首页 > 最新文献

Microelectronics Reliability最新文献

英文 中文
Thermo-mechanical reliability of glass substrate and Through Glass Vias (TGV): A comprehensive review 玻璃基板和玻璃通孔 (TGV) 的热机械可靠性:全面回顾
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-15 DOI: 10.1016/j.microrel.2024.115477
Yangyang Lai, Ke Pan, Seungbae Park

The evolution of electronic packaging technology towards the adoption of glass substrates marks a significant advancement in overcoming the constraints posed by traditional organic materials. This review delves into the thermo-mechanical reliability concerns associated with glass substrates, glass interposers, and Through Glass Vias (TGV), highlighting the inherent fragility of glass and its susceptibility to cracking as key challenges in their widespread application. The unique tunable modulus and closely matched coefficient of thermal expansion (CTE) to silicon, offer promising solutions to stress-related failures, particularly in large-format applications. Despite these advantages, the integration of glass substrates faces obstacles such as stress management, fragility, adhesion issues, and the uniformity of via fills, compounded by the limited availability of long-term reliability data. This paper provides a comprehensive overview of the fabrication processes for glass substrates and TGVs, the impact of design parameters such as via density and aspect ratio on glass substrate reliability, and the mitigation strategies for stress and crack of TGV. Through the examination of Finite Element Analysis (FEA) models and experimental data, we explore the delicate balance between the stress induced by Redistribution Layers (RDL) and the fracture strength of glass, influenced by various design factors. The review also considers the potential of glass substrates in high-density interconnects and advanced packaging architectures, positioning glass as a transformative material in the future of electronic packaging.

电子封装技术朝着采用玻璃基板的方向发展,标志着在克服传统有机材料的限制方面取得了重大进展。本综述深入探讨了与玻璃基板、玻璃中间膜和玻璃通孔 (TGV) 相关的热机械可靠性问题,强调玻璃固有的易碎性和易开裂性是其广泛应用所面临的主要挑战。玻璃独特的可调模量和与硅密切匹配的热膨胀系数(CTE),为解决应力相关故障,尤其是大尺寸应用中的应力相关故障,提供了前景广阔的解决方案。尽管具有这些优势,但玻璃基板的集成仍面临着应力管理、易碎性、粘附性问题和通孔填充均匀性等障碍,加之长期可靠性数据有限。本文全面概述了玻璃基板和 TGV 的制造工艺、通孔密度和纵横比等设计参数对玻璃基板可靠性的影响,以及 TGV 应力和裂纹的缓解策略。通过研究有限元分析 (FEA) 模型和实验数据,我们探讨了再分布层 (RDL) 诱导的应力与玻璃断裂强度之间受各种设计因素影响的微妙平衡。综述还考虑了玻璃基板在高密度互连和先进封装架构中的潜力,将玻璃定位为未来电子封装的变革性材料。
{"title":"Thermo-mechanical reliability of glass substrate and Through Glass Vias (TGV): A comprehensive review","authors":"Yangyang Lai,&nbsp;Ke Pan,&nbsp;Seungbae Park","doi":"10.1016/j.microrel.2024.115477","DOIUrl":"10.1016/j.microrel.2024.115477","url":null,"abstract":"<div><p>The evolution of electronic packaging technology towards the adoption of glass substrates marks a significant advancement in overcoming the constraints posed by traditional organic materials. This review delves into the thermo-mechanical reliability concerns associated with glass substrates, glass interposers, and Through Glass Vias (TGV), highlighting the inherent fragility of glass and its susceptibility to cracking as key challenges in their widespread application. The unique tunable modulus and closely matched coefficient of thermal expansion (CTE) to silicon, offer promising solutions to stress-related failures, particularly in large-format applications. Despite these advantages, the integration of glass substrates faces obstacles such as stress management, fragility, adhesion issues, and the uniformity of via fills, compounded by the limited availability of long-term reliability data. This paper provides a comprehensive overview of the fabrication processes for glass substrates and TGVs, the impact of design parameters such as via density and aspect ratio on glass substrate reliability, and the mitigation strategies for stress and crack of TGV. Through the examination of Finite Element Analysis (FEA) models and experimental data, we explore the delicate balance between the stress induced by Redistribution Layers (RDL) and the fracture strength of glass, influenced by various design factors. The review also considers the potential of glass substrates in high-density interconnects and advanced packaging architectures, positioning glass as a transformative material in the future of electronic packaging.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"161 ","pages":"Article 115477"},"PeriodicalIF":1.6,"publicationDate":"2024-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141991163","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Aggravated NBTI reliability due to hard-to-detect open defects 难以检测的开放式缺陷导致 NBTI 可靠性降低
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-13 DOI: 10.1016/j.microrel.2024.115480
Gustavo Aguirre, Jesus Gamez, Victor Champac

FinFET technology has become an attractive candidate for high-performance and power-efficient applications. In the other hand, the behavior of FinFET devices is influenced by self-heating effect (SHE) due to its 3D structure, low thermal coupling and quantum confinement effect, among others. SHE degrades the device’s performance and could worsen reliability mechanisms like NBTI. In addition, some hard-to-detect open defects in FinFET based-circuits using logic gates designed with multi-fin and multi-finger techniques may escape the test and present abnormal static currents, which may increase the impact of self-heating effect and make the NBTI degradation more severe. Hence, it is crucial to accurately determine the temperature profiles of those chips passing the test and presenting abnormal static currents. This paper investigates the reliability of chips passing the test with abnormal static currents using Sentaurus Technology Computer-Aided Design (TCAD). FinFET transistors are calibrated with Intel 14-nm FinFET technology. Our TCAD simulation framework determines accurately the temperature and NBTI degradation. Using the TCAD information, the device degradation over time can be predicted. Moreover, the delay penalization of a critical logic path of an ISCAS benchmark circuit is investigated. The delay penalization of logic paths, attributed to the defect and NBTI, is analyzed with varying logic depths, emphasizing the importance of addressing critical paths with different logic depths. Our study leads to new considerations for improving the prediction of circuit reliability and taking countermeasures.

