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High-quality thickness-tunable InAs nanowire crosses grown by molecular-beam epitaxy 分子束外延生长的高质量厚度可调砷化镓纳米线交叉层
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-16 DOI: 10.1016/j.vacuum.2024.113657
InAs nanowire crosses show great potential applications in detection and braiding of Majorana zero modes. Controlled growth of high-quality and diameter tunable InAs nanowire crosses is fundamental for these applications. However, it is still difficult to freely and conveniently adjust the diameter of the free-standing InAs nanowire crosses grown by the conventional growth methods. Here, we report a new technique to realize the growth of high-quality thickness-tunable InAs nanowire crosses by molecular-beam epitaxy. GaAs nanowire crosses were firstly grown on the Si (100) substrates spontaneously by merging the <111>-oriented GaAs nanowires. InAs nanowire crosses were then obtained by in situ growth of InAs shells on the facets of GaAs nanowire cross cores. Detailed scanning and transmission electron microscopic observations and energy dispersive spectrum analyses confirm that the InAs nanowire crosses grown by this manner have continuous and smooth morphology and they are high-quality zinc-blende crystals. More importantly, the InAs shell is grown with the vapor-solid growth mechanism and the thickness of the InAs nanowire crosses can be tuned by varying the InAs shell growth time. Our work provides a valuable method for the controlled growth of thickness-tunable semiconductor nanowire crosses.
砷化砷纳米线交叉在马约拉纳零模的探测和编织方面显示出巨大的应用潜力。高质量和直径可调的 InAs 纳米线交叉的可控生长是这些应用的基础。然而,传统生长方法仍然难以自由、方便地调节独立 InAs 纳米线交叉的直径。在此,我们报告了一种通过分子束外延实现高质量厚度可调 InAs 纳米线交叉生长的新技术。首先,在 Si (100) 衬底上通过合并<111>取向砷化镓纳米线自发生长出砷化镓纳米线十字。然后,通过在砷化镓纳米线交叉核的面上原位生长砷化镓外壳,获得了砷化镓纳米线交叉核。详细的扫描和透射电子显微镜观察以及能量色散谱分析证实,通过这种方法生长的 InAs 纳米线十字芯具有连续光滑的形态,是高质量的锌蓝晶。更重要的是,InAs 壳是在气固生长机制下生长的,InAs 纳米线交叉的厚度可以通过改变 InAs 壳的生长时间来调整。我们的工作为厚度可调的半导体纳米线交叉的可控生长提供了一种有价值的方法。
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引用次数: 0
Effect of Ta/Ni dual-interlayer on the microstructure and properties of high strength titanium alloy and steel composite plate 钽/镍双夹层对高强度钛合金和钢复合板微观结构和性能的影响
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113569
The combination of ultra-high-strength Ti-6Al-4V (TC4) titanium alloy and 30CrNiMoNb (6211) steel was achieved by adding Ta/Ni dual-interlayer and rolling at 950 °C through welding a symmetrical blank sleeve with a vacuum electron beam. In order to unveil the metallurgical bonding mechanism and the interfacial structure, SEM, XRD, and compression-shear performance tests were used. The results revealed the presence of thin-film brittle TiC, TiFe, and TiFe2 compounds at the TC4/6211 interface, resulting in an increased risk of interface mismatch and brittle fracture along the matrix phase interface, and the average interfacial bonding strength was tested at 323 MPa.
