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2021 6th International Conference on Integrated Circuits and Microsystems (ICICM)最新文献

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A Data Eye Width Improved and ODT PVT Tolerance Enhanced DDR4 SDRAM Using Fast Clock Gating and tADC Self-align 基于快速时钟门控和tdac自对准的DDR4 SDRAM数据眼宽改善和ODT PVT容差增强
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660276
Hongguang Zhang, Zhiqiang Zhang, Yuanyuan Gong, Yanan Zhang, Jake Jung, Brian Lee, Edwin Kim, Kanyu Cao
An 8Gb3200Mbps DDR4 SDRAM with fast clock gating and ODT path self-align technique is presented. Fast clock gating is utilized in the DDR4 SDRAM to pursue cut down DLL, read, write and ODT Paths stage, thus data jitters and current consumption can be reduced. ODT path delay self-align method is proposed to the DDR4 SDRAM which is implemented in DRAM process. Measurement results show fast clock gating can reduce 12 stages in DLL, read, write and ODT path and reduce 600uA current, and 5.4% jitters in Read and ODT path. What’s more, the measurement results also show the tADC variation is reduced from 220ps to 30ps with delay self-align technique.
提出了一种具有快速时钟门控和ODT路径自对准技术的8Gb3200Mbps DDR4 SDRAM。在DDR4 SDRAM中使用快速时钟门控来追求减少DLL,读,写和ODT路径阶段,从而可以减少数据抖动和电流消耗。针对DDR4 SDRAM,提出了ODT路径延迟自对准方法,并在DRAM过程中实现。测试结果表明,快速时钟门控可以减少DLL、读、写和ODT通路的12级,减少600uA电流,减少5.4%的读和ODT通路抖动。此外,测量结果还表明,采用延迟自对准技术后,ttac变化从220ps降低到30ps。
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引用次数: 0
Analysis of Abnormal Defects of High Resistance of 1000 kV UHV Transmission Line 1000kv特高压输电线路高阻异常缺陷分析
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660218
Yue Bing, Zhou Luyao, Yang Zhi, Zhao Lin, Lin Haofan, Yang Yong
The oil chromatographic data of the high-voltage reactor in an UHV substation was abnormal, and subsequent live detection measures were taken for this defect, including high-frequency partial discharge test, UHF partial discharge test, ultrasonic partial discharge test, and vibration monitoring. This paper comprehensively analyzed the test data, judges that there was discharge inside, and basically judged the discharge position in the Y-pillar area of the high-voltage reactor, and put forward suggestions and opinions for subsequent disposal measures and operation and maintenance measures.
某特高压变电所高压电抗器油色谱数据异常,对该缺陷采取了后续带电检测措施,包括高频局部放电试验、超高频局部放电试验、超声局部放电试验、振动监测等。本文对试验数据进行综合分析,判断内部有放电,并对高压反应器y柱区域放电位置进行基本判断,并对后续处置措施和运行维护措施提出建议和意见。
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引用次数: 0
Simulation and Research of Piezoelectric Film Bulk Acoustic Resonator Based on Mason Model 基于Mason模型的压电薄膜体声谐振器仿真与研究
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660240
Linyu Xu, Xiushan Wu, Yuqi Zeng
With the rapid development of micromechanical technology and the maturity of integrated circuit technology, which have made it possible to make miniaturization of high-performance frequency control devices. The piezoelectric film bulk acoustic resonator (FBAR) has gradually become one of the research hotspots of RF filters. This paper mainly derives the electrical impedance model of FBAR based on the sound wave transmission characteristics of thin-film materials, a one-dimensional Mason model is established for the later RF filter design, and the influence of the thickness and resonant area of each film on the resonant frequency of the device is studied. And detailed simulation of the physical parameters of the model. The simulation results show that as the thickness of each layer increases, the acoustic wave transmission path increases, and the loss increases, which causes the resonant frequency decrease gradually; as the resonant area increases, the resonant frequency is not affected, but the impedance value of the device decreases gradually.
随着微机械技术的飞速发展和集成电路技术的成熟,使得高性能变频调速装置的小型化成为可能。压电薄膜体声谐振器(FBAR)已逐渐成为射频滤波器的研究热点之一。本文主要基于薄膜材料的声波传输特性推导了FBAR的电阻抗模型,建立了一维Mason模型,用于后期的RF滤波器设计,并研究了各薄膜厚度和谐振面积对器件谐振频率的影响。并对模型的物理参数进行了详细的仿真。仿真结果表明:随着各层厚度的增加,声波传播路径增加,损耗增大,导致谐振频率逐渐降低;随着谐振面积的增大,谐振频率不受影响,但器件的阻抗值逐渐减小。
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引用次数: 1
A Novel High Precision Low Power Current-Mode Multiplier 一种新型高精度低功耗电流模乘法器
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660279
Feng Yang
In this paper a novel current-mode analog multiplier based on translinear principle is presented. The transistors in the translinear loop all operate in the strong inversion region. The circuit consists of a current-mode square root circuit and a current-mode square/divider circuit. The circuit has favorable precision, wide dynamic range and is insensitive to variations in temperature and processing. The simulated results show that the multiplier has a bandwidth of 1 MHz. The total harmonic distortion of the multiplier is less than 1%. It is suitable for a wide range of analog signal processing application. Due to the low power, scalability and modularity, it can be also easily integrated in massive parallel systems.