FinFET 技术已成为高性能和高能效应用的理想选择。另一方面,由于三维结构、低热耦合和量子约束效应等原因,FinFET 器件的行为受到自热效应(SHE)的影响。SHE 会降低器件的性能,并可能恶化 NBTI 等可靠性机制。此外,在使用多鳍和多指技术设计的逻辑门的 FinFET 电路中,一些难以检测的开路缺陷可能会逃过测试,出现异常静态电流,这可能会增加自热效应的影响,使 NBTI 退化更加严重。因此,准确测定通过测试并出现异常静态电流的芯片的温度曲线至关重要。本文使用 Sentaurus 技术计算机辅助设计(TCAD)研究了通过异常静态电流测试的芯片的可靠性。FinFET 晶体管采用英特尔 14 纳米 FinFET 技术进行校准。我们的 TCAD 仿真框架可准确确定温度和 NBTI 退化情况。利用 TCAD 信息,可以预测器件随时间的衰减。此外,我们还研究了 ISCAS 基准电路关键逻辑路径的延迟惩罚。我们分析了不同逻辑深度的逻辑路径因缺陷和 NBTI 而受到的延迟惩罚,强调了处理不同逻辑深度的关键路径的重要性。我们的研究为改进电路可靠性预测和采取对策提供了新的思路。
{"title":"Aggravated NBTI reliability due to hard-to-detect open defects","authors":"Gustavo Aguirre,&nbsp;Jesus Gamez,&nbsp;Victor Champac","doi":"10.1016/j.microrel.2024.115480","DOIUrl":"10.1016/j.microrel.2024.115480","url":null,"abstract":"<div><p>FinFET technology has become an attractive candidate for high-performance and power-efficient applications. In the other hand, the behavior of FinFET devices is influenced by self-heating effect (SHE) due to its 3D structure, low thermal coupling and quantum confinement effect, among others. SHE degrades the device’s performance and could worsen reliability mechanisms like NBTI. In addition, some hard-to-detect open defects in FinFET based-circuits using logic gates designed with multi-fin and multi-finger techniques may escape the test and present abnormal static currents, which may increase the impact of self-heating effect and make the NBTI degradation more severe. Hence, it is crucial to accurately determine the temperature profiles of those chips passing the test and presenting abnormal static currents. This paper investigates the reliability of chips passing the test with abnormal static currents using Sentaurus Technology Computer-Aided Design (TCAD). FinFET transistors are calibrated with Intel 14-nm FinFET technology. Our TCAD simulation framework determines accurately the temperature and NBTI degradation. Using the TCAD information, the device degradation over time can be predicted. Moreover, the delay penalization of a critical logic path of an ISCAS benchmark circuit is investigated. The delay penalization of logic paths, attributed to the defect and NBTI, is analyzed with varying logic depths, emphasizing the importance of addressing critical paths with different logic depths. Our study leads to new considerations for improving the prediction of circuit reliability and taking countermeasures.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115480"},"PeriodicalIF":1.6,"publicationDate":"2024-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141978825","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Interface traps in the sub-3 nm technology node: A comprehensive analysis and benchmarking of negative capacitance FinFET and nanosheet FETs - A reliability perspective from device to circuit level 3 纳米以下技术节点的界面陷阱:负电容 FinFET 和纳米片 FET 的全面分析和基准测试 - 从器件到电路层面的可靠性视角
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-12 DOI: 10.1016/j.microrel.2024.115479
Sresta Valasa, Venkata Ramakrishna Kotha, Narendar Vadthiya

Interface traps play a significant role in shaping the performance and reliability of semiconductor devices, particularly in advanced technologies such as Negative Capacitance based FinFET and Nanosheet (NS) FET. Hence, for the first time, using well calibrated TCAD models, we benchmark and explore into the analysis of interface traps in NC-FinFET and NC-NSFET devices at the sub-3 nm technology node, focusing on their effects on digital, analog/RF performance parameters. The investigation is mainly focussed on: (a) Positioning of acceptor (EV + 1 - EV-0.4) and donor (EC + 0.2 - EC-1.5) trap locations in the energy band (b) variation in acceptor and donor interface trap concentration (c) design of Common Source (CS) amplifier for analog integrated circuits. In addition, we explored a design space to achieve optimal capacitance matching, targeting the NC effect for an optimized device design. Our findings showed a significant improvement in ION/IOFF ratio by ~9× for NC-NSFET when compared to NC-FinFET with change in acceptor trap locations. The NC-FinFETs demonstrated a resilient intrinsic gain (AV) profile, making them suitable for high-speed amplifiers. Varying donor trap locations had minimal impact on NC-NSFET but slightly affected NC-FinFET's intrinsic gain profile. Moreover, increasing acceptor trap concentration improved digital performance, with NC-NSFET outperforming NC-FinFET and the analog/RF performance favored lower trap concentrations. In addition, NC-FinFETs were more resilient to increased donor traps concentration than NC-NSFETs. Further, the CS amplifier-based NC acceptor devices offered effective amplification and power-saving features, making them ideal for IoT and biomedical applications reliant on battery voltages.

