首页 > 最新文献

Active and Passive Electronic Components最新文献

英文 中文
A Novel Inverter Topology for Single-Phase Transformerless PV System 一种单相无变压器光伏系统逆变器拓扑结构
IF 0.4 Q3 Engineering Pub Date : 2016-01-13 DOI: 10.1155/2016/1962438
H. Cao
Transformerless photovoltaic (PV) power system is very promising due to its low cost, small size, and high efficiency. One of its most important issues is how to prevent the common mode leakage current. In order to solve the problem, a new inverter is proposed in this paper. The system common mode model is established, and the four operation modes of the inverter are analyzed. It reveals that the common mode voltage can be kept constant, and consequently the leakage current can be suppressed. Finally, the experimental tests are conducted. The experimental results verify the effectiveness of the proposed solution.
无变压器光伏发电系统具有成本低、体积小、效率高等优点,具有广阔的应用前景。其最重要的问题之一是如何防止共模漏电流。为了解决这一问题,本文提出了一种新型逆变器。建立了系统共模模型,分析了逆变器的四种工作模式。结果表明,共模电压可以保持恒定,从而可以抑制泄漏电流。最后进行了实验测试。实验结果验证了该方法的有效性。
{"title":"A Novel Inverter Topology for Single-Phase Transformerless PV System","authors":"H. Cao","doi":"10.1155/2016/1962438","DOIUrl":"https://doi.org/10.1155/2016/1962438","url":null,"abstract":"Transformerless photovoltaic (PV) power system is very promising due to its low cost, small size, and high efficiency. One of its most important issues is how to prevent the common mode leakage current. In order to solve the problem, a new inverter is proposed in this paper. The system common mode model is established, and the four operation modes of the inverter are analyzed. It reveals that the common mode voltage can be kept constant, and consequently the leakage current can be suppressed. Finally, the experimental tests are conducted. The experimental results verify the effectiveness of the proposed solution.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/1962438","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64253627","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
A Structural Based Thermal Model Description for Vertical SiC Power MOSFETs under Fault Conditions 故障条件下垂直SiC功率mosfet的结构热模型描述
IF 0.4 Q3 Engineering Pub Date : 2016-01-01 DOI: 10.1155/2016/9414901
A. Maerz, Teresa Bertelshofer, M. Bakran
The accurate prediction of the SiC MOSFET withstanding time for single fault events greatly influences the requirements for device protection circuits for these devices in power converter applications, like voltage source inverters or power electronic transformers. For this reason, a thermal model, based on the structural design and the physical dimensions of the chip as well as material properties of 4H-SiC, is proposed. This article gives a general description of the thermal behaviour of vertical SiC MOSFET under various driving and boundary conditions in case of a short-circuit event. The thermal model substitutes destructive tests of a device for an individual set of boundary conditions of an occurring fault event. The validity of the analytically parametrised thermal model is verified by experimental short-circuit tests of state-of-the-art vertical SiC MOSFETs for a set of various boundary conditions. The investigated thermal model can furthermore be used to standardise different gate-oxide degradation values from the literature for means of lifetime prediction of the gate oxide for an individual application under repetitive occurring fault or overload conditions. These manufacturer specific reported values measured with no standardised testing procedures can be translated into a maximum junction temperature, which is repeatedly reached. The thermal model therefore provides a unifying parameter for the gate-oxide lifetime calculation for an individual chip and application.
