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Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)最新文献

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Design of an LVCMOS high resolution frequency synthesizer LVCMOS高分辨率频率合成器的设计
F. Lobato-Lopez, S. Solis-Bustos, H. Sucar
This work presents the design and implementation of a high frequency high resolution clock synthesizer. A phased-locked-loop (PLL) with internal feedback is the core of the synthesizer. The operating frequency range of the PLL oscillator is 1 GHz to 2 GHz. High resolution is achieved by a wide range programmable feedback divider from 1 to 1024 divide factors in steps of 1. A programmable current mode charge pump is designed to manage the wide range feedback divider. Circuit simulation results demonstrate design feasibility. The design was implemented on a 0.18 /spl mu/m low voltage CMOS (LVCMOS) technology.
本文介绍了一种高频高分辨率时钟合成器的设计与实现。带内部反馈的锁相环(PLL)是合成器的核心。锁相环振荡器的工作频率范围为1ghz ~ 2ghz。高分辨率是通过一个宽范围的可编程反馈分频器实现的,分频范围从1到1024,分频系数为1。设计了一种可编程电流模式电荷泵来管理宽范围反馈分压器。电路仿真结果验证了设计的可行性。该设计采用0.18 /spl mu/m低压CMOS (LVCMOS)技术实现。
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引用次数: 0
Multiphase voltage-mode hysteretic controlled VRM with DSP control and novel current sharing 采用DSP控制的多相电压型滞回控制VRM,实现了新颖的共流控制
J. Abu-Qahouq, N. Pongratananukul, I. Batarseh, T. Kasparis
Applying the voltage-mode hysteretic control to multiphase Voltage Regulator Modules (VRMs) can satisfy many of the new and future generation of microprocessors and ICs powering requirements. This is because of the numerous advantages that can be obtained when both techniques are used. However, several challenges arise that include current sharing, multiphase control signals distribution, high-speed comparators noise sensitivity, hysteretic band accuracy and stability, VRM operation startup, and the stability of the controller operation at large load transients. Addressing these challenges cannot be easily achieved using analog and discrete components but rather DSP can be used to solve these problems. In this paper, multiphase voltage-mode hysteretic controlled VRM with DSP control and novel current sharing is proposed.
将电压型迟滞控制应用于多相稳压模块(VRMs)可以满足许多新一代和未来一代微处理器和集成电路的供电要求。这是因为使用这两种技术可以获得许多优点。然而,也出现了一些挑战,包括电流共享、多相控制信号分配、高速比较器噪声灵敏度、滞回带精度和稳定性、VRM运行启动以及控制器在大负载瞬态下运行的稳定性。解决这些挑战不能轻易实现使用模拟和离散元件,而DSP可以用来解决这些问题。本文提出了一种基于DSP控制的多相电压型滞回控制VRM,并采用新颖的共流控制。
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引用次数: 16
Platform III: A new version for the integrated test system for AC machine drives performance analysis 平台三:新版本的交流电机驱动性能分析综合测试系统
J. Restrepo, M. Giménez, V. Guzmán, J. Aller, A. Bueno, A. Millan
This work presents the third version of the "Plataforma" integrated test system, a test rig for experiments required to validate dynamically different types of new strategies and control schemes based on vector control theories, parametric estimation, and neural networks applied to AC machine drives; and to analyze the effect of these control strategies over the mains quality. The equipment includes the AC driver power stages, the mechanical load emulation stage, the instrumentation stage and the signal processing and control stage. Two main improvements have been performed: (1) an improved instrumentation stage; (2) a dynamic load system implemented with a torque controlled DC motor. Due to its high versatility, this test system can be used both in research laboratories and postgraduate courses.
