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2014 IEEE 16th Electronics Packaging Technology Conference (EPTC)最新文献

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Optimization of the wafer level molding process for high power device module 大功率器件模块晶圆级成型工艺的优化
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028368
L. Bu, S. Ho, Dexter Velez Sorono, Daniel Rhee Min Woo
High power modules are indispensible in our future automotive, aerospace and green & renewable energy industry. However, a lot of issues rise along with the power rising. More components are needed to increase the reliability, dissipate heat and etc. Thus, the whole packages are more complicated than the normal ones. Complicated structure including copper clips makes the molding process rather difficult. Voids are more easily to be trapped in between the pads under the chip covered by the copper clip. In our simulation, we are trying to achieve void free molding by varying the dispensing pattern, the package layout and initial diameter of molding compound on the wafer. The results show that round dispensing pattern dominates straight line dispensing pattern in the measurement of voids coverage as well as the incomplete fill. However, the four packages on the outmost of the wafer still contain high coverage of voids ratio. Therefore, the extremely high voids coverage packages are removed eventually from the wafer. In the parametric studies of diameter of the initial dispensing pattern shows that smaller diameter results in lower voids issue. A series of simulation are carried out to achieve a void free molding process.
高功率模块是未来汽车、航空航天、绿色和可再生能源行业不可或缺的。然而,随着权力的上升,许多问题也随之产生。需要更多的元件来提高可靠性、散热等。因此,整个包比普通包更复杂。包括铜夹在内的复杂结构使得成型过程相当困难。孔洞更容易被困在铜夹覆盖的芯片下的衬垫之间。在我们的模拟中,我们试图通过改变点胶模式,封装布局和晶圆上成型化合物的初始直径来实现无空洞成型。结果表明:在测量空隙覆盖率和不完全填充率时,圆形点药模式优于直线点药模式;然而,晶圆最外层的四个封装仍然包含较高的空隙覆盖率。因此,极高空隙覆盖率的封装最终会从晶圆片上移除。对初始点胶模式直径的参数化研究表明,粒径越小,孔隙问题越小。为了实现无空隙成型工艺,进行了一系列的仿真。
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引用次数: 0
Challenges and solutions on pre-assembly processes for thinned 3D wafers with micro-bumps on the backside 带有微凸点的3D晶圆薄壁预组装工艺的挑战与解决方案
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028283
A. Podpod, C. Demeurisse, C. Gerets, K. Rebibis, G. Capuz, F. Duval, A. Phommahaxay, E. Sleeckx, H. Struyf, R. A. Miller, G. Beyer, E. Beyne
In 3D IC technology, temporary bonding systems and stacking/assembly process are identified as critical elements given all the concerns on wafer handling amidst BEOL processes and how to do the stacking as best as one could in so many different schemes. In between the temporary bonding systems and stacking/assembly process, is a group and series of processes that link the two. This is collectively and commonly known as the pre-assembly process. This paper presents the in-house pre-assembly 3D IC process flow for thinned wafer with micro-bumps on the backside along with the different challenges on materials and processes on each step. Most importantly, this paper reports on a solution found that enabled pre-assembly process to successfully provide a bridge from temporary bonding systems to stacking/assembly process: a UV dicing tape that can handle the complexities at hand when processing thinned 3D IC wafers with backside micro bumps in pre-assembly integration.
在3D集成电路技术中,临时键合系统和堆叠/组装工艺被认为是关键因素,考虑到BEOL工艺中晶圆处理的所有问题,以及如何在这么多不同的方案中尽可能做到最好的堆叠。在临时粘合系统和堆叠/组装过程之间,是连接两者的一组和一系列过程。这就是通常所说的预装配过程。本文介绍了带有微凸点的薄晶圆的内部预组装3D集成电路工艺流程,以及每一步在材料和工艺上的不同挑战。最重要的是,本文报告了一种解决方案,该解决方案使预组装过程能够成功地提供从临时粘合系统到堆叠/组装过程的桥梁:一种UV切割带,可以在预组装集成中处理带有背面微凸起的薄3D IC晶圆时处理手上的复杂性。
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引用次数: 6
Alternative package-on-package with organic substrate interposer for stacking packaging solution 替代封装对封装与有机基板中间层堆叠封装解决方案
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028323
Steven Lin, M. Liao, Albert Lan, Davidlion Wang
Package-on-Package (PoP) is an integrated circuit packaging method to vertically combine discrete logic device and low power mobile memory packages. Two chip scale BGA packages are installed atop each other, i.e. stacked, with a specific interface to route signals between them. This allows higher component density in devices, such as smart phone and tablet hand held products for bottom FCCSP digital Apps Processor, Modem, to stack with top Wire Bond LPPDDR CSP. The bottom FCCSP package form factor and its pin up of top solder balls were limited by LPDDR BGA matrix which had been defined by JEDEC. Due to high bandwidth memory requirement in smart phone, a lot of new PoP package solutions to accommodate more I/Os between top LPDDR memory package and bottom digital application processor package are booming up recently.
