首页 > 最新文献

1993 (5th) International Conference on Indium Phosphide and Related Materials最新文献

英文 中文
On the production of semi-insulating buried layers in epitaxially grown InP by Fe ion implantation 铁离子注入外延生长InP制备半绝缘埋层的研究
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380641
A. Carnera, A. Gasparotto, M. Caldironi, S. Pellegrino, M. Tromby, F. Vidimari, C. Frigeri
The realization of a semi-insulating buried layer in a InP-based epitaxial structure is discussed by the selective ion implantation of Fe. Results indicate the feasibility of the production of a buried semi-insulating, current-blocking region with the selective implant of Fe into InP followed by an epitaxial overgrowth. The study of the involved physical processes revealed many interesting aspects. A strong difference is evidenced between the annealing behavior of samples implanted above or below the amorphization threshold. Particular attention has been devoted to the study of the solid phase epitaxial growth of the amorphous layer and of the Fe redistribution and segregation mechanisms.<>
讨论了利用选择性离子注入铁在inp基外延结构中实现半绝缘埋层的方法。结果表明,通过选择性地向InP中植入铁,然后进行外延过度生长,可以制造出埋藏的半绝缘电流阻断区。对相关物理过程的研究揭示了许多有趣的方面。在非晶化阈值以上或以下植入样品的退火行为之间存在明显差异。重点研究了非晶层的固相外延生长和铁的重分布和偏析机制
{"title":"On the production of semi-insulating buried layers in epitaxially grown InP by Fe ion implantation","authors":"A. Carnera, A. Gasparotto, M. Caldironi, S. Pellegrino, M. Tromby, F. Vidimari, C. Frigeri","doi":"10.1109/ICIPRM.1993.380641","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380641","url":null,"abstract":"The realization of a semi-insulating buried layer in a InP-based epitaxial structure is discussed by the selective ion implantation of Fe. Results indicate the feasibility of the production of a buried semi-insulating, current-blocking region with the selective implant of Fe into InP followed by an epitaxial overgrowth. The study of the involved physical processes revealed many interesting aspects. A strong difference is evidenced between the annealing behavior of samples implanted above or below the amorphization threshold. Particular attention has been devoted to the study of the solid phase epitaxial growth of the amorphous layer and of the Fe redistribution and segregation mechanisms.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"142 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132761104","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Properties of heteroepitaxial InP solar cells at variable proton energies 变质子能下异质外延InP太阳能电池的性能
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380670
I. Weinberg, C. K. Swartz, H. Curtis, D. Brinker, C. Vargas-Aburto
InP solar cells, epitaxially grown on GaAs substrates with intervening Ga/sub x/In/sub 1-x/As layers, were irradiated by protons over a range of energies from 10 to 0.5 MeV. Cell performance, temperature dependencies and carrier removal were determined over this energy range. The superior radiation resistance of these cells was due to an excessively small pre-irradiation diffusion length, attributable to a high dislocation density. This latter factor was also found to be dominant in the temperature dependency of open circuit voltage. Carrier removal was found to be inversely proportional to energy while radiation resistance decreased with decreasing proton energy, the proton range being the dominant factor in determining the behavior of these cell properties.<>
在GaAs衬底上外延生长的InP太阳能电池,中间有Ga/sub x/In/sub 1-x/As层,用能量在10到0.5 MeV范围内的质子照射。在此能量范围内确定了电池性能,温度依赖性和载流子去除。由于位错密度高,辐照前扩散长度过小,因此具有优异的抗辐射性能。后一个因素也被发现在开路电压的温度依赖性中占主导地位。发现载流子的去除与能量成反比,而辐射阻力随着质子能量的降低而降低,质子范围是决定这些细胞特性行为的主要因素。
{"title":"Properties of heteroepitaxial InP solar cells at variable proton energies","authors":"I. Weinberg, C. K. Swartz, H. Curtis, D. Brinker, C. Vargas-Aburto","doi":"10.1109/ICIPRM.1993.380670","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380670","url":null,"abstract":"InP solar cells, epitaxially grown on GaAs substrates with intervening Ga/sub x/In/sub 1-x/As layers, were irradiated by protons over a range of energies from 10 to 0.5 MeV. Cell performance, temperature dependencies and carrier removal were determined over this energy range. The superior radiation resistance of these cells was due to an excessively small pre-irradiation diffusion length, attributable to a high dislocation density. This latter factor was also found to be dominant in the temperature dependency of open circuit voltage. Carrier removal was found to be inversely proportional to energy while radiation resistance decreased with decreasing proton energy, the proton range being the dominant factor in determining the behavior of these cell properties.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132210611","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Double doping: A method to decrease dislocation densities in LEC InP crystals 双掺杂:一种降低LEC InP晶体位错密度的方法