SiC MOSFET对单次故障事件耐受时间的准确预测,极大地影响了电压源逆变器或电力电子变压器等功率变换器应用中对这些器件的器件保护电路的要求。因此,基于芯片的结构设计和物理尺寸以及4H-SiC的材料特性,提出了一种热模型。本文对垂直SiC MOSFET在各种驱动和边界条件下发生短路时的热行为进行了一般描述。热模型用一个装置的破坏性试验来代替一个正在发生的故障事件的一组单独的边界条件。通过在不同边界条件下对最先进的垂直SiC mosfet进行短路实验,验证了解析参数化热模型的有效性。所研究的热模型还可以用于标准化文献中不同的栅极氧化物降解值,以便在重复发生故障或过载条件下对单个应用的栅极氧化物进行寿命预测。这些制造商特定的报告值测量没有标准化的测试程序可以转化为最大结温,这是反复达到。因此,热模型为单个芯片和应用的栅极氧化寿命计算提供了统一的参数。
{"title":"A Structural Based Thermal Model Description for Vertical SiC Power MOSFETs under Fault Conditions","authors":"A. Maerz, Teresa Bertelshofer, M. Bakran","doi":"10.1155/2016/9414901","DOIUrl":"https://doi.org/10.1155/2016/9414901","url":null,"abstract":"The accurate prediction of the SiC MOSFET withstanding time for single fault events greatly influences the requirements for device protection circuits for these devices in power converter applications, like voltage source inverters or power electronic transformers. For this reason, a thermal model, based on the structural design and the physical dimensions of the chip as well as material properties of 4H-SiC, is proposed. This article gives a general description of the thermal behaviour of vertical SiC MOSFET under various driving and boundary conditions in case of a short-circuit event. The thermal model substitutes destructive tests of a device for an individual set of boundary conditions of an occurring fault event. The validity of the analytically parametrised thermal model is verified by experimental short-circuit tests of state-of-the-art vertical SiC MOSFETs for a set of various boundary conditions. The investigated thermal model can furthermore be used to standardise different gate-oxide degradation values from the literature for means of lifetime prediction of the gate oxide for an individual application under repetitive occurring fault or overload conditions. These manufacturer specific reported values measured with no standardised testing procedures can be translated into a maximum junction temperature, which is repeatedly reached. The thermal model therefore provides a unifying parameter for the gate-oxide lifetime calculation for an individual chip and application.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/9414901","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64613646","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Impact of Band Nonparabolicity on Threshold Voltage of Nanoscale SOI MOSFET 带非抛物性对纳米SOI MOSFET阈值电压的影响
IF 0.4 Q3 Engineering Pub Date : 2016-01-01 DOI: 10.1155/2016/6068171
Y. Omura
This paper reconsiders the mathematical formulation of the conventional nonparabolic band model and proposes a model of the effective mass of conduction band electrons including the nonparabolicity of the conduction band. It is demonstrated that this model produces realistic results for a sub-10-nm-thick Si layer surrounded by an SiO2 layer. The major part of the discussion is focused on the low-dimensional electron system confined with insulator barriers. To examine the feasibility of our consideration, the model is applied to the threshold voltage of nanoscale SOI FinFETs and compared to prior experimental results. This paper also addresses a model of the effective mass of valence band holes assuming the nonparabolic condition.
本文重新考虑了传统的非抛物带模型的数学表达式,提出了一个考虑导带非抛物性的导带电子有效质量模型。结果表明,该模型对厚度小于10nm的硅层和被SiO2层包裹的硅层具有较好的模拟效果。讨论的主要部分集中在受绝缘体势垒限制的低维电子系统上。为了验证我们考虑的可行性,将该模型应用于纳米级SOI finfet的阈值电压,并与先前的实验结果进行了比较。本文还讨论了在非抛物条件下价带空穴有效质量的模型。
{"title":"Impact of Band Nonparabolicity on Threshold Voltage of Nanoscale SOI MOSFET","authors":"Y. Omura","doi":"10.1155/2016/6068171","DOIUrl":"https://doi.org/10.1155/2016/6068171","url":null,"abstract":"This paper reconsiders the mathematical formulation of the conventional nonparabolic band model and proposes a model of the effective mass of conduction band electrons including the nonparabolicity of the conduction band. It is demonstrated that this model produces realistic results for a sub-10-nm-thick Si layer surrounded by an SiO2 layer. The major part of the discussion is focused on the low-dimensional electron system confined with insulator barriers. To examine the feasibility of our consideration, the model is applied to the threshold voltage of nanoscale SOI FinFETs and compared to prior experimental results. This paper also addresses a model of the effective mass of valence band holes assuming the nonparabolic condition.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/6068171","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64456737","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Apodization Optimization of FBG Strain Sensor for Quasi-Distributed Sensing Measurement Applications 准分布式传感测量应用中光纤光栅应变传感器的解耦优化
IF 0.4 Q3 Engineering Pub Date : 2016-01-01 DOI: 10.1155/2016/6523046
F. Chaoui, O. Aghzout, Mounia Chakkour, M. E. Yakhloufi
A novel optimized apodization of Fiber Bragg Grating Sensor (FBGS) for quasi-distributed strain sensing applications is developed and introduced in this paper. The main objective of the proposed optimization is to obtain a reflectivity level higher than 90% and a side lobe level around −40 dB, which is suitable for use in quasi-distributed strain sensing application. For this purpose, different design parameters as apodization profile, grating length, and refractive index have been investigated to enhance and optimize the FBGS design. The performance of the proposed apodization has then been compared in terms of reflectivity, side lobe level (SLL), and full width at half maximum (FWHM) with apodization profiles proposed by other authors. The optimized sensor is integrated on quasi-distributed sensing system of 8 sensors demonstrating high reliability. Wide strain sensitivity range for each channel has also been achieved in the quasi-distributed system. Results prove the efficiency of the proposed optimization which can be further implemented for any quasi-distributed sensing application.