封装上封装(Package-on-Package, PoP)是一种将离散逻辑器件与低功耗移动存储器封装垂直结合的集成电路封装方法。两个芯片级的BGA封装安装在彼此的顶部,即堆叠,具有特定的接口来在它们之间路由信号。这使得设备(如智能手机和平板电脑手持产品)中的组件密度更高,用于底部FCCSP数字应用处理器,调制解调器,与顶部Wire Bond LPPDDR CSP堆叠。底部FCCSP封装尺寸及其顶部焊球引脚受JEDEC定义的LPDDR BGA矩阵的限制。由于智能手机对高带宽内存的需求,近年来出现了许多新的PoP封装解决方案,以在顶层LPDDR内存封装和底层数字应用处理器封装之间容纳更多的I/ o。
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引用次数: 1
Capacitive crosstalk compensation structure for improved high-speed on-package signaling 改进高速封装信号的电容串扰补偿结构
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028279
B. E. Cheah, J. Kong, Ping Ping Ooi, Kok Hou Teh, Po Yin Yaw
This paper explores the effectiveness of under-bump comb (UBC) structure to address the capacitive crosstalk couplings in high-speed on-package interconnects applications. Three-dimensional (3D) passive electrical models were established and simulated in this assessment. Transient analyses were conducted to compare the far-end crosstalk (FEXT) profiles and eye diagrams of the UBC and conventional package routing designs. Simulation results shows the UBC design is able to reduce the peak-to-peak FEXT magnitude by >30% at 8Gbps and delivers up-to 20mV/3ps eye margin improvement compared to conventional design. The sensitivity of the UBC design parameters e.g. fin-count and fin-length correspond to electrical performances such as eye diagram opening, signal overshoot and undershoot are also included in this paper for design optimizations.
本文探讨了碰撞下梳状结构(UBC)在高速封装互连应用中解决电容串扰耦合的有效性。建立了三维(3D)无源电模型并进行了仿真。进行了瞬态分析,比较了UBC和传统封装路由设计的远端串扰(ext)轮廓和眼图。仿真结果表明,与传统设计相比,UBC设计能够在8Gbps时将峰对峰幅度降低bbb30 %,并提供高达20mV/3ps的眼余量改善。本文还考虑了UBC设计参数(如鳍数和鳍长)对眼图开口、信号超调和欠调等电气性能的敏感性,以便进行设计优化。
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引用次数: 0
Inkjet printed transmission line elements for RF applications and measurement challenges 用于射频应用和测量挑战的喷墨印刷传输线元件
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028360
N. Narampanawe, S. K. Yak, Zhang Jie
In the future Internet of things (IoT) era, printed electronics is believed to be a key development technology for sensor tag development. Radio Frequency (RF) circuits such as RF energy harvesters and wireless power transfer will play a major role in future “smart” product. The fundamental element in RF hardware is transmission line. Ink and substrate properties, printing and curing process are vital in desirable quality output. Here, we report inkjet printed transmission line element design and implementation for beyond 1GHz operation. Further, measuring the characteristics of implemented transmission lines with correction is presented.
