 mW and the chip dimension is 0.45 × 0.4 mm2. The tripler chip can provide output power of 3.8 dBm and has 3-dB output bandwidth of 27 GHz from 162–189 GHz. The balanced topology and band pass filter were utilized in tripler circuit for harmonic suppression. The fundamental- and second-harmonic suppressions are better than 20 dBc and 28 dBc, respectively. The dc power consumption is 26 mW. The chip surface is 0.9 × 0.4 mm2.
提出了一种宽带平衡有源倍频器(110 ~ 170 GHz)和三倍频器(140 ~ 220 GHz)。电路采用250nm InP DHBT技术,ft/fmax分别为350/600 GHz。实验结果表明,该倍频器的输出功率为4.2 dBm, 3db输出带宽为120 ~ 158 GHz,相对带宽为27.3%。在124 GHz输出和5 dBm输入功率下,功率效率为11.9%。倍增芯片的直流功耗为19mw,芯片尺寸为0.45 × 0.4 mm2。该三倍器芯片的输出功率为3.8 dBm, 3db输出带宽为27ghz,范围为162-189 GHz。在三倍频电路中,采用平衡拓扑和带通滤波器进行谐波抑制。基频和二次谐波的抑制效果分别优于20 dBc和28 dBc。直流功耗为26mw。芯片表面为0.9 × 0.4 mm2。
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引用次数: 4
Numerical analysis of the thermal behavior sensitivity to technology parameters and operating conditions in InGaP/GaAs HBTs InGaP/GaAs薄膜热行为对工艺参数和工作条件敏感性的数值分析
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240444
A. P. Catalano, A. Magnani, V. d’Alessandro, L. Codecasa, N. Rinaldi, B. Moser, P. Zampardi
This paper presents an extensive numerical analysis of the thermal behavior of InGaP/GaAs HBTs in a laminate (package) environment. The combination between the Design of Experiments technique and a fast and accurate simulation capability is adopted to quantify the impact of all the key technology parameters and explore a wide range of operating conditions.
本文对InGaP/GaAs薄膜热性能在层压(封装)环境下进行了广泛的数值分析。采用实验设计技术与快速准确的仿真能力相结合,量化了所有关键技术参数的影响,并探索了广泛的操作条件。
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引用次数: 7
Innovative submicron thermal characterization method for AlGaN/GaN power HEMTs with hyperspectral thermoreflectance imaging 基于高光谱热反射成像的AlGaN/GaN功率hemt亚微米热表征方法
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240438
G. Brocero, D. Kendig, A. Shakouri, Y. Guhel, P. Eudeline, J. Sipma, B. Boudart
Significant advances in AlGaN/GaN heterostructure based technologies in the last decade, with AlGaN/GaN high electron mobility transistors (HEMTs) has led to high power performance at Gigahertz frequencies for communication, space, radar, and defense applications. The conjunction of the remarkable properties of the AlGaN/GaN heterojunction and the high thermal conductivity of the silicon carbide substrate enables GaN on SiC-based high electron-mobility transistors (HEMTs) to be very efficient for RF and microwave applications. However, this very high power density leads to self-heating under operating conditions and has important consequences for both performance and reliability. Since these devices, over time, are going to be increasingly smaller and more powerful a method for measuring the self-heating is of great interest for thermal management, temperature control, and optimizing simulation software. This paper presents early results of a new high spatial resolution thermal characterization technique using a thermoreflectance imaging system on a commercial sample. This technique, hyperspectral thermoreflectance imaging, enables us to obtain a clean thermal image in CW mode with 45 nm spatial resolution. We will show the thermal imaging results for a AlGaN/GaN HEMT on a SiC substrate. Although the zone of interest has narrow geometry and some grainy surfaces, the results show a very good linearity of reflection response with changing temperature with a significantly smaller error.
