Pub Date : 2024-01-24DOI: 10.1016/j.ultramic.2024.113927
Leonardo M. Corrêa , Eduardo Ortega , Arturo Ponce , Mônica A. Cotta , Daniel Ugarte
The association of scanning transmission electron microscopy (STEM) and detection of a diffraction pattern at each probe position (so-called 4D-STEM) represents one of the most promising approaches to analyze structural properties of materials with nanometric resolution and low irradiation levels. This is widely used for texture analysis of materials using automated crystal orientation mapping (ACOM). Herein, we perform orientation mapping in InP nanowires exploiting precession electron diffraction (PED) patterns acquired by an axial CMOS camera. Crystal orientation is determined at each probe position by the quantitative analysis of diffracted intensities minimizing a residue comparing experiments and simulations in analogy to x-ray structural refinement. Our simulations are based on the two-beam dynamical diffraction approximation and yield a high angular precision (∼0.03°), much lower than the traditional ACOM based on pattern matching algorithms (∼1°). We anticipate that simultaneous exploration of both spot positions and high precision crystal misorientation will allow the exploration of the whole potentiality provided by PED-based 4D-STEM for the characterization of deformation fields in nanomaterials.
{"title":"High precision orientation mapping from 4D-STEM precession electron diffraction data through quantitative analysis of diffracted intensities","authors":"Leonardo M. Corrêa , Eduardo Ortega , Arturo Ponce , Mônica A. Cotta , Daniel Ugarte","doi":"10.1016/j.ultramic.2024.113927","DOIUrl":"10.1016/j.ultramic.2024.113927","url":null,"abstract":"<div><p>The association of scanning transmission electron microscopy (STEM) and detection of a diffraction pattern at each probe position (so-called 4D-STEM) represents one of the most promising approaches to analyze structural properties of materials with nanometric resolution and low irradiation levels. This is widely used for texture analysis of materials using automated crystal orientation mapping (ACOM). Herein, we perform orientation mapping in InP nanowires exploiting precession electron diffraction (PED) patterns acquired by an axial CMOS camera. Crystal orientation is determined at each probe position by the quantitative analysis of diffracted intensities minimizing a residue comparing experiments and simulations in analogy to x-ray structural refinement. Our simulations are based on the two-beam dynamical diffraction approximation and yield a high angular precision (∼0.03°), much lower than the traditional ACOM based on pattern matching algorithms (∼1°). We anticipate that simultaneous exploration of both spot positions and high precision crystal misorientation will allow the exploration of the whole potentiality provided by PED-based 4D-STEM for the characterization of deformation fields in nanomaterials.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113927"},"PeriodicalIF":2.2,"publicationDate":"2024-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139555548","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-01-20DOI: 10.1016/j.ultramic.2024.113924
Wei Li , Xingui Zhou , Jingchao Xu , Ruyue Zhang , Lizhao Lai , Yi Zeng , Hong Miao
The authors of this study develop an accurate and fast method for the localization of the pattern centers (PCs) in the electron backscatter diffraction (EBSD) technique by using the model of deformation of screen moving technology. The proposed algorithm is divided into two steps: (a) Approximation: We use collinear feature points to obtain the initial value of the coordinates of the PC and the zoom factor. (b) Subdivision: We then construct a deformation function containing the three parameters to be solved, select a large region for global registration, use the inverse compositional Gauss–Newton (ICGN) to optimize the objective function, and obtain the results of iteration of the PC and the zoom factor. The proposed algorithm was applied to simulated patterns, and yielded an accuracy of measurement of the PCs that was better than of their resolution while taking only 0.2 s for computations. Moreover, the proposed algorithm has a large radius of convergence that makes it robust to the initial estimate. We also discuss the influence of factors of mechanical instability on its results of calibration during the insertion of the detector, and show that errors in measurements caused by the tilt motion of the camera are related only to the tilt angle of its motion and the detector distance, and are unrelated to the distance moved by it.