在未来的物联网(IoT)时代,印刷电子被认为是传感器标签发展的关键发展技术。射频(RF)电路,如射频能量采集器和无线电力传输将在未来的“智能”产品中发挥重要作用。射频硬件的基本元件是传输线。油墨和承印物的性能、印刷和固化过程对理想的质量输出至关重要。在这里,我们报告了超过1GHz工作的喷墨印刷传输线元件的设计和实现。此外,还介绍了用校正方法测量实现的传输线的特性。
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引用次数: 0
Aging effect on creep properties of SnBi solders 时效对SnBi钎料蠕变性能的影响
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028312
M. Sakane, K. Yagi, Takamoto Itoh, M. Yamashita, H. Hokazono
This paper discusses the effects of additive elements and aging on creep properties of SnBi solder system. Creep tests were performed on unaged and aged SnBi, SnBiAg and SnBiAgCuNiGe solders at three temperatures and the effects of them on creep rupture lifetimes and creep strain rates were discussed. The additive elements decreased creep strain rates and elongated creep rupture lifetimes. Causes of the effects were discussed from EBSD observations. The additive elements reduced the grain size and the aging coarsened grain size. The grain size had a pronounced effect on the creep strain rates and rupture lifetimes.
讨论了添加元素和时效对SnBi钎料体系蠕变性能的影响。对未时效和时效的SnBi、SnBiAg和SnBiAgCuNiGe钎料在3种温度下进行蠕变试验,探讨了不同温度对其蠕变断裂寿命和蠕变应变率的影响。添加元素降低了蠕变应变速率,延长了蠕变断裂寿命。从EBSD观测结果讨论了影响的原因。添加元素使晶粒尺寸减小,使晶粒尺寸时效变粗。晶粒尺寸对蠕变应变速率和断裂寿命有显著影响。
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引用次数: 0
Electrical measurement and analysis of TSV/RDL for 3D integration 三维集成TSV/RDL的电测量与分析
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028399
Xin Sun, R. Fang, Yunhui Zhu, Xiao Zhong, Yuan Bian, Shengli Ma, M. Miao, J. Chen, Yan Wang, Yufeng Jin
In this paper, electrical measurement and analysis of TSV/RDL is carried out, to evaluate the fabrication process and get a comprehensive understanding of electrical properties of TSV/RDL interconnect structures. DC resistance, leakage current and high frequency characterization are implemented. TSV shows a spreading distribution of DC resistance, with minimum of 4.3 mΩ. Leakage current of TSV reaches 150nA up to 30V without breakdown. Low substrate resistivity lowers the high frequency performance of TSV.
本文对TSV/RDL进行了电学测量和分析,以评价TSV/RDL互连结构的制作工艺,全面了解TSV/RDL互连结构的电学性能。实现了直流电阻、漏电流和高频特性。TSV直流电阻呈扩张性分布,最小值为4.3 mΩ。TSV漏电流可达150nA至30V而不击穿。低衬底电阻率降低了TSV的高频性能。
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引用次数: 4
Etch-hole design in encapsulation for better robustness 封装中的蚀刻孔设计,具有更好的坚固性
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028256
Jaewung Lee, J. Sharma, S. Merugu, Navab Singh
This paper reports various etch-hole schemes based on the location and quantities of etch holes to improve robustness of the Thin Film Encapsulation (TFE). In order to achieve robust TFE, different etch hole mapping is performed on the cap layer and robustness of TFE was evaluated by measuring the height of the TFE using optical profiler measurement after sealing. For demonstrating the TFE, amorphous Si and AlN (or SiO2) were used as a sacrificial layer and the cap layer, respectively. Etching of a-Si sacrificial layer was performed with help of XeF2. Experimental result shows that the quantity of etch holes and their location on the cap layer influence the downward deformation of the TFE after sealing process. A uniformly distributed etch holes scheme is effective in controlling the stress of encapsulation which results in low downward deformation..