In contrast, the TC4-Ta interface and the 6211-Ni interface in the TC4/Ta/Ni/6211 composite plate displayed good solid solution formation. The strengthening mechanism of the Ta/Ni dual-interlayer interfacial bonding was analyzed using selected area electron diffraction (SAED), revealing that the Ta-Ni diffusion region consisted of Ni3Ta and Ni2Ta. The addition of the Ta/Ni dual-interlayer prevented the aggregation of Ti and Fe atoms to form Ti-Fe compounds. The malleable intermetallic compounds of Ni3Ta and Ni2Ta effectively coordinated deformation, leading to an average interfacial bonding strength of 469 MPa, which was 45.2 % higher than the composite plate without Ta/Ni dual-interlayer.
通过添加钽/镍双夹层并在 950 °C下轧制,利用真空电子束焊接对称毛坯套筒,实现了超高强度钛合金(Ti-6Al-4V,TC4)和 30CrNiMoNb 钢(6211)的结合。为了揭示冶金结合机制和界面结构,使用了扫描电镜、XRD 和压缩剪切性能测试。结果表明,TC4/6211 界面存在薄膜状脆性 TiC、TiFe 和 TiFe2 化合物,导致沿基体相界面的界面失配和脆性断裂风险增加,经测试,平均界面结合强度为 323 MPa。利用选区电子衍射 (SAED) 分析了 Ta/Ni 双层界面结合的强化机制,发现 Ta-Ni 扩散区由 Ni3Ta 和 Ni2Ta 组成。Ta/Ni双层界面的加入阻止了Ti和Fe原子聚集形成Ti-Fe化合物。Ni3Ta 和 Ni2Ta 的可锻金属间化合物有效地协调了变形,使平均界面结合强度达到 469 兆帕,比不添加 Ta/Ni 双夹层的复合板高出 45.2%。
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引用次数: 0
Investigation of spitting effect in the boron target preparation using vapour deposition technique 利用气相沉积技术研究硼靶制备过程中的喷溅效应
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113642
Self-supported and carbon/aluminum-backed isotopically enriched thin boron targets were prepared by the vapour deposition technique using electron beam. To mitigate spitting effects observed during this process, boron powder was evaporated in both paste and pellet forms. Effective reduction of spitting was achieved by initially heating boron at low currents followed by its step-wise increase. Analysis of boron samples at various stages of evaporation was done by X-ray Diffraction (XRD) and Fourier-transform Infrared spectroscopy (FTIR). Direct exposure to high-energy electron beams contributed to a decrease in boron oxide and hydride compounds, thereby aiding in minimizing spitting. However, upon exposure to air, the evaporated film underwent surface oxidation, confirmed by Transmission Electron Microscopy (TEM), Energy Dispersive X-ray spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS) measurements. Further investigations into the longevity of the film (target) were conducted using optical microscopy and FTIR spectroscopy. These analyses revealed hydrogenation and oxidation of the film upon exposure to atmosphere, resulting in increased fragility and noticeable colour changes over time.
利用电子束气相沉积技术制备了自支撑和碳/铝支撑的同位素富集硼薄靶。为了减轻在此过程中观察到的喷溅效应,硼粉以浆料和颗粒两种形式蒸发。最初以低电流加热硼,然后逐步提高电流,可以有效减少溅射。通过 X 射线衍射(XRD)和傅立叶变换红外光谱(FTIR)对不同蒸发阶段的硼样品进行了分析。直接暴露于高能电子束有助于减少氧化硼和氢化物,从而最大限度地减少喷溅。然而,在暴露于空气中时,蒸发薄膜会发生表面氧化,透射电子显微镜 (TEM)、能量色散 X 射线光谱 (EDX) 和 X 射线光电子能谱 (XPS) 测量证实了这一点。使用光学显微镜和傅立叶变换红外光谱对薄膜(目标)的寿命进行了进一步研究。这些分析表明,薄膜在暴露于大气时会发生氢化和氧化,从而导致脆性增加,并随着时间的推移发生明显的颜色变化。
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引用次数: 0
Effect of Y on the microstructure and physical properties of Cu-Zr-Mg-Y alloys Y 对 Cu-Zr-Mg-Y 合金微观结构和物理性质的影响
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113651