界面陷阱在影响半导体器件的性能和可靠性方面发挥着重要作用,尤其是在基于负电容的 FinFET 和纳米片 (NS) FET 等先进技术中。因此,我们首次利用校准良好的 TCAD 模型,对 3 纳米以下技术节点的 NC-FinFET 和 NC-NSFET 器件中的界面陷阱进行了基准分析和探索,重点研究了它们对数字、模拟/射频性能参数的影响。研究主要集中在:(a)能带中受体(EV + 1 - EV-0.4)和供体(EC + 0.2 - EC-1.5)陷阱位置的定位(b)受体和供体界面陷阱浓度的变化(c)模拟集成电路共源(CS)放大器的设计。此外,我们还探索了实现最佳电容匹配的设计空间,针对 NC 效应优化了器件设计。我们的研究结果表明,与改变受体阱位置的 NC-FinFET 相比,NC-NSFET 的 ION/IOFF 比率明显提高了约 9 倍。NC-FinFET 显示出弹性的本征增益(AV)曲线,使其适用于高速放大器。供体阱位置的变化对 NC-NSFET 的影响很小,但对 NC-FinFET 的本征增益曲线有轻微影响。此外,增加受体阱浓度可改善数字性能,NC-NSFET 的性能优于 NC-FinFET,而模拟/射频性能则更倾向于较低的阱浓度。此外,与 NC-NSFET 相比,NC-FinFET 对供体陷阱浓度增加的适应能力更强。此外,基于 CS 放大器的 NC 受体器件具有有效的放大和省电特性,非常适合依赖电池电压的物联网和生物医学应用。
{"title":"Interface traps in the sub-3 nm technology node: A comprehensive analysis and benchmarking of negative capacitance FinFET and nanosheet FETs - A reliability perspective from device to circuit level","authors":"Sresta Valasa,&nbsp;Venkata Ramakrishna Kotha,&nbsp;Narendar Vadthiya","doi":"10.1016/j.microrel.2024.115479","DOIUrl":"10.1016/j.microrel.2024.115479","url":null,"abstract":"<div><p>Interface traps play a significant role in shaping the performance and reliability of semiconductor devices, particularly in advanced technologies such as Negative Capacitance based FinFET and Nanosheet (NS) FET. Hence, for the first time, using well calibrated TCAD models, we benchmark and explore into the analysis of interface traps in NC-FinFET and NC-NSFET devices at the sub-3 nm technology node, focusing on their effects on digital, analog/RF performance parameters. The investigation is mainly focussed on: (a) Positioning of acceptor (E<sub>V</sub> + 1 - E<sub>V</sub>-0.4) and donor (E<sub>C</sub> + 0.2 - E<sub>C</sub>-1.5) trap locations in the energy band (b) variation in acceptor and donor interface trap concentration (c) design of Common Source (CS) amplifier for analog integrated circuits. In addition, we explored a design space to achieve optimal capacitance matching, targeting the NC effect for an optimized device design. Our findings showed a significant improvement in I<sub>ON</sub>/I<sub>OFF</sub> ratio by ~9× for NC-NSFET when compared to NC-FinFET with change in acceptor trap locations. The NC-FinFETs demonstrated a resilient intrinsic gain (A<sub>V</sub>) profile, making them suitable for high-speed amplifiers. Varying donor trap locations had minimal impact on NC-NSFET but slightly affected NC-FinFET's intrinsic gain profile. Moreover, increasing acceptor trap concentration improved digital performance, with NC-NSFET outperforming NC-FinFET and the analog/RF performance favored lower trap concentrations. In addition, NC-FinFETs were more resilient to increased donor traps concentration than NC-NSFETs. Further, the CS amplifier-based NC acceptor devices offered effective amplification and power-saving features, making them ideal for IoT and biomedical applications reliant on battery voltages.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115479"},"PeriodicalIF":1.6,"publicationDate":"2024-08-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141978198","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Performance of thermo-compression bonding for HgCdTe based focal plane array 基于碲化镉汞的焦平面阵列的热压焊接性能
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-09 DOI: 10.1016/j.microrel.2024.115476
Anand Singh, Vijay Singh Meena, Ravinder Pal

HgCdTe based infrared focal plane array (IRFPA) continues to be the best performing sensor for imaging infrared seeker systems. A detailed study on the flip chip bonding is described for an improvement in the performance and reliability of FPA under stringent thermal and mechanical cycling load. HgCdTe material has a limitation in the bonding temperature and pressure to preserve the detector performance. Process of thermo-compression bonding is developed here for a large format HgCdTe detector array with ultra-fine pitch. Flip-chip bonding under ultra-low force of 4.6 × 10−4 N/bump is achieved with minimum residual stress and it protects the HgCdTe photo-diodes from dislocation circuit multiplication after hybridization. This thermo-compression process is directly usable for other materials such as InSb, T2SL and InGaAs etc. with due consideration of the material's properties like Young's modulus, coefficient of thermal expansion, Poisson ratio and mechanical strength. HgCdTe FPAs with the optimum bonding parameters are packed in detector-dewar-cooler-assembly (DDCA) and tested for stringent thermal shock, mechanical shock and random vibration process. The fatigue life of 104 thermal cycles is achieved to make suitable for fail safe operation. HgCdTe FPA will have a life span of 13 years (if it is cooled down twice on each day) which is more than the vacuum integrity shelf life of a sealed DDCA.

