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Proceedings of the 7th Conference on Semi-insulating III-V Materials,最新文献

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Conductivity and Hall-effect measurements on MBE GaAs grown at low temperatures 低温生长MBE GaAs的电导率和霍尔效应测量
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752690
D. Look, G. Robinson, J. Sizelove, C. E. Stutz
We have performed Hall-effect and conductivity measurements on MBE GaAs layers grown at 200-400 /spl deg/C, and annealed at temperatures up to 700 /spl deg/C. A key element in the success of these measurements is removal of the substrate. Results include the first accurate measurement of mobility, which can be greater than 1000 cm/sup 2//V s in annealed material, and the discovery of a new, dense donor near E/sub C/ - 0.45 eV, which is much shallower than the well-known EL2-like donor in this material. Annealing behavior of the electrical and optical properties can be quite complicated due to the existence of at least two donors as well as an acceptor, and two types of conductivity, hopping and band.
我们对在200-400 /spl°C下生长并在700 /spl°C下退火的MBE GaAs层进行了霍尔效应和电导率测量。这些测量成功的一个关键因素是去除基板。结果包括第一次精确测量迁移率,在退火材料中迁移率可以大于1000 cm/sup 2//V s,并且在E/sub C/ - 0.45 eV附近发现了一个新的致密供体,比该材料中已知的el2样供体浅得多。由于至少存在两个给体和一个受体,以及两种类型的电导率,跳变和能带,因此电学和光学性质的退火行为可能相当复杂。
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引用次数: 1
I-V behaviour of p/SI-InP: Fe/n and p/n /SI-InP/Fe/n configurations related to leakage current in buried heterostructure lasers with current blocking SI-InP:Fe p/SI-InP: Fe/n和p/n /SI-InP/Fe/n构型的I-V行为与电流阻断SI-InP:Fe埋地异质结构激光器中泄漏电流的关系
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752720
S. Lourdudoss, O. Kjebon, N. Nordell, J. Borglind
IN behaviour of p/Sl/n and p/n/SI/n configurations are studied and compared. These results are exploited to extract their contributions to leakage currents in two types of buried heterostructure lasers which use SI-InP:Fe as the current blocking layer.
研究并比较了p/Sl/n和p/n/SI/n两种构型的IN行为。利用这些结果提取了两种以SI-InP:Fe作为电流阻挡层的埋入异质结构激光器的漏电流贡献。
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引用次数: 3
Characterization of semi-insulating InP: Cu 半绝缘InP: Cu的表征
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752711
R. P. Leon, P. Werner, E. Weber
Systematic characterization of InP diffused with Cu have shown that both initially p-type and n-type InP become semi-insulating after Cu diffusion. It is also observed that thermally stable In-Cu rich precipitates form, that the concentration of deep levels is negligible and that InP:Cu samples exhibit inhomogeneities and anomalous transport behavior. These observations support the supposition that the observed semi-insulating behavior in InP:Cu can be best explained by the buried Schottky barrier model, instead of the commonly observed compensation by deep levels.
系统表征了Cu扩散后的InP,结果表明,初始p型InP和n型InP在Cu扩散后都变成半绝缘的。还观察到形成热稳定的富In-Cu沉淀,深层浓度可以忽略不计,InP:Cu样品表现出不均匀性和异常输运行为。这些观察结果支持了InP:Cu中观察到的半绝缘行为可以最好地用埋藏肖特基势垒模型来解释,而不是通常观察到的深能级补偿。
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引用次数: 1
Effect of micro-uniformity on electron mobility of LEC undoped SI-GaAs crystals 微均匀性对LEC掺杂SI-GaAs晶体电子迁移率的影响
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752712
Z. Wang, Y. Dai, C. Li, H. P. Lu, Z. Deng, S. Wan, S. Xu, M.F. Shun, H. Shun, L.Y. Lin
LEC undoped SI-GaAs materials obtained from different sources have been systematically investigated by using various techniques such as Hall effect measurements, IR absorption and Photoluminescence Mapping etc.. A strong dependence of electron mobility on spatial distribution of impurities and defects across the wafers revealed by spatially resolved photoluminescence at R.T. are observed. Spam-charge region scattering resulted from nominiformity is induced in theoretically calculating the electron mobility. A semi-empirical formula is presented by least-square fitting the mobility data obtained from temperature dependent Hall measurements. Additionally, the density and the scattering cross section of space-charge region and ionized impurity concentration were obtained.
