Pub Date : 2024-02-19DOI: 10.1016/j.ultramic.2024.113941
D.G. Şentürk , A. De Backer , S. Van Aert
In this paper, a methodology is presented to count the number of atoms in heterogeneous nanoparticles based on the combination of multiple annular dark field scanning transmission electron microscopy (ADF STEM) images. The different non-overlapping annular detector collection regions are selected based on the principles of optimal statistical experiment design for the atom-counting problem. To count the number of atoms, the total intensities of scattered electrons for each atomic column, the so-called scattering cross-sections, are simultaneously compared with simulated library values for the different detector regions by minimising the squared differences. The performance of the method is evaluated for simulated Ni@Pt and Au@Ag core–shell nanoparticles. Our approach turns out to be a dose efficient alternative for the investigation of beam-sensitive heterogeneous materials as compared to the combination of ADF STEM and energy dispersive X-ray spectroscopy.
{"title":"Element specific atom counting for heterogeneous nanostructures: Combining multiple ADF STEM images for simultaneous thickness and composition determination","authors":"D.G. Şentürk , A. De Backer , S. Van Aert","doi":"10.1016/j.ultramic.2024.113941","DOIUrl":"10.1016/j.ultramic.2024.113941","url":null,"abstract":"<div><p>In this paper, a methodology is presented to count the number of atoms in heterogeneous nanoparticles based on the combination of multiple annular dark field scanning transmission electron microscopy (ADF STEM) images. The different non-overlapping annular detector collection regions are selected based on the principles of optimal statistical experiment design for the atom-counting problem. To count the number of atoms, the total intensities of scattered electrons for each atomic column, the so-called scattering cross-sections, are simultaneously compared with simulated library values for the different detector regions by minimising the squared differences. The performance of the method is evaluated for simulated Ni@Pt and Au@Ag core–shell nanoparticles. Our approach turns out to be a dose efficient alternative for the investigation of beam-sensitive heterogeneous materials as compared to the combination of ADF STEM and energy dispersive X-ray spectroscopy.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113941"},"PeriodicalIF":2.2,"publicationDate":"2024-02-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139921818","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-02-15DOI: 10.1016/j.ultramic.2024.113937
Vadimas Ivinskij , Antanas Zinovicius , Andrius Dzedzickis , Jurga Subaciute-Zemaitiene , Juste Rozene , Vytautas Bucinskas , Eugenijus Macerauskas , Sonata Tolvaisiene , Inga Morkvenaite-Vilkonciene
Scanning electrochemical microscopy (SECM) is a scanning probe microscope with an ultramicroelectrode (UME) as a probe. The technique is advantageous in the characterization of the electrochemical properties of surfaces. However, the limitations, such as slow imaging and many functions depending on the user, only allow us to use some of the possibilities. Therefore, we applied visual recognition and machine learning to detect micro-objects from the image and determine their electrochemical activity. The reconstruction of the image from several approach curves allows it to scan faster and detect active areas of the sample. Therefore, the scanning time and presence of the user is diminished. An automated scanning electrochemical microscope with visual recognition has been developed using commercially available modules, relatively low-cost components, design, software solutions proven in other fields, and an original control and data fusion algorithm.