本研究的作者利用屏幕移动技术的变形模型,开发了一种准确而快速的方法,用于电子背散射衍射(EBSD)技术中图案中心(PC)的定位。所提出的算法分为两个步骤:(a) 近似:我们利用共线特征点获得 PC 坐标的初始值和缩放因子。(b) 细分:然后构建一个包含三个待解参数的变形函数,选择一个大区域进行全局配准,使用逆合成高斯-牛顿(ICGN)优化目标函数,并获得 PC 和缩放因子的迭代结果。所提出的算法被应用于模拟图案,其 PC 的测量精度优于其分辨率的 4.6×10-6,而计算时间仅为 0.2 秒。此外,所提出的算法具有较大的收敛半径,使其对初始估计具有鲁棒性。我们还讨论了在探测器插入过程中机械不稳定性因素对校准结果的影响,并表明摄像机倾斜运动造成的测量误差只与摄像机运动的倾斜角度和探测器距离有关,而与摄像机移动的距离无关。
{"title":"Accurate and fast localization of EBSD pattern centers for screen moving technology","authors":"Wei Li , Xingui Zhou , Jingchao Xu , Ruyue Zhang , Lizhao Lai , Yi Zeng , Hong Miao","doi":"10.1016/j.ultramic.2024.113924","DOIUrl":"10.1016/j.ultramic.2024.113924","url":null,"abstract":"<div><p>The authors of this study develop an accurate and fast method for the localization of the pattern centers (PCs) in the electron backscatter diffraction (EBSD) technique by using the model of deformation of screen moving technology. The proposed algorithm is divided into two steps: (a) Approximation: We use collinear feature points to obtain the initial value of the coordinates of the PC and the zoom factor. (b) Subdivision: We then construct a deformation function containing the three parameters to be solved, select a large region for global registration, use the inverse compositional Gauss–Newton (ICGN) to optimize the objective function, and obtain the results of iteration of the PC and the zoom factor. The proposed algorithm was applied to simulated patterns, and yielded an accuracy of measurement of the PCs that was better than <span><math><mrow><mn>4.6</mn><mo>×</mo><msup><mn>10</mn><mrow><mo>−</mo><mn>6</mn></mrow></msup></mrow></math></span> of their resolution while taking only 0.2 s for computations. Moreover, the proposed algorithm has a large radius of convergence that makes it robust to the initial estimate. We also discuss the influence of factors of mechanical instability on its results of calibration during the insertion of the detector, and show that errors in measurements caused by the tilt motion of the camera are related only to the tilt angle of its motion and the detector distance, and are unrelated to the distance moved by it.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113924"},"PeriodicalIF":2.2,"publicationDate":"2024-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139516628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-01-16DOI: 10.1016/j.ultramic.2024.113925
Raissa Lima de Oblitas , Flávio Bueno de Camargo Junior , Wagner Vidal Magalhães , Fernanda de Sá Teixeira , Maria Cecília Salvadori
We show the benefit of the use of atomic force microscopy (AFM) in spectroscopy force mode (FV: force volume) for evaluation of the cosmetic active effectiveness in improving the mechanical properties of human hair fibers cortex region. For this, we characterized human hair fibers without and with chemical damage caused by bleaching process. Fiber and resin (embedding material) data were obtained simultaneously in the mapping in order to have the resin data as a reference to ensure a coherent comparison between data from the different fiber groups. Our AFM results, which were evaluated using statistical tests, demonstrated the degradation of fibers after bleaching, corroborating the findings of transmission electron microscopy analysis and the effectiveness of a cosmetic active ingredient in improving the Young's modulus (elastic modulus) () of the damaged fibers. We also found a radial decrease in the natural logarithm of Young's modulus ln() along the cross-section of the active group fiber, which is compatible with confocal Raman spectroscopy analysis by other authors, demonstrating variation of the active permeation with depth. We note that Young's modulus was also determined by a tensile tester (macro-scale technique), in which it was not possible to obtain statistically significant differences between the groups, evidencing the advantage of the FV-AFM analysis. We also found an increase in ln() accompanied by a decrease in maximum adhesion force between tip and sample (negative Pearson correlation coefficient). This result can be explained by the fact that structures composed of hydrophobic components have a higher Young's modulus than structures composed of hydrophilic components.