采用霍尔效应测量、红外吸收、光致发光作图等技术,对不同来源的LEC掺杂SI-GaAs材料进行了系统的研究。通过空间分辨光致发光观察到,电子迁移率与杂质和缺陷在晶圆上的空间分布密切相关。在理论计算电子迁移率时,引入了非均匀性引起的垃圾电荷区散射。通过最小二乘法拟合温度相关霍尔测量得到的迁移率数据,给出了一个半经验公式。此外,还得到了空间电荷区的密度、散射截面和电离杂质浓度。
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引用次数: 0
Enhanced and persistent photocurrents in bulk semi- insulating GaAs at low temperatures 块状半绝缘砷化镓在低温下增强和持久的光电流
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752704
W. Mitchel, L. S. Rea
Enhanced and persistent photocurrents have been observed in many Czochralski GaAs samples. The temporal and thermal properties of the enhanced and persistent photocurrents have been studied. The temperature dependence of the persistent photocurrent suggests that at least two different persistent effects are being observed, one below 40K and another, separate mechanism above this temperature. It is proposed that the low temperature enhanced and persistent photocurrents are due, in addition to the transformation of EL2 into its metastable state, to a second bistable transformation.
在许多Czochralski GaAs样品中观察到增强和持续的光电流。研究了增强和持久光电流的时间和热性质。持续光电流的温度依赖性表明,至少观察到两种不同的持续效应,一种低于40K,另一种高于40K的独立机制。本文提出,低温增强和持久的光电流除了是由于EL2转变为亚稳态外,还由于二次双稳态转变。
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引用次数: 0
Photolumineseence investigation of ingot- and wafer-annealing effects on semi-insulating GaAs 半绝缘GaAs的铸锭和晶片退火效应的光致发光研究
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752685
O. Ka, O. Oda, Y. Makita, A. Yamada
Photoluminescence spectroscopy is used to characterize semi-insulating Czochralski-grown GaAs. The spectra show the differences induced by the different post growth annealing procedures, i.e. ingot- or wafer-annealing, single- or multi-step. The wafer annealing techniques definitely lead to an improvement of the crystalline quality, while ingot annealed crystals present additional defect related-emissions. For multi-step ingot-annealed crystals, two transitions around 1.45 eV are identified with the (e,A/spl ring/) and the (D/spl ring/,A/spl ring/) recombinations of an acceptor-like defect, different from the 78-meV double acceptor. On the other hand, wafer-annealed crystals present much lower concentrations of background impurities, as estimated by selective pair luminescence.
采用光致发光光谱法对半绝缘齐克拉尔斯基生长砷化镓进行了表征。光谱显示了不同的生长后退火工艺所引起的差异,即锭退火或片退火,单步退火或多步退火。晶圆退火技术确实可以改善晶体质量,而锭退火晶体则存在额外的缺陷-发射。对于多步锭退火晶体,与78-meV双受体缺陷不同的是,在1.45 eV左右的两个转变被鉴定为(e,A/spl环/)和(D/spl环/,A/spl环/)类受体缺陷的重组。另一方面,晶圆退火晶体呈现出低浓度的背景杂质,通过选择性对发光估计。
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引用次数: 0
Infrared absorption in proton- and deuteron-implanted semi-insulating Inp: Fe 质子和氘核注入半绝缘Inp: Fe的红外吸收
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752709
D. Fischer, M. O. Manasreh, G. Matous, S. Pearton
We have investigated hydrogen passivation in semi-insulating InP:Fe by implanting single crystal samples with 0.5 to 2.0 MeV protons and deuterons at fluences ranging from 1 x 10/sup 16/ to 5 x 10/sup 17/ cm/sup -2/. These implants give rise to a series of local vibrational modes (LVMs) in infrared absorption which are due to the stretching vibration of the bonds formed between phosphorus and the implanted atom in the vicinity of various lattice defects and impurities. Systematic variations in these LVMs are observed as a function of implant energy, fluence, and annealing temperature.