This work presents the development of two novel Cu-Zr-Mg(Y) alloys. The alloys were prepared using vacuum melting and show good conductivity and mechanical properties after solution treatment+60 % cold rolling + aging at 450 °C for 60 min.

The measurement results reveal that the Cu-Zr-Mg alloy has a microhardness of 165 ± 5 HV, an electrical conductivity of 68.5 ± 0.2 % IACS and a tensile strength of 483 ± 15 MPa while the Cu-Zr-Mg-Y alloy has a microhardness of 172 ± 6 HV, an electrical conductivity of 67.9 ± 0.2 % IACS and a tensile strength of 503 ± 12 MPa.

The addition of Y promotes the recovery and recrystallization of the alloys and causes the refinement of the grain size. The appearance of copper texture is the reason why the Cu-Zr-Mg-Y alloy has higher tensile strength in the rolling direction. The main phases of the Cu-Zr-Mg-Y alloy consist of Cu5Zr and a small amount of Mg24Y5. The increment in precipitation strengthening is primarily attributed to the coherent Cu5Zr phase within the matrix.

这项工作展示了两种新型铜-Zr-镁(Y)合金的开发。测量结果显示,Cu-Zr-Mg 合金的显微硬度为 165 ± 5 HV,导电率为 68.5 ± 0.2 % IACS,抗拉强度为 483 ± 15 MPa。测量结果显示,Cu-Zr-Mg 合金的显微硬度为 165 ± 5 HV,电导率为 68.5 ± 0.2 % IACS,抗拉强度为 483 ± 15 MPa,而 Cu-Zr-Mg-Y 合金的显微硬度为 172 ± 6 HV,电导率为 67.9 ± 0.2 % IACS,抗拉强度为 503 ± 12 MPa。铜纹理的出现是 Cu-Zr-Mg-Y 合金在轧制方向上具有较高抗拉强度的原因。Cu-Zr-Mg-Y 合金的主要相由 Cu5Zr 和少量 Mg24Y5 组成。沉淀强化的增加主要归因于基体中相干的 Cu5Zr 相。
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引用次数: 0
Sustainable and effective extraction of Se and recovery of valuable metals from selenium filter residue by vacuum volatilization 通过真空挥发从硒过滤残渣中可持续、有效地提取硒并回收有价金属
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113652
Selenium filter residue (SFR) is a high-value secondary resource generated during crude selenium purification. In this study, a new sustainable and efficient SFR treatment process is proposed, which not only enables the recovery of Se with high efficiency and purity but also effectively enriches valuable metals for the overall resource utilization of the entire process. The possibility of Se recovery during SFR was qualitatively analyzed using the saturated vapor pressure. A vacuum volatilization experiment was designed to investigate the recovery of Se and valuable metals at different temperatures (473–573 K) and holding times (30–120 min). The obtained results revealed that the purity of Se in volatiles reached 99.9 % at a temperature of 533 K and holding time of 90 min. The contents of valuable metals such as Te, Cu, Pb, Ag, and Au in the residue reached 4.16 %, 4.06 %, 11.49 %, 1.57 %, and 0.062 %, respectively, indicating their efficient enrichment and recovery. This work demonstrates that it is possible not only efficiently recover Se from the SFR but also maximize the enrichment of valuable metals and significantly increase the resource utilization efficiency, which satisfies the clean production requirements of the metallurgical industry.
硒滤渣(SFR)是粗硒提纯过程中产生的高价值二次资源。本研究提出了一种可持续的高效 SFR 处理新工艺,不仅能高效、高纯度地回收硒,还能有效富集有价金属,提高整个工艺的资源利用率。利用饱和蒸汽压定性分析了 SFR 过程中回收硒的可能性。设计了一个真空挥发实验,以研究在不同温度(473-573 K)和保温时间(30-120 分钟)下硒和有价金属的回收情况。结果表明,在温度为 533 K 和保温时间为 90 分钟时,挥发物中的硒纯度达到 99.9%。残留物中 Te、Cu、Pb、Ag 和 Au 等有价金属的含量分别达到 4.16%、4.06%、11.49%、1.57% 和 0.062%,表明它们得到了有效的富集和回收。这项工作表明,不仅可以从 SFR 中高效回收 Se,还可以最大限度地富集有价金属,显著提高资源利用效率,从而满足冶金工业的清洁生产要求。
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引用次数: 0
TEM and DFT calculation on the nanostructure and self-cleaning performance of in-situ grown Zn-doped graphene-based films 原位生长的掺锌石墨烯基薄膜的纳米结构和自清洁性能的 TEM 和 DFT 计算
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113653