•
Bleaching damage and cosmetic hair treatment assessed by AFM, TEM, and tensile tester.
•
Young's modulus by AFM nanoindentation of hair fibers monitored by sample standard.
•
Young's modulus changes radially along the cross-section due to the cosmetic active.
•
AFM data show statistically significant differences among sample groups.
•
Tensile tester was not able to show statistically significant differences.
{"title":"Characterization of the mechanical properties of the cortex region of human hair fibers by multiparametric atomic force microscopy mapping","authors":"Raissa Lima de Oblitas , Flávio Bueno de Camargo Junior , Wagner Vidal Magalhães , Fernanda de Sá Teixeira , Maria Cecília Salvadori","doi":"10.1016/j.ultramic.2024.113925","DOIUrl":"10.1016/j.ultramic.2024.113925","url":null,"abstract":"<div><p><span><span>We show the benefit of the use of atomic force microscopy (AFM) in spectroscopy force mode (FV: force volume) for evaluation of the cosmetic active effectiveness in improving the </span>mechanical properties<span><span> of human hair fibers cortex region. For this, we characterized human hair fibers without and with chemical damage caused by bleaching process. Fiber and resin (embedding material) data were obtained simultaneously in the mapping in order to have the resin data as a reference to ensure a coherent comparison between data from the different fiber groups. Our AFM results, which were evaluated using statistical tests, demonstrated the degradation of fibers after bleaching, corroborating the findings of transmission electron microscopy analysis and the effectiveness of a cosmetic active ingredient in improving the </span>Young's modulus (elastic modulus) (</span></span><span><math><mi>E</mi></math></span>) of the damaged fibers. We also found a radial decrease in the natural logarithm of Young's modulus ln(<span><math><mi>E</mi></math></span><span>) along the cross-section of the active group fiber, which is compatible with confocal Raman spectroscopy analysis by other authors, demonstrating variation of the active permeation with depth. We note that Young's modulus was also determined by a tensile tester (macro-scale technique), in which it was not possible to obtain statistically significant differences between the groups, evidencing the advantage of the FV-AFM analysis. We also found an increase in ln(</span><span><math><mi>E</mi></math></span>) accompanied by a decrease in maximum adhesion force between tip and sample (negative Pearson correlation coefficient). This result can be explained by the fact that structures composed of hydrophobic components have a higher Young's modulus than structures composed of hydrophilic components.</p><ul><li><span>•</span><span><p>Bleaching damage and cosmetic hair treatment assessed by AFM, TEM, and tensile tester.</p></span></li><li><span>•</span><span><p>Young's modulus by AFM nanoindentation of hair fibers monitored by sample standard.</p></span></li><li><span>•</span><span><p>Young's modulus changes radially along the cross-section due to the cosmetic active.</p></span></li><li><span>•</span><span><p>AFM data show statistically significant differences among sample groups.</p></span></li><li><span>•</span><span><p>Tensile tester was not able to show statistically significant differences.</p></span></li></ul></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"259 ","pages":"Article 113925"},"PeriodicalIF":2.2,"publicationDate":"2024-01-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139508276","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-01-08DOI: 10.1016/j.ultramic.2024.113922
Christoph Hofer, Chuang Gao, Tamazouzt Chennit, Biao Yuan, Timothy J. Pennycook
The contrast transfer function of direct ptychography methods such as the single side band (SSB) method are single signed, yet these methods still sometimes exhibit contrast reversals, most often where the projected potentials are strong. In thicker samples central focusing often provides the best ptychographic contrast as this leads to defocus variations within the sample canceling out. However focusing away from the entrance surface is often undesirable as this degrades the annular dark field (ADF) signal. Here we discuss how phase wrap asymptotes in the frequency response of SSB ptychography give rise to contrast reversals, without the need for dynamical scattering, and how these can be counteracted by manipulating the phases such that the asymptotes are either shifted to higher frequencies or damped via amplitude modulation. This is what enables post collection defocus correction of contrast reversals. However, the phase offset method of counteracting contrast reversals we introduce here is generally found to be superior to post collection application of defocus, with greater reliability and generally stronger contrast. Importantly, the phase offset method also works for thin and thick samples where central focusing does not. Finally, the independence of the method from focus is useful for optical sectioning involving ptychography, improving interpretability by better disentangling the effects of strong potentials and focus.