本文介绍了一种用于准分布式应变传感的新型光纤布拉格光栅传感器优化设计方法。所提出的优化的主要目标是获得高于90%的反射率水平和约−40 dB的旁瓣电平,这适用于准分布式应变传感应用。为此,研究了不同的设计参数,如消光轮廓、光栅长度和折射率,以增强和优化FBGS的设计。然后,根据反射率、旁瓣电平(SLL)和半最大值全宽度(FWHM)与其他作者提出的apodization剖面进行了性能比较。优化后的传感器集成在由8个传感器组成的准分布式传感系统上,具有较高的可靠性。在准分布式系统中,每个通道的应变灵敏度范围也很宽。结果证明了该优化方法的有效性,可进一步应用于任何准分布式传感应用。
{"title":"Apodization Optimization of FBG Strain Sensor for Quasi-Distributed Sensing Measurement Applications","authors":"F. Chaoui, O. Aghzout, Mounia Chakkour, M. E. Yakhloufi","doi":"10.1155/2016/6523046","DOIUrl":"https://doi.org/10.1155/2016/6523046","url":null,"abstract":"A novel optimized apodization of Fiber Bragg Grating Sensor (FBGS) for quasi-distributed strain sensing applications is developed and introduced in this paper. The main objective of the proposed optimization is to obtain a reflectivity level higher than 90% and a side lobe level around −40 dB, which is suitable for use in quasi-distributed strain sensing application. For this purpose, different design parameters as apodization profile, grating length, and refractive index have been investigated to enhance and optimize the FBGS design. The performance of the proposed apodization has then been compared in terms of reflectivity, side lobe level (SLL), and full width at half maximum (FWHM) with apodization profiles proposed by other authors. The optimized sensor is integrated on quasi-distributed sensing system of 8 sensors demonstrating high reliability. Wide strain sensitivity range for each channel has also been achieved in the quasi-distributed system. Results prove the efficiency of the proposed optimization which can be further implemented for any quasi-distributed sensing application.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/6523046","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64482457","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
Design of a Narrow Bandwidth Bandpass Filter Using Compact Spiral Resonator with Chirality 利用具有手性的紧凑螺旋谐振器设计窄带宽带通滤波器
IF 0.4 Q3 Engineering Pub Date : 2016-01-01 DOI: 10.1155/2016/7074392
Weiping Li, Z. Tang, Xin Cao
In this article, a compact narrow-bandpass filter with high selectivity and improved rejection level is presented. For miniaturization, a pair of double negative (DNG) cells consisting of quasi-planar chiral resonators are cascaded and electrically loaded to a microstrip transmission line; short ended stubs are introduced to expand upper rejection band. The structure is analyzed using equivalent circuit models and simulated based on EM simulation software. For validation, the proposed filter is fabricated and measured. The measured results are in good agreement with the simulated ones. By comparing to other filters in the references, it is shown that the proposed filter has the advantage of skirt selectivity and compact size, so it can be integrated more conveniently in modern wireless communication systems and microwave planar circuits.