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380612
B.A. Dedavid, R. Fornari, M. Moriglioni, J. Kumar, S. Anbukumar, M. Taddia, M. Battagliarin, E. Sentimenti
The authors report on the growth of low-dislocation density low-carrier concentration p-type InP via codoping with CdTe. Four crystals were grown by the liquid encapsulated Czochralski (LEC) technique. The results of electrical and analytical studies suggest that both cadmium and tellurium undergo some chemical reactions before pulling, so that only a minor fraction of the added impurities is available for doping. The effectiveness of this codoping in terms of dislocation density reduction has been confirmed by the structural investigations carried out on the four crystals with low free carrier concentrations. The role of multiple doping as a strategy for dislocation reduction is discussed.<>
本文报道了通过与CdTe共掺杂生长低位错密度、低载流子浓度的p型InP。采用液体包封法(LEC)生长了4个晶体。电学和分析研究的结果表明,镉和碲在拉伸前都会发生一些化学反应,因此只有一小部分添加的杂质可用于掺杂。通过对四种低自由载流子浓度晶体的结构研究,证实了这种共掺杂在降低位错密度方面的有效性。讨论了多重掺杂作为位错还原策略的作用。
{"title":"Double doping: A method to decrease dislocation densities in LEC InP crystals","authors":"B.A. Dedavid, R. Fornari, M. Moriglioni, J. Kumar, S. Anbukumar, M. Taddia, M. Battagliarin, E. Sentimenti","doi":"10.1109/ICIPRM.1993.380612","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380612","url":null,"abstract":"The authors report on the growth of low-dislocation density low-carrier concentration p-type InP via codoping with CdTe. Four crystals were grown by the liquid encapsulated Czochralski (LEC) technique. The results of electrical and analytical studies suggest that both cadmium and tellurium undergo some chemical reactions before pulling, so that only a minor fraction of the added impurities is available for doping. The effectiveness of this codoping in terms of dislocation density reduction has been confirmed by the structural investigations carried out on the four crystals with low free carrier concentrations. The role of multiple doping as a strategy for dislocation reduction is discussed.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133116157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Monolithic integration of 2 /spl times/ 2 switch and optical amplifiers with 0 dB fibre to fibre insertion loss grown by LP-MOCVD 2 /spl倍/ 2开关和光放大器的单片集成,光纤到光纤的插入损耗由LP-MOCVD增加为0 dB
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380705
G. Glastre, D. Rondi, S. Leger, A. Enard, E. Lallier, R. Blondeau, M. Papuchon
The fabrication and characteristics of the monolithic integration of a GaInAsP-InP 2 /spl times/ 2 switch with optical amplifiers are reported. The switch device is a current injection tuned directional coupler, which can be designed for wavelength and polarization independence. This component exhibits a 0 dB fiber to fiber insertion loss at 1.5 /spl mu/m with 17 dB extinction ratio and less than 6 mA driving current to switch from bar to cross state.<>
本文报道了单片集成gainasp - inp2 /spl倍/ 2开关与光放大器的制作及其特性。开关器件是一个电流注入调谐定向耦合器,可以设计为波长和偏振无关。该元件的光纤间插入损耗为0 dB,为1.5 /spl mu/m,消光比为17 dB,驱动电流小于6 mA,从bar状态切换到cross状态
{"title":"Monolithic integration of 2 /spl times/ 2 switch and optical amplifiers with 0 dB fibre to fibre insertion loss grown by LP-MOCVD","authors":"G. Glastre, D. Rondi, S. Leger, A. Enard, E. Lallier, R. Blondeau, M. Papuchon","doi":"10.1109/ICIPRM.1993.380705","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380705","url":null,"abstract":"The fabrication and characteristics of the monolithic integration of a GaInAsP-InP 2 /spl times/ 2 switch with optical amplifiers are reported. The switch device is a current injection tuned directional coupler, which can be designed for wavelength and polarization independence. This component exhibits a 0 dB fiber to fiber insertion loss at 1.5 /spl mu/m with 17 dB extinction ratio and less than 6 mA driving current to switch from bar to cross state.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"254 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114409702","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Large area InGaAs MSM photodetectors 大面积InGaAs MSM光电探测器