{"title":"Fast detection of micro-objects using scanning electrochemical microscopy based on visual recognition and machine learning","authors":"Vadimas Ivinskij , Antanas Zinovicius , Andrius Dzedzickis , Jurga Subaciute-Zemaitiene , Juste Rozene , Vytautas Bucinskas , Eugenijus Macerauskas , Sonata Tolvaisiene , Inga Morkvenaite-Vilkonciene","doi":"10.1016/j.ultramic.2024.113937","DOIUrl":"https://doi.org/10.1016/j.ultramic.2024.113937","url":null,"abstract":"<div><p>Scanning electrochemical microscopy (SECM) is a scanning probe microscope with an ultramicroelectrode (UME) as a probe. The technique is advantageous in the characterization of the electrochemical properties of surfaces. However, the limitations, such as slow imaging and many functions depending on the user, only allow us to use some of the possibilities. Therefore, we applied visual recognition and machine learning to detect micro-objects from the image and determine their electrochemical activity. The reconstruction of the image from several approach curves allows it to scan faster and detect active areas of the sample. Therefore, the scanning time and presence of the user is diminished. An automated scanning electrochemical microscope with visual recognition has been developed using commercially available modules, relatively low-cost components, design, software solutions proven in other fields, and an original control and data fusion algorithm.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113937"},"PeriodicalIF":2.2,"publicationDate":"2024-02-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139738274","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Four-dimensional Scanning Transmission Electron Microscopy (4D-STEM) is a powerful technique for high-resolution and high-precision materials characterization at multiple length scales, including the characterization of beam-sensitive materials. However, the field of view of 4D-STEM is relatively small, which in absence of live processing is limited by the data size required for storage. Furthermore, the rectilinear scan approach currently employed in 4D-STEM places a resolution- and signal-dependent dose limit for the study of beam sensitive materials. Improving 4D-STEM data and dose efficiency, by keeping the data size manageable while limiting the amount of electron dose, is thus critical for broader applications. Here we introduce a general method for reconstructing 4D-STEM data with subsampling in both real and reciprocal spaces at high fidelity. The approach is first tested on the subsampled datasets created from a full 4D-STEM dataset, and then demonstrated experimentally using random scan in real-space. The same reconstruction algorithm can also be used for compression of 4D-STEM datasets, leading to a large reduction (100 times or more) in data size, while retaining the fine features of 4D-STEM imaging, for crystalline samples.
{"title":"Framework of compressive sensing and data compression for 4D-STEM","authors":"Hsu-Chih Ni , Renliang Yuan , Jiong Zhang , Jian-Min Zuo","doi":"10.1016/j.ultramic.2024.113938","DOIUrl":"https://doi.org/10.1016/j.ultramic.2024.113938","url":null,"abstract":"<div><p>Four-dimensional Scanning Transmission Electron Microscopy (4D-STEM) is a powerful technique for high-resolution and high-precision materials characterization at multiple length scales, including the characterization of beam-sensitive materials. However, the field of view of 4D-STEM is relatively small, which in absence of live processing is limited by the data size required for storage. Furthermore, the rectilinear scan approach currently employed in 4D-STEM places a resolution- and signal-dependent dose limit for the study of beam sensitive materials. Improving 4D-STEM data and dose efficiency, by keeping the data size manageable while limiting the amount of electron dose, is thus critical for broader applications. Here we introduce a general method for reconstructing 4D-STEM data with subsampling in both real and reciprocal spaces at high fidelity. The approach is first tested on the subsampled datasets created from a full 4D-STEM dataset, and then demonstrated experimentally using random scan in real-space. The same reconstruction algorithm can also be used for compression of 4D-STEM datasets, leading to a large reduction (100 times or more) in data size, while retaining the fine features of 4D-STEM imaging, for crystalline samples.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113938"},"PeriodicalIF":2.2,"publicationDate":"2024-02-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124000172/pdfft?md5=8e2f018c37eccbf882d300e115155e45&pid=1-s2.0-S0304399124000172-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139733423","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-02-08DOI: 10.1016/j.ultramic.2024.113936
Shahar Seifer , Lothar Houben , Michael Elbaum
We demonstrate the use of a 4-dimensional scanning transmission electron microscope (4D-STEM) to extract atomic cross section information in amorphous materials. We measure the scattering amplitudes of 200 keV electrons in several representative specimens: amorphous carbon, silica, amorphous ice of pure water, and vitrified phosphate buffer solution. Diffraction patterns are recorded by 4D-STEM with or without energy filter at the zero-loss peak. In addition, Electron Energy Loss Spectroscopy (EELS) data are acquired at several thicknesses and energies. Mixed elastic and inelastic contributions for thick samples can be decoupled based on a convolution model. Measured differential cross sections between 1 and 3 mrad are due primarily to plasmon excitations and follow precisely a 1/θ2 angular distribution. The measured intensities match Inokuti's calculations of total dipole matrix elements for discrete dipole transitions alone, i.e., transitions to bound states of the atom and not to continuum states. We describe the fundamental mechanism of plasmon excitation in insulators as a two-step interaction process with a fast electron. First, a target electron in the specimen is excited, the probability for which follows from the availability of atomic transitions, with a strong dependence on the column of the periodic table. Second, the dielectric response of the material determines the energy loss. The energy of the loss peak depends primarily on the valence electrons. Elastic scattering is dominant at higher angles, and can be fitted conveniently to 1/θ3.7 with a linear dependence on atomic number for light atoms. In order to facilitate the interpretation of 4D STEM measurements in terms of material composition, we introduce two key parameters. Zeta is an analytical equivalent of classical STEM Z-contrast, determined by the ratio of elastic to inelastic scattering coefficients, while eta is the elastic coefficient divided by thickness. The two parameters may serve for identification of basic classes of materials in biological and other amorphous organic specimens.