基于碲化镉汞的红外焦平面阵列(IRFPA)仍然是红外寻像系统中性能最好的传感器。为了在严格的热循环和机械循环负载条件下提高 FPA 的性能和可靠性,我们对倒装芯片键合进行了详细研究。碲化镉汞材料在保持探测器性能方面受到粘合温度和压力的限制。这里开发的热压键合工艺适用于超细间距的大尺寸碲化镉汞探测器阵列。在 4.6 × 10-4 N/bump 的超低力下实现了倒装芯片键合,残余应力最小,并保护了碲化镉汞光电二极管在杂化后免受位错回路倍增的影响。在适当考虑材料特性(如杨氏模量、热膨胀系数、泊松比和机械强度)的情况下,这种热压工艺可直接用于其他材料,如 InSb、T2SL 和 InGaAs 等。具有最佳键合参数的 HgCdTe FPA 被装入探测器-露华-冷却器组件(DDCA),并进行了严格的热冲击、机械冲击和随机振动过程测试。疲劳寿命达到 104 个热循环,适合故障安全运行。HgCdTe FPA 的寿命为 13 年(如果每天冷却两次),超过了密封 DDCA 的真空完整性保质期。
{"title":"Performance of thermo-compression bonding for HgCdTe based focal plane array","authors":"Anand Singh,&nbsp;Vijay Singh Meena,&nbsp;Ravinder Pal","doi":"10.1016/j.microrel.2024.115476","DOIUrl":"10.1016/j.microrel.2024.115476","url":null,"abstract":"<div><p>HgCdTe based infrared focal plane array (IRFPA) continues to be the best performing sensor for imaging infrared seeker systems. A detailed study on the flip chip bonding is described for an improvement in the performance and reliability of FPA under stringent thermal and mechanical cycling load. HgCdTe material has a limitation in the bonding temperature and pressure to preserve the detector performance. Process of thermo-compression bonding is developed here for a large format HgCdTe detector array with ultra-fine pitch. Flip-chip bonding under ultra-low force of 4.6 × 10<sup>−4</sup> N/bump is achieved with minimum residual stress and it protects the HgCdTe photo-diodes from dislocation circuit multiplication after hybridization. This thermo-compression process is directly usable for other materials such as InSb, T2SL and InGaAs etc. with due consideration of the material's properties like Young's modulus, coefficient of thermal expansion, Poisson ratio and mechanical strength. HgCdTe FPAs with the optimum bonding parameters are packed in detector-dewar-cooler-assembly (DDCA) and tested for stringent thermal shock, mechanical shock and random vibration process. The fatigue life of 10<sup>4</sup> thermal cycles is achieved to make suitable for fail safe operation. HgCdTe FPA will have a life span of 13 years (if it is cooled down twice on each day) which is more than the vacuum integrity shelf life of a sealed DDCA.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115476"},"PeriodicalIF":1.6,"publicationDate":"2024-08-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141963677","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Evaluation of MOS interface trap generation after BTI stress using flicker noise 利用闪烁噪声评估 BTI 应力后 MOS 接口陷阱的生成情况
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-09 DOI: 10.1016/j.microrel.2024.115478
Yi Jiang , Yanning Chen , Fang Liu , Bo Wu , Yongfeng Deng , Dawei Gao , Junkang Li , John Robertson , Rui Zhang

In this study, the weak bias temperature instability (BTI) in both Si p- and n-MOSFETs was systematically investigated using subthreshold swing degradation (ΔS factor), threshold voltage shift (ΔVth) and flicker noise (1/f noise) characteristics. It is found that the 1/f noise characteristics exhibit more pronounced deterioration compared to the Si/SiO2 interface degeneration under weak BTI stress. Furthermore, the observed linear relationship between the 1/f noise characteristics and MOS interface trap density was confirmed by the carrier number fluctuation model, indicating that 1/f noise characteristics could be considered as a sensitive and effective indicator for assessing MOS interface quality after weak BTI stress.

本研究利用亚阈值摆幅劣化(ΔS 因子)、阈值电压偏移(ΔVth)和闪烁噪声(1/f 噪声)特性,对 Si p- 和 n-MOSFET 的弱偏置温度不稳定性(BTI)进行了系统研究。研究发现,在弱 BTI 应力下,1/f 噪声特性比 Si/SiO2 界面退化更为明显。此外,观察到的 1/f 噪声特性与 MOS 界面陷阱密度之间的线性关系得到了载流子数波动模型的证实,这表明 1/f 噪声特性可被视为评估弱 BTI 应力后 MOS 界面质量的灵敏而有效的指标。
{"title":"Evaluation of MOS interface trap generation after BTI stress using flicker noise","authors":"Yi Jiang ,&nbsp;Yanning Chen ,&nbsp;Fang Liu ,&nbsp;Bo Wu ,&nbsp;Yongfeng Deng ,&nbsp;Dawei Gao ,&nbsp;Junkang Li ,&nbsp;John Robertson ,&nbsp;Rui Zhang","doi":"10.1016/j.microrel.2024.115478","DOIUrl":"10.1016/j.microrel.2024.115478","url":null,"abstract":"<div><p>In this study, the weak bias temperature instability (BTI) in both Si p- and n-MOSFETs was systematically investigated using subthreshold swing degradation (Δ<em>S</em> factor), threshold voltage shift (Δ<em>V</em><sub><em>th</em></sub>) and flicker noise (1/<em>f</em> noise) characteristics. It is found that the 1/<em>f</em> noise characteristics exhibit more pronounced deterioration compared to the Si/SiO<sub>2</sub> interface degeneration under weak BTI stress. Furthermore, the observed linear relationship between the 1/<em>f</em> noise characteristics and MOS interface trap density was confirmed by the carrier number fluctuation model, indicating that 1/<em>f</em> noise characteristics could be considered as a sensitive and effective indicator for assessing MOS interface quality after weak BTI stress.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115478"},"PeriodicalIF":1.6,"publicationDate":"2024-08-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141963678","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Exploring the radiant impact of irradiance on the electrical resistance of organic thin film 探索辐照度对有机薄膜电阻的影响
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-08 DOI: 10.1016/j.microrel.2024.115474
M. Khan , M. Shah , M. Abbas , Asma A. Alothman , Saikh M. Wabaidur , Mohd. Zahid Ansari