Graphene, g-C3N4/graphene (NG), CF2-modified g-C3N4/graphene (FNG) films were in situ grown on roving fabric via PECVD, in which Zinc nanoparticles (Zn-NPs) acted as an enhancer integrated by a following chemical method. The nanostructures were revealed by high-resolution TEM, the self-cleaning performance in Zn(NO3)2 solution was evaluated, and the interaction model was established with DFT calculation. Results show that the NG@Zn-NPs film presents tightly bound zinc nanoparticles, which are stacked with the NG; whereas the FNG@Zn-NPs film is enriched with the F atoms, which alleviate stacking structure and improves bonding force of Zn-NPs with the FNG surface. The heavy metal ions are efficiently precipitated through the NG@Zn-NPs and FNG@Zn-NPs films. Moreover, the superhydrophobicity of FNG@Zn-NPs film is enhanced by the charge density around the CF2 functional groups, which further improves self-cleaning performance.

通过 PECVD 在粗纱织物上原位生长了石墨烯、g-C3N4/石墨烯(NG)、CF2 改性 g-C3N4/ 石墨烯(FNG)薄膜。通过高分辨率 TEM 揭示了纳米结构,评估了在 Zn(NO3)2 溶液中的自清洁性能,并通过 DFT 计算建立了相互作用模型。结果表明,NG@Zn-NPs 膜呈现出紧密结合的锌纳米颗粒,与 NG 堆叠在一起;而 FNG@Zn-NPs 膜富含 F 原子,缓解了堆叠结构,提高了 Zn-NPs 与 FNG 表面的结合力。重金属离子可通过 NG@Zn-NPs 和 FNG@Zn-NPs 薄膜有效析出。此外,FNG@Zn-NPs 膜的超疏水性因 CF2 功能基团周围的电荷密度而增强,从而进一步提高了自清洁性能。
{"title":"TEM and DFT calculation on the nanostructure and self-cleaning performance of in-situ grown Zn-doped graphene-based films","authors":"","doi":"10.1016/j.vacuum.2024.113653","DOIUrl":"10.1016/j.vacuum.2024.113653","url":null,"abstract":"<div><p>Graphene, g-C<sub>3</sub>N<sub>4</sub>/graphene (NG), CF<sub>2</sub>-modified g-C<sub>3</sub>N<sub>4</sub>/graphene (FNG) films were <em>in situ</em> grown on roving fabric via PECVD, in which Zinc nanoparticles (Zn-NPs) acted as an enhancer integrated by a following chemical method. The nanostructures were revealed by high-resolution TEM, the self-cleaning performance in Zn(NO<sub>3</sub>)<sub>2</sub> solution was evaluated, and the interaction model was established with DFT calculation. Results show that the NG@Zn-NPs film presents tightly bound zinc nanoparticles, which are stacked with the NG; whereas the FNG@Zn-NPs film is enriched with the F atoms, which alleviate stacking structure and improves bonding force of Zn-NPs with the FNG surface. The heavy metal ions are efficiently precipitated through the NG@Zn-NPs and FNG@Zn-NPs films. Moreover, the superhydrophobicity of FNG@Zn-NPs film is enhanced by the charge density around the CF<sub>2</sub> functional groups, which further improves self-cleaning performance.</p></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":null,"pages":null},"PeriodicalIF":3.8,"publicationDate":"2024-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142241852","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ionization of copper in gas and gasless modes of continuous high-power magnetron sputtering 连续大功率磁控溅射的有气和无气模式下的铜电离
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113649

The results of studies of magnetron sputtering of copper at discharge currents from 2 to 15 A in a 76 mm diameter planar magnetron are presented. In addition to the standard gas mode at an argon pressure of 0.12 Pa, a gasless mode was also implemented in which no argon was supplied to the vacuum chamber and the base pressure was 1·10−3 Pa. The stable gasless mode is realized at a discharge current higher than 8 A. The electrical discharge parameters as well as the copper sputtering rate, the ion current density on the substrate and the degree of ionization of the sputtered target material were measured and compared for the two modes mentioned. The plasma composition was also measured by optical spectrometry. The experimental data were used to calculate the density and composition of the neutral and ion fluxes to the substrate. It is shown that the gasless mode provides a higher ion current density on the probe and a higher degree of ionization of the sputtered copper compared to the gas mode at the same discharge current. The degree of ionization of the sputtered material reaches 14–15 % in gasless mode, whereas in gas mode it varies from 2 to 13 % depending on the discharge current.