在过去十年中,基于AlGaN/GaN异质结构的技术取得了重大进展,AlGaN/GaN高电子迁移率晶体管(hemt)在通信,空间,雷达和国防应用中实现了千兆赫频率的高功率性能。AlGaN/GaN异质结的显著特性与碳化硅衬底的高导热性相结合,使GaN在基于sic的高电子迁移率晶体管(hemt)上非常有效地用于射频和微波应用。然而,这种非常高的功率密度会导致在工作条件下自热,并对性能和可靠性产生重要影响。随着时间的推移,这些设备将变得越来越小,功能越来越强大,因此测量自热的方法对热管理,温度控制和优化模拟软件非常感兴趣。本文介绍了在商业样品上使用热反射成像系统的一种新的高空间分辨率热表征技术的早期结果。这种高光谱热反射成像技术使我们能够获得45纳米空间分辨率的连续波模式下的干净热图像。我们将展示在SiC衬底上的AlGaN/GaN HEMT的热成像结果。虽然感兴趣区具有狭窄的几何形状和一些颗粒状表面,但结果表明反射响应随温度变化具有很好的线性关系,且误差明显较小。
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引用次数: 3
Harmonic distortion analysis of InP HBTs with 650 GHz fmax for high data rate communication systems 高数据速率通信系统中fmax为650 GHz的InP hbt谐波失真分析
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240429
P. Sakalas, M. Schroter, T. Nardmann, H. Zirath
High frequency (h.f.) harmonic distortion (HD) of advanced InP heterojunction bipolar transistors (HBTs) with various emitter widths was investigated. Geometry scalable parameters for the compact model (CM) HICUM/L2 v. 2.34, featuring a two-region base-collector capacitance formulation, were extracted from temperature dependent DC and AC measurements of HBTs and from the special test structures. Single tone harmonic distortion and active two tone load pull measurements were carried out for different emitter area devices. The compact model was used for data analysis.
研究了不同发射极宽度的先进InP异质结双极晶体管(hbt)的高频谐波畸变。紧凑模型(CM) HICUM/L2 v. 2.34的几何可扩展参数采用双区基极集电极电容公式,从hbt的温度相关直流和交流测量以及特殊测试结构中提取。对不同发射极面积的器件进行了单音谐波失真和有源双音负载拉力测量。采用紧凑模型进行数据分析。
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引用次数: 2
Testbed for phased array communications from 275 to 325 GHz 275至325 GHz相控阵通信测试平台
Pub Date : 2017-10-01 DOI: 10.1109/CSICS.2017.8240474
T. Merkle, A. Tessmann, M. Kuri, S. Wagner, A. Leuther, S. Rey, M. Zink, H. Stulz, M. Riessle, I. Kallfass, T. Kürner
The first modular 4-channel frontend for exploring phased array communications at a carrier frequency of 300 GHz was developed. A metamorphic HEMT process with a gate length of 35 nm was the key enabling technology for the integration of each transmit and receive channel. All channels implemented the quadrature direct conversion architecture. The measured RF bandwidth exceeded 55 GHz for the receive array respectively 45 GHz for the transmit array using a continuous wave baseband test signal. Phase shifting in the local oscillator path was the focus of this work. The concept was realized by using four synchronized direct digital synthesis channels followed by a high power frequency multiplier-by-12 MMIC. Investigating and assessing the array coherency at 300 GHz by the use of higher order modulation schemes was also proposed, highlighted on the example of a 16-QAM signal at 4 Gbaud in comparison to phase noise measurements of each channel.
开发了第一个用于探索载波频率为300 GHz的相控阵通信的模块化4通道前端。栅极长度为35 nm的变质HEMT工艺是实现收发通道集成的关键使能技术。所有通道均采用正交直接转换架构。采用连续波基带测试信号,接收阵列测得的射频带宽超过55 GHz,发射阵列测得的射频带宽超过45 GHz。本振路径中的相移是本工作的重点。这个概念是通过使用四个同步的直接数字合成通道,然后是一个高功率的12倍频MMIC来实现的。还提出了使用高阶调制方案研究和评估300ghz下阵列的相干性,重点介绍了4gbaud下16 qam信号的示例,并与每个通道的相位噪声测量结果进行了比较。
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引用次数: 29
期刊
2017 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)
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