This article reports on the light sensitivity of Organic Thin Film Transistors (OTFTs) based on Nickel Phthalocyanine (NiPc). Phototransistors with three distinct channel lengths (25 μm, 40 μm, and 50 μm) are fabricated and compared for performance analysis. We investigate the impact of irradiance at various frequencies under different applied voltages on the performance of the phototransistor. Light exposure influences the resistance of nickel-phthalocyanine. The resistance of nickel-phthalocyanine undergoes a decrement, ranging from 185 to 0.8 KΩ, as the incident light intensity increases from zero to 130 foot candela (fc), while varying the frequency from 0.1 to 5 KHz. Under conditions of low frequency (100 Hz) and a channel length of 25 μm, the resistance of the fabricated photosensitive transistor exhibits a decrease from 92 to 40 KΩ during a voltage sweep of 5 V. The resistance of the organic phototransistor (OPT) is noted to decrease with rising irradiance, and its performance is superior at low frequencies compared to high frequencies. The decrease in resistance is attributed to the bound charge carriers that get sufficient energy from the absorbed photon to surmount the barrier when the incident light on the device possesses enough energy. These liberated conduction electrons, or holes left behind, move freely, resulting in lower resistance. The obtained results demonstrate the potential efficiency of organic photosensitive transistors for utilization in optoelectronic devices.

本文报告了基于酞菁镍(NiPc)的有机薄膜晶体管(OTFT)的光敏感性。我们制作了三种不同沟道长度(25 μm、40 μm 和 50 μm)的光电晶体管,并对其进行了性能分析比较。我们研究了不同应用电压下各种频率的辐照度对光晶体管性能的影响。光照射影响镍酞菁的电阻。当入射光强度从零增加到 130 英尺坎德拉(f),频率从 0.1 到 5 千赫不等时,镍酞菁的电阻会下降,降幅从 185 到 0.8 千欧不等。在低频(100 Hz)和通道长度为 25 μm 的条件下,制造的光敏晶体管的电阻在 5 V 电压扫描期间从 92 KΩ 下降到 40 KΩ。有机光敏晶体管(OPT)的电阻随着辐照度的升高而减小,其低频性能优于高频。电阻减小的原因是,当入射光具有足够的能量照射到器件上时,束缚电荷载流子从吸收的光子中获得了足够的能量,从而越过了势垒。这些被释放的传导电子或留下的空穴可以自由移动,从而降低了电阻。研究结果证明了有机光敏晶体管在光电设备中的潜在应用效率。
{"title":"Exploring the radiant impact of irradiance on the electrical resistance of organic thin film","authors":"M. Khan ,&nbsp;M. Shah ,&nbsp;M. Abbas ,&nbsp;Asma A. Alothman ,&nbsp;Saikh M. Wabaidur ,&nbsp;Mohd. Zahid Ansari","doi":"10.1016/j.microrel.2024.115474","DOIUrl":"10.1016/j.microrel.2024.115474","url":null,"abstract":"<div><p>This article reports on the light sensitivity of Organic Thin Film Transistors (OTFTs) based on Nickel Phthalocyanine (NiPc). Phototransistors with three distinct channel lengths (25 μm, 40 μm, and 50 μm) are fabricated and compared for performance analysis. We investigate the impact of irradiance at various frequencies under different applied voltages on the performance of the phototransistor. Light exposure influences the resistance of nickel-phthalocyanine. The resistance of nickel-phthalocyanine undergoes a decrement, ranging from 185 to 0.8 KΩ, as the incident light intensity increases from zero to 130 foot candela (f<sub>c</sub>), while varying the frequency from 0.1 to 5 KHz. Under conditions of low frequency (100 Hz) and a channel length of 25 μm, the resistance of the fabricated photosensitive transistor exhibits a decrease from 92 to 40 KΩ during a voltage sweep of 5 V. The resistance of the organic phototransistor (OPT) is noted to decrease with rising irradiance, and its performance is superior at low frequencies compared to high frequencies. The decrease in resistance is attributed to the bound charge carriers that get sufficient energy from the absorbed photon to surmount the barrier when the incident light on the device possesses enough energy. These liberated conduction electrons, or holes left behind, move freely, resulting in lower resistance. The obtained results demonstrate the potential efficiency of organic photosensitive transistors for utilization in optoelectronic devices.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115474"},"PeriodicalIF":1.6,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141941633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deep n-well dtscr with fast turn-on speed for low-voltage esd protection applications 深 n 孔 dtscr,开启速度快,适用于低电压 ESD 保护应用
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-02 DOI: 10.1016/j.microrel.2024.115475
Boyang Ma, Shupeng Chen, Ruibo Chen, Hongxia Liu, Shulong Wang, Zeen Han

In this article, a novel low trigger and fast turn on electrostatic discharge (ESD) protection device, called deep N-well diode-triggered silicon-controlled-rectifier (DNWTSCR), is proposed for 1.8 V I/O protection applications in the advanced 40-nm CMOS technology. By incorporating a deep N-well parasitic diode path into the conventional DTSCR, the triggering diodes-string gets prolonged and possesses higher impedance without area penalty. Owing to this, more current will branch to the inherent SCR during the operation, and consequently the DNWTSCR will present improved turn-on characteristics. The ESD characteristics of the proposed DNWTSCR and the conventional DTSCR were evaluated by Transmission Line Pulse (TLP) and Very Fast TLP (VFTLP). As results, the DNWTSCR presents a low trigger voltage of 3.4 V and an extremely fast turn-on time of 0.85 ns, which are 41 % and 51 % lower than the conventional DTSCR, respectively. Moreover, the TCAD simulation results agree well with the transmission line pulse testing results, further confirming that the proposed DNWTSCR can be widely used as an effective ESD protection device for high-speed ICs.