本文提出了一种紧凑的窄带通滤波器,具有高选择性和高抑制水平。为了小型化,一对双负(DNG)电池组成的准平面手性谐振器级联和电负载到微带传输线;引入短端存根以扩大上部抑制带。利用等效电路模型对其结构进行了分析,并利用电磁仿真软件对其进行了仿真。为了验证,制作并测量了所提出的滤波器。实测结果与模拟结果吻合较好。通过与文献中其他滤波器的比较,表明该滤波器具有裙边选择性好、体积小等优点,可以更方便地集成到现代无线通信系统和微波平面电路中。
{"title":"Design of a Narrow Bandwidth Bandpass Filter Using Compact Spiral Resonator with Chirality","authors":"Weiping Li, Z. Tang, Xin Cao","doi":"10.1155/2016/7074392","DOIUrl":"https://doi.org/10.1155/2016/7074392","url":null,"abstract":"In this article, a compact narrow-bandpass filter with high selectivity and improved rejection level is presented. For miniaturization, a pair of double negative (DNG) cells consisting of quasi-planar chiral resonators are cascaded and electrically loaded to a microstrip transmission line; short ended stubs are introduced to expand upper rejection band. The structure is analyzed using equivalent circuit models and simulated based on EM simulation software. For validation, the proposed filter is fabricated and measured. The measured results are in good agreement with the simulated ones. By comparing to other filters in the references, it is shown that the proposed filter has the advantage of skirt selectivity and compact size, so it can be integrated more conveniently in modern wireless communication systems and microwave planar circuits.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/7074392","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64504323","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Considerations of Physical Design and Implementation for 5 MHz-100 W LLC Resonant DC-DC Converters 5mhz - 100w LLC谐振DC-DC变换器物理设计与实现的考虑
IF 0.4 Q3 Engineering Pub Date : 2016-01-01 DOI: 10.1155/2016/4027406
Akinori Hariya, K. Matsuura, H. Yanagi, S. Tomioka, Y. Ishizuka, T. Ninomiya
Recently, high power-density, high power-efficiency, and wide regulation range isolated DC-DC converters have been required. This paper presents considerations of physical design and implementation for wide regulation range MHz-level LLC resonant DC-DC converters. The circuit parameters are designed with 3–5 MHz-level switching frequency. Also, the physical parameters and the size of the planar transformer are optimized by using derived equations and finite element method (FEM) with Maxwell 3D. Some experiments are done with prototype LLC resonant DC-DC converter using gallium nitride high electron mobility transistors (GaN-HEMTs); the input voltage is 42–53 V, the reference output voltage is 12 V, the load current is 8 A, the maximum switching frequency is about 5 MHz, the total volume of the circuit is 4.1 cm3, and the power density of the prototype converter is 24.4 W/cc.
近年来,人们对高功率密度、高功率效率和宽调节范围的隔离型DC-DC变换器提出了更高的要求。本文介绍了宽调节范围mhz级LLC谐振DC-DC变换器的物理设计与实现。电路参数设计为3-5 mhz级开关频率。利用推导方程和Maxwell 3D有限元法对平面变压器的物理参数和尺寸进行了优化。利用氮化镓高电子迁移率晶体管(GaN-HEMTs)进行了LLC谐振DC-DC变换器的实验;输入电压为42 ~ 53 V,参考输出电压为12 V,负载电流为8 A,最大开关频率约为5 MHz,电路总体积4.1 cm3,样机变换器功率密度为24.4 W/cc。
{"title":"Considerations of Physical Design and Implementation for 5 MHz-100 W LLC Resonant DC-DC Converters","authors":"Akinori Hariya, K. Matsuura, H. Yanagi, S. Tomioka, Y. Ishizuka, T. Ninomiya","doi":"10.1155/2016/4027406","DOIUrl":"https://doi.org/10.1155/2016/4027406","url":null,"abstract":"Recently, high power-density, high power-efficiency, and wide regulation range isolated DC-DC converters have been required. This paper presents considerations of physical design and implementation for wide regulation range MHz-level LLC resonant DC-DC converters. The circuit parameters are designed with 3–5 MHz-level switching frequency. Also, the physical parameters and the size of the planar transformer are optimized by using derived equations and finite element method (FEM) with Maxwell 3D. Some experiments are done with prototype LLC resonant DC-DC converter using gallium nitride high electron mobility transistors (GaN-HEMTs); the input voltage is 42–53 V, the reference output voltage is 12 V, the load current is 8 A, the maximum switching frequency is about 5 MHz, the total volume of the circuit is 4.1 cm3, and the power density of the prototype converter is 24.4 W/cc.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/4027406","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64362220","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Semiconductors: Materials, Physics, and Devices 半导体:材料、物理和器件
IF 0.4 Q3 Engineering Pub Date : 2016-01-01 DOI: 10.1155/2016/4523960