{"title":"Phase offset method of ptychographic contrast reversal correction","authors":"Christoph Hofer, Chuang Gao, Tamazouzt Chennit, Biao Yuan, Timothy J. Pennycook","doi":"10.1016/j.ultramic.2024.113922","DOIUrl":"10.1016/j.ultramic.2024.113922","url":null,"abstract":"<div><p>The contrast transfer function of direct ptychography methods such as the single side band (SSB) method are single signed, yet these methods still sometimes exhibit contrast reversals, most often where the projected potentials are strong. In thicker samples central focusing often provides the best ptychographic contrast as this leads to defocus variations within the sample canceling out. However focusing away from the entrance surface is often undesirable as this degrades the annular dark field (ADF) signal. Here we discuss how phase wrap asymptotes in the frequency response of SSB ptychography give rise to contrast reversals, without the need for dynamical scattering, and how these can be counteracted by manipulating the phases such that the asymptotes are either shifted to higher frequencies or damped via amplitude modulation. This is what enables post collection defocus correction of contrast reversals. However, the phase offset method of counteracting contrast reversals we introduce here is generally found to be superior to post collection application of defocus, with greater reliability and generally stronger contrast. Importantly, the phase offset method also works for thin and thick samples where central focusing does not. Finally, the independence of the method from focus is useful for optical sectioning involving ptychography, improving interpretability by better disentangling the effects of strong potentials and focus.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"258 ","pages":"Article 113922"},"PeriodicalIF":2.2,"publicationDate":"2024-01-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124000019/pdfft?md5=252f4115db9a421645fc1ecee48bc6fc&pid=1-s2.0-S0304399124000019-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139397689","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Coherent diffraction imaging (CDI) and its scanning version, ptychography, are lensless imaging approaches used to iteratively retrieve a sample’s complex scattering amplitude from its measured diffraction patterns. These imaging methods are most useful in extreme ultraviolet (EUV) and X-ray regions of the electromagnetic spectrum, where efficient imaging optics are difficult to manufacture. CDI relies on high signal-to-noise ratio diffraction data to recover the phase, but increasing the flux can cause saturation effects on the detector. A conventional solution to this problem is to place a beam stop in front of the detector. The pixel masking method is a common solution to the problem of missing frequencies due to a beam stop. This paper describes the information redundancy in the recorded data set and expands on how the reconstruction algorithm can exploit this redundancy to estimate the missing frequencies. Thereafter, we modify the size of the beam stop in experimental and simulation data to assess the impact of the missing frequencies, investigate the extent to which the lost portion of the diffraction spectrum can be recovered, and quantify the effect of the beam stop on the image quality. The experimental findings and simulations conducted for EUV imaging demonstrate that when using a beam stop, the numerical aperture of the condenser is a crucial factor in the recovery of lost frequencies. Our thorough investigation of the reconstructed images provides information on the overall quality of reconstruction and highlights the vulnerable frequencies if the beam stop size is larger than the extent of the illumination NA. The outcome of this study can be applied to other sources of frequency loss, and it will contribute to the improvement of experiments and reconstruction algorithms in CDI.