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380617
F. Hieronymi, E. H. Bottcher, E. Droge, D. Kuhl, D. Bimberg
The authors report on high-performance InGaAs metal-semiconductor-metal (MSM) photodetectors for large area applications. Fe-doping was employed to obtain the high-resistivity InGaAs:Fe photoactive layer and the InP:Fe Schottky-barrier enhancement layer. The fabricated interdigitated MSM detectors have an active area of 350 /spl mu/m /spl times/ 350 /spl mu/m. At typical operating bias of 10 V, a capacitance of 1.6 pF and almost 1 GHz electrical bandwidth was achieved. The devices are very attractive for large area photoreceivers since they consume high-sensitivity and large-bandwidth operation due to low capacitive loading.<>
作者报道了用于大面积应用的高性能InGaAs金属-半导体-金属(MSM)光电探测器。采用Fe掺杂获得了高电阻率InGaAs:Fe光活性层和InP:Fe肖特基势垒增强层。所制备的交叉数字MSM探测器的有效面积为350 /spl μ m /spl倍/ 350 /spl μ m /m。在典型的工作偏置为10 V时,实现了1.6 pF的电容和近1 GHz的电带宽。由于低容性负载,该器件消耗高灵敏度和大带宽操作,因此对于大面积光电接收器非常有吸引力。
{"title":"Large area InGaAs MSM photodetectors","authors":"F. Hieronymi, E. H. Bottcher, E. Droge, D. Kuhl, D. Bimberg","doi":"10.1109/ICIPRM.1993.380617","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380617","url":null,"abstract":"The authors report on high-performance InGaAs metal-semiconductor-metal (MSM) photodetectors for large area applications. Fe-doping was employed to obtain the high-resistivity InGaAs:Fe photoactive layer and the InP:Fe Schottky-barrier enhancement layer. The fabricated interdigitated MSM detectors have an active area of 350 /spl mu/m /spl times/ 350 /spl mu/m. At typical operating bias of 10 V, a capacitance of 1.6 pF and almost 1 GHz electrical bandwidth was achieved. The devices are very attractive for large area photoreceivers since they consume high-sensitivity and large-bandwidth operation due to low capacitive loading.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116490351","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Magneto-transport properties of strained GaInAs/InP single quantum wells 应变GaInAs/InP单量子阱的磁输运性质
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380677
V. Harle, H. Bolay, J. Hugo, F. Scholz, B. Meyer, M. Drechsler, C. Wetzel, B. Kowalski, P. Omling
Using magnetic and magneto-optical methods, the authors were able to determine various material parameters of the strained system GaInAs in InP. To investigate some of these parameters, they have grown various modulation doped single quantum wells. The quantum well composition of Ga/sub x/In/sub 1-x/As was varied from x = 0.4 to 0.55 and the well width from 1 to 15 nm. The effective in-plane electron masses were measured for the various compositions using cyclotron resonance and temperature dependent Shubnikov-de Haas measurements (SdH). The dependency of the carrier mobility of n- and p-modulation doped samples on the well width and the composition were investigated by the use of SdH and Hall measurements at 4 K and 77 K. Optical detected magnetic resonance investigations were carried out to determine the hole/electron g-factors.<>
利用磁性和磁光方法,作者能够确定InP中应变体系GaInAs的各种材料参数。为了研究这些参数,他们培育了各种调制掺杂的单量子阱。Ga/sub x/In/sub 1-x/As的量子阱组成变化范围为x = 0.4 ~ 0.55,量子阱宽度为1 ~ 15 nm。利用回旋共振和温度相关的舒布尼科夫-德哈斯测量(SdH)测量了不同成分的有效面内电子质量。通过在4 K和77 K下的SdH和Hall测量,研究了n和p调制掺杂样品的载流子迁移率与阱宽度和组成的关系。采用光学探测磁共振法测定空穴/电子g因子
{"title":"Magneto-transport properties of strained GaInAs/InP single quantum wells","authors":"V. Harle, H. Bolay, J. Hugo, F. Scholz, B. Meyer, M. Drechsler, C. Wetzel, B. Kowalski, P. Omling","doi":"10.1109/ICIPRM.1993.380677","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380677","url":null,"abstract":"Using magnetic and magneto-optical methods, the authors were able to determine various material parameters of the strained system GaInAs in InP. To investigate some of these parameters, they have grown various modulation doped single quantum wells. The quantum well composition of Ga/sub x/In/sub 1-x/As was varied from x = 0.4 to 0.55 and the well width from 1 to 15 nm. The effective in-plane electron masses were measured for the various compositions using cyclotron resonance and temperature dependent Shubnikov-de Haas measurements (SdH). The dependency of the carrier mobility of n- and p-modulation doped samples on the well width and the composition were investigated by the use of SdH and Hall measurements at 4 K and 77 K. Optical detected magnetic resonance investigations were carried out to determine the hole/electron g-factors.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114656418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multi-wafer MOCVD growth of highly uniform InGaAsP strained quantum well structure for low threshold 1.3 /spl mu/m lasers 低阈值1.3 /spl μ m激光器高均匀InGaAsP应变量子阱结构的多晶片MOCVD生长