Jiangwei Liu, Hong Zhao, Jinlong Liu, A. Maréchal, Wei Wang
1Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan 2Department of Materials Science and Engineering, Wuhan Institute of Technology, Wuhan 430073, China 3School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China 4School of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an, Shaanxi 710049, China
1国家材料科学研究所功能材料研究中心,茨城市筑波纳米1-1,茨城市3050044 2武汉理工大学材料科学与工程系,武汉430073 3北京科技大学材料科学与工程学院,北京100083 4西安交通大学电子信息工程学院,陕西西安710049
{"title":"Semiconductors: Materials, Physics, and Devices","authors":"Jiangwei Liu, Hong Zhao, Jinlong Liu, A. Maréchal, Wei Wang","doi":"10.1155/2016/4523960","DOIUrl":"https://doi.org/10.1155/2016/4523960","url":null,"abstract":"1Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan 2Department of Materials Science and Engineering, Wuhan Institute of Technology, Wuhan 430073, China 3School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China 4School of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an, Shaanxi 710049, China","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2016-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2016/4523960","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64386009","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Anomalous DIBL Effect in Fully Depleted SOI MOSFETs Using Nanoscale Gate-Recessed Channel Process 利用纳米栅极凹槽工艺研究完全耗尽SOI mosfet的异常DIBL效应
IF 0.4 Q3 Engineering Pub Date : 2015-10-28 DOI: 10.1155/2015/609828
A. Karsenty, A. Chelly
Nanoscale Gate-Recessed Channel (GRC) Fully Depleted- (FD-) SOI MOSFET device with a silicon channel thickness () as low as 2.2 nm was first tested at room temperature for functionality check and then tested at low temperature (77 K) for characterizations. In spite of its FD-SOI nanoscale thickness and long channel feature, the device has surprisingly exhibited a Drain-Induced Barrier Lowering (DIBL) effect at RT. However, this effect was suppressed at 77 K. If the apparition of such anomalous effect can be explained by a parasitic short channel transistor located at the edges of the channel, its suppression is explained by the decrease of the potential barrier between the drain and the channel when lowering the temperature.
首先在室温下测试了硅沟道厚度()低至2.2 nm的纳米栅极凹槽(GRC)完全耗尽- (FD-) SOI MOSFET器件的功能检查,然后在低温(77 K)下进行了表征测试。尽管其FD-SOI具有纳米级厚度和长沟道特性,但该器件在室温下令人惊讶地表现出漏极诱导势垒降低(DIBL)效应。然而,这种效应在77 K时被抑制。如果这种异常效应的出现可以用位于沟道边缘的寄生短沟道晶体管来解释,那么它的抑制可以用降低温度时漏极和沟道之间的势垒降低来解释。
{"title":"Anomalous DIBL Effect in Fully Depleted SOI MOSFETs Using Nanoscale Gate-Recessed Channel Process","authors":"A. Karsenty, A. Chelly","doi":"10.1155/2015/609828","DOIUrl":"https://doi.org/10.1155/2015/609828","url":null,"abstract":"Nanoscale Gate-Recessed Channel (GRC) Fully Depleted- (FD-) SOI MOSFET device with a silicon channel thickness () as low as 2.2 nm was first tested at room temperature for functionality check and then tested at low temperature (77 K) for characterizations. In spite of its FD-SOI nanoscale thickness and long channel feature, the device has surprisingly exhibited a Drain-Induced Barrier Lowering (DIBL) effect at RT. However, this effect was suppressed at 77 K. If the apparition of such anomalous effect can be explained by a parasitic short channel transistor located at the edges of the channel, its suppression is explained by the decrease of the potential barrier between the drain and the channel when lowering the temperature.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2015-10-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2015/609828","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"65056623","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A High Efficiency Li-Ion Battery LDO-Based Charger for Portable Application 一种便携式高效锂离子电池ldo充电器
IF 0.4 Q3 Engineering Pub Date : 2015-09-07 DOI: 10.1155/2015/591986
Youssef Ziadi, H. Qjidaa
This paper presents a high efficiency Li-ion battery LDO-based charger IC which adopted a three-mode control: trickle constant current, fast constant current, and constant voltage modes. The criteria of the proposed Li-ion battery charger, including high accuracy, high efficiency, and low size area, are of high importance. The simulation results provide the trickle current of 116 mA, maximum charging current of 448 mA, and charging voltage of 4.21 V at the power supply of 4.8–5 V, using 0.18 μm CMOS technology.