本文提出了一种新型低触发和快速开启静电放电(ESD)保护器件,称为深 N 孔二极管触发式硅控整流器(DNWTSCR),适用于先进的 40 纳米 CMOS 技术中的 1.8 V I/O 保护应用。通过在传统的 DTSCR 中加入深 N 孔寄生二极管路径,触发二极管串得以延长,并在不增加面积的情况下具有更高的阻抗。因此,在工作期间会有更多电流流向固有的可控硅,从而使 DNWTSCR 具有更好的开启特性。通过传输线脉冲 (TLP) 和极快速 TLP (VFTLP) 评估了所提出的 DNWTSCR 和传统 DTSCR 的 ESD 特性。结果显示,DNWTSCR 具有 3.4 V 的低触发电压和 0.85 ns 的超快导通时间,分别比传统 DTSCR 低 41% 和 51%。此外,TCAD 仿真结果与传输线脉冲测试结果非常吻合,进一步证实了所提出的 DNWTSCR 可广泛用作高速集成电路的有效 ESD 保护器件。
{"title":"Deep n-well dtscr with fast turn-on speed for low-voltage esd protection applications","authors":"Boyang Ma,&nbsp;Shupeng Chen,&nbsp;Ruibo Chen,&nbsp;Hongxia Liu,&nbsp;Shulong Wang,&nbsp;Zeen Han","doi":"10.1016/j.microrel.2024.115475","DOIUrl":"10.1016/j.microrel.2024.115475","url":null,"abstract":"<div><p>In this article, a novel low trigger and fast turn on electrostatic discharge (ESD) protection device, called deep N-well diode-triggered silicon-controlled-rectifier (DNWTSCR), is proposed for 1.8 V I/O protection applications in the advanced 40-nm CMOS technology. By incorporating a deep N-well parasitic diode path into the conventional DTSCR, the triggering diodes-string gets prolonged and possesses higher impedance without area penalty. Owing to this, more current will branch to the inherent SCR during the operation, and consequently the DNWTSCR will present improved turn-on characteristics. The ESD characteristics of the proposed DNWTSCR and the conventional DTSCR were evaluated by Transmission Line Pulse (TLP) and Very Fast TLP (VFTLP). As results, the DNWTSCR presents a low trigger voltage of 3.4 V and an extremely fast turn-on time of 0.85 ns, which are 41 % and 51 % lower than the conventional DTSCR, respectively. Moreover, the TCAD simulation results agree well with the transmission line pulse testing results, further confirming that the proposed DNWTSCR can be widely used as an effective ESD protection device for high-speed ICs.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115475"},"PeriodicalIF":1.6,"publicationDate":"2024-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141941632","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cross-scale finite element analysis of PCBA thermal cycling based on manufacturing history for more accurate fatigue life prediction of solder joints 基于制造历史的 PCBA 热循环跨尺度有限元分析,用于更准确地预测焊点的疲劳寿命
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-01 DOI: 10.1016/j.microrel.2024.115473
Ruiqian Zheng, Wenqian Li, Mengxuan Cheng, Hao Zheng, Zhiyan Zhao, Guoshun Wan, Yuxi Jia

Printed Circuit Board Assemblies (PCBA) are crucial components of integrated circuit products. To address the issue of solder joint failure in PCBA under thermal cycling conditions, this study proposes a multiscale modeling approach to assess the warpage of the Printed Circuit Board (PCB) and the thermal fatigue life of solder joints during the PCBA working process. Firstly, a PCBA model incorporating the PCB, substrate, chip, Epoxy Molding Compound (EMC), and solder joints was established. The equivalent thermal-mechanical properties of the Conductive Layers (CDLs) in the PCB are calculated using a mesoscopic finite element approach to capture its complex structural characteristics. Finite Element Analysis (FEA) was conducted on the reflow soldering and thermal cycling processes of the PCBA to systematically investigate the effects of temperature variations during thermal cycling and residual stress from the manufacturing process on the fatigue life of solder joints. The results indicate that during the thermal cycling process, the complex deformation of the solder joints caused by the inconsistent deformation of the PCB and substrate as well as the accumulated inelastic strain of the solder joints lead to solder joint failures, and the dangerous solder joint is concentrated at the edges of the solder joint array. The temperature range significantly influenced the fatigue life of solder joints because of the thermal fatigue life of the solder joints decreased as the temperature range increased. The presence of residual stress during manufacturing reduces the fatigue life of solder joints, thus emphasizing the need to optimize the reflow process design to reduce residual stress in solder joints. The cross-scale simulation method developed in this study enables more accurate prediction of the thermal fatigue life of solder joints, thereby facilitating reliability studies and optimized designs of integrated circuit products.