本文介绍了“platform”集成测试系统的第三个版本,这是一个实验平台,用于动态验证基于矢量控制理论、参数估计和应用于交流电机驱动的神经网络的不同类型的新策略和控制方案;并分析了这些控制策略对市电质量的影响。该设备包括交流驱动电源阶段、机械负载仿真阶段、仪表阶段和信号处理与控制阶段。主要进行了两项改进:(1)改进了仪器仪表阶段;(2)采用转矩控制直流电动机实现动态负载系统。由于它的高通用性,该测试系统既可以用于研究实验室,也可以用于研究生课程。
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引用次数: 21
Schottky barrier lowering in Mo/n-Si contacts at the reverse bias 反向偏压下Mo/n-Si触点的肖特基势垒降低
V.S. Pitanov, A. Yakimenko
We have investigated I-V characteristics of nearly ideal Schottky contacts Mo/n-Si by power exponent method in order to determine physical phenomena which bear responsibility for reverse current soft behavior. The static and differential resistances as functions of reverse bias were studied. They allowed to obtain power exponent depending on the applied reverse bias. The absolute values of Schottky barrier lowerings were found up to 50 V. Nonlinear regression analysis was used for determining of basic effects, which give rise to barrier lowering in Mo/n-Si contacts. There are interfacial image forces and dipole effect, created by electric field increasing at the metal-semiconductor boundary owing to reverse voltage growth. The largest absolute value of barrier lowering is equal to 4.8 kT (0,12 eV) at 50 V and not exceed by 18% of zero-bias Schottky barrier height. It is established that thermoionic-field emission and barrier height inhomogeneities are not substantial in comparison with both above-mentioned effects.
本文用幂指数法研究了Mo/n-Si近理想肖特基触点的I-V特性,以确定导致反向电流软行为的物理现象。研究了静态电阻和微分电阻随反向偏压的变化规律。它们允许根据应用的反向偏置获得功率指数。肖特基势垒衰减的绝对值高达50 V。用非线性回归分析确定了Mo/n-Si接触中引起势垒降低的基本效应。由于电压反向增长,在金属-半导体边界处电场增大,产生界面像力和偶极子效应。势垒降低的最大绝对值等于50 V时的4.8 kT (0,12 eV),不超过零偏置肖特基势垒高度的18%。与上述两种效应相比,热离子场发射和势垒高度的不均匀性并不明显。
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引用次数: 1
A comparison of Spice-based and carrier transport based simulations of plasma spread in thyristors 基于香料和载流子输运的晶闸管等离子体扩散模拟的比较
R. Quintero, A. Cerdeira
The transient current density distribution in the plane XZ parallel to the electrodes of thyristors and other 4-layer devices is of interest. Since numerical simulations based on the carrier transport equations that include the XZ plane would have to be carried out in 3D, they would become time consuming and expensive. Spice-based XZ simulators as reported in literature are much faster, but the results depend strongly on the necessarily simple equivalent circuits that are used. This paper compares plasma spread simulations in a thyristor, done with an XZ Spice-based simulator previously reported by the authors, with 2D-XY simulations based on the carrier transport equations. It found that for the simulated structure, plasma spread velocity deviates +38% at the beginning of the transient, and -32% near the end of it. On the other hand, for the XZ simulations, it is assumed that the anode current is perpendicular to the XZ plane, and, therefore, the number of discrete elements depend on the extent of validity of that assumption. From the XY simulations it is confirmed that the current flow is almost parallel to the Y direction, making possible high degrees of XZ discretizations.
在平行于晶闸管和其他四层器件电极的XZ平面上的瞬态电流密度分布令人感兴趣。由于基于载流子输运方程(包括XZ平面)的数值模拟必须以3D形式进行,因此它们将变得既耗时又昂贵。文献中报道的基于香料的XZ模拟器要快得多,但结果强烈依赖于所使用的必要的简单等效电路。本文比较了用XZ spice模拟器在晶闸管中进行的等离子体扩散模拟,以及基于载流子输运方程的2D-XY模拟。研究发现,对于模拟结构,等离子体扩散速度在瞬态开始时偏离+38%,在瞬态结束时偏离-32%。另一方面,对于XZ模拟,假设阳极电流垂直于XZ平面,因此,离散元件的数量取决于该假设的有效性程度。从XY模拟可以证实,电流流动几乎平行于Y方向,使得高度的XZ离散化成为可能。
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引用次数: 2
A new approach for modelling the thermal behaviour of bipolar transistors 一种模拟双极晶体管热行为的新方法
H. Mnif, T. Zimmer, J. Battaglia, B. Ardouin, D. Berger, D. Céli
A new physical model which describes the self-heating phenomena - the device temperature rise due to its own internal power dissipation - is presented. It permits the accurate temporal response determination of the BJT junction's temperature rise. This model is validated using measurements from an silicon-germanium heterojunction bipolar transistor (Si-Ge HBT).