相干衍射成像(CDI)及其扫描版本 "ptychography "是一种无透镜成像方法,用于从测量的衍射图样中迭代检索样品的复合散射振幅。这些成像方法在电磁波谱的极紫外(EUV)和 X 射线区域最为有用,因为在这些区域很难制造出高效的成像光学器件。CDI 依靠高信噪比的衍射数据来恢复相位,但增加通量会对探测器造成饱和效应。解决这一问题的传统方法是在探测器前放置光束挡板。像素掩蔽法是解决因光束阻挡而导致频率缺失问题的常用方法。本文描述了记录数据集中的信息冗余,并阐述了重建算法如何利用这种冗余来估计缺失的频率。之后,我们修改了实验和模拟数据中光束停止点的大小,以评估缺失频率的影响,研究衍射谱丢失部分的恢复程度,并量化光束停止点对图像质量的影响。针对超紫外成像进行的实验结果和模拟证明,在使用光束止挡时,聚光器的数值孔径是恢复丢失频率的关键因素。我们对重建图像的深入研究提供了有关重建整体质量的信息,并突出显示了如果光束止挡尺寸大于照明 NA 范围时易受影响的频率。这项研究的结果可应用于其他频率损失源,并将有助于改进 CDI 中的实验和重建算法。
{"title":"Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration","authors":"Atoosa Dejkameh , Ricarda Nebling , Uldis Locans , Hyun-Su Kim , Iacopo Mochi , Yasin Ekinci","doi":"10.1016/j.ultramic.2023.113912","DOIUrl":"10.1016/j.ultramic.2023.113912","url":null,"abstract":"<div><p>Coherent diffraction imaging (CDI) and its scanning version, ptychography, are lensless imaging approaches used to iteratively retrieve a sample’s complex scattering amplitude from its measured diffraction patterns. These imaging methods are most useful in extreme ultraviolet (EUV) and X-ray regions of the electromagnetic spectrum, where efficient imaging optics are difficult to manufacture. CDI relies on high signal-to-noise ratio diffraction data to recover the phase, but increasing the flux can cause saturation effects on the detector. A conventional solution to this problem is to place a beam stop in front of the detector. The pixel masking method is a common solution to the problem of missing frequencies due to a beam stop. This paper describes the information redundancy in the recorded data set and expands on how the reconstruction algorithm can exploit this redundancy to estimate the missing frequencies. Thereafter, we modify the size of the beam stop in experimental and simulation data to assess the impact of the missing frequencies, investigate the extent to which the lost portion of the diffraction spectrum can be recovered, and quantify the effect of the beam stop on the image quality. The experimental findings and simulations conducted for EUV imaging demonstrate that when using a beam stop, the numerical aperture of the condenser is a crucial factor in the recovery of lost frequencies. Our thorough investigation of the reconstructed images provides information on the overall quality of reconstruction and highlights the vulnerable frequencies if the beam stop size is larger than the extent of the illumination NA. The outcome of this study can be applied to other sources of frequency loss, and it will contribute to the improvement of experiments and reconstruction algorithms in CDI.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"258 ","pages":"Article 113912"},"PeriodicalIF":2.2,"publicationDate":"2023-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399123002292/pdfft?md5=0efa39d677d72d406052ce188a5a96ca&pid=1-s2.0-S0304399123002292-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139065160","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2023-12-21DOI: 10.1016/j.ultramic.2023.113911
Paweł Urbański, Piotr Szyszka, Marcin Białas, Tomasz Grzebyk
This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.
本文介绍了一种场发射器,其形式是在硅尖上覆盖一层碳纳米管。发射的光束通过一组两个静电透镜和磁场聚焦,这在此类结构中尚属首次。所提出的方法取得了非常有前景的结果。场发射器能够提供较高的发射电流(约 50 µA)和均匀的小光斑光束。这种电子源是许多微型微机电系统和纳米电子器件的必要组成部分。该电子源特别适用于目前开发的微机电系统 X 射线源和微机电系统电子显微镜。
{"title":"Point field emission electron source with a magnetically focused electron beam","authors":"Paweł Urbański, Piotr Szyszka, Marcin Białas, Tomasz Grzebyk","doi":"10.1016/j.ultramic.2023.113911","DOIUrl":"https://doi.org/10.1016/j.ultramic.2023.113911","url":null,"abstract":"<p>This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.</p>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"17 1","pages":""},"PeriodicalIF":2.2,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139031305","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2023-12-21DOI: 10.1016/j.ultramic.2023.113911
Paweł Urbański, Piotr Szyszka, Marcin Białas, Tomasz Grzebyk
This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.