{"title":"Quantitative atomic cross section analysis by 4D-STEM and EELS","authors":"Shahar Seifer , Lothar Houben , Michael Elbaum","doi":"10.1016/j.ultramic.2024.113936","DOIUrl":"https://doi.org/10.1016/j.ultramic.2024.113936","url":null,"abstract":"<div><p>We demonstrate the use of a 4-dimensional scanning transmission electron microscope (4D-STEM) to extract atomic cross section information in amorphous materials. We measure the scattering amplitudes of 200 keV electrons in several representative specimens: amorphous carbon, silica, amorphous ice of pure water, and vitrified phosphate buffer solution. Diffraction patterns are recorded by 4D-STEM with or without energy filter at the zero-loss peak. In addition, Electron Energy Loss Spectroscopy (EELS) data are acquired at several thicknesses and energies. Mixed elastic and inelastic contributions for thick samples can be decoupled based on a convolution model. Measured differential cross sections between 1 and 3 mrad are due primarily to plasmon excitations and follow precisely a 1/θ<sup>2</sup> angular distribution. The measured intensities match Inokuti's calculations of total dipole matrix elements for discrete dipole transitions alone, i.e., transitions to bound states of the atom and not to continuum states. We describe the fundamental mechanism of plasmon excitation in insulators as a two-step interaction process with a fast electron. First, a target electron in the specimen is excited, the probability for which follows from the availability of atomic transitions, with a strong dependence on the column of the periodic table. Second, the dielectric response of the material determines the energy loss. The energy of the loss peak depends primarily on the valence electrons. Elastic scattering is dominant at higher angles, and can be fitted conveniently to 1/θ<sup>3.7</sup> with a linear dependence on atomic number for light atoms. In order to facilitate the interpretation of 4D STEM measurements in terms of material composition, we introduce two key parameters. Zeta is an analytical equivalent of classical STEM Z-contrast, determined by the ratio of elastic to inelastic scattering coefficients, while eta is the elastic coefficient divided by thickness. The two parameters may serve for identification of basic classes of materials in biological and other amorphous organic specimens.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113936"},"PeriodicalIF":2.2,"publicationDate":"2024-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124000159/pdfft?md5=4a1a0e05657a9dfb8c78654366c118e7&pid=1-s2.0-S0304399124000159-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139733425","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-02-06DOI: 10.1016/j.ultramic.2024.113935
Rudolf M. Tromp
Energy-Dispersive X-Ray Spectroscopy (EDS) is a technique frequently used in Scanning and Transmission Electron Microscopes to study the elemental composition of a sample. Briefly, high energy electrons of the incident electron beam may ionize an electron from a core shell. The decay of this excited state may result in the emission of a characteristic X-ray photon or Auger-Meitner electron. A solid-state EDS detector captures the X-ray photon and determines its energy. The energy spectrum thus contains information on the elemental make-up of the sample. Low Energy Electron Microscopy (LEEM) typically utilizes incident electrons with energies in the range 0–100 eV, insufficient for the generation of elemental X-rays. In general, LEEM does therefore not allow for elemental characterization of the sample under study. Here we show how relatively simple modifications and additions to the LEEM instrument make in-situ EDS spectroscopy possible, and how high-quality EDS spectra can be obtained, thus enabling elemental analysis in LEEM instruments for the first time.