本文介绍了在直径为 76 毫米的平面磁控管中以 2 至 15 安培的放电电流对铜进行磁控溅射的研究结果。除了氩气压力为 0.12 Pa 的标准气体模式外,还采用了无气模式,即不向真空室提供氩气,基础压力为 1-10-3 Pa。对上述两种模式的放电参数以及铜溅射率、基片上的离子电流密度和溅射靶材料的电离程度进行了测量和比较。此外,还通过光学光谱仪测量了等离子体的成分。实验数据用于计算中性通量和离子通量的密度和组成,以及基片的离子通量。实验结果表明,在相同的放电电流下,无气模式与有气模式相比,探针上的离子电流密度更高,溅射铜的电离程度更高。在无气模式下,溅射材料的离子化程度达到 14-15%,而在有气模式下,根据放电电流的不同,离子化程度从 2% 到 13% 不等。
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引用次数: 0
A numerical study of the effect of interfacial thermal resistance on thermal conductivity of Cu-B/diamond composites 界面热阻对铜-B/金刚石复合材料热导率影响的数值研究
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113654

Cu/diamond composite is a promising thermal management material for heat dissipation of high-power electronic devices. Heat transfer models for a Cu-B/diamond composite with varying boron contents added in the Cu matrix were constructed using the finite element (FE) method, based on the results from transmission electron microscopy (TEM) characterization. The heat transfer behavior of the Cu/diamond composites was then investigated. The predicted effective thermal conductivities were compared to experimental values, using both analytical model calculation and FE simulation. The FE simulation effectively illustrates the dependence of thermal conductivity on interface structure evolution of the composite. The heat transfer behavior of the Cu-B/diamond composites varies as the boron content increases. In the Cu-0.3 wt%B/diamond composite, most of the heat flow is concentrated and transferred along the diamond particles. In the Cu-1.0 wt%B/diamond composite, the heat flux distribution and flow direction are similar to those in the Cu-0.3 wt%B/diamond composite, but the heat flux is substantially lower. The heat transfer behavior is closely related to the interactions between the two phases in the composite and is intensively influenced by the evolution of interfacial carbide morphology. The FE simulation provides a more accurate prediction of effective thermal conductivity compared to the analytical model calculation, as it considers the reasonable interactions between the two phases relating to the actual interfacial structure. The findings provide a fundamental basis for optimizing the interfacial structure of Cu/diamond composites and further improving their thermal conductivity.

铜/金刚石复合材料是一种很有前途的热管理材料,可用于大功率电子设备的散热。根据透射电子显微镜(TEM)表征的结果,使用有限元(FE)方法构建了铜基体中添加不同硼含量的铜-B/金刚石复合材料的传热模型。然后研究了铜/金刚石复合材料的传热行为。通过分析模型计算和 FE 模拟,将预测的有效热导率与实验值进行了比较。FE 模拟有效地说明了热导率对复合材料界面结构演变的依赖性。铜-B/金刚石复合材料的传热行为随着硼含量的增加而变化。在 Cu-0.3 wt%B/金刚石复合材料中,大部分热流集中并沿着金刚石颗粒传递。在 Cu-1.0 wt%B/金刚石复合材料中,热通量分布和流动方向与 Cu-0.3 wt%B/金刚石复合材料相似,但热通量大大降低。传热行为与复合材料中两相之间的相互作用密切相关,并受到界面碳化物形态演变的严重影响。与分析模型计算相比,FE 模拟能更准确地预测有效热导率,因为它考虑到了与实际界面结构相关的两相之间的合理相互作用。这些发现为优化铜/金刚石复合材料的界面结构和进一步提高其热导率提供了基本依据。
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引用次数: 0
Fractal formalism in crystallized-Ge via Al induced crystallization under ion irradiation 离子辐照下铝诱导结晶态金的分形形式主义
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113646