本文提出了一种基于跨线性原理的新型电流模模拟乘法器。跨线性回路中的晶体管都工作在强反转区。该电路由电流模平方根电路和电流模平方/分频电路组成。该电路精度高,动态范围宽,对温度和工艺变化不敏感。仿真结果表明,该倍增器的带宽为1 MHz。乘法器的总谐波失真小于1%。它适用于广泛的模拟信号处理应用。由于低功耗、可扩展性和模块化,它也可以很容易地集成在大规模并行系统中。
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引用次数: 0
Thermodynamic Analysis in Failure Analysis of 3D Stacked Package Devices 三维堆叠封装器件失效分析中的热力学分析
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660285
Xu Wang, Zhimin Ding, Chao Duan, Meng Meng, Yudong Liu, Zhibin Wang, Xiangtian Yu
Three-dimensional(3D) stacked packaging devices use epoxy packaging materials to integrate multiple components or chips in the vertical direction, and adopt various new interconnection technologies to realize the vertical interconnection of components. This article introduces a case of cracking on the surface coating of a 3D stacked package component with a vertical electrical connection by the surface metal coating. Through the analysis of the stacked packaging material and discussion of the process, the failure mechanism is clearly obtained and the cause of the failure was found out. Finally, several quality assurance methods to ensure the epoxy curing quality of epoxy-encapsulated 3D devices are given.
三维(3D)堆叠封装器件采用环氧树脂封装材料将多个组件或芯片在垂直方向进行集成,并采用多种新型互连技术实现组件的垂直互连。本文介绍了一种具有垂直电气连接的三维堆叠封装组件的表面涂层被表面金属涂层开裂的案例。通过对堆积包装材料的分析和工艺讨论,明确了堆积包装材料的失效机理,找出了堆积包装材料失效的原因。最后给出了几种保证环氧封装三维器件环氧固化质量的方法。
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引用次数: 0
A X/Ku-Band Broadband Low Noise Amplifier in 0.18 μm CMOS 0.18 μm CMOS X/ ku波段宽带低噪声放大器
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660246
Ziyu Zhang, Leijun Xu
This paper presents a X/Ku-band wideband low noise amplifier (LNA), which consists of a cascode stage and a common-source stage based on 0.18 μm CMOS process working at 9-15 GHz. The parasitic capacitance at the gate-source of the cascode and the parasitic capacitance at the drain of the common-source stage are involved in the input and output matching network. In this way, two independent passive devices are used to form a T-shaped matching structure achieving the broadband performance. Moreover, the number of passive devices is saved and the chip area is also saved. The measured results of the LNA show a low return loss (< -10 dB) in the range of 9-15 GHz and a greater gain (> 10 dB). In addition, the noise factor is 4.43 dB at the center frequency. It generates 21 mA bias current at a 1.8 V supply and the area of the layout is 607μm×460μm.
提出了一种基于0.18 μm CMOS工艺的X/ ku波段宽带低噪声放大器(LNA),该放大器由级联码级和共源级组成,工作频率为9-15 GHz。输入输出匹配网络中涉及级联码栅源端的寄生电容和共源级漏极端的寄生电容。这样,使用两个独立的无源器件形成t形匹配结构,实现宽带性能。此外,还节省了无源器件的数量和芯片面积。测量结果表明,该LNA在9-15 GHz范围内具有较低的回波损耗(< -10 dB)和较大的增益(> 10 dB)。中心频率处的噪声系数为4.43 dB。它在1.8 V电源下产生21 mA偏置电流,布局面积为607μm×460μm。
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引用次数: 0
A 1.8~3.1 GHz High-Gain LNA with 1.5~1.7 dB NF in 0.18-μm SiGe BiCMOS Technology 基于0.18 μm SiGe BiCMOS技术的1.5~1.7 dB NF的1.8~3.1 GHz高增益LNA
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660327
Guoxiao Cheng, Y. Sun, Wen Wu
This paper presents a 1.8 ~ 3.1 GHz high-gain three-stage low-noise amplifier (LNA) in 0.18- $mu m$ SiGe BiCMOS technology. Firstly, a 4th-order $pi$-type input matching network is adopted to achieve both wideband noise and power matching. Secondly, current-reused topology is used in the first two stages for high gain and low power consumption, and the resonance points of each stage are staggered to expand the frequency bandwidth. Thirdly, to improve linearity performance, an optimized multiple gated transistor method (MGTR) is employed in the third stage, which focuses on alleviating the degradation of the transconductance. The post-layout simulated results show that the proposed LNA achieves $26.8 sim 29.8$ dB power gain and 1.5 $sim$ 1.7 dB noise Figure (NF) within the 3-dB bandwidth. It also has 1.1 ~ 5.8 GHz S11 bandwidth and $16.2 dBm OIP_{3}$ (third-order output intercept point).