本文介绍了一种场发射器,其形式是在硅尖上覆盖一层碳纳米管。发射的光束通过一组两个静电透镜和磁场聚焦,这在此类结构中尚属首次。所提出的方法取得了非常有前景的结果。场发射器能够提供较高的发射电流(约 50 µA)和均匀的小光斑光束。这种电子源是许多微型微机电系统和纳米电子器件的必要组成部分。该电子源特别适用于目前开发的微机电系统 X 射线源和微机电系统电子显微镜。
{"title":"Point field emission electron source with a magnetically focused electron beam","authors":"Paweł Urbański, Piotr Szyszka, Marcin Białas, Tomasz Grzebyk","doi":"10.1016/j.ultramic.2023.113911","DOIUrl":"10.1016/j.ultramic.2023.113911","url":null,"abstract":"<div><p>This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"258 ","pages":"Article 113911"},"PeriodicalIF":2.2,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139024565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2023-12-21DOI: 10.1016/j.ultramic.2023.113913
Josephine DeRonja , Matthew Nowell , Stuart Wright , Josh Kacher
Introduced over ten years ago, cross-correlation-based electron backscatter diffraction has enabled high precision measurements of crystallographic rotations and elastic strain gradients at high spatial resolution. Since that time, there have been remarkable improvements in electron detector technology, including the advent of ultra-high speed detectors and the commercialization of direct detectors. In this study, we assess the efficacy of multiple generations of electron detectors for cross-correlation-based analysis using a single crystal Si sample as a reference. We show that, while improvements in precision are modest, there have been significant gains in the rate at which high-quality diffraction patterns can be collected. This has important implications in the size of datasets that can be collected and reduces the impact of drift and sample contamination.
{"title":"Generational assessment of EBSD detectors for cross-correlation-based analysis: From scintillators to direct detection","authors":"Josephine DeRonja , Matthew Nowell , Stuart Wright , Josh Kacher","doi":"10.1016/j.ultramic.2023.113913","DOIUrl":"10.1016/j.ultramic.2023.113913","url":null,"abstract":"<div><p>Introduced over ten years ago, cross-correlation-based electron backscatter diffraction has enabled high precision measurements of crystallographic rotations and elastic strain gradients at high spatial resolution. Since that time, there have been remarkable improvements in electron detector technology, including the advent of ultra-high speed detectors and the commercialization of direct detectors. In this study, we assess the efficacy of multiple generations of electron detectors for cross-correlation-based analysis using a single crystal Si sample as a reference. We show that, while improvements in precision are modest, there have been significant gains in the rate at which high-quality diffraction patterns can be collected. This has important implications in the size of datasets that can be collected and reduces the impact of drift and sample contamination.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"257 ","pages":"Article 113913"},"PeriodicalIF":2.2,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139031252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2023-12-14DOI: 10.1016/j.ultramic.2023.113890
Peter Rez
Especially for light elements inelastic scattering is more probable than the elastic scattering that conveys the structural information. The question arises as to whether an image using inelastically scattered electrons is different depending on whether the elastic or inelastic scattering happens first, is there a top-bottom effect. We show that since inelastic scattering is concentrated in a narrow range of angles, much less than typical Bragg angles in light element materials, the inelastic and elastic processes are separable and, to a very good approximation, there is no top-bottom effect. For weakly scattering thin biological specimens that are phase objects the separation is exact and there can be no top-bottom effect.