为了提高薄膜封装(TFE)的稳健性,本文根据蚀刻孔的位置和数量,提出了不同的蚀刻孔方案。为了获得坚固的TFE,在帽层上进行不同的蚀刻孔映射,并在密封后使用光学剖面仪测量TFE的高度来评估TFE的坚固性。为了证明TFE,非晶态Si和AlN(或SiO2)分别作为牺牲层和帽层。利用XeF2进行了a-Si牺牲层的刻蚀。实验结果表明,孔的数量和孔在帽层上的位置影响密封后TFE的向下变形。采用均匀分布的蚀刻孔方案可以有效地控制封装应力,从而实现低的向下变形。
{"title":"Etch-hole design in encapsulation for better robustness","authors":"Jaewung Lee, J. Sharma, S. Merugu, Navab Singh","doi":"10.1109/EPTC.2014.7028256","DOIUrl":"https://doi.org/10.1109/EPTC.2014.7028256","url":null,"abstract":"This paper reports various etch-hole schemes based on the location and quantities of etch holes to improve robustness of the Thin Film Encapsulation (TFE). In order to achieve robust TFE, different etch hole mapping is performed on the cap layer and robustness of TFE was evaluated by measuring the height of the TFE using optical profiler measurement after sealing. For demonstrating the TFE, amorphous Si and AlN (or SiO2) were used as a sacrificial layer and the cap layer, respectively. Etching of a-Si sacrificial layer was performed with help of XeF2. Experimental result shows that the quantity of etch holes and their location on the cap layer influence the downward deformation of the TFE after sealing process. A uniformly distributed etch holes scheme is effective in controlling the stress of encapsulation which results in low downward deformation..","PeriodicalId":115713,"journal":{"name":"2014 IEEE 16th Electronics Packaging Technology Conference (EPTC)","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132320417","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Thermal and mechanical reliability of low-temperature solder alloys for handheld devices 手持设备用低温焊料合金的热可靠性和机械可靠性
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028385
M. Ribas, Sujatha Chegudi, Anilesh Kumar, R. Pandher, R. Raut, S. Mukherjee, S. Sarkar, Bawa Singh
Low temperature alloys are used to achieve peak reflow temperatures from 170 to 200°C. Sn-Bi alloy stands as logic choices due to its low melting point, higher strength and low cost. However, use of Sn42-Bi58 alloy as soldering material is limited by a series of drawbacks such as low ductility, and poor thermal and mechanical reliability. Here we show how the use of micro-additives in eutectic Sn-Bi alloys improves thermal fatigue and mechanical shock properties. The basic properties of the new alloys shown here were fully characterized and their use in SMT applications evaluated, especially in drop shock and temperature cycling tests. Among the new alloys proposed, alloy B demonstrates superior mechanical properties, thermal cycling, drop shock and creep resistance, against benchmarks. Use of this new alloy in applications such as portable devices, PV ribbons and high efficiency LEDs will be highly beneficial due to its superior performance.
低温合金用于达到170至200°C的峰值回流温度。锡铋合金因其熔点低、强度高、成本低而成为逻辑选择。然而,Sn42-Bi58合金作为焊接材料的使用受到一系列缺陷的限制,如延展性低,热可靠性和机械可靠性差。在这里,我们展示了在共晶Sn-Bi合金中使用微添加剂如何改善热疲劳和机械冲击性能。本文对新合金的基本性能进行了全面表征,并对其在SMT应用中的应用进行了评估,特别是在跌落冲击和温度循环测试中。在新提出的合金中,合金B具有优异的机械性能、热循环、抗跌落冲击和抗蠕变性能。由于其优越的性能,这种新合金在便携式设备,光伏带和高效led等应用中的使用将非常有益。
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引用次数: 3
An automatic visual system to identify and estimate ionic contamination in printed circuit boards using electrochemical migration patterns 一种利用电化学迁移模式识别和估计印刷电路板中离子污染的自动视觉系统
Pub Date : 2014-12-01 DOI: 10.1109/EPTC.2014.7028406
H. Villanueva, M. Mena, P. Naval
Detection and estimation of ionic contamination in electronics is important, in order to ensure manufacturing quality by detecting the cause and preventing failure mechanisms such as electrochemical migration (ECM). However, such tests require expensive, specialized equipment. This paper proposes a low-cost, automatic, visual-based method, in which the ionic contamination profile of a printed circuit board is determined through the analysis of shape and color features of optical microscope images of ECM failures. Images of copper dendrites were acquired through the water drop test using solutions contaminated with NaCl and Na2SO4 from 10-50 ppm, in steps of 10. Thresholding and connected component analysis were used to segment the shorting dendrite. The method used three types of features: global and local shape features, and color features. Two feature selection methods, ReliefF and Correlation-based Feature Selection (CFS) were also tested to measure feature quality and to determine the best feature subsets. The predictive model used was feature-weighted k-nearest neighbor. The study determined that copper dendrites produced with sodium sulfate contaminant were larger and denser compared to sodium chloride. Increasing the amount of contaminant also increased the density of the pattern. At higher sodium sulfate contamination levels, dendrites tended to have reddish tips, while with sodium chloride, branch shapes transitioned from a well-defined appearance to a “stringy” appearance. The system was able to distinguish between the two contaminants at 97.3%, while using only eight descriptors. The system was also able to distinguish between five closely-spaced contaminant levels at 63.38% and 57.14% accuracy for sodium chloride and sodium sulfate respectively. Local shape features, which were not used in previous work, were found to be generally more useful compared to global shape features.