The fractal characterization of polycrystalline-Ge formed via Al induced crystallization under ion irradiation is presented. The polycrystalline (p-) Al (50 nm)/amorphous (a-) Ge (50 nm) is irradiated using 1000 keV Xe+ ions with fluences of 7 × 1014 ions/cm2, 3 × 1015 ions/cm2 and 1 × 1016 ions/cm2 followed by post-thermal annealing at 200 °C. The pristine (i.e., as-prepared) sample is also thermally annealed for comparison purposes. The X-ray diffraction measurement confirms the crystallization of Ge after thermal annealing in both pristine and ion irradiated samples whereas only ion irradiation does not show any crystallization of Ge. The optical micrograph and field emission scanning electron microscopy (FE-SEM) images show dotted like structures on the surface of the film which are found to increase with increasing ion fluence. The Rutherford backscattering spectrometry and energy dispersive X-ray spectroscopy confirm the layer exchange phenomena at the interface in the p-Al/a-Ge bilayer system with Ge crystallization. The fractal analyses have been carried out on FE-SEM images which confirms the Ge fractals formation due to crystallization of Ge followed by layer exchange. The fractal dimension and hurst exponent are calculated and found that the surface roughness decreases with increasing ion fluence up to the fluence of 3 × 1015 ions/cm2 and then increases at higher fluence.

本文介绍了在离子辐照下通过铝诱导结晶形成的多晶锗的分形特征。使用 1000 keV Xe+ 离子以 7 × 1014 离子/cm2、3 × 1015 离子/cm2 和 1 × 1016 离子/cm2 的通量辐照多晶 (p-) Al (50 nm) / 非晶 (a-) Ge (50 nm),然后在 200 °C 下进行热退火。为便于比较,原始(即制备时)样品也进行了热退火处理。X 射线衍射测量证实,原始样品和离子照射样品在热退火后都出现了 Ge 结晶,而仅离子照射则没有出现任何 Ge 结晶。光学显微照片和场发射扫描电子显微镜(FE-SEM)图像显示,薄膜表面的点状结构随着离子通量的增加而增加。卢瑟福反向散射光谱法和能量色散 X 射线光谱法证实了 p-Al/a-Ge 双层体系界面上的层交换现象与 Ge 结晶。对 FE-SEM 图像进行的分形分析证实了 Ge 结晶后层交换导致的 Ge 分形的形成。通过计算分形维数和赫斯特指数发现,在 3 × 1015 离子/cm2 的离子通量下,表面粗糙度随离子通量的增加而降低,而在更高的离子通量下,表面粗糙度则会增加。
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引用次数: 0
Effect of insulator matrix on electrical transport properties of iron-insulator discontinuous multilayers 绝缘体基质对铁-绝缘体非连续多层膜电传输特性的影响
IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-09-14 DOI: 10.1016/j.vacuum.2024.113650

This work presents the results of the study of structural and electrical transport properties of the iron-insulator discontinuous multilayers (DMIMs). SiO2, HfO2, and MgO were chosen as the materials for the insulating layers. The discontinuous multilayers were prepared by the sequential magnetron sputtering on ceramic substrates. Obtained systems were annealed at different temperatures in an Ar + N2(2 %) environment using an annealing furnace with a continuous gas flow. Crystal structure analysis showed that the effect of annealing on the crystal structure of the samples varies and depends on the annealing temperature and the type of insulator. It has been demonstrated that the formation of iron oxide during annealing can be reduced by using HfO2 as the insulating layer material. The resistivity and temperature coefficient of resistance variation with temperature and the effective thicknesses of the ferromagnetic layers were analyzed.

这项研究成果介绍了铁-绝缘体不连续多层膜(DMIM)的结构和电气传输特性。绝缘层材料选择了二氧化硅、二氧化铪和氧化镁。不连续多层膜是在陶瓷基底上通过顺序磁控溅射制备的。在 Ar + N2(2 %)环境下,使用连续气流退火炉在不同温度下对获得的系统进行退火。晶体结构分析表明,退火对样品晶体结构的影响各不相同,并取决于退火温度和绝缘体类型。实验证明,使用 HfO2 作为绝缘层材料可以减少退火过程中氧化铁的形成。分析了电阻率和电阻温度系数随温度的变化以及铁磁层的有效厚度。
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引用次数: 0
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