能量色散 X 射线光谱(EDS)是扫描和透射电子显微镜中常用的一种技术,用于研究样品的元素组成。简而言之,入射电子束的高能电子可能会电离出核壳中的电子。这种激发态的衰变可能会导致特征 X 射线光子或奥杰-迈特纳电子的发射。固态 EDS 检测器可捕获 X 射线光子并确定其能量。因此,能谱包含了样品元素构成的信息。低能电子显微镜(LEEM)通常利用能量在 0-100 eV 之间的入射电子,这些电子不足以产生元素 X 射线。因此,低能电子显微镜一般无法对所研究的样品进行元素表征。在这里,我们将展示如何通过对 LEEM 仪器进行相对简单的修改和添加,实现原位 EDS 光谱分析,以及如何获得高质量的 EDS 光谱,从而首次在 LEEM 仪器中实现元素分析。
{"title":"Energy-dispersive X-ray spectroscopy in a low energy electron microscope","authors":"Rudolf M. Tromp","doi":"10.1016/j.ultramic.2024.113935","DOIUrl":"10.1016/j.ultramic.2024.113935","url":null,"abstract":"<div><p>Energy-Dispersive X-Ray Spectroscopy (EDS) is a technique frequently used in Scanning and Transmission Electron Microscopes to study the elemental composition of a sample. Briefly, high energy electrons of the incident electron beam may ionize an electron from a core shell. The decay of this excited state may result in the emission of a characteristic X-ray photon or Auger-Meitner electron. A solid-state EDS detector captures the X-ray photon and determines its energy. The energy spectrum thus contains information on the elemental make-up of the sample. Low Energy Electron Microscopy (LEEM) typically utilizes incident electrons with energies in the range 0–100 eV, insufficient for the generation of elemental X-rays. In general, LEEM does therefore not allow for elemental characterization of the sample under study. Here we show how relatively simple modifications and additions to the LEEM instrument make in-situ EDS spectroscopy possible, and how high-quality EDS spectra can be obtained, thus enabling elemental analysis in LEEM instruments for the first time.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113935"},"PeriodicalIF":2.2,"publicationDate":"2024-02-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139708003","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-02-01DOI: 10.1016/j.ultramic.2024.113928
Masayuki Kamaya
The local misorientation, known as KAM, is affected by both the step size (representing the spacing of measurement points applied in orientation measurements) and the point distance (indicating the distance between the points used in the misorientation calculation). The point distance can be increased by selecting surrounding points that are far from the target point. This study proposed the concept of an equidistant local misorientation, for which surrounding points at the same point distance from the target point were selected to calculate misorientation. An arbitrary point distance can be set for the equidistant local misorientation regardless of the step size. The changes in equidistant local misorientation for various point distances were calculated for the crystal orientation datasets obtained with different step sizes and measurement grids (square or hexagonal) using Type 316 stainless steel specimens, in which plastic strain of about 5 % was induced. It was shown that the equidistant local misorientation was identical regardless of the step size and measurement grid when the same point distance was used. Then, it was concluded that the difference in the local misorientation which emanated from the difference in step size could be corrected by employing the equidistant local misorientation. Increasing the point distance improved the signal-to-noise (S/N) ratio in the mapping data of the equidistant local misorientation. However, the results suggested that the maximum point distance for enhancing the S/N ratio should be within 30 % of the average grain size. On the other hand, decreasing the step size by keeping the point distance constant was found not to improve the S/N ratio, while it enhanced the spatial resolution of the mapping data.