{"title":"Does the order of elastic and inelastic scattering affect an image or is there a top bottom effect from inelastic scattering?","authors":"Peter Rez","doi":"10.1016/j.ultramic.2023.113890","DOIUrl":"10.1016/j.ultramic.2023.113890","url":null,"abstract":"<div><p>Especially for light elements inelastic scattering is more probable than the elastic scattering that conveys the structural information. The question arises as to whether an image using inelastically scattered electrons is different depending on whether the elastic or inelastic scattering happens first, is there a top-bottom effect. We show that since inelastic scattering is concentrated in a narrow range of angles, much less than typical Bragg angles in light element materials, the inelastic and elastic processes are separable and, to a very good approximation, there is no top-bottom effect. For weakly scattering thin biological specimens that are phase objects the separation is exact and there can be no top-bottom effect.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"257 ","pages":"Article 113890"},"PeriodicalIF":2.2,"publicationDate":"2023-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138693087","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2023-12-14DOI: 10.1016/j.ultramic.2023.113909
David Rutherford , Kateřina Kolářová , Jaroslav Čech , Petr Haušild , Jaroslav Kuliček , Egor Ukraintsev , Štěpán Stehlík , Radek Dao , Jan Neuman , Bohuslav Rezek
Research investigating the interface between biological organisms and nanomaterials nowadays requires multi-faceted microscopic methods to elucidate the interaction mechanisms and effects. Here we describe a novel approach and methodology correlating data from an atomic force microscope inside a scanning electron microscope (AFM-in-SEM). This approach is demonstrated on bacteria-diamond-metal nanocomposite samples relevant in current life science research. We describe a procedure for preparing such multi-component test samples containing E. coli bacteria and chitosan-coated hydrogenated nanodiamonds decorated with silver nanoparticles on a carbon-coated gold grid. Microscopic topography information (AFM) is combined with chemical, material, and morphological information (SEM using SE and BSE at varied acceleration voltages) from the same region of interest and processed to create 3D correlative probe-electron microscopy (CPEM) images. We also establish a novel 3D RGB color image algorithm for merging multiple SE/BSE data from SEM with the AFM surface topography data which provides additional information about microscopic interaction of the diamond-metal nanocomposite with bacteria, not achievable by individual analyses. The methodology of CPEM data interpretation is independently corroborated by further in-situ (EDS) and ex-situ (micro-Raman) chemical characterization as well as by force volume AFM analysis. We also discuss the broader applicability and benefits of the methodology for life science research.
{"title":"Correlative atomic force microscopy and scanning electron microscopy of bacteria-diamond-metal nanocomposites","authors":"David Rutherford , Kateřina Kolářová , Jaroslav Čech , Petr Haušild , Jaroslav Kuliček , Egor Ukraintsev , Štěpán Stehlík , Radek Dao , Jan Neuman , Bohuslav Rezek","doi":"10.1016/j.ultramic.2023.113909","DOIUrl":"10.1016/j.ultramic.2023.113909","url":null,"abstract":"<div><p>Research investigating the interface between biological organisms and nanomaterials nowadays requires multi-faceted microscopic methods to elucidate the interaction mechanisms and effects. Here we describe a novel approach and methodology correlating data from an atomic force microscope inside a scanning electron microscope (AFM-in-SEM). This approach is demonstrated on bacteria-diamond-metal nanocomposite samples relevant in current life science research. We describe a procedure for preparing such multi-component test samples containing <em>E. coli</em> bacteria and chitosan-coated hydrogenated nanodiamonds decorated with silver nanoparticles on a carbon-coated gold grid. Microscopic topography information (AFM) is combined with chemical, material, and morphological information (SEM using SE and BSE at varied acceleration voltages) from the same region of interest and processed to create 3D correlative probe-electron microscopy (CPEM) images. We also establish a novel 3D RGB color image algorithm for merging multiple SE/BSE data from SEM with the AFM surface topography data which provides additional information about microscopic interaction of the diamond-metal nanocomposite with bacteria, not achievable by individual analyses. The methodology of CPEM data interpretation is independently corroborated by further <em>in-situ</em> (EDS) and <em>ex-situ</em> (micro-Raman) chemical characterization as well as by force volume AFM analysis. We also discuss the broader applicability and benefits of the methodology for life science research.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"258 ","pages":"Article 113909"},"PeriodicalIF":2.2,"publicationDate":"2023-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138631652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}