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380667
K. Mori, M. Takemi, T. Takiguchi, K. Goto, T. Nishimura, T. Kimura, Y. Mihashi, T. Murotani
The authors demonstrated a successful multi-wafer growth for the 1.3 /spl mu/m InGaAsP strained multiple quantum well (MQW) lasers. Excellent uniformity of composition and thickness was realized by optimizing the growth conditions. The standard deviation of photoluminescence (PL) wavelength of InGaAsP layer over a 2 inch wafer is 4 nm, which is the lowest value for the multi-wafer growth. For a strained MQW structure, the standard deviation in PL wavelength of 7nm has been obtained. Buried-heterostructure lasers have been fabricated using the multi-wafer metal-organic chemical vapor deposition growth. The lasers exhibit very low threshold current over wide temperature range and low operating current of 26 mA was obtained even at 80/spl deg/C with 5 mW continuous wave (CW) output.<>
作者展示了1.3 /spl mu/m InGaAsP应变多量子阱(MQW)激光器的成功多晶片生长。通过优化生长条件,实现了良好的成分均匀性和厚度均匀性。InGaAsP层在2英寸晶圆上的光致发光(PL)波长标准差为4 nm,这是多晶圆生长的最低值。对于应变MQW结构,得到了在PL波长7nm处的标准偏差。采用多晶片金属有机化学气相沉积生长技术制备了埋藏异质结构激光器。该激光器在宽温度范围内具有非常低的阈值电流,即使在80/spl度/C和5 mW连续波(CW)输出下,也能获得26 mA的低工作电流
{"title":"Multi-wafer MOCVD growth of highly uniform InGaAsP strained quantum well structure for low threshold 1.3 /spl mu/m lasers","authors":"K. Mori, M. Takemi, T. Takiguchi, K. Goto, T. Nishimura, T. Kimura, Y. Mihashi, T. Murotani","doi":"10.1109/ICIPRM.1993.380667","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380667","url":null,"abstract":"The authors demonstrated a successful multi-wafer growth for the 1.3 /spl mu/m InGaAsP strained multiple quantum well (MQW) lasers. Excellent uniformity of composition and thickness was realized by optimizing the growth conditions. The standard deviation of photoluminescence (PL) wavelength of InGaAsP layer over a 2 inch wafer is 4 nm, which is the lowest value for the multi-wafer growth. For a strained MQW structure, the standard deviation in PL wavelength of 7nm has been obtained. Buried-heterostructure lasers have been fabricated using the multi-wafer metal-organic chemical vapor deposition growth. The lasers exhibit very low threshold current over wide temperature range and low operating current of 26 mA was obtained even at 80/spl deg/C with 5 mW continuous wave (CW) output.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128218580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Perspectives of the VGF growth process for the preparation of low-defect InP substrate crystals VGF生长制备低缺陷InP衬底晶体的研究进展
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380710
G. Muller, D. Hofmann, N. Schafer
The current status of LEC (liquid encapsulated Czochralski)-type growth processes and vertical gradient freeze (VGF)-growth of InP substrate crystals is reviewed. The twinning problem presently limiting the VGF potential is discussed and strategies to overcome this defect are considered. A new type of VGF multizone furnace is introduced. VGF processing under defined thermal and constitutional boundary conditions in this apparatus based on a recently developed global numerical model offers new perspectives for the growth of low-defect InP single crystals.<>
综述了液态封装式生长工艺和垂直梯度冻结法生长InP衬底晶体的研究现状。讨论了目前限制VGF潜力的孪生问题,并考虑了克服这一缺陷的策略。介绍了一种新型VGF多区炉。基于最近开发的全局数值模型,在该装置中在定义的热和本构边界条件下加工VGF,为低缺陷InP单晶的生长提供了新的视角
{"title":"Perspectives of the VGF growth process for the preparation of low-defect InP substrate crystals","authors":"G. Muller, D. Hofmann, N. Schafer","doi":"10.1109/ICIPRM.1993.380710","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380710","url":null,"abstract":"The current status of LEC (liquid encapsulated Czochralski)-type growth processes and vertical gradient freeze (VGF)-growth of InP substrate crystals is reviewed. The twinning problem presently limiting the VGF potential is discussed and strategies to overcome this defect are considered. A new type of VGF multizone furnace is introduced. VGF processing under defined thermal and constitutional boundary conditions in this apparatus based on a recently developed global numerical model offers new perspectives for the growth of low-defect InP single crystals.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"12 3","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133287514","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Loss and index change in GaInAsP/InP multiple quantum well QCSE tuning element for surface emitting lasers 表面发射激光器GaInAsP/InP多量子阱QCSE调谐元件损耗及折射率变化