被称为 KAM 的局部方向偏差受步长(表示方向测量中测量点的间距)和点距(表示方向偏差计算中使用的点之间的距离)的影响。可以通过选择远离目标点的周围点来增加点距。本研究提出了等距局部迷失方向的概念,即选择与目标点点距相同的周围点来计算迷失方向。无论步长大小如何,都可以为等距局部迷失方向设置任意点距。使用 316 型不锈钢试样计算了不同步长和测量网格(正方形或六角形)下获得的晶体取向数据集在不同点距下的等距局部定向错误的变化,在试样中诱导了约 5% 的塑性应变。结果表明,在使用相同点距的情况下,无论步长大小和测量网格如何,等距局部错向都是相同的。因此可以得出结论,步长不同造成的局部迷失方向差异可以通过采用等距局部迷失方向来纠正。增加点距可以改善等距局部测偏法测绘数据的信噪比(S/N)。但结果表明,提高信噪比的最大点距应在平均晶粒尺寸的 30% 以内。另一方面,在保持点距不变的情况下减小步长并不能提高信噪比,但却提高了测绘数据的空间分辨率。
{"title":"Correction of step size dependency in local misorientation obtained by EBSD measurements: Introducing equidistant local misorientation","authors":"Masayuki Kamaya","doi":"10.1016/j.ultramic.2024.113928","DOIUrl":"https://doi.org/10.1016/j.ultramic.2024.113928","url":null,"abstract":"<div><p>The local misorientation, known as KAM, is affected by both the step size (representing the spacing of measurement points applied in orientation measurements) and the point distance (indicating the distance between the points used in the misorientation calculation). The point distance can be increased by selecting surrounding points that are far from the target point. This study proposed the concept of an equidistant local misorientation, for which surrounding points at the same point distance from the target point were selected to calculate misorientation. An arbitrary point distance can be set for the equidistant local misorientation regardless of the step size. The changes in equidistant local misorientation for various point distances were calculated for the crystal orientation datasets obtained with different step sizes and measurement grids (square or hexagonal) using Type 316 stainless steel specimens, in which plastic strain of about 5 % was induced. It was shown that the equidistant local misorientation was identical regardless of the step size and measurement grid when the same point distance was used. Then, it was concluded that the difference in the local misorientation which emanated from the difference in step size could be corrected by employing the equidistant local misorientation. Increasing the point distance improved the signal-to-noise (S/N) ratio in the mapping data of the equidistant local misorientation. However, the results suggested that the maximum point distance for enhancing the S/N ratio should be within 30 % of the average grain size. On the other hand, decreasing the step size by keeping the point distance constant was found not to improve the S/N ratio, while it enhanced the spatial resolution of the mapping data.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113928"},"PeriodicalIF":2.2,"publicationDate":"2024-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139674934","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-01-24DOI: 10.1016/j.ultramic.2024.113926
Mengshu Ge , Yue Pan , Xiaozhi Liu , Zhicheng Zhao , Dong Su
Selected area electron diffraction (SAED) is a widely used technique for characterizing the structure and measuring lattice parameters of materials. An autonomous analytic method has become an urgent demand for the large-scale SAED data produced from in-situ experiments. In this work, we realize the automatic processing for center identification with a proposed deep segmentation model named the multi-scale Transformer (MS-Trans) network. This algorithm enables robust segmentation of the central spots by combining a novel gated axial-attention module and multi-scale feature fusion. The proposed MS-Trans model shows high precision and robustness, enabling autonomous processing of SAED patterns without any prior knowledge. The application on in-situ SAED data of the oxidation process of FeNi alloy demonstrates its capability of implementing autonomous quantitative processing.
Pub Date : 2024-01-24DOI: 10.1016/j.ultramic.2024.113923
M.D. Décima, G.E. Castellano, J.C. Trincavelli, A.C. Carreras
M-subshell X-ray production cross sections were indirectly measured for Ir and Bi targets irradiated with monoenergetic electron beams. The projectile energy range ran from 2.2 to 28 keV, impinging on Ir and Bi pure bulk targets in a scanning electron microscope. The resulting X-ray emission spectra were acquired with an energy dispersive spectrometer, and processed afterwards by means of a robust parameter optimization procedure developed previously. X-ray production cross sections were finally obtained through an approach involving an analytical prediction for the emission spectra, which relies on the ionization depth distribution function. The values obtained by this approach were compared with empirical and theoretical predictions, appealing to different relaxation data taken from the literature.