提出了一种采用0.18- $mu m$ SiGe BiCMOS技术的1.8 3.1 GHz高增益三级低噪声放大器。首先,采用四阶$pi$型输入匹配网络实现宽带噪声和功率匹配;其次,前两级采用电流复用拓扑,实现高增益和低功耗,各级谐振点错开,扩大频宽;为了提高线性性能,第三阶段采用了优化的多门控晶体管方法(MGTR),该方法的重点是减轻跨导的退化。布局后的仿真结果表明,该LNA在3db带宽范围内实现了$26.8 sim 29.8$ dB的功率增益和1.5 $sim$ 1.7 dB的噪声系数。它还具有1.1 5.8 GHz S11带宽和$16.2 dBm OIP_{3}$(三阶输出截距点)。
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引用次数: 0
RF Front-End CMOS Receiver with Antenna for Millimeter-Wave Applications 毫米波应用射频前端CMOS接收机与天线
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660304
W. Lai
This article introduces integrated RF front-end CMOS receiver for millimeter-wave and biosensing applications. The proposed integrated RF front-end receiver consists of singlein differential-out (SIDO) low-noise amplifier (LNA), high linearity double-gate mixer, 3th-order loop bandpass filter, phaselocked loop (PLL) with a LC-tank voltage-controlled oscillates (VCO) and array antenna. The proposed integrated RF frontend CMOS receiver has been implemented in tsmc 0.18um CMOS technique.
本文介绍了用于毫米波和生物传感应用的集成射频前端CMOS接收器。该集成射频前端接收机由单输入差出(SIDO)低噪声放大器(LNA)、高线性双门混频器、三阶环带通滤波器、带LC-tank压控振荡器(VCO)的锁相环(PLL)和阵列天线组成。所提出的射频前端集成CMOS接收器已在台积电0.18um CMOS技术上实现。
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引用次数: 1
Design of Charge Pump with Low Voltage Differential Current Mirror in 22nm CMOS Technology 22nm CMOS低压差动电流镜电荷泵的设计
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660364
Qingbo Cai, Zhiqun Li, Zhennan Li, Yan Yao, Xiaowei Wang, Bofan Chen
In this paper, based on TSMC 22nm CMOS process, a Charge Pump with a working frequency of 50MHz is designed. In order to further expand the output voltage range with current matching of CP when charging and discharging, a CP structure based on low voltage differential current mirror technology was proposed. Rail-to-rail operational amplifier is used to clamp the voltage and improve the matching accuracy of charge current and discharge current of CP.
本文基于台积电22nm CMOS工艺,设计了工作频率为50MHz的电荷泵。为了进一步扩大充电放电时CP电流匹配的输出电压范围,提出了一种基于低压差动电流镜技术的CP结构。采用轨对轨运算放大器对电压进行箝位,提高了充电电流和放电电流的匹配精度。
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引用次数: 0
Design of Transient Enhanced LDO Circuit for GaN HEMT Gate Driver GaN HEMT栅极驱动器瞬态增强LDO电路设计
Pub Date : 2021-10-22 DOI: 10.1109/ICICM54364.2021.9660317
Li Wang, De-Zhong Zhou, Ningye He, Yuan Xu, Xiaoxiong He, Zhenhai Chen
A dynamic bias transient enhanced LDO (Low Dropout regulator) circuit for GaN gate driver is presented in this paper. With high-speed comparator, the bias current of LDO error amplifier can be switched dynamically when large load occurs. The reference voltage of high-speed comparator determines the response time of dynamic bias control circuit. The LDO has been designed in 0.18 μm BCD (Bipolar-CMOS-DMOS) process, simulation results show that the proposed LDO undershoot voltage is 16.6% of output voltage and the recovery time is less than 0.5us when load current is changed from 0mA to 20mA by frequency is 1MHZ.
提出了一种用于GaN栅极驱动器的动态偏置瞬态增强型LDO电路。利用高速比较器,可以在大负载时动态切换LDO误差放大器的偏置电流。高速比较器的参考电压决定了动态偏置控制电路的响应时间。采用0.18 μm BCD (bibipolar - cmos - dmos)工艺设计LDO,仿真结果表明,当负载电流由0mA变为20mA,频率为1MHZ时,LDO欠激电压为输出电压的16.6%,恢复时间小于0.5us。
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引用次数: 1
期刊
2021 6th International Conference on Integrated Circuits and Microsystems (ICICM)
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