本文设计了一种高效锂离子电池ldo充电器IC,采用涓流恒流、快速恒流和恒压三种模式控制。所提出的锂离子电池充电器的标准,包括高精度、高效率和小尺寸面积,是非常重要的。仿真结果表明,在4.8 ~ 5 V电源下,采用0.18 μm CMOS工艺,该器件的涓流电流为116 mA,最大充电电流为448 mA,充电电压为4.21 V。
{"title":"A High Efficiency Li-Ion Battery LDO-Based Charger for Portable Application","authors":"Youssef Ziadi, H. Qjidaa","doi":"10.1155/2015/591986","DOIUrl":"https://doi.org/10.1155/2015/591986","url":null,"abstract":"This paper presents a high efficiency Li-ion battery LDO-based charger IC which adopted a three-mode control: trickle constant current, fast constant current, and constant voltage modes. The criteria of the proposed Li-ion battery charger, including high accuracy, high efficiency, and low size area, are of high importance. The simulation results provide the trickle current of 116 mA, maximum charging current of 448 mA, and charging voltage of 4.21 V at the power supply of 4.8–5 V, using 0.18 μm CMOS technology.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2015-09-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2015/591986","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"65048196","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Thermomechanical Behaviour of a PWB by Speckle Interferometry Technique 用散斑干涉技术研究PWB的热力学行为
IF 0.4 Q3 Engineering Pub Date : 2015-08-18 DOI: 10.1155/2015/141583
B. Trentadue, Giuseppe Illuzzi
The speckle interferometry technique has been used in this work in order to determine the thermomechanical behaviour of Printed Wiring Board (PWB) (circuits) of a radio integrated with tape player and speakers. A preliminary experiment of such technique has been carried out on a single electronic component (silicon transistor), during the thermal transient and at the steady state. The thermal deformation and stresses on PWB have been obtained through related experimental analyses on both cases. The results showed a very good applicability of speckle technique on the irregular object surface as PWB.
本文采用散斑干涉测量技术,对带式磁带播放机和扬声器集成的收音机的印刷线路板(PWB)电路的热力学特性进行了研究。在单个电子元件(硅晶体管)上进行了热瞬态和稳态的初步实验。通过对两种情况的相关实验分析,得到了压板的热变形和应力。结果表明,散斑技术在不规则物体表面有很好的适用性。
{"title":"Thermomechanical Behaviour of a PWB by Speckle Interferometry Technique","authors":"B. Trentadue, Giuseppe Illuzzi","doi":"10.1155/2015/141583","DOIUrl":"https://doi.org/10.1155/2015/141583","url":null,"abstract":"The speckle interferometry technique has been used in this work in order to determine the thermomechanical behaviour of Printed Wiring Board (PWB) (circuits) of a radio integrated with tape player and speakers. A preliminary experiment of such technique has been carried out on a single electronic component (silicon transistor), during the thermal transient and at the steady state. The thermal deformation and stresses on PWB have been obtained through related experimental analyses on both cases. The results showed a very good applicability of speckle technique on the irregular object surface as PWB.","PeriodicalId":43355,"journal":{"name":"Active and Passive Electronic Components","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2015-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1155/2015/141583","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"64804043","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
期刊
Active and Passive Electronic Components
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1