间接测量了用单能电子束辐照的Ir和Bi靶的M子壳X射线产生截面。射弹能量范围从 2.2 到 28 keV,在扫描电子显微镜中撞击在 Ir 和 Bi 纯体靶上。由此产生的 X 射线发射光谱由能量色散光谱仪获取,然后通过之前开发的稳健参数优化程序进行处理。最后通过分析预测发射光谱的方法获得了 X 射线生成截面,该方法依赖于电离深度分布函数。利用文献中的不同弛豫数据,将这种方法获得的值与经验预测值和理论预测值进行了比较。
{"title":"X-ray production cross sections for Ir and Bi M-subshells induced by electron impact","authors":"M.D. Décima, G.E. Castellano, J.C. Trincavelli, A.C. Carreras","doi":"10.1016/j.ultramic.2024.113923","DOIUrl":"10.1016/j.ultramic.2024.113923","url":null,"abstract":"<div><p>M-subshell X-ray production cross sections were indirectly measured for Ir and Bi targets irradiated with monoenergetic electron beams. The projectile energy range ran from 2.2 to 28 keV, impinging on Ir and Bi pure bulk targets in a scanning electron microscope. The resulting X-ray emission spectra were acquired with an energy dispersive spectrometer, and processed afterwards by means of a robust parameter optimization procedure developed previously. X-ray production cross sections were finally obtained through an approach involving an analytical prediction for the emission spectra, which relies on the ionization depth distribution function. The values obtained by this approach were compared with empirical and theoretical predictions, appealing to different relaxation data taken from the literature.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113923"},"PeriodicalIF":2.2,"publicationDate":"2024-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139555486","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-01-24DOI: 10.1016/j.ultramic.2024.113927
Leonardo M. Corrêa , Eduardo Ortega , Arturo Ponce , Mônica A. Cotta , Daniel Ugarte
The association of scanning transmission electron microscopy (STEM) and detection of a diffraction pattern at each probe position (so-called 4D-STEM) represents one of the most promising approaches to analyze structural properties of materials with nanometric resolution and low irradiation levels. This is widely used for texture analysis of materials using automated crystal orientation mapping (ACOM). Herein, we perform orientation mapping in InP nanowires exploiting precession electron diffraction (PED) patterns acquired by an axial CMOS camera. Crystal orientation is determined at each probe position by the quantitative analysis of diffracted intensities minimizing a residue comparing experiments and simulations in analogy to x-ray structural refinement. Our simulations are based on the two-beam dynamical diffraction approximation and yield a high angular precision (∼0.03°), much lower than the traditional ACOM based on pattern matching algorithms (∼1°). We anticipate that simultaneous exploration of both spot positions and high precision crystal misorientation will allow the exploration of the whole potentiality provided by PED-based 4D-STEM for the characterization of deformation fields in nanomaterials.
{"title":"High precision orientation mapping from 4D-STEM precession electron diffraction data through quantitative analysis of diffracted intensities","authors":"Leonardo M. Corrêa , Eduardo Ortega , Arturo Ponce , Mônica A. Cotta , Daniel Ugarte","doi":"10.1016/j.ultramic.2024.113927","DOIUrl":"10.1016/j.ultramic.2024.113927","url":null,"abstract":"<div><p>The association of scanning transmission electron microscopy (STEM) and detection of a diffraction pattern at each probe position (so-called 4D-STEM) represents one of the most promising approaches to analyze structural properties of materials with nanometric resolution and low irradiation levels. This is widely used for texture analysis of materials using automated crystal orientation mapping (ACOM). Herein, we perform orientation mapping in InP nanowires exploiting precession electron diffraction (PED) patterns acquired by an axial CMOS camera. Crystal orientation is determined at each probe position by the quantitative analysis of diffracted intensities minimizing a residue comparing experiments and simulations in analogy to x-ray structural refinement. Our simulations are based on the two-beam dynamical diffraction approximation and yield a high angular precision (∼0.03°), much lower than the traditional ACOM based on pattern matching algorithms (∼1°). We anticipate that simultaneous exploration of both spot positions and high precision crystal misorientation will allow the exploration of the whole potentiality provided by PED-based 4D-STEM for the characterization of deformation fields in nanomaterials.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113927"},"PeriodicalIF":2.2,"publicationDate":"2024-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139555548","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-01-20DOI: 10.1016/j.ultramic.2024.113924