电子产品中离子污染的检测和评估是重要的,通过检测原因和防止电化学迁移(ECM)等失效机制来保证制造质量。然而,这种测试需要昂贵的专用设备。本文提出了一种低成本、自动的、基于视觉的方法,该方法通过分析ECM故障的光学显微镜图像的形状和颜色特征来确定印刷电路板的离子污染特征。采用10- 50ppm的NaCl和Na2SO4污染溶液,分10步进行水滴试验,获得铜枝晶图像。采用阈值法和连通成分分析法对短枝进行分割。该方法使用了三种类型的特征:全局和局部形状特征以及颜色特征。对ReliefF和基于关联的特征选择(Correlation-based feature selection, CFS)两种特征选择方法进行了测试,以衡量特征质量并确定最佳特征子集。使用的预测模型是特征加权k近邻。研究发现,与氯化钠相比,硫酸钠污染产生的铜枝晶更大、密度更大。增加污染物的量也增加了图案的密度。在较高的硫酸钠污染水平下,树突往往有红色的尖端,而在氯化钠污染下,树枝形状从明确的外观转变为“丝状”外观。该系统在仅使用8个描述符的情况下,区分两种污染物的准确率为97.3%。该系统还能够区分五种紧密间隔的污染物水平,氯化钠和硫酸钠的准确率分别为63.38%和57.14%。与全局形状特征相比,以前工作中没有使用的局部形状特征通常更有用。
{"title":"An automatic visual system to identify and estimate ionic contamination in printed circuit boards using electrochemical migration patterns","authors":"H. Villanueva, M. Mena, P. Naval","doi":"10.1109/EPTC.2014.7028406","DOIUrl":"https://doi.org/10.1109/EPTC.2014.7028406","url":null,"abstract":"Detection and estimation of ionic contamination in electronics is important, in order to ensure manufacturing quality by detecting the cause and preventing failure mechanisms such as electrochemical migration (ECM). However, such tests require expensive, specialized equipment. This paper proposes a low-cost, automatic, visual-based method, in which the ionic contamination profile of a printed circuit board is determined through the analysis of shape and color features of optical microscope images of ECM failures. Images of copper dendrites were acquired through the water drop test using solutions contaminated with NaCl and Na2SO4 from 10-50 ppm, in steps of 10. Thresholding and connected component analysis were used to segment the shorting dendrite. The method used three types of features: global and local shape features, and color features. Two feature selection methods, ReliefF and Correlation-based Feature Selection (CFS) were also tested to measure feature quality and to determine the best feature subsets. The predictive model used was feature-weighted k-nearest neighbor. The study determined that copper dendrites produced with sodium sulfate contaminant were larger and denser compared to sodium chloride. Increasing the amount of contaminant also increased the density of the pattern. At higher sodium sulfate contamination levels, dendrites tended to have reddish tips, while with sodium chloride, branch shapes transitioned from a well-defined appearance to a “stringy” appearance. The system was able to distinguish between the two contaminants at 97.3%, while using only eight descriptors. The system was also able to distinguish between five closely-spaced contaminant levels at 63.38% and 57.14% accuracy for sodium chloride and sodium sulfate respectively. Local shape features, which were not used in previous work, were found to be generally more useful compared to global shape features.","PeriodicalId":115713,"journal":{"name":"2014 IEEE 16th Electronics Packaging Technology Conference (EPTC)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131963725","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2014 IEEE 16th Electronics Packaging Technology Conference (EPTC)
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