印刷电路板组件(PCBA)是集成电路产品的关键部件。为了解决热循环条件下 PCBA 焊点失效的问题,本研究提出了一种多尺度建模方法,以评估 PCBA 工作过程中印刷电路板(PCB)的翘曲和焊点的热疲劳寿命。首先,建立了一个包含印刷电路板、基板、芯片、环氧模塑料(EMC)和焊点的 PCBA 模型。使用介观有限元方法计算 PCB 中导电层 (CDL) 的等效热机械特性,以捕捉其复杂的结构特征。对 PCBA 的回流焊接和热循环过程进行了有限元分析,以系统地研究热循环过程中的温度变化和制造过程中的残余应力对焊点疲劳寿命的影响。结果表明,在热循环过程中,PCB 和基板的不一致变形以及焊点累积的非弹性应变导致焊点的复杂变形,从而导致焊点失效,且危险焊点集中在焊点阵列的边缘。温度范围对焊点的疲劳寿命有很大影响,因为焊点的热疲劳寿命随着温度范围的增加而降低。制造过程中残余应力的存在降低了焊点的疲劳寿命,因此强调了优化回流焊工艺设计以减少焊点残余应力的必要性。本研究开发的跨尺度模拟方法能更准确地预测焊点的热疲劳寿命,从而促进集成电路产品的可靠性研究和优化设计。
{"title":"Cross-scale finite element analysis of PCBA thermal cycling based on manufacturing history for more accurate fatigue life prediction of solder joints","authors":"Ruiqian Zheng,&nbsp;Wenqian Li,&nbsp;Mengxuan Cheng,&nbsp;Hao Zheng,&nbsp;Zhiyan Zhao,&nbsp;Guoshun Wan,&nbsp;Yuxi Jia","doi":"10.1016/j.microrel.2024.115473","DOIUrl":"10.1016/j.microrel.2024.115473","url":null,"abstract":"<div><p>Printed Circuit Board Assemblies (PCBA) are crucial components of integrated circuit products. To address the issue of solder joint failure in PCBA under thermal cycling conditions, this study proposes a multiscale modeling approach to assess the warpage of the Printed Circuit Board (PCB) and the thermal fatigue life of solder joints during the PCBA working process. Firstly, a PCBA model incorporating the PCB, substrate, chip, Epoxy Molding Compound (EMC), and solder joints was established. The equivalent thermal-mechanical properties of the Conductive Layers (CDLs) in the PCB are calculated using a mesoscopic finite element approach to capture its complex structural characteristics. Finite Element Analysis (FEA) was conducted on the reflow soldering and thermal cycling processes of the PCBA to systematically investigate the effects of temperature variations during thermal cycling and residual stress from the manufacturing process on the fatigue life of solder joints. The results indicate that during the thermal cycling process, the complex deformation of the solder joints caused by the inconsistent deformation of the PCB and substrate as well as the accumulated inelastic strain of the solder joints lead to solder joint failures, and the dangerous solder joint is concentrated at the edges of the solder joint array. The temperature range significantly influenced the fatigue life of solder joints because of the thermal fatigue life of the solder joints decreased as the temperature range increased. The presence of residual stress during manufacturing reduces the fatigue life of solder joints, thus emphasizing the need to optimize the reflow process design to reduce residual stress in solder joints. The cross-scale simulation method developed in this study enables more accurate prediction of the thermal fatigue life of solder joints, thereby facilitating reliability studies and optimized designs of integrated circuit products.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115473"},"PeriodicalIF":1.6,"publicationDate":"2024-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141866403","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analytical solution for forced vibration of multilayer structures composed of plates with different geometric dimensions 由不同几何尺寸的板材组成的多层结构的受迫振动解析解
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-31 DOI: 10.1016/j.microrel.2024.115472
Bin Li , Xin Yao , Shuantao Li , Yongbin Ma

Multilayer system composed of parallel plate components with different geometric dimensions is frequently used to describe engineering objects, such as electronic assembly. In this work, an analytical method was proposed for forced vibration of this type of multilayer system. The proposed method overcomes the limitation that the traditional wave method is only applicable to all plate components must have the same in-plane dimensions. The proposed analytical method has an efficiency advantages in parameter analysis than element-based methods such as finite element method (FEM). The connection joints between two adjacent plate components, such as ball grid array (BGA) solder interconnect, are represented by elastic springs. The vibration of each component are described in terms of general and physical analytical waves, respectively, and the dynamic coupling between them are established by an equivalent dynamic flexibility matrix. The forced responses of the multilayer system are analytically calculated by solving the system equation in wave space. In the numerical examples, the effectiveness of the proposed method is validated by comparing the present results with the FEM results. The influence of number of the defective solder joints on vibration response is also investigated.

由具有不同几何尺寸的平行板组件组成的多层系统常用于描述工程对象,如电子组件。在这项工作中,我们提出了一种分析方法,用于分析这类多层系统的受迫振动。所提出的方法克服了传统波方法仅适用于所有板组件必须具有相同面内尺寸的限制。与有限元法(FEM)等基于元素的方法相比,所提出的分析方法在参数分析方面具有效率优势。相邻两个板状元件(如球栅阵列 (BGA) 焊料互连)之间的连接点用弹性弹簧表示。每个组件的振动分别用一般分析波和物理分析波描述,它们之间的动态耦合由等效动态弹性矩阵建立。多层系统的强迫响应是通过在波空间求解系统方程来分析计算的。在数值示例中,通过比较本结果与有限元结果,验证了所提方法的有效性。此外,还研究了缺陷焊点数量对振动响应的影响。
{"title":"Analytical solution for forced vibration of multilayer structures composed of plates with different geometric dimensions","authors":"Bin Li ,&nbsp;Xin Yao ,&nbsp;Shuantao Li ,&nbsp;Yongbin Ma","doi":"10.1016/j.microrel.2024.115472","DOIUrl":"10.1016/j.microrel.2024.115472","url":null,"abstract":"<div><p>Multilayer system composed of parallel plate components with different geometric dimensions is frequently used to describe engineering objects, such as electronic assembly. In this work, an analytical method was proposed for forced vibration of this type of multilayer system. The proposed method overcomes the limitation that the traditional wave method is only applicable to all plate components must have the same in-plane dimensions. The proposed analytical method has an efficiency advantages in parameter analysis than element-based methods such as finite element method (FEM). The connection joints between two adjacent plate components, such as ball grid array (BGA) solder interconnect, are represented by elastic springs. The vibration of each component are described in terms of general and physical analytical waves, respectively, and the dynamic coupling between them are established by an equivalent dynamic flexibility matrix. The forced responses of the multilayer system are analytically calculated by solving the system equation in wave space. In the numerical examples, the effectiveness of the proposed method is validated by comparing the present results with the FEM results. The influence of number of the defective solder joints on vibration response is also investigated.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115472"},"PeriodicalIF":1.6,"publicationDate":"2024-07-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141866406","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Two-step sub-modeling framework for thermomechanical fatigue analysis of solder joints in DRAM module 用于 DRAM 模块焊点热机械疲劳分析的两步子建模框架
IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-26 DOI: 10.1016/j.microrel.2024.115469
Hyun Suk Lee , Giseok Yun , Ju-Hwan Song , Do-Nyun Kim