Wei Li , Xingui Zhou , Jingchao Xu , Ruyue Zhang , Lizhao Lai , Yi Zeng , Hong Miao
The authors of this study develop an accurate and fast method for the localization of the pattern centers (PCs) in the electron backscatter diffraction (EBSD) technique by using the model of deformation of screen moving technology. The proposed algorithm is divided into two steps: (a) Approximation: We use collinear feature points to obtain the initial value of the coordinates of the PC and the zoom factor. (b) Subdivision: We then construct a deformation function containing the three parameters to be solved, select a large region for global registration, use the inverse compositional Gauss–Newton (ICGN) to optimize the objective function, and obtain the results of iteration of the PC and the zoom factor. The proposed algorithm was applied to simulated patterns, and yielded an accuracy of measurement of the PCs that was better than of their resolution while taking only 0.2 s for computations. Moreover, the proposed algorithm has a large radius of convergence that makes it robust to the initial estimate. We also discuss the influence of factors of mechanical instability on its results of calibration during the insertion of the detector, and show that errors in measurements caused by the tilt motion of the camera are related only to the tilt angle of its motion and the detector distance, and are unrelated to the distance moved by it.
本研究的作者利用屏幕移动技术的变形模型,开发了一种准确而快速的方法,用于电子背散射衍射(EBSD)技术中图案中心(PC)的定位。所提出的算法分为两个步骤:(a) 近似:我们利用共线特征点获得 PC 坐标的初始值和缩放因子。(b) 细分:然后构建一个包含三个待解参数的变形函数,选择一个大区域进行全局配准,使用逆合成高斯-牛顿(ICGN)优化目标函数,并获得 PC 和缩放因子的迭代结果。所提出的算法被应用于模拟图案,其 PC 的测量精度优于其分辨率的 4.6×10-6,而计算时间仅为 0.2 秒。此外,所提出的算法具有较大的收敛半径,使其对初始估计具有鲁棒性。我们还讨论了在探测器插入过程中机械不稳定性因素对校准结果的影响,并表明摄像机倾斜运动造成的测量误差只与摄像机运动的倾斜角度和探测器距离有关,而与摄像机移动的距离无关。
{"title":"Accurate and fast localization of EBSD pattern centers for screen moving technology","authors":"Wei Li , Xingui Zhou , Jingchao Xu , Ruyue Zhang , Lizhao Lai , Yi Zeng , Hong Miao","doi":"10.1016/j.ultramic.2024.113924","DOIUrl":"10.1016/j.ultramic.2024.113924","url":null,"abstract":"<div><p>The authors of this study develop an accurate and fast method for the localization of the pattern centers (PCs) in the electron backscatter diffraction (EBSD) technique by using the model of deformation of screen moving technology. The proposed algorithm is divided into two steps: (a) Approximation: We use collinear feature points to obtain the initial value of the coordinates of the PC and the zoom factor. (b) Subdivision: We then construct a deformation function containing the three parameters to be solved, select a large region for global registration, use the inverse compositional Gauss–Newton (ICGN) to optimize the objective function, and obtain the results of iteration of the PC and the zoom factor. The proposed algorithm was applied to simulated patterns, and yielded an accuracy of measurement of the PCs that was better than <span><math><mrow><mn>4.6</mn><mo>×</mo><msup><mn>10</mn><mrow><mo>−</mo><mn>6</mn></mrow></msup></mrow></math></span> of their resolution while taking only 0.2 s for computations. Moreover, the proposed algorithm has a large radius of convergence that makes it robust to the initial estimate. We also discuss the influence of factors of mechanical instability on its results of calibration during the insertion of the detector, and show that errors in measurements caused by the tilt motion of the camera are related only to the tilt angle of its motion and the detector distance, and are unrelated to the distance moved by it.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113924"},"PeriodicalIF":2.2,"publicationDate":"2024-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139516628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}