提出了一种新的物理模型来描述器件自身内部功耗引起的温升现象。它允许精确的BJT结温升的时间响应测定。该模型是验证使用测量从硅锗异质结双极晶体管(Si-Ge HBT)。
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引用次数: 3
Identifying positive feedback structures for assessing the uniqueness of the DC solution by using topological conditions 通过使用拓扑条件确定用于评估直流解的唯一性的正反馈结构
L. Hernández-Martínez, H. Vázquez-Leal, A. Sarmiento-Reyes
This paper presents a method focused on assessing the uniqueness of the DC solution of transistor networks. It determines the conditions for such a network in order to possess multiple DC operating points. The method is based on identifying positive feedback structures (PFSs) by resorting to the definitions given by Hasler (Fosseprez et al, IEEE Trans. Circuits and Sys. vol. 18, no. 3, pp. 393-402, 1989; Hasler, Int. J. Circuit Theory and Appl., vol. 14, pp. 237-262, 1986; Fosseprez and Hasler, ibid., vol. 18, no. 6, pp. 625-638, 1990). The topological conditions for the existence of PFSs at nullator and norator level are established.
本文提出了一种评估晶体管网络直流解的唯一性的方法。它确定了这样一个网络的条件,以便拥有多个直流工作点。该方法是基于识别正反馈结构(pfs),通过求助于Hasler (Fosseprez等人,IEEE Trans.)给出的定义。电路与系统第18卷,没有。3,第393-402页,1989;Hasler) Int。电路理论与应用。,第14卷,第237-262页,1986年;福塞普雷兹和哈斯勒,同上,第18卷,第2号。6, 625-638页,1990)。建立了空化和调节能级pfs存在的拓扑条件。
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引用次数: 0
Macro-modeling for MOS device simulation MOS器件仿真宏建模
T. Rodrigo-Rodriguez, E. Gutiérrez-D., R. Arturo-Sarmiento, S. Selberherr
By making use of the MOS diode theory, the carrier, and current distribution, as well as the mobility in a MOS device is evaluated. Simple analytical expressions are used for parameters like mobility, carrier concentration, and transversal electric field. Agreement between experimental and simulated results from an LDD MOSFET and an n-well resistance is in agreement, probing this approach is suitable as a plug-in model tester for quick model evaluation.
利用MOS二极管理论,对MOS器件中的载流子、电流分布和迁移率进行了评价。对于迁移率、载流子浓度和横向电场等参数,使用简单的解析表达式。LDD MOSFET和n阱电阻的实验和模拟结果一致,探测该方法适合作为快速模型评估的插入式模型测试仪。
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引用次数: 0
Very low photo-CVD deposition rate process for high quality thin SiO/sub 2/ films 高质量SiO/ sub2 /薄膜的极低光- cvd沉积速率工艺
V.M. Sanchez-Z, J. Munguía, M. Estrada
Very low deposition rates, below 0.56 nm/min, of SiO/sub 2/ were investigated using photo-induced chemical vapor deposition (photo-CVD). These low deposition rates are adequate to grow very thin and ultra thin layers of SiO/sub 2/. Details on the design of the reaction chamber, reactive gases and process parameters to obtain the desired deposition regime are presented. Dependence of deposition rate on pressure in the chamber is discussed. Deposited layers were characterized using I-V and C-V techniques.
利用光致化学气相沉积技术(photocvd)研究了SiO/sub 2/的极低沉积速率(低于0.56 nm/min)。这些低沉积速率足以生长非常薄和超薄的SiO/sub 2/层。详细介绍了反应室、反应气体和工艺参数的设计,以获得所需的沉积制度。讨论了沉积速率与腔内压力的关系。利用I-V和C-V技术对沉积层进行了表征。
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引用次数: 0
Characterisation of microcontroller susceptibility to radio frequency interference 微控制器对射频干扰敏感性的表征
S. Baffreau, S. Bendhia, M. Ramdani, E. Sicard
Work in the field of electromagnetic compatibility (EMC), generally concentrating on noise and interference at electronic systems, has recently focused more attention on integrated circuits (ICs). In this work, we mainly focus on immunity of programmable devices to radio frequency interference (RFI). This paper presents various kinds of RFI and how it can be coupled to a digital signal processor (DSP) or micro-controller. A new approach for immunity measurement is introduced and some ways to improve embedded software are proposed.
电磁兼容(EMC)领域的工作,通常集中在电子系统的噪声和干扰,最近更多地关注集成电路(ic)。本文主要研究可编程器件对射频干扰(RFI)的抗扰性。本文介绍了各种RFI及其如何与数字信号处理器(DSP)或微控制器耦合。介绍了一种新的抗扰度测量方法,并提出了改进嵌入式软件的方法。
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引用次数: 23
期刊
Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)
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