The characteristics of thermomechanical fatigue life of complex electronic device system, micro-scaled design, is highly sensitive to changes in design factors. The solder ball, which acts as a linkage between the circuit board and the package, is a vital part to examine the performance of electronic device system. Repeated thermal loading causes the solder crack growth in models, eventually leads to the breakdown of devices. There have been lots of studies on investigating the fatigue life of solder joints employing well-established finite element procedure. However, generating a finite element model reflecting the whole device often requires unnecessarily large finite element matrices which may increase the computational cost and solder joint fatigue life can be highly dependent on the mesh resolutions. Recent studies suggest the sub-modeling method to handle the meshing process and alleviate the computational cost. In this paper, we delineate the methodology of two-step sub-modeling framework, aimed at improving the mesh fidelity of complex models while ensuring the efficiency of labor-intensive process of solder joint fatigue analysis. We employ the strain energy-based Darveaux's fatigue model to predict the fatigue life of solder joints. Through the investigation of the predicted fatigue life of solder joints across various sets of design parameters, it has been observed that the design factors of electronic devices exhibit a clear pattern in relation to the predicted fatigue life, even when only the second step of two-step sub-modeling framework is considered. Our findings suggest that it is efficient to utilize solely the second step of two-step sub-modeling framework to identify an appropriate reduced design space, where design parameters can be strategically selected for designing an optimal model.

复杂的电子设备系统、微尺度设计的热机械疲劳寿命特性对设计因素的变化高度敏感。焊球作为电路板和封装之间的纽带,是检验电子设备系统性能的重要部分。反复的热负荷会导致模型中焊料裂纹的增长,最终导致器件的损坏。很多研究都采用了成熟的有限元程序来研究焊点的疲劳寿命。然而,生成反映整个器件的有限元模型往往需要不必要的大有限元矩阵,这可能会增加计算成本,而且焊点疲劳寿命与网格分辨率有很大关系。最近的研究建议采用子建模方法来处理网格划分过程并降低计算成本。本文阐述了两步子建模框架方法,旨在提高复杂模型的网格保真度,同时确保焊点疲劳分析这一劳动密集型过程的效率。我们采用基于应变能的 Darveaux 疲劳模型来预测焊点的疲劳寿命。通过对不同设计参数集下焊点疲劳寿命预测的研究,我们发现,即使只考虑两步子建模框架的第二步,电子设备的设计因素与疲劳寿命预测也呈现出明显的相关性。我们的研究结果表明,仅利用两步子建模框架的第二步来确定一个适当的缩小设计空间是有效的,在这个空间中可以有策略地选择设计参数,从而设计出最佳模型。
{"title":"Two-step sub-modeling framework for thermomechanical fatigue analysis of solder joints in DRAM module","authors":"Hyun Suk Lee ,&nbsp;Giseok Yun ,&nbsp;Ju-Hwan Song ,&nbsp;Do-Nyun Kim","doi":"10.1016/j.microrel.2024.115469","DOIUrl":"10.1016/j.microrel.2024.115469","url":null,"abstract":"<div><p>The characteristics of thermomechanical fatigue life of complex electronic device system, micro-scaled design, is highly sensitive to changes in design factors. The solder ball, which acts as a linkage between the circuit board and the package, is a vital part to examine the performance of electronic device system. Repeated thermal loading causes the solder crack growth in models, eventually leads to the breakdown of devices. There have been lots of studies on investigating the fatigue life of solder joints employing well-established finite element procedure. However, generating a finite element model reflecting the whole device often requires unnecessarily large finite element matrices which may increase the computational cost and solder joint fatigue life can be highly dependent on the mesh resolutions. Recent studies suggest the sub-modeling method to handle the meshing process and alleviate the computational cost. In this paper, we delineate the methodology of two-step sub-modeling framework, aimed at improving the mesh fidelity of complex models while ensuring the efficiency of labor-intensive process of solder joint fatigue analysis. We employ the strain energy-based Darveaux's fatigue model to predict the fatigue life of solder joints. Through the investigation of the predicted fatigue life of solder joints across various sets of design parameters, it has been observed that the design factors of electronic devices exhibit a clear pattern in relation to the predicted fatigue life, even when only the second step of two-step sub-modeling framework is considered. Our findings suggest that it is efficient to utilize solely the second step of two-step sub-modeling framework to identify an appropriate reduced design space, where design parameters can be strategically selected for designing an optimal model.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"160 ","pages":"Article 115469"},"PeriodicalIF":1.6,"publicationDate":"2024-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141866315","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Microelectronics Reliability
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1