我们研究了半绝缘InP:Fe中氢的钝化,方法是在1 × 10/sup 16/到5 × 10/sup 17/ cm/sup -2/的影响范围内注入0.5到2.0 MeV的质子和氘核单晶样品。这些植入物在红外吸收中产生了一系列的局部振动模式(LVMs),这是由于在各种晶格缺陷和杂质附近磷与植入原子之间形成的键的拉伸振动。这些lvm的系统变化被观察到作为植入物能量、影响和退火温度的函数。
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引用次数: 1
Semi-Insulating Inp Obtained by Co-Implantation of Mg and Ti Mg和Ti共注入制备半绝缘Inp
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752678
M. Salvi, J. Viallet, H. L'haridon, P. Favennec, M. Gauneau
Implantation of magnesium acceptor in semi-insulating InP:Fe leads to a p-type layer which is further implanted with the low diffusitivity titanium deep donor, the sample recovering the semi-insulating behavior.
在半绝缘的InP:Fe中注入镁受体形成p型层,再注入低扩散率的钛深给体,样品恢复半绝缘行为。
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引用次数: 0
The correlation of reverse contrast absorption imaging with photoquenchable deep acceptor centres in semi-insulating LEC GaAs 半绝缘LEC GaAs中反向对比吸收成像与光猝灭深度受体中心的关系
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752703
S. Tuzemen, M. Brozel
Reverse Contrast imaging is a photo-quenchable, absorption imaging technique, thought to result from absorption by very deep acceptors with an ionisation energy of approximately E/sub g/ - 65 meV near 4K. At temperatures above 140K, all optical behaviour disappears. In this paper we present Hall data on lightly n-type GaAs both before and after photoquenching of these defects and demonstrate that the predicted acceptor level exists and the concentration of the levels correlates with the RC absorption. Optical cross-sections for this absorption at 830 nm are thus derived.
反向对比成像是一种光猝灭吸收成像技术,被认为是由非常深的受体吸收产生的,电离能约为E/sub g/ - 65 meV,接近4K。在140K以上的温度下,所有的光学行为都消失了。在本文中,我们给出了这些缺陷光猝灭前后轻n型GaAs的霍尔数据,并证明了预测的受体能级存在,并且能级浓度与RC吸收相关。由此导出了830nm吸收的光学截面。
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引用次数: 0
Recent changes in our understanding of EL2 in GaAs 最近我们对GaAs中EL2理解的变化
Pub Date : 1992-04-21 DOI: 10.1109/SIM.1992.752671
G. Baraff
EL2 is an intrinsic, metastable donor defect which is important in making semi-insulating GaAs. Remarkably, even after a decade of intense investigation, the microscopic nature of the defect is still controversial. There are two models which must still be considered seriously, namely that EL2 is the isolated As/sub Ga/ antisite, and that EL2 also contains an arsenic interstitial on the [111] axis. This paper will comment on some of the experiments used to support each of the two models, and will discuss attempts to reconcile the two.
EL2是一种固有的亚稳态供体缺陷,在制备半绝缘GaAs中起着重要的作用。值得注意的是,即使经过十年的深入研究,该缺陷的微观性质仍然存在争议。有两个模型仍然必须认真考虑,即EL2是孤立的As/sub Ga/对位,EL2在[111]轴上也含有砷间隙。本文将评论一些用于支持这两个模型的实验,并将讨论调和这两个模型的尝试。
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引用次数: 1
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Proceedings of the 7th Conference on Semi-insulating III-V Materials,
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