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380604
N. Yokouchi, T. Uchida, T. Miyamoto, Y. Inaba, K. Mori, F. Koyama, K. Iga
The authors investigated some fundamental characteristics of chemical beam epitaxy (CBE) grown GaInAsP/InP multiple quantum wells (MQWs) for a wavelength tuner and estimated the wavelength shift for realizing wavelength tunable surface emitting (SE) lasers. They observed the quantum confined Stark effect in a GaInAsP/InP MQW structure grown by CBE and estimated the refractive index change, which was as large as 1%. By using these results, the possibility realizing a wavelength tunable SE laser with a MQW tuner is exhibited and the maximum wavelength change is expected to be as large as 7/spl Aring/.<>
研究了用于波长调谐器的化学束外延(CBE)生长GaInAsP/InP多量子阱(MQWs)的一些基本特性,并估计了实现波长可调谐表面发射(SE)激光器的波长位移。他们在CBE生长的GaInAsP/InP MQW结构中观察到量子受限的Stark效应,并估计折射率变化高达1%。利用这些结果,展示了利用MQW调谐器实现波长可调谐SE激光器的可能性,并且最大波长变化有望达到7/spl / /。
{"title":"Loss and index change in GaInAsP/InP multiple quantum well QCSE tuning element for surface emitting lasers","authors":"N. Yokouchi, T. Uchida, T. Miyamoto, Y. Inaba, K. Mori, F. Koyama, K. Iga","doi":"10.1109/ICIPRM.1993.380604","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380604","url":null,"abstract":"The authors investigated some fundamental characteristics of chemical beam epitaxy (CBE) grown GaInAsP/InP multiple quantum wells (MQWs) for a wavelength tuner and estimated the wavelength shift for realizing wavelength tunable surface emitting (SE) lasers. They observed the quantum confined Stark effect in a GaInAsP/InP MQW structure grown by CBE and estimated the refractive index change, which was as large as 1%. By using these results, the possibility realizing a wavelength tunable SE laser with a MQW tuner is exhibited and the maximum wavelength change is expected to be as large as 7/spl Aring/.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134285965","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Physical modeling and experimental study of the InP MISFET for power applications 功率用InP MISFET的物理建模与实验研究
Pub Date : 1993-04-19 DOI: 10.1109/ICIPRM.1993.380588
I. Mouatakif, J.C. DeJaeger, M. Lefebvre, G. Salmer, G. Post
A theoretical and experimental investigation of the InP metal-insulated semiconductor FET (MISFET) is presented. It is based on a 2-D hydrodynamic model in order to study the physical behavior of the device making it possible to simulate depletion and enhancement operating modes. A complete microwave characterization has been done to validate the theoretical results and show the technological difficulties for making such devices. Power measurements are also presented using an active load pull power bench.<>
本文对InP金属绝缘半导体场效应管(MISFET)进行了理论和实验研究。它基于二维流体动力学模型,以便研究装置的物理行为,从而可以模拟耗尽和增强操作模式。完成了一个完整的微波表征,以验证理论结果,并显示了制造这种器件的技术困难。功率测量也提出了使用有源负载拉动式功率台。
{"title":"Physical modeling and experimental study of the InP MISFET for power applications","authors":"I. Mouatakif, J.C. DeJaeger, M. Lefebvre, G. Salmer, G. Post","doi":"10.1109/ICIPRM.1993.380588","DOIUrl":"https://doi.org/10.1109/ICIPRM.1993.380588","url":null,"abstract":"A theoretical and experimental investigation of the InP metal-insulated semiconductor FET (MISFET) is presented. It is based on a 2-D hydrodynamic model in order to study the physical behavior of the device making it possible to simulate depletion and enhancement operating modes. A complete microwave characterization has been done to validate the theoretical results and show the technological difficulties for making such devices. Power measurements are also presented using an active load pull power bench.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132399676","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
1993 (5th) International Conference on Indium Phosphide and Related Materials
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1